Defect-free nanoporous thin films from ABC triblock copolymers

The self-assembly of triblock copolymers of poly(ethylene oxide-b-methyl methacrylate-b-styrene) (PEO-b-PMMA-b-PS), where PS is the major component and PMMA and PEO are minor components, provides a robust route to highly ordered, nanoporous arrays with cylindrical pores of 10-15 nm that show promise in block copolymer lithography. These ABC triblock copolymers were synthesized by controlled living radical polymerization, and after solvent annealing, thin films showing defect-free cylindrical microdomains were obtained. The key to the successful generation of highly regular, porous thin films is the use of PMMA as a photodegradable mid-block which leads to nanoporous structures with an unprecedented degree of lateral order. The power of using a triblock copolymer when compared to a traditional diblock copolymer is evidenced by the ability to exploit and combine the advantages of two separate diblock copolymer systems, the high degree of lateral ordering inherent in PS-b-PEO diblocks plus the facile degradability of PS-b-PMMA diblock copolymer systems, while negating the corresponding disadvantages, poor degradability in PS-b-PEO systems and no long-range order for PS-b-PMMA diblocks.     

Elucidation of protein adsorption behavior on polymeric surfaces: toward high-density, high-payload protein templates

The elucidation of protein adsorption behavior on polymeric surfaces is very important, since their use as arrays and carriers of biomolecules is ever growing for a wide variety of bioapplications. We evaluate protein adsorption characteristics on chemically homogeneous and heterogeneous polymeric surfaces by employing polystyrene-block-polymethylmethacrylate (PS-b-PMMA) diblock copolymer, PS homopolymer, PMMA homopolymer, and PS/PMMA blend as protein templates. We also investigate distance-dependent protein adsorption behavior on the interfacial region between PS and PMMA. We observe selective protein adsorption exclusively onto PS areas for the chemically heterogeneous PS-b-PMMA and PS/PMMA blend templates. On blend films, protein adsorption is highly favored on the PS regions located near the PS:PMMA interface over that on the PS areas situated away from the interface. Protein density on PS domains is inversely proportional to the separation distance between two neighboring PS:PMMA interfaces. We also observe a higher protein density on the PS-b-PMMA than on the PS or PMMA homopolymer templates. This effect is due to the fact that chemically heterogeneous PS-b-PMMA presents periodically spaced PS:PMMA interfaces on the nanometer scale, whereas no such interfaces are present on homopolymer films. The density of protein molecules on the heterogeneous PS-b-PMMA surface is approximately 3-4-fold higher than on the homogeneous PS surface for the identical experimental conditions. These results demonstrate that self-assembling, chemically heterogeneous, nanoscale domains in PS-b-PMMA diblock copolymers can be used as excellent, high-payload, high-density protein templates. The unique advantages of the diblock copolymer may prove the spontaneously constructed protein nanotemplates to be highly suitable as functional substrates in many proteomics applications.     

Atomic force microscopy investigation of asymmetric diblock copolymer morphologies in thin films

Microphase separation and the resulting morphology of asymmetric diblock copolymers of poly(ε-caprolactone) (PCL) in thin films have been investigated by atomic force microscopy. Copolymers consisted of a short block of PCL (M_n∼2500-4500 g/mole) and a longer second block of poly(methyl methacrylate) (PMMA), poly(styrene) (PS) or poly(cyclohexene oxide) (PCHO). Tendency for microphase separation above the glass transition temperature of the second block (PMMA, PS or PCHO) resulted in a pitted morphology on the surface of the thin films. This tendency was strongest for PMMA and weakest for PCHO. The presence of up to 54% PMMA homopolymer in PCL-PMMA block copolymer did not prevent the formation of such pitted morphology on the surface. The effect of the chemical structure of the second block and the possible orientations of the block copolymer molecules in thin films are discussed.     

Controlling the size of nanostructures in thin films via blending of block copolymers and homopolymers

The effects of molecular weight and concentration of poly (methyl methacrylate) (PMMA) homopolymer or symmetric short polystyrene-block-poly (methyl methacrylate) (PS-b-PMMA) diblock copolymer on the size of the nanostructures of its blends with symmetric long PS-b-PMMA diblock copolymer have been investigated by atomic force microscopy. By careful controlling of the film thickness, solvent selectivity, and annealing time, PMMA cylindrical microdomains oriented normal to the film surface were obtained in all thin films. With the addition of both low- and high-molecular-weight PMMA homopolymers, the cylindrical domain sizes increased although it was less obvious for the lower molecular weight homopolymer. In contrast to the homopolymer, adding the short chain diblock copolymer resulted in a decrease in the cylindrical domain size, which was ascribed to the reduction of the interfacial tension and increase in the stretching energy.     

Fabrication of nanoporous templates from diblock copolymer thin films on alkylchlorosilane-neutralized surfaces

The fabrication of nanoporous templates from poly(styrene)-b-poly(methyl methacrylate) diblock copolymer thin films (PS-b-PMMA, volume ratio 70:30) on silicon requires precise control of interfacial energies to achieve a perpendicular orientation of the PMMA cylindrical microdomains relative to the substrate. To provide a simple, rapid, yet tunable approach for surface neutralization, we investigated the self-assembled ordering of PS-b-PMMA diblock copolymer thin films on silicon substrates modified with a partial monolayer of octadecyldimethyl chlorosilane (ODMS), i.e., a layer of ODMS with a grafting density less than the maximum possible monolayer surface coverage. We demonstrate herein the fabrication of nanoporous PS templates from annealed PS-b-PMMA diblock copolymer thin films on these partial ODMS SAMs.     

An optical waveguide study on the nanopore formation in block copolymer/homopolymer thin films by selective solvent swelling

Thin films of mixtures of asymmetric poly(styrene-block-methyl methacrylate) (PS-b-PMMA) diblock copolymers and PMMA homopolymers with cylindrical PMMA microdomains oriented normal to the substrate surface were used to couple optical modes in the Kretschmann configuration, and their optical properties were investigated by optical waveguide spectroscopy (OWS). The nanopore formation in the block copolymer (BCP) waveguide layer via selective solvent swelling and subsequent reannealing was monitored in terms of shifts in the coupling mode angles. The sequential swelling/reannealing of the initial mixture film resulted in a number of discrete or partially interconnected pores instead of cylindrical pores with a high aspect ratio. The simultaneous processes occurring inside and on top of the BCP waveguide layer were discerned independently with high selectivity for p- and s-polarization.     

Selective control over the lamellar thickness of one domain in thin binary blends of block copolymer films

Thin binary blends of poly(styrene‐b‐methyl methacrylate) (PS‐PMMA) block copolymers in films where the lamellar thickness of one domain is controlled while preserving the thickness of the other domain were demonstrated without microphase separation. One of the block copolymers used here was short and symmetric, and the other was long and asymmetric; the molecular weights of the PMMA block chains in the constituents were similar. A random copolymer brush was introduced and film thickness and composition of brush were adjusted to induce perpendicular orientation in thin film. As the blend composition of the long asymmetric block copolymer increased, the PS lamellar thickness increased from 15.8 to 25.1 nm, whereas the PMMA lamellar thickness remained constant at approximately 14 nm (the thickness decreased slightly from 14.0 to 13.3 nm). The domain spacing behavior in thin film was consistent in the bulk. These results were compared with the Birshtein, Zhulina, and Lyatskaya model and the theories for pure block copolymers in the strong segregation limit and in the intermediate segregation regime. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2013, 51, 1393–1399     

Ring-shaped morphology in solution-cast polystyrene-poly(methyl methacrylate) block copolymer thin films

We report observation of ring-shaped morphology formed in thin films of a cylinder-forming polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer cast from 1,1,2,2-tetrachloroethane (Tetra-CE) solution via relatively fast solvent evaporation rates, in which Tetra-CE is a good solvent for both blocks but preferential affinity for the minority PMMA block. We studied the microstructure of a set of solution-cast block copolymer films dried with different solvent evaporation rates, R. The control with different R leads to keeping microstructures in different solution concentrations (phi) and bringing mechanical strain fields with different strength in the film, for which faster evaporation rates result in microstructures of lower solution concentrations and mechanical strain fields of higher strength. As R decreases from rapid evaporation (approximately 0.1 mL/h), the film microstructure evolved from an intermediate ringlike morphology sequentially to ring-shaped morphologies including loose and tight rings and then inverted phase of PS spheres in a PMMA matrix and finally reached the equilibrium phase, namely, cylinders of PMMA in a PS matrix. In view of the influence of the film constraints, the microstructure of a film with a terraced free surface profile has been examined. The results indicate that the ring-shaped morphology can form as long as the film thickness is larger than a critical value of about one microdomain spacing. In the case where the film thickness is larger than that value, the nature of solvent and the kinetics of solvent evaporation are shown to be mainly responsible for the ring-shaped morphology formation.     

Simulated annealing study of asymmetric diblock copolymer thin films

We report a simulated annealing study of the morphology of asymmetric diblock copolymer thin films confined between two homogeneous and identical surfaces. We have focused on copolymers that form a gyroidal morphology in the bulk. The morphological dependence of the confined films on the film thickness and the surface-polymer interaction has been systematically investigated. From the simulations it is found that much richer morphologies can form for the gyroid-forming asymmetric diblock copolymer thin films, in contrast to the lamella-forming symmetric and cylinder-forming asymmetric diblock copolymer films. Multiple morphological transitions induced by changing the film thickness and polymer-surface interactions are observed.     

Control of self‐organized low‐dimensional morphology in poly(styrene‐b‐4vinylpyridine)/polystyrene blend thin films

The surface morphologies of poly(styrene‐b‐4vinylpyridine) (PS‐b‐P4VP) diblock copolymer and homopolystyrene (hPS) binary blend thin films were investigated by atomic force microscopy as a function of total volume fraction of PS (?_PS) in the mixture. It was found that when hPS was added into symmetric PS‐b‐P4VP diblock copolymers, the surface morphology of this diblock copolymer was changed to a certain degree. With ?_PS increasing at first, hPS was solubilized into the corresponding domains of block copolymer and formed cylinders. Moreover, the more solubilized the hPS, the more cylinders exist. However, when the limit was reached, excessive hPS tended to separate from the domains independently instead of solubilizing into the corresponding domains any longer, that is, a macrophase separation occurred. A model describing transitions of these morphologies with an increase in ?_PS is proposed. The effect of composition on the phase morphology of blend films when graphite is used as a substrate is also investigated. © 2004 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 42: 3496–3504, 2004     

Control of the microdomain orientation in block copolymer thin films with homopolymers for lithographic application

Block copolymer lithography is a promising method for fabricating periodical nanopatterns of less than 20 nm by self-assembly and can be applicable for fabricating patterned magnetic media with a recording density over 1 Tb/in.2. We found a simple technique to control the orientation of cylindrical microdomains in thin films. Simply by mixing polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers with the homopolymer (PS or PMMA) of the major component, we could align the cylindrical microdomains perpendicular to the film surface. The added homopolymer induces conformational entropic relaxation of the block chains in microdomain space and stabilizes the perpendicular orientation of hexagonally packed cylindrical microdomains. Thus formed perpendicular cylinders can be readily aligned in a regular array with a grating substrate.     

PI-b-PMMA diblock copolymers: nanostructure development in thin films and nanostructuring of thermosetting epoxy systems

Poly(isoprene-block-methyl methacrylate) (PI-b-PMMA) block copolymers with different block ratios have been used to generate nanostructures both in thin films and by nanostructuring a thermosetting epoxy system. Obtained morphologies have been analyzed in terms of atomic force microscopy. The nanostructuring of thin films was carried out by thermal and solvent vapor annealing, in which the copolymer films were exposed to acetone vapors, selective solvent for methyl methacrylate (PMMA) block. By solvent vapor annealing thin films of both copolymers self-assembled into a hexagonally packed cylindrical morphology. Thermal annealing was carried out above the glass transition temperature of both blocks, obtaining worm-like and lamellar morphologies, depending on the block ratio. One of the copolymers has also been used for nanostructuring an epoxy thermosetting system. Morphologies consisting of spherical-shaped PI domains dispersed in a continuous epoxy matrix in which PMMA remained miscible were obtained, independently of the copolymer amount.     

Surface segregation of polypeptide-based block copolymer micelles: An approach to engineer nanostructured and stimuli responsive surfaces

We describe the surface segregation of polypeptide-based block copolymer micelles to produce stimuli-responsive nanostructures at the polymer blend/air interface. Such structures were obtained by simultaneous surface migration and self assembly at the surface of diblock copolymer/homopolymer blends. We employed blends composed of homopolymer (PS) and an amphiphilic block copolymer polystyrene-b-poly(l-glutamic acid) (PS-b-PGA). The surface was functionalized based on the preferential segregation to the polymer blend/air interface of the hydrophilic PGA block of the diblock copolymer upon annealing to water vapor. The surface migration of the diblock copolymer to the interface was demonstrated both by XPS and contact angle measurements. As a consequence, the PGA interfacial attraction leads to a large surface excess on diblock copolymer which in turn, through macrophase and microphase separation, produced separated domains at the surface with regions composed either of homo or block copolymer. Herein we demonstrate that the use of asymmetric diblock copolymers with a higher content in PS lead to spherical micellar assemblies randomly distributed at the surface. As observed by AFM imaging the blend composition, i.e. the amount of block copolymer within the blend influences the density of micelles at the surface. Finally, when exposed to water, the pH affects the surface morphology. The PGA segments are collapsed at low pH values and extended at pH values above 4.8, thus inducing variations on the topography of the films at the nanometer scale.     

The Formation of Ordered Nanoholes in Binary,Chemically Similar,Symmetric Diblock Copolymer Blend Films

Summary: Binary symmetric diblock copolymer blends, that is, low‐molecular‐weight poly(styrene‐block‐methyl methacrylate) (PS‐b‐PMMA) and high‐molecular‐weight poly(styrene‐block‐methacrylate) (PS‐b‐PMA), self‐assemble on silicon substrates to form structures with highly ordered nanoholes in thin films. As a result of the chemically similar structure of the PMA and the PMMA block, the PMMA chain penetrates through the large PMA block that absorbs preferentially on the polar silicon substrate. This results in the formation of nanoholes in the PS continuous matrix.

An atomic force microscopy image of the thin film obtained from the blend of low‐molecular‐weight PS‐b‐PMMA and high‐molecular‐weight PS‐b‐PMA. The regular array of nanoholes in the films surface is clearly visible.     

Reactively and physically compatibilized immiscible polymer blends: stability of the copolymer at the interface

This paper reports on the interfacial behaviour of block and graft copolymers used as compatibilizers in immiscible polymer blends. A limited residence time of the copolymer at the interface has been shown in both reactive blending and blend compatibilization by preformed copolymers. Polystyrene (PS)/polyamide6 (PA6), polyphenylene oxide (PPO)/PA6 and polymethylmethacrylate (PMMA)/PA6 blends have been reactively compatibilized by a styrene-maleic anhydride copolymer SMA. The extent of miscibility of SMA with PS, PPO and PMMA is a key criterion for the stability of the graft copolymer at the interface. For the first 10 to 15 minutes of mixing, the in situ formed copolymer is able to decrease the particle size of the dispersed phase and to prevent it from coalescencing. However, upon increasing mixing time, the copolymer leaves the interface which results in phase coalescence. In PS/LDPE blends compatibilized by preformed PS/hydrogenated polybutadiene (hPB) block copolymers, a tapered diblock stabilizes efficiently a co-continuous two-phase morphology, in contrast to a triblock copolymer that was unable to prevent phase coarsening during annealing at 180°C for 150 minutes.     

Effect of a solvent on self-organization in nanofilms: Modeling by the dissipative particle dynamics method

Mesoscopic simulation of processes of drying and swelling of thin copolymer films on a solid substrate is performed. Structural rearrangements in films of symmetric and asymmetric diblock copolymers are studied by the dissipative particle dynamics method in the presence of both nonselective and selective solvents. The plasticizing effect of a solvent is favorable for formation of lamellar and hexagonal mesophases. Owing to evaporation of the solvent from a film or its absorption from the external volume, flows along the normal to the film surface arise. These flows exert an orienting effect on the microdomain structure.     

高分子共混物薄膜表面形貌形成过程中的溶剂效应

采用原子力显微镜观测了由四氢呋喃和2-丁酮分别作为共溶剂制备得到的聚苯乙烯/聚甲基丙烯酸甲酯(PS/PMMA)共混物薄膜的表面形貌.研究发现,溶剂效应对共混物薄膜的表面形貌有较大影响,表面形貌中凸起与凹坑的组分分布是由溶剂效应决定的,与组分比无关.溶剂对不同组分的溶解能力不同还可以导致薄膜表面相逆转点的偏移.     

An in situ GISAXS study of selective solvent vapor annealing in thin block copolymer films: Symmetry breaking of in-plane sphere order upon deswelling

Thin films of asymmetric poly(styrene-b-4-vinylpyridine) (PS-b-P4VP) block copolymers are studied by means of in situ grazing-incidence small-angle X-ray scattering (GISAXS) during solvent vapor annealing in tetrahydrofuran, a solvent selective for the PS majority block of the copolymer. Upon swelling, PS-b-P4VP block copolymers form hexagonal arrays of spherical P4VP microdomains in a PS matrix in films 7–9 layers thick. Deswelling the films induces a transition from hexagonal to face-centered orthorhombic (fco) symmetry, which is stable only at ∼7 layers of spherical microdomains. Dry films show co-existing hexagonal and orthorhombic symmetries when the solvent is removed slowly, whereas instantaneous solvent removal suppresses the fco structure, resulting in films with only hexagonal structure. The in-plane order of microdomains is significantly deteriorated in dry films independent of the solvent removal rate.Spherical block copolymer microdomains are known to undergo a transition from hexagonal to orthorhombic packing in isothermally annealed thin films when the number of sphere layers is increased from 4 to 5. In this paper, in situ GISAXS experiments reveal that a similar transition occurs during solvent vapor annealing in a selective solvent. Interestingly, the transition from hexagonal to orthorhombic packing of spheres occurs as solvent is removed from a thin block copolymer film. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016, 54, 331–338     

聚苯乙烯/聚二甲基硅氧烷嵌段共聚物的表面形态研究

采用原子力显微镜(AFM)和透射电镜(TEM)研究了聚苯乙烯/聚二甲基硅氧烷嵌段共聚物(PS-b-PDMS)薄膜的相形态.结果表明,当采用甲苯作为溶剂,旋转涂膜的薄膜样品呈现网络状的形态分布在表面,而样品所对应的透射电镜照片中,PDMS相作为球状分布在PS的连续相中.退火温度对共聚物表面形态有一定的影响,当退火温度高于PDMS的玻璃化温度,表面中PDMS相增多.PS-b-PDMS嵌段共聚物的表面形态随着所用溶剂的变化而有所不同,当采用甲苯作为溶剂时,样品的PS相形成凹坑分布在PDMS的相区之中,而采用环己烷作为溶剂时,PS相作为突起分布在PDMS相区之中.另外,基底对共聚物薄膜表面形态的有较大的影响,当采用硅晶片作为基底时,样品中的PDMS相和PS相呈现近似平行于表面的层状结构.     

Multitechnique characterization of thin films of immiscible polymer systems: PS–b‐PMMA diblock copolymers and PS–PMMA symmetric blends

Immiscible polymer systems are known to form various kinds of phase‐separated structures capable of producing self‐assembled patterns at the surface. In this study, different surface characterization methods were utilized to study the surface morphology and composition produced after annealing thin polymer films. Two different SIMS techniques—static time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) and dynamic nano‐SIMS—were used, complemented by x‐ray photoelectron spectrometry (XPS) and atomic force microscopy (AFM). Thin films (spin‐coated onto silicon wafers) of polystyrene (PS)–poly(methyl methacrylate) (PMMA) symmetric blends and diblock copolymers of similar molecular weight were investigated. Surface enrichment by PS was found on all as‐cast samples. The samples were annealed at 160 °C for different time periods, after which the blend and the copolymer films exhibited opposite behaviour as seen by ToF‐SIMS and XPS. The annealed blend surface presented an increase in the PMMA concentration whereas that of copolymers showed a decrease in PMMA concentration compared with the as‐cast sample. For blends, the nano‐SIMS as well as AFM images revealed the formation of phase‐separated domains at the surface. The composition information obtained from ToF‐SIMS and XPS, as well as the surface mapping by nano‐SIMS and AFM, allowed us to conclude that PS formed phase separated droplet‐like domains on a thin PMMA matrix on annealing. The three‐dimensional nano‐SIMS images showed that the PS droplets were supported inside a rim of PMMA and that these droplets continued from the surface like columnar rods into the film until the substrate interface. In the case of annealed copolymer samples, the AFM images revealed topographical features resembling droplet‐like domains on the surface but there was no phase difference between the domains and the matrix. In the case of copolymers, owing to the covalent bonding between the blocks, complete phase separation was not possible. The three‐dimensional nano‐SIMS images showed domain structures in the form of striations inside the film, which were not continuous until the substrate interface. Information from the different techniques was required to gain an accurate view of the surface composition and topographical changes that have occurred under the annealing conditions. Copyright © 2005 John Wiley & Sons, Ltd.