Emission properties of a pulsed-periodic barrier discharge initiated in helium-iodine and argon-iodine mixtures

The subject of investigation is the emission properties of a pulsed-periodic barrier discharge initiated by submicrosecond pulses (f = 40–1000 Hz) in He-I₂ and Ar-I₂ mixtures. The investigation is carried out in the spectral range 200–400 nm at a pressure of the working medium of 1–100 kPa and an iodine partial pressure of 130–200 Pa. The dependence of UV emission from the plasma of the barrier discharge at the 342 nm I₂(D′ → A′) band and the iodine atom spectral line at 206.2 nm on the argon and helium partial pressures, excitation pulses repetition rate, and charging voltage of the capacitor of a short high-voltage pulse modulator is optimized. The contribution of the 206.2 nm I* spectral line to the UV emission of the barrier discharge is estimated.     

Ultraviolet gas-discharge lamp on iodine molecules

The emission characteristics of a pulsed-periodic UV radiation source are reported. The source excited by a pulsed-periodic capacitive discharge initiated in helium-iodine vapor, neon-iodine vapor, or krypton-iodine vapor mixtures radiates in the spectral range 200–450 nm. It is shown that most of the plasma radiation power concentrates in the integral line of the iodine atom (206.2 nm) and in the D′-A′ band of the iodine molecule with a maximum at 342 nm. The radiation intensity of the lamp is optimized in accordance with the partial pressure of the inert gases. The discharge plasma parameters that are of interest for simulating the process kinetics and the output characteristics of an UV source based on molecular iodine, atomic iodine, and xenon iodide are calculated in helium-iodine vapor and xenon-iodine vapor mixtures.     

Influence of the iodine vapor pressure on the output characteristics of a UV low-pressure gas-discharge lamp

The influence of the iodine vapor pressure on the output characteristics of a UV lamp pumped by a longitudinal glow discharge is studied. The lamp is filled with a helium-iodine mixture to a pressure of 100–1500 Pa. In the spectral range 320–360 nm, the I₂(D′ → A′) band with a peak at 342 nm prevails, while in the bactericidal range, iodine atomic lines at 183.0 and 206.2 nm dominate. The power of the UV lamp is optimized according to the iodine vapor pressure and working mixture composition by numerical simulation.     

RF exciplex halogen source of UV radiation on an argon-xenon-chlorine mixture

An exciplex halogen source of UV radiation that is excited by an rf transverse discharge is studied experimentally. The active medium of the source is an Ar-Xe-Cl₂ mixture kept at a low pressure (100–1000 Pa), and its working spectral range is 220–450 nm. The radiation spectrum contains 235 nm XeCl(D-X), 257 nm Cl₂(D′-A′), 306 nm XeCl(B-X), 390 nm XeCl(C-A), and 430 nm XeCl(B-A) lines. The results of optimization of the UV power as a function of the pressure, Ar-Xe-Cl₂ mixture composition, and excitation power are reported.     

Radiative characteristics and kinetics of processes in low-pressure gas-discharge lamps based on a mixture of helium and iodine vapors

The UV radiation of glow- and capacitive-discharge lamps based on mixtures of inert gases with iodine vapors are optimized in the spectral range of 175–360 nm, in which working helium-iodine mixtures of different compositions are used. The most intense spectral lines in the bactericidal region of the spectrum were the atomic lines of iodine (183.0, 206.2 nm), and in the region of 320–360 nm, emission of the spectral band of an iodine molecule prevailed with a maximum at λ = 342 nm. For a capacitive lamp with a casing opaque in the spectral range λ < 250 nm, the main part of the plasma emission power is concentrated in the A′-D′ band of an iodine molecule with a maximum at 342 nm. The emission brightness of this lamp is optimized in iodine molecule transitions depending on the partial helium pressure. We present the results of simulating the kinetics of processes in a glow-discharge plasma in mixtures of He, Xe, and iodine vapors. We establish the dependence of the main part of the emission intensity of the 206.2 nm spectral line of an iodine atom and the 342 nm band of an iodine molecule on the helium pressure in a glow-discharge lamp operating on a He-I₂ mixture.     

Mercury-free emitter pumped by a krypton fluoride molecule pulse-periodic barrier discharge

The characteristics of a pulsed-periodic short-barrier-discharge emitter operating at wavelength λ = 248 nm KrF(X-B) are investigated. The operating mixtures of the UV lamp are low-aggressive krypton-sulfur hexafluoride (SF6) mixtures at a total pressure in the range 1–50 kPa and a SF₆ partial pressure of 0.1–0.4 kPa. The spectral characteristics of the plasma are studied, and the 248 nm KrF(X-B) band luminosity is optimized in terms of the operating mixture composition, pump voltage, and pulse repetition rate. The mean power of UV emission from the lateral surface of the cylindrical lamp is estimated.     

Electrical and optical characterization of pulsed plasma of N<Subscript>2</Subscript>–H<Subscript>2</Subscript>

This paper considers the electrical and optical characterization of glow discharge pulsed plasma in N₂/H₂ gas mixtures at a pressures range between 0.5 and 4.0 Torr and discharge current between 0.2 and 0.6 A. Electron temperature and ion density measurements were performed employing a double Langmuir probe. They were found to increase rapidly as the H₂ percentage in the mixture was increased up to 20%. This increase slows down as the H₂ percentage in the gas mixture was increased above 20% at the same pressure. Emission spectroscopy was employed to observe emission from the pulsed plasma of a steady-state electric discharge. The discharge mainly emits within the range 280–500 nm. The emission consists of N₂ (C-X) 316, 336, 358 nm narrow peaks and a broad band with a maximum at λ_max = 427 nm. Also lines of N₂, N₂ ⁺ and NH excited states were observed. All lines and bands have their maximum intensity at the discharge current of 0.417 A. The intensities of the main bands and spectral lines are determined as functions of the total pressure and discharge current. Agreement with other theoretical and experimental groups was established.     

Emissivity of the pulsed capacitive discharge in helium-iodine and neon-iodine mixtures

The emission parameters of a pulsed capacitive discharge initiated in helium-iodine and neon-iodine mixtures are reported. The discharge plasma emits at wavelengths of 183.0 and 206.2 nm, which correspond to iodine atom spectral lines. The capacitive discharge is initiated in a cylindrical quartz tube with an electrode distance of 10 cm. The discharge radiation is optimized in exciting pulse repetition rate and helium and neon pressures in He(Ne)-I₂ mixtures. The optimal pressures of helium, neon, and iodine vapor fall into the ranges 0.8–2.0 kPa, 0.5–1.0 Pa, and ≤60 Pa, respectively.     

Optical characteristics of a transverse discharge in neon at atmospheric pressure

We present the results of investigation into radiation of a pulsed transverse discharge in neon at a pressure of 10–200 kPa. Survey spectra of plasma radiation, time characteristics of radiation, and the effect of small impurities of water vapors and air on the optical characteristics of a neon plasma were studied. We show that at a pressure of residual gases at a level of 10 Pa intense OH*, NO*, and N _* ² bands are observed in radiation of the plasma of a nanosecond transverse discharge in Ne against the background of continuous plasma radiation, and in the spectral region with λ>400 nm radiation was observed on the H_β 486.1 nm and NeI 585.3 nm lines, and (when P≥100 kPa) on the line at the 3s–3p-transitions of a Ne atom. The radiation intensity of the third continuum of neon increases with pressure and with energy contribution to plasma, with its maximum being located in the VUV spectral region (λ _max <200 nm). To whom correspondence should be adressed. Uzhgorod State University, 46, Pidgirna St., Uzhgorod, Ukraine. Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 66, No. 1, pp. 5–10, January–February, 1999.     

Source of far and vacuum ultraviolet radiation based on a transverse high-frequency discharge

We present the results of an investigation of a short-wavelength radiation source (Δλ = 130–350 nm) with excitation by a transverse high-frequency (f = 1.76 MHz) discharge based on a mixture of argon and chlorine (p = 100–500 Pa). We have studied the spectral characteristics of the plasma, the oscilloscope traces of the voltage, the current and emission of the discharge, the dependence of the power of the emission on the electrical power of the discharge, and also the pressure and partial composition of the Ar/Cl₂ mixture. The UV-VUV source emits in a system of broadened and overlapping ArCl(B/X), Cl₂(D′/A′), and Cl**₂ molecular bands. __________ Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 74, No. 5, pp. 648–651, September–October, 2007.     

Subnormal glow discharge in a Xe/Cl2 mixture in a narrow discharge tube

Electrical and optical characteristics of a subnormal glow discharge in a short (L=10 cm) discharge tube with an inner diameter of 5 mm are investigated. The dependences of the discharge current-voltage characteristic, the energy deposition in the discharge, the plasma spectral characteristics in the 130-to 350-nm wavelength range, the emission intensities of the XeCl(D-X) 236-nm and XeCl(B-X) 308-nm bands, and the total emission intensity in the range 180–340 nm on the pressure and composition of the Xe/Cl₂ mixture are studied. Two modes of glow discharge are shown to exist: the low-current mode at a discharge current of I _ch ≤2 mA and the high-current mode at I _ch >2 mA. The transition from one mode to another occurs in a stepwise manner. The increase in the chlorine content causes the discharge voltage and the energy deposition in the plasma to increase. At low pressures of the Xe/Cl₂ mixture (P≤0.7 kPa), stationary strata form in the cathode region. The lower the discharge current, the greater the volume occupied by the strata. This longitudinal discharge acts as a powerful source of continuous broadband emission in the range 180–340 nm, which forms due to overlapping the XeCl(D, B-X) and Cl ₂ ^* bands with edges at λ=236, 308, and 258 nm. The intensity of the 236-nm band is at most 20% of the total intensity of UV radiation. The maximum power of UV radiation (3 W at an efficiency of 8%) is attained at a xenon partial pressure of 250–320 Pa and a total pressure of the mixture of 2 kPa.     

Emission from a DC glow discharge in a He/H2O mixture

The electrical and optical characteristics of a longitudinal dc glow discharge in a cylindrical discharge tube in mixtures of helium with saturated water vapor at room temperature are investigated. In the UV range, a broad band with a maximum at λ_max=309.6 nm and Δλ=9 nm prevails. The H_α 656.3-nm, H_β 486.1-nm, and HeI lines in the range 440–670 nm are the main diagnostic spectral lines. The helium partial pressure and the glow discharge current are optimized to achieve the maximum intensities of the 309.6-nm band and HeI and HI spectral lines. The results obtained are of interest for the development of an ecologically safe radiation source based on the products of the decomposition of water molecules and clusters in plasma.     

Electric-discharge He/Xe/I<Subscript>2</Subscript> excimer-halogen UV lamp

The characteristics of a low-size low-pressure UV lamp operating on the atomic iodine resonant line (λ=206 nm) and xenon iodide (λ=253 nm) and dimer iodine (λ=342 nm) bands are investigated. A lamp with an interelectrode distance of 19 cm was pumped by a longitudinal dc glow discharge. The working gas mixtures were He/I₂ and He/Xe/I₂ mixtures with a total pressure of 50–1500 Pa. The output parameters of the electric-discharge excimer-halogen lamp were optimized in terms of the gas mixture pressure and composition and the power deposited in the discharge. It is shown that the total UV power emitted from the entire aperture of the lamp in the spectral range 200–350 nm attains 5–7 W with an efficiency of ≤5%.     

Ultraviolet radiation sources on (H2O,D2O) water vapor

Emission characteristics of ultraviolet (UV) radiation from water vapor (H₂O, D₂O, and a mixture of H₂O and D₂O vapors) excited by pulse-periodic discharges with open electrodes, as well as electrodes outside the discharge tube (capacitive discharge), are presented. Radiation is studied in a spectral range of 175–350 nm. The emission characteristics of a UV radiation source based on vapors of ordinary and “heavy” water, as well as the results of optimization of brightness of radiation bands from the OH and OD radicals as functions of pressure and the composition of the He-H₂O and He-D₂O mixtures, are reported.     

Glow-discharge-pumped broadband ultraviolet lamp

The optical characteristics of a UV broadband lamp that was excited by a longitudinal glow discharge and operated on Kr—Br₂—I₂, Xe—Br₂—I₂, and Kr—Xe—Br₂—I₂ mixtures are investigated. The interelectrode spacing in the lamp is 10 cm, the inner diameter of a discharge tube being 14 mm. The current-voltage characteristics, the emission spectra of the plasma, and the dependence of the intensity of spectral lines (the amplitude of radiation bands) on the power that was pumped into the plasma based on mixtures of various compositions and pressures, as well as the radiation power in the spectral range from 200 to 390 nm, are studied. __________ Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 72, No. 6, pp. 840–842, November–December, 2005.     

Emission characteristics of a gas-discharge plasma of water vapor in the vacuum UV region of the spectrum

We present the results of a study of emission from a low-density water vapor plasma in the vacuum ultraviolet (VUV) region of the spectrum. The plasma was formed in a longitudinal glow discharge. We have studied the spectral characteristics of the plasma and also the dependences of the relative energy characteristics of the hydroxyl (OH) emission band on the discharge current and the helium partial pressure in a He-H₂O mixture in the spectral range 130–190 nm. __________ Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 73, No. 6, pp. 831–833, November–December, 2006.     

Spectral characteristics of the emission from a barrier discharge plasma based on an Ar–H2O mixture in the UV spectral region

We present the results of a study of a barrier-discharge plasma in an Ar–H₂O mixture in the UV region of the spectrum (200–500 nm). The saturated water vapor pressure was varied over the range 2.0–2.5 kPa. A comparative study of the spectral characteristics of the plasma based on water vapor and the Ar–H₂O mixture showed that the intensity of the emission of the A → X band of the OH^● radical increases three-fold in the mixture of water with argon.     

Multiwave excimer lamps using XeF/XeCl/KrF/KrCl molecules

Results are presented of an investigation of the spectral and temporal characteristics of an electricdischarge excimer lamp emitting simultaneously on the 351 nm XeF, 308 nm XeCl, 249 nm KrF, and 222 nm KrCl transitions. The He/Kr/Xe/SF₆/HCl working mixtures were excited in a transverse discharge with ultraviolet spark preionization at a total pressure of 25–100 kPa. In order to obtain the same brightness the concentration ratio [Kr]/[Xe] for the excimer molecular transitions was 8/0.8 kPa, and that for the halogen-containing molecules was [SF₆]/[HCl][=[0.06–0.12]/[0.08–0.16] kPa. The duration of the radiation pulses for the excimer molecular transitions at atmospheric pressure was 100–200 ns and when the total mixture pressure was reduced to 250 kPa, this was doubled or trebled. The service life of the spontaneous radiation for B-X transitions in excimer molecules was 10⁵ pulses. Zh. Tekh. Fiz. 68, 64–67 (December 1998)     

OH number densities and plasma jet behavior in atmospheric microwave plasma jets operating with different plasma gases (Ar,Ar/N<Subscript>2</Subscript>, and Ar/O<Subscript>2</Subscript>)

OH radical number density in multiple atmospheric pressure microwave plasma jets is measured using UV cavity ringdown spectroscopy of the OH (A–X) (0–0) band at 308 nm. The plasma cavity was excited by a 2.45 GHz microwave plasma source and plasma jets of 2–12 mm long were generated by using three different plasma gases, argon (Ar), Ar/N₂, and Ar/O₂. Comparative characterization of the plasma jets in terms of plasma shape, stability, gas temperature, emission intensities of OH, NO, and N₂, and absolute number density of the OH radical was carried out under different plasma gas flow rates and powers at various locations along the plasma jet axis. With three different operating gases, the presence of OH radicals in all of the plasma jets extended to the far downstream. As compared to the argon plasma jets, the plasma jets formed with Ar/N₂ and Ar/O₂ are more diffuse and less stable. Plasma gas temperatures along the jet axis were measured to be in the range of 470–800 K for all of the jets formed in the different gas mixtures. In each plasma jet, OH number density decreases along the jet axis from the highest OH density in the vicinity of the jet tip to the lowest in the far downstream. OH density ranges from 1.3 × 10¹² to 1.1 × 10¹⁶, 4.1 × 10¹³ to 3.9 × 10¹⁵, and 7.0 × 10¹² to 4.6 × 10¹⁶ molecule/cm³ in the Ar, Ar/N₂, and Ar/O₂ plasma jets, respectively. The OH density dependence on plasma power and gas flow rate in the three plasma jets is also investigated.     

Optical characteristics of the steady-state plasma of a longitudinal discharge in a He/CFC-12 mixture

The emission from the plasma of a contracted longitudinal dc discharge in a He/CF₂Cl₂ mixture in the wavelength range 130–300 nm is investigated. It is shown that the discharge plasma emits within the range 150–260 nm. The emission consists mainly of the broad bands of Cl₂ molecules and single-charged chlorine ions. The pressure and composition of the working mixtures, the discharge current, and the time during which the emitter can operate on a single gas fill are optimized to attain the best characteristics of UV and VUV radiation. The results obtained are of interest for developing a steady-state source of VUV and UV radiation to be applied in microelectronics, photochemistry, and medicine.