Estimation of the lowest limit of 1/f noise in semiconductor materials

A lowest limit of 1/f noise in semiconductor materials has not yet been reported; we do not even know if such a lowest limit exists. 1/f noise in semiconductors has recently been brought into relation with 1/f noise in quantum dots and other materials. These materials exhibit on-off states which are power-law distributed over a wide range of timescales. We transfer such findings to semiconductors, assuming that the g-r process is also controlled by such on-off states. As a result, we obtain 1/f noise which can be expressed as Hooge's relation. Based on the intermittent g-r process, we estimate the lowest limit of 1/f noise in semiconductor materials. We show that this limit is inversely proportional to the dopant concentration; to detect the lowest limit of 1/f noise, the number of centers should be as small as possible. We also find a smooth dependence of 1/f noise and g-r noise on time.     

On Stephany's theory of origin of 1/f bulk noise

Summary Stephany's treatment is not correct since he neglects the friction force proportional to the velocity, which we show to be universal,i.e. present in any mechanism of electric conduction. Moreover his predicted power spectral density is in some cases three orders of magnitude larger than the observed one. Finally, his noise cannot be the true 1/f noise because it should predict a low cut-off of ∼5·10⁻² Hz due to the transit time of the electron-linked lattice (ELL) carriers through a distance of 20 μm while no cut-off has been observed down to 10⁻³ Hz.     

Spin-dependent shot noise in diluted-magnetic-semiconductor/ semiconductor heterostructures

We investigated the shot noise properties in the diluted-magnetic-semiconductor/semiconductor heterostructures, where the sp-d exchange interaction gives rise to a giant spin splitting when an external magnetic field is applied along the growth direction of the heterostructures. It is found that the noise becomes strongly spin-dependent and can be greatly modulated not only by the external magnetic and electric fields, but also by the structural configuration and geometric parameters. Both the spin-up and spin-down components of the noise spectral density can be greatly suppressed by the magnetic field. The Fano factor is notably sensitive to the transmission probabilities, which varies greatly with the spin-polarization, the external magnetic field, and the structural configuration.     

The 1/f noise in multiwalled carbon nanotubes

The $1/f$ noise in multiwalled carbon nanotubes bundles has been investigated between the frequency range of 0.1 to 30 Hz. At room temperature the noise spectrum is standard 1/f, and its level is proportional to the square of the bias voltage. With decreasing temperature the noise level also decreases. At 4.2 K the noise level follows a non-monotonic dependence against the bias voltage, showing a peak at a certain bias voltage, meanwhile its frequency dependence also deviates from the 1/f trend. This anomalous behaviour is discussed within the picture of environmental quantum fluctuation of charge transport in the samples.     

TMR与GMR传感器1/f噪声的研究进展

隧道结磁阻(TMR) 传感器及巨磁阻(GMR) 传感器的1/f噪声在低频段噪声功率密度较大, 是影响其低频下分辨率和灵敏度的主要噪声形式. 本文详细介绍了近年来TMR传感器及GMR传感器1/f噪声的特点、来源、理论模型、检测方法及降噪措施等方面的研究进展, 并就隧道结磁阻传感器1/f噪声的物理模型进行了详细解释. 通过纳米模拟软件Virtual NanoLab对不同MgO厚度的Fe/MgO/Fe型磁性隧道结(MTJ) 进行了隧穿概率和TMR变化率的模拟计算, 得到保守估计与乐观估计的TMR变化率, 分别为98.1%与10324.55%, 同时通过MTJ的噪声模型分析了MgO厚度对TMR传感器噪声的影响. 制备了磁屏蔽系数大于10000的磁屏蔽筒并搭建了磁阻传感器1/f噪声的测试平台, 通过测试验证了磁屏蔽系统对环境磁场具有较好的屏蔽效果, 为噪声检测提供了稳定的磁场空间. 最后分析了TMR与GMR中各种因素对传感器噪声的影响, 提出了影响MTJ传感器1/f噪声的因素及一些降噪措施.     

高功率半导体激光器结温与1/f噪声的关系研究

高功率半导体激光器的结温上升, 不仅影响它的输出功率、斜坡效率、阈值电流和寿命, 而且还会产生光谱展宽和波长偏移. 因此, 热管理成为抽运激光器研发中的一个主要问题. 本文首先建立了噪声功率谱与结温变化的物理模型, 根据压缩感知理论, 将测量得到含有高斯白噪声和1/f噪声的混叠复合噪声信号稀疏化后, 进行基追踪算法去噪, 通过改变算法的迭代次数及测量矩阵大小, 获得1/f噪声电压功率谱与结温变化关系曲线, 避免了直接测量结温的复杂性.通过数值估计结果, 可以较好地指导高功率半导体激光器的热管理工作. 关键词： f噪声')" href="#">1/f噪声 结温度 热阻 高功率半导体激光器     

N/P沟道MOSFET1/f噪声的统一模型

对n／p两种沟道类型、不同沟道尺寸MOSFET的1／f噪声特性进行了实验和理论研究.实验结 果表明，虽然nMOSFET的1／f噪声幅值比pMOSFET大一个数量级，但是其噪声幅值均表现出和 有效栅压的平方成反比、和漏压的平方成正比、和沟道面积成反比的规律.基于该实验结果 ，认为MOSFET的1/f噪声产生机理为位于半导体_氧化物界面附近几个纳米范围内的氧化层陷 阱通过俘获和发射过程与沟道交换载流子，在引起载流子数涨落的同时也通过库仑散射导致 沟道载流子迁移率的涨落.在这两种涨落机理的基础上，引入了氧化层陷阱的分布特征及其 与沟道交换载流子的隧穿和热激活两种方式，建立了MOSFET l／f噪声的统一模型.实验结果 和本文模型符合良好. 关键词： 1/f噪声 MOSFET 氧化层陷阱 涨落     

1/f noise and slow relaxations in glasses

Recently we have shown that slow relaxations in the electron glass system can be understood in terms of the spectrum of a matrix describing the relaxation of the system close to a metastable state. The model focused on the electron glass system, but its generality was demonstrated on various other examples. Here, we study the noise spectrum in the same framework. We obtain a remarkable relation between the spectrum of relaxation rates λ described by the distribution function P (λ) ～ 1/λ and the 1/f noise in the fluctuating occupancies of the localized electronic sites. This noise can be observed using local capacitance measurements. We confirm our analytic results using numerics, and also show how the Onsager symmetry is fulfilled in the system.     

氮化镓基蓝光发光二极管伽马辐照的1/f噪声表征

通过电离辐照对氮化镓基蓝光发光二极管器件有源区光/暗电流产生机制的研究, 建立了电离辐照减小发光二极管有效输出功率电学模型.通过电离辐照对氮化镓基蓝光发光 二极管器件有源区1/f噪声影响机制的研究, 建立了电离辐照增大发光二极管1/f噪声的相关性模型.在I < 1 μA 的小注入区,空间电荷区的复合电流随辐照剂量的增加而增加. 同时, 随着电离辐照产生缺陷的增加, 1/f噪声幅度增大. 在 I> 1 mA 的大注入条件下, 由于串联电阻的影响占主导地位,表面复合速率和电流随辐照剂量的增加而增加.同时, 随着电离辐照产生缺陷的增加, 1/f噪声幅度增大.根据辐照前后电流电压试验结果噪声测试结论, 证实了实验结论与理论推导结果的一致性. 在1 μA < I < 5×10^-5 A 的中值电流情况下, 由于高能载流子散射相关的迁移率涨落与辐照新增缺陷引起的载流子数涨落竞争机制, 随着辐照剂量增大, 1/f噪声在频域变化没有明显规律. 但是, 通过1/f噪声时域多尺度熵复杂度分析方法, 得出随着辐照剂量增大, 1/f噪声时域多尺度熵复杂度的结果. 最终证实1/f噪声幅度可以敏感地反映小注入和大注入情况下氮化镓基蓝光发光二极管电离辐照的可靠性. 噪声幅值越大, 则说明辐照感应N_it越高, 暗电流相关的复合电流越大, 光电流相关的扩散电流比例减少, 使得器件发光效率、光输出功率等性能参数下降, 继而影响器件可靠性, 造成失效率显著增大. 1/f噪声时域多尺度熵复杂度可以敏感地反映中值电流情况下氮 化镓基蓝光发光二极管的电离辐照可靠性.多尺度熵复杂度越大, 则说明辐照感应越多, 复合电流越大,器件可靠性越差.本文结论提供了一种基于 1/f噪声的氮化镓基蓝光发光二极管电离辐照可靠性表征方法. 关键词： f噪声')" href="#">1/f噪声 电离辐照 氮化镓基蓝光发光二极管     

基于1/f噪声变化的pn结二极管辐射效应退化机理研究

基于pn结二极管辐射效应退化机理中位移效应和电离效应之间的关系, 并结合pn结二极管辐射退化的噪声机理, 得到了pn结二极管辐射诱导低频噪声的变化规律, 发现两种效应引起的二极管噪声变化规律之间的不一致性. 根据实验得到的噪声变化规律, 判断出了辐射应力条件下两种效应之间的关系, 很好地解释了实验中出现的不符合原有理论解释的现象, 对器件加固的研究有着重要意义.     

Radiation-induced 1/f noise degradation of PNP bipolar junction transistors at different dose rates

It is found that ionizing-radiation can lead to the base current and the 1/f noise degradations in PNP bipolar junction transistors. In this paper, it is suggested that the surface of the space charge region of the emitter-base junction is the main source of the base surface 1/f noise. A model is developed which identifies the parameters and describes their interactive contributions to the recombination current at the surface of the space charge region. Based on the theory of carrier number fluctuation and the model of surface recombination current, a 1/f noise model is developed. This model suggests that 1/f noise degradations are the result of the accumulation of oxide-trapped charges and interface states. Combining models of ELDRS, this model can explain the reason why the 1/f noise degradation is more severe at a low dose rate than at a high dose rate. The radiations were performed in a Co~(60) source up to a total dose of 700 Gy(Si). The low dose rate was 0.001 Gy(Si)/s and the high dose rate was 0.1 Gy(Si)/s. The model accords well with the experimental results.     

基于1/f噪声的NPN晶体管辐照感生电荷的定量分离

本文针对NPN双极性晶体管, 在研究辐照感生的氧化层电荷及界面态对晶体管基极电流和1/f噪声的影响的基础上, 建立辐照感生氧化层电荷及界面态与基极电流和1/f噪声的定量物理模型. 根据所建立的模型, 提出一种新的分离方法, 利用1/f噪声和表面电流求出氧化层电荷密度, 利用所求得氧化层电荷密度和表面电流求出界面态密度. 利用本方法初步实现了辐照感生氧化层电荷及界面态的定量计算.     

光电耦合器件闪烁噪声模型

对电应力前后光电耦合器件的闪烁噪声（1/f噪声）进行了实验和理论研究.实验发现,应力前后1/f噪声幅值随偏置电流均有相同的变化规律：在低电流区,1/f噪声幅值与偏置电流成正比,在高电流区,1/f噪声幅值与偏置电流的平方成正比,且应力后1/f噪声幅值增大了约7倍.理论分析表明,小电流时该器件的1/f噪声为扩散1/f噪声,大电流时为复合1/f噪声,应力在器件有源区诱生的陷阱是1/f噪声增大的根本原因.基于载流子数涨落和迁移率涨落机制,建立了一个光电耦合器件1/f噪声的定量分析模型,实验结果和模型符合良好.     

基于辐照前1/f噪声的金属-氧化物-半导体场效应晶体管潜在缺陷退化模型

基于金属-氧化物-半导体-场效应管(MOSFET)辐射损伤的微观机理,推导出了MOSFET经历辐照之后氧化层空穴俘获与阈值电压漂移之间关系的表达式.又根据MOSFET中1/f噪声产生的微观机理,建立了辐照之前MOSFET的1/f噪声功率谱幅值与阈值电压漂移量之间的定量关系,并通过实验予以验证.结果表明,辐照之前的1/f噪声功率谱幅值与辐照之后的阈值电压漂移量存在正比例关系,阈值电压漂移量可以反映出MOSFET内部的潜在缺陷的退化程度,因此,该模型有助于利用1/f噪声参量来表征MOSFET内部潜在缺陷的数量和严重程度.     

光电耦合器件1/f噪声和g-r噪声的机理研究

对光电耦合器件1/f噪声和g-r噪声(产生－复合噪声) 的偏置特性及其产生机理进行了实验和理论研究.结果表明：在低频段,光电耦合器件的g-r噪声通常表现为叠加1/f噪声,且两者均随输入电流的增加呈现先增大后减小的规律.通过测量前级噪声和后级噪声,发现光电耦合器件的g-r噪声源为后级光敏三极管.理论分析表明：光电耦合器件的1/f噪声主要为表面1/f噪声,g-r噪声则源于光敏三极管发射结空间电荷区的深能级对载流子的俘获和发射.     

A theory of 1/f noise

Letu() be an absolutely integrable function and define the random process where thet _i are Poisson arrivals and thes _i, are identically distributed nonnegative random variables. Under routine independence assumptions, one may then calculate a formula for the spectrum ofn(t), S _n(), in terms of the probability density ofs, p_s(). If any probability density p_s() having the property p_s() I for small is substituted into this formula, the calculated S_n() is such that S_n() 1 for small . However, this is not a spectrum of a well-defined random process; here, it is termed alimit spectrum. If a probability density having the property p_s() for small , where > 0, is substituted into the formula instead, a spectrum is calculated which is indeed the spectrum of a well-defined random process. Also, if the latter p_s is suitably close to the former p_s, then the spectrum in the second case approximates, to an arbitrary, degree of accuracy, the limit spectrum. It is shown how one may thereby have 1/f noise with low-frequency turnover, and also strict 1/f ^1– noise (the latter spectrum being integrable for > 0). Suitable examples are given. Actually, u() may be itself a random process, and the theory is developed on this basis.     

HgCdTe长波光伏探测器的表面漏电流及1/f噪声研究

在同一Hg_1-xCd_xTe晶片上(x=0217)制备了单层ZnS钝化和双层 （CdTe+ZnS）钝化的两种器件，对器件烘烤前后的暗电流和1/f噪声进行了测试，烘烤 前发现，ZnS钝化的器件在反偏较大时具有较大的表面隧道电流，而这种表面漏电流是ZnS钝 化器件具有较大1/f噪声电流的原因，通过高分辨x射线衍射中的倒易点阵技术（recipr ocal space mapping,RSM）研究了单双层钝化对HgCdTe外延层晶格完整性的影响，发现单层 ZnS钝化的HgCdTe外延层产生了大量缺陷，而这些缺陷正是ZnS钝化器件具有较大表面漏电流 和1/f噪声的原因. 经过高温烘烤后，ZnS钝化的器件暗电流和1/f噪声增加，而双 层钝化器件经过高温烘烤后性能提高. RSM的研究表明，高温烘烤后ZnS钝化的HgCdTe外延层 产生大量缺陷，这些缺陷正是单层钝化器件表面漏电流和1/f噪声电流增加的原因. 关键词： HgCdTe 光伏探测器 钝化 表面漏电流 1/f噪声 倒易点     

MOSFET 辐照诱生界面陷阱形成过程的1/f噪声研究

基于界面陷阱形成的氢离子运动两步模型和反应过程的热力学平衡假设，推导了金属-氧化物-半导体-场效应晶体管(MOSFET)经历电离辐照后氧化层空穴俘获与界面陷阱形成间关系的表达式.利用初始1/f噪声功率谱幅值与氧化层空穴俘获之间的联系，建立了辐照前的1/f噪声幅值与辐照诱生界面陷阱数量之间的半经验公式，并通过实验予以验证.研究结果表明，由于辐照诱生的氧化层内陷阱通过与分子氢作用而直接参与到界面陷阱的建立过程中，从而使界面陷阱生成数量正比于这种陷阱增加的数量，因此辐照前的1/f噪声功率谱幅值正比于辐照诱生的界面陷阱数量.研究结果为1/f噪声用作MOSFET辐照损伤机理研究的新工具，对其抗辐照性能进行无损评估提供了理论依据与数学模型. 关键词： 辐照效应 界面陷阱 1/f噪声 氧化层空穴俘获     

宽范围偏置电流下的GaAlAs红外发光二极管1/f噪声特性

在宽范围偏置条件下,测量了GaAlAs红外发光二极管(IRLED)的低频噪声,发现1/f噪声幅值与偏置电流的γ次方成正比,在小电流区,γ≈1,在大电流区γ≈2.基于载流子数涨落和迁移率涨落机制建立了一个GaAlAs IRLED 1/f噪声模型,该模型的分析表明,低电流区GaAlAs IRLED的1/f噪声源于体陷阱对载流子俘获和发射导致的扩散电流涨落,高电流区的1/f噪声源于结空间电荷区附近氧化层陷阱对该处表面势的调制而引起载流子表面复合速率的涨落.该研究结果为1/f噪声表征GaAlAs IRLED的可靠性提供了实验基础与理论依据.     

一种抗干扰变电站1/3倍频程噪声测量方法*

针对变电站噪声测量容易受外界干扰的问题,提出了一种抗干扰变电站噪声测量系统实现方法,利用最小值控制递归平均算法实时估计每个时频点变电站噪声存在概率,再综合成每个1/3倍频程中外界干扰信号存在概率;对干扰信号存在的1/3倍频程,不进行1/3倍频程噪声更新,从而避免外界干扰信号对变电站噪声测量的影响。仿真结果证明,该方法可以有效减小瞬态干扰对变电站噪声的影响。