金属Nd增强TiO2高硅氧纤维薄膜光催化性能及机理研究

用浸渍-提拉法在高硅氧玻璃纤维网格布上制备了具有优异光催化性能的金属Nd/TiO₂薄膜,甲基橙光催化降解实验表明Nd的掺杂对TiO₂催化剂薄膜的光学性能有明显的促进作用,当Nd的掺杂量为3 wt%时,表现出最优的光催化降解效果。采用XRD、SEM、UV-vis漫反射等分析方法对Nd/TiO₂薄膜进行表征分析,探讨光催化机理。结果表明:适量掺杂金属Nd能够细化TiO₂薄膜晶粒,得到分布致密均匀的锐钛矿型TiO₂薄膜;同时使TiO₂薄膜的拉曼和紫外可漫反射峰位红移,薄膜的禁带宽度从原来的3.15 eV减小到2.77 ev,促进了对紫外光的吸收,拓宽了TiO₂薄膜的光响应范围,增强了TiO₂薄膜的光催化活性。     

F离子掺杂TiO2的性能研究

以NH₄F为掺杂剂,采用溶胶-凝胶法制备F离子掺杂型TiO₂光催化剂,对其进行XRD、XPS和PL表征,结果表明,F离子掺杂TiO₂由于Ti-F配位体的形成而能抑制金红石相的生成,同时F离子掺杂能增加TiO₂表面缺陷浓度并降低Ti_2P键的结合能,另外,由于F离子能取代Ti-OH配位体而降低了表面羟基氧浓度.光催化研究结果表明,F离子掺杂提高了TiO₂光催化活性近1.5倍.     

金属离子掺杂二氧化钛及水体光催化脱氮研究

采用溶胶-凝胶法制备了掺杂Ce³⁺、La³⁺、Ag⁺、Fe³⁺的TiO₂光催化剂,以考察其薄膜和粉体形式对水中无机氮的光催化去除效果和活性.用所制备的催化剂对含氨氮-亚硝酸氮的混合液进行了光催化脱氮研究.本文利用UV-Vis吸收光谱、XRD和TEM对催化剂进行了表征.同时,对影响TiO₂光催化效率的因素:如掺杂金属离子的种类、浓度、涂膜层数、反应液中有无Fe²⁺、不锈钢和玻璃载体、反应器的构型等进行了探讨,并对今后的研究进行展望.经过2 h紫外光照射反应,实验最佳脱氮效果:金属离子掺杂TiO₂薄膜型催化剂总氮去除率在30%左右,金属离子掺杂粉末型催化剂光催化最高总氮去除率可达41.7%.     

溶胶-凝胶及水热法制备掺杂铁、铬离子的二氧化钛光催化剂

通过溶胶 凝胶法结合水热处理制备了掺杂铁或铬离子的纳米尺寸锐钛矿型TiO₂光催化剂.用XRD、BET、TEM、EPR和UV VisDRS对样品进行了系列表征.在对活性偶氮染料XRG的降解中,可见光激发下适量掺杂的TiO₂呈现出优于纯TiO₂和P25的活性,同时掺杂并未降低其在紫外光激发下的活性.     

掺硼纳米TiO2的制备及光催化性能研究

采用改进的Sol-gel方法,制备了单分散椭球形微孔结构的掺B纳米TiO₂光催化剂,并用TG-DTA、XRD、XPS、UV-Vis、TEM、BET等手段进行表征.以难生化降解的染料罗丹明B为目标降解物,采用HPLC检测,通过不同光照时间下染料降解率考察了产物的光催化活性.结果表明,改进的Sol-gel法制得的光催化剂具有明显的孔结构,而且比表面积大、孔径分布窄、粒径小、分散性好;适量B的掺杂能够有效促进TiO₂纳米粒子的光催化活性.最佳催化剂制备条件:B掺杂的摩尔分数为20%、450℃煅烧2 h,此时所制得的B-TiO₂光催化剂活性比纯TiO₂有显著提高.     

Zn-TiO2/AC复合催化剂的制备及其光催化活性

以硝酸锌、钛酸四丁酯和活性炭为原料,采用真空吸附法制备了不同组成的Zn TiO₂/AC.通过X射线衍射(XRD)和透射电镜(TEM)对催化剂进行了表征.选择较难降解的Cl₃CCOOH作为探针分子考察了其光催化活性.结果表明,掺锌能提高TiO₂/AC的催化活性,当Zn的摩尔分数为0.5%(相对TiO₂)、处理温度为400℃,溶液的pH值为6时,Zn TiO₂/AC催化剂具有很好的光催化活性.     

高度有序的二氧化钛纳米管阵列的制备及其光催化活性的研究

采用电化学阳极氧化法在钛表面构筑了一种结构有序、微米级的TiO₂纳米管阵列膜层. 考察了制备电压、氧化时间、溶液搅拌等实验参数对TiO₂纳米管阵列形貌和尺寸的影响. 应用SEM和XRD对膜层的形貌和晶型进行了分析和表征, 并通过TiO₂纳米管阵列膜对甲基橙的光催化降解, 研究了TiO₂纳米管阵列膜层结构与光催化活性的关系. 结果表明: 阳极电压和溶液搅拌对制备TiO₂纳米管阵列的结构起到关键的作用. 控制20 V电压制备的TiO₂纳米管阵列膜, 管长达2.6～3.3 μm, 经500 ℃热处理后具有最高的光催化活性, 其光催化性能明显优于一般的TiO₂纳米颗粒膜.     

CeO2/TiO2光催化剂的制备及其可见光脱氮性能

采用溶胶-凝胶和浸渍掺杂两步法合成了CeO₂/TiO₂光催化剂,并对催化剂的理化结构进行表征分析;以吡啶-正辛烷体系为模拟油品氮源,研究了该催化剂在可见光作用下的光催化脱氮行为,并探究了光催化脱氮的最佳反应条件。 结果表明,掺杂的铈主要以CeO₂的形式存在,且增强了催化剂在可见光区的吸收;在可见光辐照150 min的条件下,铈的掺杂量质量分数为8%,所制备的CeO₂/TiO₂催化剂投入量为1.0 g/L时,模拟油品中吡啶的脱氮率高达76.45%。     

Si掺杂TiO2催化剂的结构与可见光催化活性研究

采用溶胶-凝胶法制备出Si⁴⁺离子掺杂的TiO₂可见光催化剂 (TiO₂-xSi),该催化剂的可见光催化活性高于纯TiO₂和N掺杂的TiO₂(TiO₂-N).利用XRD、XPS、FT-IR和UV-Vis DRS等表征技术,研究了TiO₂-xSi催化剂的晶体结构、能带结构和表面性质.研究发现:掺入Si⁴⁺离子在TiO₂粒子表面主要形成Ti-O-Si结构,并在导带下0.2-0.6 eV区域形成表面态能级,该表面态能级的存在是催化剂产生可见光响应、实现可见光催化的根本原因.另外,讨论了Si⁴⁺离子的掺杂对金红石相和晶粒的生长抑制作用,以及催化剂的比表面积和表面羟基物种增加对可见光催化活性的影响.     

三维网状Dy3+:YVO4/TiO2复合纤维的制备及光催化产氢性能

以电纺TiO₂纳米纤维为基质, 柠檬酸为软模板, 采用一步水热法制备了具有三维立体网状结构的稀土Dy ³⁺掺杂YVO₄/TiO₂复合纤维. 通过X射线衍射、 扫描电子显微镜、 X射线光电子能谱、 N₂吸附-脱附、 紫外-可见漫反射光谱及荧光光谱等手段对材料的组成、 表面形貌和性能进行表征, 以光分解水产氢实验考察其光催化活性. 结果表明, Dy ³⁺∶YVO₄纳米枝与TiO₂纳米纤维相互交联构筑的纳米纤维网具有大比表面积, 可提供更多活性位点, 改善了多相光催化反应的传递过程; 稀土Dy ³⁺掺杂的YVO₄与TiO₂复合形成异质结相互促进, 在拓宽光谱响应范围、 提高太阳光利用率的同时使光生电子-空穴对得到较好分离, 从而提高了样品的光催化活性. 模拟太阳光照射下, Dy ³⁺∶YVO₄/TiO₂复合纤维光催化产氢速率达到8.63 mmol· h ^-1·g ^-1, 是纯TiO₂纳米纤维的10倍.     

铂非均匀掺杂二氧化钛薄膜的光催化性能

采用溶胶-凝胶法制备了铂非均匀掺杂的二氧化钛薄膜, 并用UV-vis分光光度计及电化学工作站表征了薄膜的光吸收性能和光电化学行为, 通过对甲基橙的光催化降解动力学来表征催化剂的光催化活性. 结果表明 Pt非均匀掺杂可以明显增强二氧化钛的光催化活性, 而均匀掺杂的效果较差; Pt非均匀掺杂的最佳量为0.3 mol%. 催化剂薄膜的电化学行为显示: Pt非均匀掺杂二氧化钛薄膜的开路电压高, 交流阻抗小. 并从半导体的PN结原理探讨了Pt非均匀掺杂二氧化钛的催化活性机理.     

Ni控制掺杂TiO2薄膜的光电化学及光催化活性

采用溶胶-凝胶法通过分步控制工艺制备了镍离子不同掺杂方式的TiO₂薄膜。通过甲基橙的光催化降解动力学来表征其光催化活性。结果表明：镍离子非均匀掺杂在掺杂量0.5%时可以明显增强TiO₂的光催化活性，而均匀掺杂提高TiO₂的光催化活性较小。光电化学表征结果显示：镍离子非均匀掺杂TiO₂薄膜的瞬时光电流信号较强，说明其光生载流子易于生成且分离效果较好；循环伏安曲线表明，光照时Ni非均匀掺杂的TiO₂薄膜改变了体系的氧化还原电位，说明了薄膜内建电场的建立。基于半导体的P-N结原理探讨了镍离子非均匀掺杂TiO₂薄膜的光催化活性机理。     

Sm掺杂对TiO2薄膜光催化性能的影响

 采用溶胶-凝胶法、浸渍-提拉法制备了不同形式和不同含量Sm掺杂的锐钛矿晶型TiO2的光催化剂薄膜. 采用X射线衍射、UV-Vis光谱及电化学实验对所制得的TiO2光催化剂薄膜进行了表征,并通过甲基橙溶液的光催化降解实验评价了其光催化活性. 结果表明,与未掺杂的TiO2薄膜相比,Sm掺杂的TiO2薄膜的UV-Vis吸收光波长向长波方向移动,并且光照开路电压也相应提高; 适量Sm掺杂可以明显提高TiO2薄膜的光催化活性,最佳Sm掺杂量为x(Sm3+)=0.5%; 在各种掺杂形式中以表层Sm掺杂的Sm-TiO2(S)薄膜的光催化活性最好. 讨论了Sm掺杂提高TiO2薄膜光催化活性的机理.     

Effect of dopant concentration on photocatalytic activity of TiO2 film doped by Mn non-uniformly

The thin films of TiO₂ doped by Mn non-uniformly were prepared by sol-gel method under process control. In our preceding study, we investigated in detail, the effect of doping mode on the photocatalytic activity of TiO₂ films showing that Mn non-uniform doping can greatly enhance the activity. In this study we looked at the effect of doping concentration on the photocatalytic activity of the TiO₂ films. In this paper, the thin films were characterized by UV-vis spectrophotometer and electrochemical workstation. The activity of the photocatalyst was also evaluated by photocatalytic degradation rate of aqueous methyl orange under UV radiation. The results illustrate that the TiO₂ thin film doped by Mn non-uniformly at the optimal dopant concentration (0.7 at %) is of the highest activity, and on the contrary, the activity of those doped uniformly is decreased. As a comparison, in 80 min, the degradation rate of methyl orange is 62 %, 12 % and 34 % for Mn non-uniform doping film (0.7 at %), the uniform doping film (0.7 at %) and pure titanium dioxide film, respectively. We have seen that, for the doping and the pure TiO₂ films, the stronger signals of open circuit potential and transient photocurrent, the better photocatalytic activity. We also discusse the effect of dopant concentration on the photocatalytic activity of the TiO₂ films in terms of effective separation of the photon-generated carriers in the semiconductor.     

Co~(2+)掺杂的纳米TiO_2薄膜光催化特性及电化学阻抗谱研究

本文采用交流电沉积技术,在多孔氧化铝模板中合成出Co2+掺杂的纳米TiO2薄膜(Co2+/TiO2薄膜)。以次甲基蓝为降解物,研究了纳米Co2+/TiO2薄膜在可见光下的催化性能,考察了阳极偏压对光催化活性的影响。用电化学阻抗谱(EIS)研究了纳米Co2+/TiO2薄膜在次甲基蓝溶液中的电化学行为,给出了相应的等效电路和半导体能带结构参数-空间电荷层宽度。研究表明,适量Co2+掺杂可以提高TiO2薄膜的光催化活性。在Co2+/TiO2膜电极上施加一定阳极偏压,使空间电荷层宽度增加,因此能有效实现光生电子-空穴分离,进一步提高次甲基蓝的光催化降解效率。     

退火气氛对掺银TiO2薄膜结构和光催化性能的影响

本文采用sol-gel法制备了掺银的TiO2/glass纳米光催化薄膜,并分别在空气和真空条件下对薄膜进行退火处理, 结构和光催化性能的测试结果表明, 退火气氛对薄膜的结构和薄膜对染料溶液的光催化降解效率都有影响。经真空退火处理的TiO2及Ag-TiO2薄膜较空气中退火处理的同样薄膜的光催化性能都低, 但适量掺银的Ag-TiO2薄膜的光催化活性较TiO2有不同程度的增强。     

Fabrication and photocatalytic characterizations of ordered nanoporous X-doped (X = N, C, S, Ru, Te, and Si) TiO2/Al2O3 films on ITO/glass

Transparent, ordered nanoporous TiO2/Al2O3 composite films doped with metal elements (Ru, Si, and Te) and nonmetal elements (N, C, and S) were fabricated by successive anodization and sol-gel process directly on glass substrates covered with a tin-doped indium oxide (ITO) film. The doping of ruthenium, nitrogen, carbon, and sulfur in TiO2 exhibited an enhanced effect on the absorbance, while the doping of silicon and tellurium showed little effect. Particularly, the N- and Ru-doped TiO2/Al2O3 films on ITO/glass developed an enhanced absorption red shift of 580 nm (-N) and 500 nm (-Ru). The nanoporous TiO2/Al2O3 composite film exhibited the highest photocatalytic activity in decomposing acetaldehyde under ultraviolet-light irradiation, with a value of 13 times in initial reaction rate or 7.8 times in quantum yield higher than a commercially available TiO2 material, Degussa P25. The ultraviolet-light photocatalytic activities of nanoporous TiO2/Al2O3 films were enhanced by the doping of nitrogen, carbon, and sulfur but slightly weakened by the doping of ruthenium, silicon, and tellurium. Particularly, the nanoporous N-doped TiO2/Al2O3 films exhibited effective photocatalytic activity on ultraviolet light decomposition of a highly toxic dioxin, HpCDD, and gave the highest decomposition rate of approximately 95% (via 7 h of irradiation) for the specimen with a dopant content of 1.7 wt % nitrogen.     

氟掺杂纳米 TiO2 薄膜的低温制备及其光催化性能

 以氟化铵为氟源, 采用水热法制得氟掺杂 TiO2 (FTO) 溶胶, 并通过浸渍提拉法在低温下制备了 FTO 薄膜. 其中在 120 oC 下水热处理 10 h 所得的 TiO2 溶胶制备的薄膜均匀透明, 具有较高的光催化活性. 氟掺杂后的 TiO2 晶粒尺寸并未发生明显变化, 但薄膜的光催化活性显著升高. F/Ti 摩尔比为 0.01 时, FTO 薄膜的光催化活性最高, 比 TiO2 薄膜的活性升高了 23%. X 射线光电子能谱结果表明, 氟掺杂 TiO2 中的氟离子存在晶格取代掺杂和表面化学吸附两种形式. 这两种氟离子的共同作用是 FTO 薄膜光催化活性升高的主要原因.     

Comparison of optical and structural properties of nanostructure TiO2 thin film doped by Sn and Nb

The thin films of TiO₂ doped by Sn or Nb were prepared by sol–gel method under process control. The effects of Sn and Nb doping on the structural, optical and photo-catalytic properties of applied thin films have been studied by X-ray diffraction (XRD) high resolution transmission electron microscopy and UV–Vis absorption spectroscopy. Surface chemical state of thin films was examined by atomic X-ray photoelectron spectroscopy. XRD results suggest that adding impurities has a great effect on the crystallinity and particle size of TiO₂. Titania rutile phase formation in thin film was promoted by Sn⁴⁺ addition but was inhibited by Nb⁵⁺ doping. The activity of the photocatalyst was evaluated by photocatalytic degradation kinetics of aqueous methylene blue under UV and Visible radiation. The results show that the photocatalytic activity of the Sn-doped TiO₂ thin film have a larger degradation efficiency than Nb-doped TiO₂ under visible light, but under UV light photocatalytic activity of the Nb-doped TiO₂ thin film is better.     

Preparation and Characterization of Bismuth Doped TiO2 Thin Films

A series of Bismuth-doped titanium oxide (Bi-doped TiO₂) thin films on glass substrates have been prepared by sol-gel dip coating process. The prepared catalysts were characterized by XRD and XPS. The photocatlytic activity of the thin film catalysts was evaluated through the photodegradation of aqueous methyl orange under UV illumination. The experiments demonstrated that the Bi-doped TiO₂ prepared was anatase phase. The doped bismuth was in the 3⁺ oxidation state. The presence of Bi significantly enhanced the photocatalytic activity of TiO₂ films. At calcination temperature of 500°C, with doping concentration of 2 wt %, Bi-doped TiO₂ thin film showed the highest photocatalyic activity.