Electrostatic assembly of gold colloidal nanoparticles on organosilane monolayers patterned by microcontact electrochemical conversion

A new approach is introduced for electrostatically guided adsorption of colloidal nanoparticles onto a patterned self-assembled monolayer (SAM) with feature sizes ranging from nm to mm. Patterning of the adsorption templates is realized by electric-field-induced anodic oxidation of aminosilane SAM using an ink-free method. In this versatile method, both "positive" and "negative" type pattern transfers are possible. The chemically converted patterns are induced by localized electrical fields on the microcontacted areas, and the patterning resolution is insensitive to the diffusion of oxidizing agents because of the self-limiting oxidation kinetics, thereby enabling high-resolution, large-scale parallel patterning.     

Substrate effects in poly(ethylene glycol) self-assembled monolayers on granular and flame-annealed gold

Poly(ethylene glycol) (PEG) self-assembled monolayers (SAMs) are surface coatings that efficiently prevent nonspecific adhesion of biomolecules to surfaces. Here, we report on SAM formation of the PEG thiol CH3O(CH2CH2O)17NHCO(CH2)2SH (PEG(17)) on three types of Au films: thermally evaporated granular Au and two types of Au films from hydrogen flame annealing of granular Au, Au(111), and Au silicide. The different Au surfaces clearly affects the morphology and mechanical properties of the PEG(17) SAM, which is shown by AFM topographs and force distance curves. The two types of SAMs found on flame-annealed Au were denoted "soft" and "hard" due to their difference in stiffness and resistance to scratching by the AFM probe. With the aim of nanometer scale patterning of the PEG(17), the SAMs were exposed by low energy (1 kV) electron beam lithography (EBL). Two distinctly different types of behaviour were observed on the different types of SAM; the soft PEG(17) SAM was destroyed in a self-developing process while material deposition was dominant for the hard PEG(17) SAM.     

High-energy electron beam lithography of octadecylphosphonic acid monolayers on aluminum

Monolayers of octadecylphosphonic acid were self-assembled on silicon substrates sputter coated with aluminum. Patterning of the self-assembled monolayer was achieved by high-energy electron (50 kV) illumination using an electron beam lithography tool. The change in chemical composition of the exposed monolayer was investigated by time-of-flight secondary ion mass spectrometry over an area of 100 x 100 microm2. The electron dose required to fully expose the SAM was found to be about 6 mC/cm2. Gratings were exposed with line widths from 10 microm to 100 nm. The resulting patterns were imaged using friction force microscopy. It was found that the minimum line width is limited to ca. 100 nm by the patterning resolution. The pattern resolution achieved, ca. 40 nm, is equal to the grain size of the sputter-coated aluminum layer, and the possibility that the grain size limits the pattern resolution is discussed.     

Positive microcontact printing with mercaptoalkyloligo(ethylene glycol)s

The soft lithographic replication of patterns with a low filling ratio by microcontact printing (microCP) is problematic due to the poor mechanical stability of common elastomeric stamps. A recently described strategy to avoid this problem employs a modified patterning method, positive microcontact printing ((+)microCP), in which a stamp with a mechanically more stable inverted relief pattern is used. In contrast to conventional negative microCP ((-)microCP), in the contact areas a self-assembled monolayer (SAM) is printed of a "positive ink", which provides only minor etch protection, whereas the noncontacted areas are subsequently covered with a different, etch-resistant SAM, prior to development by chemical etching. With the aim to identify novel, highly versatile positive inks, the patterning of gold by (+)microCP with mercaptoalkyloligo(ethylene glycol)s (MAOEGs), the subsequent adsorption of octadecanethiol (ODT), and the final development by wet chemical etching have now been studied. A polydisperse mixture of mercaptoundecylocta(ethylene glycol) derivatives was found to provide the best patterning results. The surface spreading of the positive ink during stamping, the exchange of printed MAOEGs with ODT, and the choice of the right etching bath were identified as key parameters that influence the achievable pattern resolution and contrast. Due to the modular composition of functionalized alkyloligo(ethylene glycol) derivatives, (+)microCP with these positive inks has the potential for easy adaptation to a variety of materials and development conditions.     

High-resolution submicron patterning of self-assembled monolayers using a molecular fluorine laser at 157 nm

Using a molecular fluorine laser at 157 nm wavelength, submicron patterning of organosilane self-assembled monolayers (SAMs) is demonstrated utilizing mask-contact photolithography. An organosilane, namely, octadecyltrimethoxysilane [ODS, CH(3)(CH(2))(17)Si(OCH(3))(3)], SAM is chemisorbed onto Si substrates covered with a 2 nm thick oxide layer and subsequently patterned using the laser. The optical path of the laser beam and the photomask-sample space are evacuated and then backfilled and purged with nitrogen during laser firing. The resulting pattern is investigated using various measurement techniques. The scanning probe microscopy images show that patterns are transferred to the SAM-covered Si substrates and that 500 nm features are successfully photoprinted in this way.     

"Lens" effect in directed assembly of nanowires on gradient molecular patterns

We report a new phenomenon, named here as the "lens" effect, in the directed-assembly process of nanowires (NWs) on self-assembled monolayer (SAM) patterns. In this process, the adsorption of NWs is focused in the nanoscale regions at the center of microscale SAM patterns with gradient surface molecular density just like an optical lens focuses light. As a proof of concepts, we successfully demonstrated the massive assembly of V2O5 NWs and single-walled carbon nanotubes (swCNTs) with a nanoscale resolution using only microscale molecular patterning methods. This work provides us with important insights about the directed-assembly process, and from a practical point of view, it allows us to generate nanoscale patterns of NWs over a large area for mass fabrication of NW-based devices.     

Poly(ethylene glycol) self-assembled monolayer island growth

Here, we report a study of the morphology and growth dynamics of a self-assembled monolayer (SAM) of the amide containing poly(ethylene glycol) (PEG) thiol (CH3O(CH2CH2O)17NHCO(CH2)2SH) on atomically flat Au(111) surfaces. SAM growth from a 20 muM ethanolic solution reveals island growth through three distinct steps: island nucleation, island growth, and coalescence. The coalescence-step, filling voids in the SAM, is by far slowest. The fine structure study reveals dendritic island formation, an observation which can be explained by attractive intermolecular interactions and surface diffusion-limited aggregation. We have also observed a change in the island height, which peaks during the island growth phase. This height change can be associated with a molecular conformational transition.     

氮杂硅三环类化合物的质谱研究

本文对二十四个氮杂硅三环类化合物进行了质谱研究.测定了它们的低分辨质谱,收集了大部分化合物的高分辨质谱数据并进行了亚稳跃迁测定。结果表明,分子离子的稳定性、基峰的生成方式以及碎片离子的多少主要取决于取代基R的性质.分子的电子轰击质谱裂解存在三种基本方式:(1)断裂Si～R键,生成高度稳定的(M-R)~ 离子,碎片离子较少;(2)开环,失去碎片C_2H_3O;(3)开环,失去碎片CH_2O或CH_3O.用电荷自由基定域理论解释这类化合物的质谱裂解机理,并对影响分子离子稳定性的有关因素及影响基峰形成的原因进行了讨论.     

Si取代Keggin型多酸催化光解水产氢机理

本文采用DFT和TD-DFT方法研究了Keggin型多酸[SiW12O40]4-光催化劈裂水产氢气机理。计算结果显示反应主要包括四个步骤：(i) 光激发,(ii) 电荷转移和生成单电子还原(OER)中间体,(iii) 生成双电子还原(TER)中间体,(iv)氢气从多酸表面解离和催化剂重生。当第一个电子从甲醇转移到多酸后,后续反应存在均为热力学上有利的放热途径,并推动第二个电子从甲醇自由基,H[SiW12O40]4-或[SiW12O40]5-转移到OER中间体H[SiW12O40]4-或[SiW12O40]5-生成TER中间体[SiW12O40]6-,H[SiW12O40]5-或H2[SiW12O40]4-,并伴随着H2产生。耦合的电子和质子转移路径在能量上最有利。甲醇和水分子的参与有利于H2产生。多酸在整个催化循环中,扮演了光敏剂、催化剂、电子的受体和给体。     

Electron transport through thin organic films in metal--insulator--metal junctions based on self-assembled monolayers.

This paper describes an experimentally simple system for measuring rates of electron transport across organic thin films having a range of molecular structures. The system uses a metal--insulator--metal junction based on self-assembled monolayers (SAMs); it is particularly easy to assemble. The junction consists of a SAM supported on a silver film (Ag-SAM(1)) in contact with a second SAM supported on the surface of a drop of mercury (Hg-SAM(2))--that is, a Ag-SAM(1)SAM(2)-Hg junction. SAM(1) and SAM(2) can be derived from the same or different thiols. The current that flowed across junctions with SAMs of aliphatic thiols or aromatic thiols on Ag and a SAM of hexadecane thiol on Hg depended both on the molecular structure and on the thickness of the SAM on Ag: the current density at a bias of 0.5 V ranged from 2 x 10(-10) A/cm(2) for HS(CH(2))(15)CH(3) on Ag to 1 x 10(-6) A/cm(2) for HS(CH(2))(7)CH(3) on Ag, and from 3 x 10(-6) A/cm(2) for HS(Ph)(3)H (Ph = 1,4-C(6)H(4)) on Ag to 7 x 10(-4) A/cm(2) for HSPhH on Ag. The current density increased roughly linearly with the area of contact between SAM(1) and SAM(2), and it was not different between Ag films that were 100 or 200 nm thick. The current--voltage curves were symmetrical around V = 0. The current density decreased with increasing distance between the electrodes according to the relation I = I(0)e(-beta d(Ag,Hg)), where d(Ag,Hg) is the distance between the electrodes, and beta is the structure-dependent attenuation factor for the molecules making up SAM(1). At an applied potential of 0.5 V, beta was 0.87 +/- 0.1 A(-1) for alkanethiols, 0.61 +/- 0.1 A(-1) for oligophenylene thiols, and 0.67 +/- 0.1 A(-1) for benzylic derivatives of oligophenylene thiols. The values of beta did not depend significantly on applied potential over the range of 0.1 to 1 V. These junctions provide a test bed with which to screen the intrinsic electrical properties of SAMs made up of molecules with different structures; information obtained using these junctions will be useful in correlating molecular structure and rates of electron transport.     

Cu2O亚微米空心球的低共熔溶剂辅助合成与表征

以低共熔溶剂(DESs)/H2O混合溶剂为介质成功制备了形貌均一、尺寸小且稳定性高的亚微米Cu2O空心球。采用扫描电镜、透射电镜和X射线衍射等方法表征了所制备样品的形貌、尺寸和结构。同时,研究了温度、p H、聚乙烯吡咯烷酮(PVP)用量等因素对样品尺寸、形貌及纯度的影响。结果表明,制备高纯Cu2O空心球的优化工艺条件为40℃、p H=11和PVP用量0.9g。混合溶剂中DESs的存在对提高所制备Cu2O样品的纯度、形态均一性和稳定性以及缩小颗粒的尺寸起到了重要作用。     

High‐Resolution Surface Chemical Analysis of a Trifunctional Pattern Made by Sequential Colloidal Shadowing

We present a new method for creating surface chemical patterns where three chemistries can be periodically arranged at alternate positions on a single substrate without the use of top‐down approaches. High‐resolution chemical imaging by time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS), with nanometer spatial resolution, is used to prove the success of the patterning and subsequent chemical modification steps. We use a combination of colloidal self‐assembly, plasma etching, self‐assembled monolayers (SAMs) and physical vapour deposition (PVD). The method utilizes a double colloid assembly process in which a first layer of close‐packed colloids is created, followed by plasma etching, coating with gold and deposition of a first SAM layer. A second particle layer is deposited on top of the first layer masking the interstitial spaces containing the first SAM. A second gold layer is deposited followed by a second SAM. After particle removal the surface consists of the pattern containing two different SAMs and a SiO₂ layer that can be readily functionalized with silanes. The possibility in the replacement of the two different thiols is investigated by X‐ray photoelectron spectroscopy (XPS) and it was found that no replacement is taking place. ToF‐SIMS imaging is used to show the periodicity of the chemical patterns by tracking unique fragment ions from the different surface regions. The patterning method is adaptable to create smaller or larger chemical patterns by appropriate choice of particle sizes. The patterns are useful for immobilizing biomolecules for cell studies or as multiplexed biosensors.     

Photosensitive Polyarylates Based on Reaction Development Patterning

Films of a commercially available polyarylate (U polymer®) containing a photosensitive agent were prepared by means of spin‐coating onto copper foil, which showed positive‐tone behavior after UV irradiation and development with an ethanolamine/N‐methylpyrrolidone/H₂O mixture. Scanning electron microscope photographs of the images exhibited fine patterns (≈10 μm line/space resolution) with 9–14 μm film thickness. The pattern‐forming mechanism is based on the reaction development patterning (RDP) process, where the main pattern‐forming reaction occurs during development.     

A microsystem for sensing and patterning oxidative microgradients during cell culture

We present the design, modeling, fabrication and testing of a microsystem for the electrolytic patterning and sensing of oxidative microgradients within 1 x 1 mm2 area during cell culture. The system employs an array of microfabricated electrodes (3-40 microm in width) embedded in gas-permeable microchannels to generate precise doses of dissolved oxygen (ranging from 10 fmol O2 mm(-2) s(-1) to 100 nmol O2 mm(-2) s(-1)) via electrolysis. The microgradients generated by different microelectrodes in the array can be superimposed to pattern multi-dimensional oxygen profiles not possible with other methods. We demonstrate the patterning, sensing and quantification of dissolved oxygen microgradients in the 0 to 40% dO2 range using this microsystem. Reactive oxygen species generation and dosing is also quantified. Lastly, we demonstrate how the microtechnology enables new types of experiments in three different cell culture models: localized hyperoxia-induced apoptosis in C2C12 myoblasts, dynamic aerotaxis assays of Bacillus subtilis, and studies of calcium release in an ischemia/re-oxygenation myoblast model.     

含酰胺结构的巯基自组装膜的设计与结构表征

提出了一种简便通用的合成巯基化合物的途径，以分子中的羧基CO2H为起始基团，与2-流基乙胺的氨基选择性缩合；合成了一系列具有RC（O）NHCH2CH2SH（R分别为偶氯苯衍生物，双炔衍生物及直链烷基）结构的化合物，并用接触角测量，电化学和掠角反射红外光谱（GIR-IR）等手段对这些化合物在金表面形成的自组装单分子膜进行了表征。发现4-（N－（2‘-巯基已基））酰胺偶氮苯的自组装膜表现出良好的电活性，电化学测定表面浓度为4．21×10(－10)mol·cm(-2)．当R为烷基链时，随烷基链的增长，膜的致密度与有序度增加GIR-IR证明在自组装腹中CH3（CH2）6C（O）NHCH2CH2SH的C＝O和N－H键与Au表面平行，分子轴线与Au表面近似垂直．     

Oxidation of organic films by beams of hydroxyl radicals

We have studied the oxidation of self-assembled monolayers (SAMs) of alkanes and alkenes with a thermal beam of OH radicals. The target films were produced by bonding alkane thiols and alkene thiols to a gold surface and the SAMs are mounted in a vacuum chamber at a base pressure of 10-9 Torr. Hydroxyl radicals were produced by a corona discharge in an Ar/H2O2/water mixture. The resultant molecular beam was scanned by an electrostatic hexapole and the OH radicals [4 (+/- 1) x 1011 OH radicals cm-2 sec-1] were focused onto the target SAM. All of the hydroxyl radicals impinging on the SAM surface are rotationally (J' ' 相似文献   

Bond and site selectivity in dissociative electron attachment to gas phase and condensed phase ethanol and trifluoroethanol

The formation of negative ions following electron impact to ethanol (CH(3)CH(2)OH) and trifluoroethanol (CF(3)CH(2)OH) is studied in the gas phase by means of a crossed electron-molecular beam experiment and in the condensed phase via Electron Stimulated Desorption (ESD) of fragment ions from the corresponding molecular films under UHV conditions. Gas phase ethanol exhibits two pronounced resonances, located at 5.5 eV and 8.2 eV, associated with a remarkable selectivity in the decomposition of the precursor ion. While the low energy resonance exclusively decomposes into O(-), that at higher energy generates OH(-) and a comparatively small signal of [CH(3)CH(2)O](-) due to the loss of a neutral hydrogen. CF(3)CH(2)OH shows a completely different behaviour, as now an intense feature at 1.7 eV appears associated with the loss of a neutral hydrogen atom exclusively occurring at the O site. The H(-) formation from the gas phase compounds is below the detection limit of the present experiment, while in ESD from 3 MonoLayer (ML) films of CH(3)CH(2)OH and CF(3)CH(2)OH the most intense fragment is H(-), appearing from a broad resonant feature between 7 and 12 eV. With CF(3)CH(2)OH, by using the isotopically-labelled analogues CF(3)CD(2)OH and CF(3)CH(2)OD it can be shown that this feature consists of two resonances, one located at 8 eV leading to H(-)/D(-) loss from the O site and a second resonance located at 10 eV leading to the loss of H(-)/D(-) from the CH(2) site.     

Modification and stability of aromatic self-assembled monolayers upon irradiation with energetic particles

We have studied ion and electron irradiation of self-assembled monolayers (SAMs) of 2-(4'-methyl-biphenyl-4yl)-ethanethiol (BP2, CH3-C6H4C6H4CH2CH2-SH), phenyl mercaptan (PEM, C6H5CH2CH2-SH), and 4'-methyl-biphenyl-4-thiol (BP0, CH3-C6H4C6H4-SH) deposited on Au(111) substrates. Desorption of neutral particles from PEM/Au and BP2/Au was investigated using laser ionization in combination with mass spectrometry. The ion-induced damage of both BP2 and PEM SAMs is very efficient and interaction with a single ion leads to the modification of tens of molecules. This feature is the result of a desorption process caused by a chemical reaction initiated by an ion impact. Both for ions and electrons, experiments indicate that the possibility for scission of the Au-S bond strongly depends on the chemical nature of the SAM system. We attribute the possible origin of this effect to the orientation of the Au-S-C angle or adsorption sites of molecules. The analysis of electron-irradiated PEM/Au and BP2/Au, using ion-initiated laser probing, enabled measurements of the cross section for the electron-induced damage of the intact molecule or specific fragment. Analysis of electron-irradiated BP0/Au by using time-of-flight secondary ion mass spectrometry (TOF-SIMS) provides direct evidence for the quasi-polymerization process induced by electron irradiation.     

对甲苯磺酸铜的电化学表征

合成了对甲苯磺酸铜,用X光单晶衍射确定了其结构.实验结果表明,该盐容易脱除全部结晶水,在空气中不潮解.分别测定了对甲苯磺酸铜(Cu(p-OTs)2)在H2O、CH3OH和DMF中的电化学参数.实验结果表明Cu(p-OTs)2在不同溶剂中的反应机理各异. Cu(II)的电化学还原在H2O中是分两步进行,而在CH3OH和DMF中的电化学还原是一步两电子过程.对实验结果进行了分析讨论.     

Oxidation states and CO ligand exchange kinetics in a self-assembled monolayer of a triruthenium cluster studied by in situ infrared spectroscopy

Oxidation states and CO ligand exchange kinetics in a self-assembled monolayer (SAM) of an oxo-centered triruthenium cluster [Ru(3)(mu3-O)(mu-CH3COO)6(CO)(L1)(L2)] (L1 = [(NC5H4)CH2NHC(O)(CH2)10S-]2, L2 = 4-methylpyridine) have been extensively investigated on the surface of a gold electrode in aqueous and nonaqueous solutions. The SAM exhibits three consecutive one-electron transfers and four oxidation states, which have been characterized by electrochemistry, in situ infrared spectroscopy, and in situ sum frequency generation (SFG) vibrational spectroscopy measurements. The original electron-localized state of the Ru cluster center was changed to electron delocalization states by oxidation or reduction of the central Ru ions. These changes are revealed by the IR absorptions of the CO ligand and the bridging acetate ligands of the triruthenium cluster in the SAM. The IR absorptions of the two kinds of ligands are strongly dependent on the oxidation state of the Ru cluster center. One-electron oxidation of the central Ru ion in the SAM triggers a CO ligand liberation process. Solvent molecules may then occupy the CO site to result in a CO-free SAM. One-electron reduction of this CO-free SAM in a CO-saturated solution leads to re-coordination of the CO ligand into the SAM. Both processes can be precisely controlled by tuning the electrode potential. The kinetics of the CO exchange cycle in the SAM, including liberation and coordination, has been investigated by in situ IR and SFG measurements for the first time. The CO exchange cycle is significantly dependent on the temperature. The reaction rate greatly decreases with decreasing solution temperature, which is an important factor in the CO ligand exchange process. The activation energies of both CO liberation and coordination have been evaluated from the reaction rate constants obtained at various temperatures.