P掺杂正交相Ca_2Si电子结构及光学性质的第一性原理计算

采用基于密度泛函理论第一性原理超软贋势平面波方法系统计算了Ca2Si及P掺杂Ca2Si的电子结构、光学性质,分析了P掺杂对Ca2Si的能带结构、电子态密度、光学性质的影响.计算结果表明:掺入P后Ca2Si的能带向低能方向偏移,禁带宽带为0.557 95eV,价带主要由Si的3p,P的3p以及Ca的4s、3d电子构成,导带主要由Ca的3d电子贡献.通过能带结构和态密度分析了P掺杂正交相Ca2Si的复介电函数、折射率、反射谱、吸收谱和能量损失函数,结果表明P掺杂增强了Ca2Si的光利用率,说明掺杂能够有效改变材料电子结构和光电性能,为Ca2Si材料光电性能的开发、应用提供理论依据.     

镍掺杂硅纳米线电子结构和光学性质的第一性原理研究

利用基于密度泛函理论的第一性原理计算,对镍掺杂硅纳米线的结构稳定性、电子与光学性质进行了研究.结果表明:Ni容易占据硅纳米线表面的替代位置.镍掺杂后的硅纳米线引入了杂质能级,杂质能级主要来源于Ni的3d电子的贡献.由于Ni的3d态和Si的3p态的耦合作用,使禁带宽度变窄.掺杂后的硅纳米线在低能区出现了一个较强的吸收峰,且吸收带出现宽化现象. 关键词： 硅纳米线 掺杂 电子结构 光学性质     

掺杂Si/SiO_2界面电子结构与光学性质的第一性原理研究

采用基于密度泛函理论的第一性原理方法,在局域密度近似(LDA)下研究了B掺杂Si/SiO_2界面及其在压强作用下的电子结构和光学性质.能带的计算结果表明:掺杂前后Si/SiO_2界面均属于直隙半导体材料,但掺B后界面带隙由0. 74 eV减小为0. 57 eV,说明掺B使材料的金属性增强;对B掺杂Si/SiO_2界面施加正压强,发现随着压强不断增大,Si/SiO_2界面的带隙呈现了逐渐减小的趋势,并且由直隙逐渐转变为间隙.光学性质的计算结果表明:掺B对Si/SiO_2界面在低能区(即红外区)的介电函数虚部、吸收系数、折射率以及反射率等光学参数有显著影响,且在红外区出现新的吸收峰;对B掺杂Si/SiO_2界面施加正压强,随着压强增大,红外区的吸收峰逐渐消失,而在紫外区出现了吸收峰.上述结果表明,对Si/SiO_2界面掺B及施加正压强均可调控Si/SiO_2界面的电子结构与光学性质.本文的研究为基于Si/SiO_2界面的光电器件研究与设计提供一定的理论参考.     

第一性原理研究Fe掺杂SnO2材料的光电性质

采用基于第一性原理的线性缀加平面波(FP-LAPW)方法,研究Fe掺杂SnO₂材料电子结构和光学性质,包括电子态密度、能带结构、介电函数和其他一些光学图谱. 研究结果表明,掺Fe后材料均属于直接跃迁半导体,且呈现半金属性;随掺杂浓度增加,费米能级进入价带,带隙逐渐减小,Fe原子之间耦合作用增强;通过掺杂能够在一定程度上改变成键性质,使其具有金属键性质. 光学谱线(吸收谱、消光系数等)与介电函数虚部谱线相对应,均发生蓝移,各峰值与电子跃迁吸收有关,从理论上指出光学性质和电子结构的内在联系. 关键词： 能带结构 态密度 光学性质 介电函数     

Cr1-xNbxSi2固溶体弹性性质、电子结构和光学性质的理论研究

采用基于密度泛函理论(DFT)的第一性原理计算,对Nb掺杂CrSi2的晶格结构、弹性性质,电子结构和光学性质进行了系统的研究. 研究结果表明：随着Nb掺杂浓度增加,弹性常数、体变模量、剪切模量、杨氏模量均减小,而且能带间隙也逐渐减小,表现为p型掺杂特点. 基于电子结构计算结果以及已知的实验结果, 讨论了Nb掺杂CrSi2后对其复介电函数、折射率、消光系数、反射率和吸收谱等光学性质的影响.     

外来原子替代碳的氟化石墨烯的磁性和电子性质

采用基于自旋极化密度泛函理论的第一性原理计算,研究了在氟化石墨烯中少量C原子被M原子(M=B,N,Si,P)替代后原子片的磁性和电子性质.结果表明:不同原子掺杂后的氟化石墨烯的电子结构会发生很大的变化,并有很大的不同.掺杂B和P原子后,纳米原子片由半导体转变为金属,并且由非磁性转变为磁性;掺杂N原子后,材料则仍为半导体,但具有磁性;进一步讨论了掺杂原子浓度与磁性的关系.对于Si原子掺杂的氟化石墨烯原子片,其半导体性质不变,但禁带宽度也会发生改变.     

Cr_(1-x)Nb_xSi_2固溶体弹性性质、电子结构和光学性质的第一性能计算

采用基于密度泛函理论(DFT)的第一性原理计算,对Nb掺杂CrSi_2的晶格结构、弹性性质,电子结构和光学性质进行了系统的研究.研究结果表明:随着Nb掺杂浓度增加,弹性常数、体变模量、剪切模量、杨氏模量均减小,而且能带间隙也逐渐减小,表现为p型掺杂特点.基于电子结构计算结果以及已知的实验结果,讨论了Nb掺杂CrSi_2后对其复介电函数、折射率、消光系数、反射率和吸收谱等光学性质的影响.     

Ta掺杂对ZnO光电材料性能影响的研究

采用基于密度泛函理论第一性原理的方法, 研究了Ta掺杂ZnO的电子结构和光学性质. 计算结果表明: 掺入Ta原子后, 费米能级进入导带, 随着掺杂浓度的增加, 带隙逐渐变窄, 介电函数虚部、吸收系数、反射率和折射率均发生明显变化, 介电函数虚部和反射率均向高能方向移动, 吸收边发生红移, 从理论上指出了光学性质和电子结构的内在联系.     

Cu,O共掺杂AlN晶体电子结构与光学性质研究

采用基于密度泛函理论的平面波超软赝势方法对纯Al N,Cu单掺杂以及Cu与O共掺杂Al N超胞进行了几何结构优化,计算了掺杂前后体系的晶格常数、能带结构、态密度与光学性质.结果表明:掺杂后晶格体积增大,系统能量下降;Cu掺入后Cu 3d电子与N 2p电子间有强烈的轨道杂化效应,Cu与O共掺后Cu和O之间的吸引作用克服了Cu原子之间的排斥作用,能够明显提高掺杂浓度和体系的稳定性.光学性质分析中,介电函数计算结果表明Cu与O共掺杂能改善Al N电子在低能区的光学跃迁特性,增强电子在可见光区的光学跃迁;复折射率计算结果显示Cu与O掺入后由于电磁波穿过不同的介质,导致折射率发生变化,体系对低频电磁波吸收增加.     

共轭低聚物中光生分子间电荷转移态的第一性原理研究（英文）

本文基于第一性原理中的Heyd-Scuseria-Ernzerh方法研究了单层In_(1-x)Ga_xN的电子结构和光学性质.计算得到单层In_(1-x)Ga_xN的能带结构和态密度(DOS),发现随着掺杂比例的变化,体系带隙的变化范围是1.8～3.8 eV,表明通过Ga的掺杂可以实现体系带隙值的调节.并且还研究了单层In_(1-x)Ga_xN的介电函数,折射率和吸收系数等光学性质,结果表明随着Ga掺杂浓度的增加,介电函数谱的主峰和吸收谱发生了显著的蓝移.此外,基于能带结构和态密度图谱,对单层In_(1-x)Ga_xN的光学性质进行分析,预测这种材料独特的光学性质在纳米电子学和光学器件中会有广泛的应用.     

A comparison of silicon oxide and nitride as host matrices on the photoluminescence from Er+ ions

This paper compares the properties of silicon oxide and nitride as host matrices for Er ions.Erbium-doped silicon nitride films were deposited by a plasma-enhanced chemical-vapour deposition system.After deposition,the films were implanted with Er3+ at different doses.Er-doped thermal grown silicon oxide films were prepared at the same time as references.Photoluminescence features of Er3+ were inspected systematically.It is found that silicon nitride films are suitable for high concentration doping and the thermal quenching effect is not severe.However,a very high annealing temperature up to 1200° C is needed to optically activate Er3+,which may be the main obstacle to impede the application of Er-doped silicon nitride.     

基于发光机理提高掺铒硅基材料发光效率的几条途径

掺铒硅基发光材料可以用于制备光通信用光源、光纤放大器，更重要的是可能成为实现硅基光电子集成技术的重要途径，已成为研究的热点之一．文章讨论了掺铒硅及掺铒硅基材料的发光机理，指出了制约实用化方面存在的问题．从不同方面着重探讨了共掺氧对提高掺铒硅发光效率的作用．最后介绍了基于掺铒硅发光机理提高掺铒硅基材料发光效率的几种途径、目前存在的主要问题及研究进展．     

Antiferromagnetic interactions in Er-doped SnO<Subscript>2</Subscript> DMS nanoparticles

Diluted magnetic semiconductor (DMS) nanoparticles of Sn_1−x Er _x O₂ (x = 0.0, 0.02, 0.04, and 0.1) were prepared by sol–gel method. The X-ray diffraction patterns showed SnO₂ rutile structure for all samples with no impurity peaks. The decrease in crystallite size with Er concentration was confirmed from TEM measurements (from 12 to 4 nm). The UV–Visible absorption spectra of Er-doped SnO₂ nanoparticles showed blue shift in band gap compared to undoped SnO₂. The electron spin resonance analysis of Er-doped SnO₂ nanoparticles indicate Er³⁺ in a rutile lattice and also decrease in intensity with Er concentration above x = 0.02. Temperature-dependent magnetization studies and the inverse susceptibility curves indicated increased antiferromagnetic interaction with Er concentration.     

The Verdet constant of Er-doped crystalline YAG and tellurite glass at 1645 nm

We describe the measurement of the Verdet constant of undoped and Er-doped crystalline YAG and tellurite glass at 1645 nm. The undoped YAG value is compared to those measured using visible light. We show that the paramagnetic nature of Er reduces the Verdet constant but that the decrease is probably not significant for the typical Er doping levels used in Er:YAG or in Er:tellurite-glass mid-IR lasers.     

Design and Fabrication of an Er-Doped Silica Optical Fiber with Six Photosensitive Subcores

A type of multi-core Er-doped photosensitive silica optical fiber （MC-EDPF） is proposed and fabricated, in which a high consistency Er-doped core is surrounded by six high consistency Ge-doped cores. The multi-core design can overcome the difficulties encountered in the design and fabrication of single-core EDPFs through a modified chemical vapor deposition method combined with solution doping technology, and there is a conflict between high consistency Er doping and high consistency Ce doping. The absorption of MC-EDPFs achieved 15.876dB/m at 1550mm and lOdB/m at 98Ohm. The refleetivity of the fiber Bragg gratings （FBCs） written directly on the MC-EDPFs is as much as 96.84%.     

Y共掺对掺Er硅酸盐玻璃光致荧光及荧光寿命的影响

采用固相反应方法制备了Er/Y共掺激光玻璃，其中Er³⁺浓度分别为0.5at%和1.0at%，所对应的Y³⁺浓度的变化范围分别为0.0at%—2.5at%和0.0at%—5.0at%.通过吸收光谱、瞬态和稳态光致发光光谱测量，研究了Y共掺对Er³⁺吸收截面、发射截面、荧光寿命和光致荧光特征的影响.研究结果表明：Y共掺杂导致1530nm附近的吸收峰宽化，对Er³⁺的吸收起到了一定的增强作用，并且这种宽化作用随着Er关键词： Er/Y共掺玻璃 光致荧光 荧光寿命     

Erbium-doped Si nanocrystals: optical properties and electroluminescent devices

In the last decade, a strong effort has been devoted towards the achievement of efficient light emission from silicon. Among the different approaches, rare-earth doping and quantum confinement in Si nanostructures have shown great potentialities. In the present work, the synthesis and properties of low-dimensional silicon structures in SiO₂ will be analyzed. All of these structures present a strong room temperature optical emission, tunable in the visible by changing the crystal size. Moreover, Si nanocrystals (nc) embedded in SiO₂ together with Er ions show a strong coupling with the rare earth. Indeed each Si nc absorbs energy which is then preferentially transferred to the nearby Er ions. The signature of this interaction is the strong increase of the excitation cross section for an Er ion in the presence of Si nc with respect to a pure oxide host. We will show the properties of Er-doped Si nc embedded within Si/SiO₂ Fabry–Pérot microcavities. Very narrow, intense and highly directional luminescence peaks can be obtained. Moreover, the electroluminescence (EL) properties of Si nc and Er-doped Si nc in MOS devices are investigated. It is shown that an efficient carrier injection at low voltages and quite intense room temperature EL signals can be achieved, due to the sensitizing action of Si nc for the rare earth. These data will be presented and the impact on future applications discussed.     

Visible-Light Activities of Erbium Doped BiVO4 Photocatalysts

采用水热合成法,制备出Er掺杂的BiVO₄复合光催化剂,并采用XRD、SEM、XPS和紫外-可见漫反射光谱技术对其进行分析表征．通过可见光下降解水溶液中甲基橙分子来考察其光催化性能,结果显示掺杂组份以氧化物Er₂O₃形式存在于的复合光催化剂中;且掺杂复合光催化剂的可见光吸收和催化活性都比纯BiVO₄有所增强．     

室温下掺Er富硅氧化硅和掺Er富硅氮化硅的光致发光及其退火

用磁控溅射淀积掺Er氧化硅、掺Er富硅氧化硅、掺Er氮化硅和掺Er富硅氮化硅薄膜,室温下测量这四种薄膜的光致发光（PL）谱,观察到这四种薄膜都具有1.54μm的峰位,其强度与薄膜的退火温度有关。为了确定1.54μmPL的最佳退火温度,这些薄膜都分别在600,700,800,900,1000,1100℃的温度下同时退火,发现两种富硅薄膜的最佳退火温度是800℃,不富硅的两种薄膜的最佳退火温度是900℃。样品的1.54μmPL最强,且800℃退火的掺Er富硅氧化硅薄膜的1.54μm峰强度是最强的,比不富硅的强了约20倍,还观察到这四种薄膜都具有1.38μm的PL带,且掺Er富硅氧化硅和掺Er富硅氮化硅这两种薄膜的PL在强度上1.38μm峰与1.54μm峰有一定的关系。     

Photoluminescence from Er-doped silicon rich oxide thin films

 Photoluminescence (PL) properties of Er-doped silicon rich oxide thin films deposited on Si substrate by co-evaporation of silicon monoxide and Er under different atmospheres are investigated. The samples exhibit luminescence peak at 1.54 μm which could be assigned to the recombination in intra-4f Er³⁺ transition. PL shows that this transition is highest when ammonia atmosphere is used during deposition followed by an annealing temperature at 850 °C in 95% N₂+5% H₂ gas (forming gas). In fact, we believe that the presence of the N atoms around Er ions increases the intensity of the 1.54 μm luminescence.