氧化镓薄膜的制备及其日盲紫外探测性能研究

采用射频磁控溅射方法在蓝宝石单晶衬底上沉积氧化镓(Ga2O3)薄膜,并通过光刻剥离工艺(Lift-off)制备了金属-半导体-金属结构的Ga2O3日盲紫外探测器。对不同温度下沉积的Ga2O3薄膜分析表明,在800℃下获得的薄膜结晶质量最好,薄膜的导电性则随着沉积温度的上升先增大后减小。在800℃制备的β-Ga2O3薄膜的可见光透光率大于90%,光学吸收边在255 nm附近。在10 V偏压下,探测器的暗电流约为1n A,光电流达800 n A,对紫外光响应迅速。器件的响应度达到0.3 A/W,260 nm波长处的响应度是290 nm波长对应响应度的40倍,可实现日盲紫外波段的探测。     

基于FTO/VO2/FTO结构的VO2薄膜电压诱导相变光调制特性

采用直流磁控溅射和后退火工艺在掺氟的SnO₂(FTO)导电玻璃衬底上制备VO₂薄膜, 研究了不同退火时间和不同比例的氮氧气氛对VO₂薄膜性能的影响, 对VO₂薄膜的结晶取向、表面形貌、表面元素的相对含量和透过率随波长变化进行了测试分析, 结果表明在最佳工艺条件下制备得到了组分相对单一的VO₂薄膜. 基于FTO/VO₂/FTO结构在VO₂薄膜两侧的透明导电膜上施加电压并达到阈值电压时, 观察到了明显的电流突变. 当接触面积为3 mm×3 mm时, 阈值电压为1.7 V, 阈值电压随接触面积的增大而增大. 与不加电压的情况相比, FTO/VO₂/FTO结构在电压作用下高低温的红外透过率差值可达28%, 经反复施加电压, 该结构仍保持性能稳定, 具有较强的电致调控能力.     

Cu掺杂Ga2O3薄膜的光学性能

采用射频磁控溅射和N2气氛退火处理制备了多晶Ga2O3薄膜和Cu掺杂Ga2O3薄膜.用X射线衍射仪、紫外-可见分光光度计、荧光光谱仪对Ga2O3薄膜和Cu掺杂Ga2O3薄膜的结构和光学性能进行了表征.结果表明,Cu掺杂后Ga2O3薄膜的结晶质量变差,透过率明显降低,吸收率增加,光学带隙减小.本征Ga2O3薄膜在紫外、蓝光和绿光出现了发光带,Cu掺杂后紫外和蓝光发射增强,且在475nm处出现了一个新的发光峰.     

磁控溅射制备W掺杂VO2/FTO复合薄膜及其性能分析

为了获得相变温度低且热致变色性能优越的光学材料, 室温下在F:SnO₂ (FTO)导电玻璃基板表面沉积钨钒金属膜, 再经空气气氛下的热氧化处理, 制备了W掺杂VO₂/FTO复合薄膜, 利用X射线光电子能谱、X射线衍射和扫描电镜对薄膜的结构和表面形貌进行了分析. 结果表明: 高温热氧化处理过程中没有生成W, F, V混合氧化物, W以替换V原子的方式掺杂. 与采用相同工艺和条件制备的纯VO₂/FTO复合薄膜相比, W掺杂VO₂薄膜没有改变晶面取向, 仍具有(110)晶面择优取向, 相变温度下降到35 ℃左右, 热滞回线收窄到4 ℃, 高低温下的近红外光透过率变化量提高到28%. 薄膜的结晶程度明显提高, 表面变得平滑致密, 具有很好的一致性, 对光电薄膜器件的设计开发和工业化生产具有重要意义. 关键词： W掺杂 2')" href="#">VO₂ FTO导电玻璃 磁控溅射     

Tuning electronic properties of the S_2/graphene heterojunction by strains from density functional theory

Based on the density functional calculations, the structural and electronic properties of the WS_2/graphene heterojunction under different strains are investigated. The calculated results show that unlike the free mono-layer WS_2, the monolayer WS_2 in the equilibrium WS_2/graphene heterojunctionis characterized by indirect band gap due to the weak van der Waals interaction. The height of the schottky barrier for the WS_2/graphene heterojunction is 0.13 eV, which is lower than the conventional metal/MoS_2 contact. Moreover, the band properties and height of schottky barrier for WS_2/graphene heterojunction can be tuned by strain. It is found that the height of the schottky barrier can be tuned to be near zero under an in-plane compressive strain, and the band gap of the WS_2 in the heterojunction is turned into a direct band gap from the indirect band gap with the increasing schottky barrier height under an in-plane tensile strain. Our calculation results may provide a potential guidance for designing and fabricating the WS_(2~-)based field effect transistors.     

Ga2O3薄膜的光致发光及激光烧蚀产物的分布

采用脉冲激光沉积技术在氧气氛中制备了Ｃａ２Ｏ３薄膜,Ｘ射线衍射表明薄膜属于β单斜晶系,薄膜的颗粒在纳米量级;原子力显微镜显示随着氧气压强的增加,薄膜颗粒增大,测定了薄膜的光致发光,发现沉积时氧气压强的增加可以提高纯Ｇａ２Ｏ３薄膜的发光强度,且峰位红移,Ｇａ２Ｏ３靶物质中掺杂少量的ＣｅＯ２后所得到的薄膜,其发光强度可以明显地增加,此外,还利用发光光谱技术研究了由激光烧蚀所产生的羽状物中Ｇａ原子或离     

Tm~(3+)/Er~(3+)/Yb~(3+)掺杂的镓锗酸盐玻璃光谱性能及能量传递

采用熔融淬冷法制备得到透明的Tm~(3+)/Er~(3+)/Yb~(3+)掺杂镓锗钠玻璃。对比研究了808 nm和980 nm激发下Tm_2O_3含量对样品可见-红外光学光谱特性的影响。结合稀土离子能级结构,分析了Tm~(3+)、Er~(3+)和Yb~(3+)离子之间的能量传递机制。结果表明:在808 nm和980 nm的激发下,Tm~(3+)/Er~(3+)/Yb~(3+)掺杂样品中均观察到了473,655,521,544 nm的蓝、红和绿光。在808 nm激发下,随着Tm~(3+)浓度的增加,Tm~(3+):1 800 nm和Er~(3+):1 530 nm发射强度的比率I1.8/I1.53逐渐增大。由于在Tm~(3+)和Er~(3+)间的能量传递有效地改变了红光和绿光的发射强度,473,521,655 nm的发光强度呈现先升高再降低的趋势,在Tm_2O_3掺杂摩尔分数为0.3%时达到最大值。而在980 nm激发下,由于Yb~(3+)对Er~(3+)和Tm~(3+)的能量传递起主要作用,使得其上转换红光(655 nm)、绿光(521 nm和544 nm)和蓝光(473 nm)的发光强度高于808 nm激发下的上转换发光。     

CuO/Al2O3、CuO/CeO2-Al2O3和CuO/La2O3-Al2O3催化剂中CuO物种被CO氧化的比较

用浸渍法制备了CuO/Al2O3 (Cu/Al)、CuO/CeO2- Al2O3 (Cu/CeAl)和CuO/La2O3-Al2O3(Cu/LaAl)催化剂. 通过原位XRD、Raman和H2-TPR方法， 对催化剂中的CuO物种以及CuO-Al2O3的固-固相反应进行了表征. 结果表明，对于Cu/Al催化剂，CuAl2O4存在于CuO与Al2O3层之间，CuO以高分散和晶相两种相态存在于催化剂的表层；对于Cu/CeAl催化剂，除了少量高分散和晶相的CuO存在于表层外，大部分CuO迁移到了CeO2的内层，     

Band alignment of Ga2O3/6H-SiC heterojunction

A high-quality Ga₂O₃ thin film is deposited on an SiC substrate to form a heterojunction structure. The band alignment of the Ga₂O₃/6H-SiC heterojunction is studied by using synchrotron radiation photoelectron spectroscopy. The energy band diagram of the Ga₂O₃/6H-SiC heterojunction is obtained by analysing the binding energies of Ga 3d and Si 2p at the surface and the interface of the heterojunction. The valence band offset is experimentally determined to be 2.8 eV and the conduction band offset is calculated to be 0.89 eV, which indicate a type-II band alignment. This provides useful guidance for the application of Ga₂O₃/6H-SiC electronic devices.     

SO2-4/Fe2O3-Al2O3纳米固体酸的红外光谱研究

用IR光谱研究了SO4^2-/Fe2O3-Al2O3纳米固体酸在不同焙烧温度下表面结构与酸性的变化，结果表明，当焙烧温度在450－500℃时，双齿螯合配位结构特征谱带齐全，酸性强，小于450℃时，双齿螯合配位特征谱带不齐全，酸性不强，而大于500℃时，随着温度的升高，特性谱带区域宽化，特征峰消失，酸性变弱。此外，从Fe-O纳米颗粒的特征振动带显示可得知，样品的粒径小于30nm。     

Improvement of the scintillation properties of Gd3Ga3Al2O12:Ce,B single crystals having tailored defect structure

A novel approach is reported to minimize various defect centers in Ce doped Gd₃Ga₃Al₂O₁₂ single crystals to improve the scintillation properties. The crystals of Gd₃Ga₃Al₂O₁₂ codoped with 0.2 at% Ce and B (GGAG:Ce,B) have been grown in air and argon ambient using the Czochralski technique. The scintillation light output of crystals grown in Ar ambient was significantly increased after annealing the crystals in air. The measured light output of 60000 ph/MeV for annealed crystals is the highest value reported among this class of materials. As a consequence, the energy resolution at 662 keV gamma‐rays from a ¹³⁷Cs source was improved from 8% for the crystals grown in air to 6% for crystals grown in Ar and subsequently annealed in air. Further, the thermal quenching energy of photoluminescence (PL) emission was increased to be 470 meV for the annealed crystals. The thermoluminescence (TL) measurements suggest that the crystals grown in Ar ambient and post‐growth annealed in air may have a lesser concentration of trap centers which subsequently lead to the improvement in optical and scintillation properties leading to a superior detector performance. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Ga3S2-和Ga4S3-团簇结构及性质的密度泛函理论研究

采用密度泛函理论（DFT）中的B3LYP方法和BP86方法,对Ga₃S₂^-团簇和Ga₄S₃^-团簇进行结构优化,并计算和分析了最稳定结构的成键性质及振动特性.计算结果表明,Ga₃S₂^-团簇和Ga₄S₃^-团簇的最稳定结构是由"Ga-S-Ga"结构单元和处于端位的"Ga-S"结构单元组成的.键级分析表明上述两结构单元都具有较强的稳定性.此外,通过分析红外振动光谱数据也发现在"Ga-S-Ga"单元和"Ga-S"单元处有红外强峰出现.     

氢气引入对宽光谱Mg和Ga共掺杂ZnO透明导电薄膜的特性影响

为适应宽光谱高效率硅基薄膜太阳电池的应用需求,本文尝试采用直流磁控溅射技术在553 K衬底温度下生长氢化Mg和Ga共掺杂ZnO(HMGZO)透明导电氧化物(TCO)薄膜.通过对薄膜微观结构、表面形貌、电学以及光学性能的测试和分析,详细地研究了氢气(H2)流量(0—16.0 sccm)对HMGZO薄膜结晶特性及光电性能的影响.实验结果表明:生长获得的HMGZO薄膜均为六角纤锌矿结构的多晶薄膜,择优取向为(002)晶面生长方向.薄膜的生长速率随着氢气流量的增加呈现逐渐减小趋势,主要归因于溅射产额的减小.适当的氢气引入会引起晶粒尺寸的增加.随着氢气流量由0增加至4.0 sccm,ZnO薄膜电阻率从177?·cm急剧减小至7.2×10-3?·cm,主要是由于H施主的引入显著地增加了载流子浓度;然而进一步增加氢气流量(4.0—16.0 sccm)造成电阻率的轻微增加,主要归因于载流子浓度的减小以及过多氢杂质引入造成杂质散射的增加.所有生长获得的HMGZO薄膜平均光学透过率在波长λ～320—1100 nm范围内可达87%以上.由于Mg的作用及Burstein-Moss效应的影响造成了带隙展宽,带隙变化范围～3.49—3.70 eV,其中最大光学带隙Eg可达～3.70 eV.     

Si掺杂Al_2O_3电子结构的第一性原理计算

本文采用第一性原理对纯Al2O3和Si掺杂的Si0.167Al0.833O1.5,Si0.25Al0.75O1.5晶体体系的能带结构、态密度进行了计算分析.结果发现:随着Si在Al2O3晶体中所占比例的增加,体系能隙变小,在Si0.25Al0.75O1.5晶体体系中能隙已降到2.5 e V,表明该体系为半导体材料;而在掺杂的体系中有数条分散的能带穿过了费米能级,即可以预测该掺杂体系有特别的光电性质;同时对比纯Al2O3和Si掺杂的Si0.167Al0.833O1.5,Si0.25Al0.75O1.5晶体体系的总态密度,发现掺杂体系的价带和导带向低能区域移动.     

Si掺杂Al2O3电子结构的第一性原理计算

本文采用第一性原理对纯Al2O3和Si掺杂的Si 0.167Al0.833O1.5, Si 0.25Al0.75O1.5晶体体系的能带结构、态密度进行了计算分析. 结果发现：随着Si在Al2O3晶体中所占比例的增加,体系能隙变小,在Si 0.25Al0.75O1.5晶体体系中能隙已降到2.5eV,表明该体系为半导体材料;而在掺杂的体系中有数条分散的能带穿过了费米能级,即可以预测该掺杂体系有特别的光电性质;同时对比纯Al2O3和Si掺杂的Si 0.167Al0.833O1.5, Si 0.25Al0.75O1.5晶体体系的总态密度,发现掺杂体系的价带和导带向低能区域移动.     

Suppression of persistent photoconductivity in high gain Ga2O3 Schottky photodetectors

The defect-related photoconductivity gain and persistent photoconductivity (PPC) observed in Ga₂O₃ Schottky photodetectors lead to a contradiction between high responsivity and fast recovery speed. In this work, a metal-semiconductor-metal (MSM) Schottky photodetector, a unidirectional Schottky photodetector, and a photoconductor were constructed on Ga₂O₃ films. The MSM Schottky devices have high gain (> 13) and high responsivity (> 2.5 A/W) at 230-250 nm, as well as slow recovery speed caused by PPC. Interestingly, applying a positive pulse voltage to the reverse-biased Ga₂O₃/Au Schottky junction can effectively suppress the PPC in the photodetector, while maintaining high gain. The mechanisms of gain and PPC do not strictly follow the interface trap trapping holes or the self-trapped holes models, which is attributed to the correlation with ionized oxygen vacancies in the Schottky junction. The positive pulse voltage modulates the width of the Schottky junction to help quickly neutralize electrons and ionized oxygen vacancies. The realization of suppression PPC functions and the establishment of physical models will facilitate the realization of high responsivity and fast response Schottky devices.     

Cu_2O/ZnO氧化物异质结太阳电池的研究进展

介绍了近年来低成本Cu_2O/ZnO氧化物异质结太阳电池方面的研究进展.应用于光伏器件的吸收层材料Cu_2O是直接带隙半导体材料,天然呈现p型;其原材料丰富,且对环境友好.Cu_2O/ZnO异质结太阳电池结构主要有平面结构和纳米线/纳米棒结构.纳米结构的Cu_2O太阳电池提高了器件的电荷收集作用;通过热氧化Cu片技术获得的具有大晶粒尺寸平面结构Cu_2O吸收层在Cu_2O/ZnO太阳电池应用中展现出了高质量特性.界面缓冲层(如i-ZnO,a-ZTO,Ga_2O_3等)和背表面电场(如p~+-Cu_2O层等)可有效地提高界面处能级匹配和增强载流子输运.10 nm厚度的Ga_2O_3提供了近理想的导带失配,减少了界面复合;Ga_2O_3非常适合作为界面层,其能够有效地提高Cu_2O基太阳电池的开路电压V_(oc)(可达到1.2 V)和光电转换效率.p~+-Cu_2O(如Cu_2O:N和Cu_2O:Na)能够减少器件中背接触电阻和形成电子反射的背表面电场(抑制电子在界面处复合).利用p型Na掺杂Cu_2O(Cu_2O:Na)作为吸收层和Zn_(1-x)Ge_x-O作为n型缓冲层,Cu_2O异质结太阳电池(器件结构:MgF_2/ZnO:Al/Zn_(0.38)Ge_(0.62)-O/Cu_2O:Na)光电转换效率达8.1%.氧化物异质结太阳电池在光伏领域展现出极大的发展潜力.     

Sr_3Ga_2Ge_4O_（14）晶体中Cr~（3＋）和Cr~（4＋）吸收光谱

采用提拉法生长了掺Ｃｒ的Ｓｒ３Ｇａ２Ｇｅ４Ｏ１４低温石榴石结构型单晶，测量了它的吸收光谱及其偏振特性，系统描述了该晶体在可见和近红外波段各吸收带的特征，指出Ｃｒ在此晶体晶格中主要存在两种价态Ｃｒ３＋和Ｃｒ４＋，Ｃｒ４＋在近红外的吸收将影响到Ｃｒ３＋的发光。     

A 4×4 metal-semiconductor-metal rectangular deep-ultraviolet detector array of Ga2O3 photoconductor with high photo response

A 4$times $4 beta-phase gallium oxide ($beta $-Ga$_{2}$O$_{3}$) deep-ultraviolet (DUV) rectangular 10-fingers interdigital metal-semiconductor-metal (MSM) photodetector array of high photo responsivity is introduced. The Ga$_{2}$O$_{3}$ thin film is prepared through the metalorganic chemical vapor deposition technique, then used to construct the photodetector array via photolithography, lift-off, and ion beam sputtering methods. The one photodetector cell shows dark current of 1.94 pA, photo-to-dark current ratio of 6$times $10$^{7}$, photo responsivity of 634.15 A$cdot$W$^{-1}$, specific detectivity of 5.93$times $10$^{11}$ cm$cdot$Hz$^{1/2}cdot$W$^{-1}$ (Jones), external quantum efficiency of 310000%, and linear dynamic region of 108.94 dB, indicating high performances for DUV photo detection. Furthermore, the 16-cell photodetector array displays uniform performances with decent deviation of 19.6% for photo responsivity.