New diluted ferromagnets based on diamond-like semiconductors GaSb,InSb, InAs,Ge, and Si,supersaturated with manganese or iron impurities during laser epitaxy

The electric, magnetic, and magneto-optical properties of thin (50–100 nm) GaSb:Mn, InSb:Mn, InAs:Mn, Ge:Mn, Ge:Fe, Si:Mn, and Si:Fe layers with a Curie point up to 500 K, obtained by laser plasma deposition in vacuum in the case of strong supersaturation of a solid solution with a 3d impurity, have been experimentally investigated.     

High-temperature ferromagnetism in laser-deposited layers of silicon and germanium doped with manganese or iron impurities

The paper reports on the results of a study of the synthesis conditions effects on magnetic and transport properties of nanosized layers of high-T_c diluted magnetic semiconductors (DMS), such as Ge:Mn, Si:Mn and Si:Fe, fabricated by laser-plasma deposition over a wide range of the growth temperature, T_g=(20-550) °C on single-crystal GaAs or Al₂O₃ substrates. Ferromagnetism of the layers was detected by measurement data of the magneto-optical Kerr effect, anomalous Hall effect, negative magnetoresistance and ferromagnetic resonance (FMR) at 5-500 K. The optimum growth temperature, T_g, for Si:Mn/GaAs layers with T_c≈400 K is shown to be about 400 °C. The Si:Mn/Al₂O₃ layers with 35% of Mn have the metal-type of conductivity with manifestation of magnetization up to room temperature. Different types of uniformly doped structures and digital alloys have been investigated. In contrast to GaSb:Mn films, Si-based ferromagnetic layers have strongly different magnetic and electric properties in case of uniformly doped structures and digital alloys. Positive results of the Fermi level variation effect on the improvement of Si- and Ge-based DMS layers have been gained on the use of additional doping with shallow acceptor Al impurity which contributes to the increase of the hole concentration and the RKKY exchange interaction of 3d-ions. The Ge:(Mn, Al)/GaAs or Ge (Mn, Al)/Si layers grown at 20 °C feature surprising extraordinary angular dependence of FMR.     

Laser-induced damage in InSb at 1.06 μm wavelength—a comparative study with Ge, Si and GaAs

This paper deals with the study of laser-induced damage in n-type single crystal InSb irradiated with a Nd: glass laser of 1.06 μm wavelength and 300 μs pulse duration. Samples of different surface quality were prepared by mechanical lapping and polishing by diamond paste. Evolution of damage morphological features observed at different power densities is discussed. Damage threshold results are analysed in terms of a thermal model taking into account the temperature dependence of various physical parameters and using the finite difference method of calculation. A comparative study of laser induced damage in InSb, Ge, Si and GaAs irradiated under similar conditions is also presented.     

Photoionization cross-section and binding energy of donor impurities in GaAs, Ge and Si quantum wires with infinite barriers

Within the effective-mass approximation, we have investigated the binding energies of donor impurities as a function of the wire dimensions and the photoionization cross-section for a hydrogenic donor impurity placed on the center of the quantum well-wire as a function of the normalized photon energy in the GaAs, Ge and Si quantum wires with infinite barriers. The calculations are performed by the variational method based on a two-parametric trial wave function. The results show that the impurity binding energy and the photoionization cross-section depend strongly on both wire dimensions and material parameters.     

First principle calculations of thermodynamic properties of pure graphene sheet and graphene sheets with Si,Ge,Fe,and Co impurities

The thermal properties of pure graphene and graphene–impurity(impurity = Fe,Co,Si,and Ge) sheets have been investigated at various pressures(0–7 GPa) and temperatures(0–900 K).Some basic thermodynamic quantities such as bulk modulus,coefficient of volume thermal expansion,heat capacities at constant pressure and constant volume of these sheets as a function of temperature and pressure are discussed.Furthermore,the effect of the impurity density and tensile strain on the thermodynamic properties of these sheets are investigated.All of these calculations are performed based on the density functional theory and full quasi harmonic approximation.     

Use of the integer and non-integer n-dimensional Debye functions in computing thermal expansivity,with applications to Si and Ge semiconductors

In the present study, a novel method is proposed to accurately calculate the thermal expansivity of semiconductors using the analytical expression obtained for the integer and non-integer n-dimensional Debye functions. The proposed approach is novel as it uses the non-integer n-dimensional Debye functions for the accurate calculations of the thermal expansivities of semiconductors. As an example of the application, the calculation is performed for the thermal expansivities of the Si and Ge semiconductors. Analysis using computer simulation proved that the formula was in excellent agreement with the results reported in the literature.     

Pulsewidth-dependence of nonlinear energy deposition and redistribution in Si, GaAs and Ge during 1 μm picosecond irradiation

We have used 1 μm pulses ranging in duration from 4–260 ps to measure the pulsewidth dependence of the nonlinear absorption, melting threshold, and resolidification morphologies of Si, GaAs, and Ge. With these materials, we have been able to quantify a variety of nonlinear absorption processes with a single excitation wavelength. We find that the fluence required to melt Si and GaAs is roughly proportional to the square root of the pulsewidth while that required for Ge is nearly pulsewidth independent. A crystalline-to-amorphous transition is observed in Si for pulses less than 10 ps and in GaAs for all pulsewidths, but no such transition is observed in Ge. These observations are shown to be consistent with the various energy deposition and redistribution mechanisms present in each material. Finally, we have used the active nonlinearities in Si and GaAs to construct optical limiters designed to protect sensitive optical components from intense 1 μm radiation.     

Effect of nickel,iron, and manganese on the solubility of copper in the alloy Al−10% Si

A study has been made of the effect of nickel, iron, and manganese on the solubility of copper in solid silicon-aluminum alloys. Nickel leads to solid solutions having the least copper. Iron has essentially no effect on the solubility of copper in the solid solution. Manganese, which binds copper in the ternary compound Al₁₂Mn₂Cu, partially replaces it in solid solution.Translated from Izvestiya VUZ. Fizika, No. 3, pp. 92–95, March, 1970.     

Interplay of surface morphology, strain relief, and surface stress during surfactant mediated epitaxy of Ge on Si

Lattice-mismatch-induced surface or film stress has significant influence on the morphology of heteroepitaxial films. This is demonstrated using Sb surfactant-mediated epitaxy of Ge on Si(111). The surfactant forces a two-dimensional growth of a continous Ge film instead of islanding. Two qualitatively different growth regimes are observed. Elastic relaxation: Prior to the generation of strain-relieving defects the Ge film grows pseudomorphically with the Si lattice constant and is under strong compressive stress. The Ge film relieves strain by forming a rough surface on a nm scale which allows partial elastic relaxation towards the Ge bulk lattice constant. The unfavorable increase of surface area is outbalanced by the large decrease of strain energy. The change of film stress and surface morphology is monitored in situ during deposition at elevated temperature with surface stress-induced optical deflection and high-resolution spot profile analysis low-energy electron diffraction. Plastic relaxation: After a critical thickness the generation of dislocations is initiated. The rough phase acts as a nucleation center for dislocations. On Si(111) those misfit dislocations are arranged in a threefold quasi periodic array at the interface that accommodate exactly the different lattice constants of Ge and Si. Received: 1 April 1999 / Accepted: 17 August 1999 / Published online: 6 October 1999     

Coating stainless steel with diamond-like carbon using the hot filament chemical vapor deposition system,and its effects on fusion devices

Internal mirrors are used widely for plasma diagnostics in fusion devices. Therefore, keeping them in good optical condition is essential. The results of this experiment show that coating stainless steel 316l (S.S.316l) mirrors with diamond-like carbon (DLC) reduces the erosion rate and contamination of plasma by evaporation and sputtering and also increases the optical lifetime of these mirrors. For this purpose, firstly two similar S.S.316l samples were chosen. One of these samples was coated with DLC by a Hot Filament Chemical Vapor Deposition device, while the other was kept intact as a reference for investigating the effect of DLC coating. Then, in order to study the coating effects, these samples were exposed to 200 shots of the hydrogen plasma, with a total duration of 7 s in tokamak. Before and after the exposure, samples were analyzed by the atomic force microscopy, scanning electron microscopy, Raman Spectroscopy, and Spectrophotometer. It was found that the uncoated sample was damaged severely and its reflection dropped significantly, and the sample showed some cracks and some melting lines, while no significant change was observed on the surface characteristic of coated sample. Moreover, the weight loss of the uncoated was more in comparison to the coated, sample. Therefore, the results of this experiment showed that coating of S.S.316l by DLC is a useful method to strengthen this material against plasma erosion, and with further optimization, it could possibly be used in preparing plasma diagnostics mirrors.     

The formation of a diamond layer on a carbide substrate during diamond interaction with Si,WC and Co

Abstract

A diamond layer was formed on a carbide substrate in an irregular temperature field at high pressures (HP). A gradient scheme of HP cell set-up has been developed, which provides for a simultaneous impregnation of opposite planes of a diamond layer by components that differ in melting temperature. The cell temperature field has been calculated and physico-mechanical properties of the obtained composite material have been studied.     

A density-functional theory investigation on disorption of O2 on Sn(111) and its comparison with initial oxidation on the X(111) (X=Si,Ge, Sn,Pb) surfaces

The first-principles calculations are performed to investigate the adsorption of O₂ molecules on an Sn(111) 2×2 surface. The chemisorbed adsorption precursor states for O₂ are identified to be along the parallel and vertical channels, and the surface reconstructions of Sn(111) induced by oxygen adsorption are studied. Based on this, the adsorption behaviours of O₂ on X(111) (X=Si, Ge, Sn, Pb) surfaces are analysed, and the most stable adsorption channels of O₂ on X(111) (X=Si, Ge, Sn, Pb) are identified. The surface reconstructions and electron distributions along the most stable adsorption channels are discussed and compared. The results show that the O₂ adsorption ability declines gradually and the amount of charge transferred decreases with the enhancement of metallicity.     

Investigation of evolution hydrocarbon species on a Si surface during methane plasma with and without substrate bias, using infrared spectroscopy in multiple internal reflection geometry

We investigated evolution of hydrocarbon species on a Si surface during methane plasma both with and without substrate bias, using infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS). We found that the relative density of the sp³-CH or sp³-CH₂ species to the sp³-CH₃ species was low in the low exposure regions, but that the relative density of the sp³-CH or sp³-CH₂ species increased as the exposure was higher. Substrate temperatures rose as the plasma exposure was higher. The changes of ratios would be ascribed to the substrate heating effect by plasma exposure, which would enhance the etching and/or hydrogen abstraction effects. We also found the change of CH_1-2/CH₃ ratios was enhanced when the high substrate bias was applied. The enhancement of the ratio was due to ion effects.