The impact of ultra thin silicon nitride buffer layer on GaN growth on Si (1 1 1) by RF-MBE

Ultra thin films of pure silicon nitride were grown on a Si (1 1 1) surface by exposing the surface to radio-frequency (RF) nitrogen plasma with a high content of nitrogen atoms. The effect of annealing of silicon nitride surface was investigated with core-level photoelectron spectroscopy. The Si 2p photoelectron spectra reveals a characteristic series of components for the Si species, not only in stoichiometric Si₃N₄ (Si⁴⁺) but also in the intermediate nitridation states with one (Si¹⁺) or three (Si³⁺) nitrogen nearest neighbors. The Si 2p core-level shifts for the Si¹⁺, Si³⁺, and Si⁴⁺ components are determined to be 0.64, 2.20, and 3.05 eV, respectively. In annealed sample it has been observed that the Si⁴⁺ component in the Si 2p spectra is significantly improved, which clearly indicates the crystalline nature of silicon nitride. The high resolution X-ray diffraction (HRXRD), scanning electron microscopy (SEM) and photoluminescence (PL) studies showed a significant improvement of the crystalline qualities and enhancement of the optical properties of GaN grown on the stoichiometric Si₃N₄ by molecular beam epitaxy (MBE).     

Fabrication and capacitive characteristics of conjugated polymer composite p-polyaniline/n-WO3 heterojunction

A nanocrystalline and porous p-polyaniline/n-WO₃ dissimilar heterojunction at ambient temperature is reported. The high-quality and well-reproducible conjugated polymer composite films have been fabricated by oxidative polymerization of anilinium ion on predeposited WO₃ thin film by chemical bath deposition followed by thermal annealing at 573 K for 1 h. Atomic force microscopy (AFM) analyses reveal a homogenous but irregular cluster of faceted spherically shaped grains with pores. The scanning electron microscopy confirms the porous network of grains, which is in good agreement with the AFM result. The optical absorption analysis of polyaniline/WO₃ hybrid films showed that direct optical transition exist in the photon energy range 3.50–4.00 eV with bandgap of 3.70 eV. The refractive index developed peak at 445 nm in the dispersion region while the high-frequency dielectric constant, ? _∞, and the carrier concentration to effective mass ratio, N/m^*, was found to be 1.58 and 1.10 × 10³⁹ cm^?3, respectively. The temperature dependence of electrical resistivity of the deposited films follows the semiconductor behavior while the C–V characteristics (Mott–Schottky plots) show that the flat band potential was ?791 and 830 meV/SCE for WO₃ and polyaniline.     

稀土（Tb，Gd）掺杂多孔硅的光致发光性能研究

用电化学方法对多孔硅薄膜进行了稀土（Tb，Gd）离子的化学掺杂.利用荧光分光光度计测试了样品的光致发光特性.用扫描电子显微镜研究了薄膜的表面形貌.用卢瑟福背散射谱分析了稀土离子在多孔硅薄膜中的分布情况.结果表明，Tb的掺入显著增强了多孔硅的发光强度，并且发光峰位出现蓝移.这是由于Tb³⁺的4f能级⁵D_{4—⁷F3，⁵D4—⁷F关键词： 多孔硅 稀土掺杂 光致发光}     

Optical characteristics of porous silicon structures

Morphology, composition, and optical properties of porous silicon on single-crystal-silicon substrates and p-n junctions are studied. Substrate orientation, type of conduction, and composition of etching agent are varied to obtain nano-, meso-, and microporous silicon and multilayer porous structures. A correlation of the photoluminescence intensity and intensity of the IR absorption band peaking at 616 cm^?1 is related to the presence of Si-Si bonds.     

Porous Silicon as an Intermediate Buffer Layer for Zinc Oxide Nanorods

Zinc thin films were deposited onto porous silicon (PSi) substrates by dc sputtering using a Zn target. These films were then annealed under flowing (6 l/min) oxygen gas environment in the furnace at 600°C for 2 h. Porous silicon is used as an intermediate layer between silicon and ZnO films and it provides a large area composed of an array of voids. The PSi samples were prepared using photoelectrochemical method on n-type silicon wafer with (111) and (100) orientation. To prepare porous structures, the samples were dipped into a mixture of HF:ethanol (1:1) for 5 min with current densities of 50 mA/cm², and subjected to external illumination with a 500 W UV lamp. The surface morphology and the nanorod structure of the ZnO films were characterized by scanning electron microscope (SEM) and X-ray diffraction (XRD). We synthesized the ZnO nanorods with diameter of 80–100 nm without any catalysts or templates. The XRD pattern confirmed that the ZnO nanorods were of polycrystalline structure. The surface-related optical properties have been investigated by photoluminescence (PL) and Raman measurements at room temperature. Micro-Raman results showed that A₁(LO) of hexagonal ZnO/Si(111) and ZnO/Si(100) have been observed at 522 cm^–1 and 530 cm^–1, respectively. PL spectra peaks are clearly visible at 366 cm^–1 and 368 cm^–1 for ZnO film grown on porous Si(111) and Si(100) substrates, respectively. The PL spectral peak position in ZnO nanorods on porous silicon is blue-shifted with respect to that in unstrained ZnO (381 nm).     

Tunable photoluminescence of porous silicon by liquid crystal infiltration

The photoluminescence (PL) of porous silicon films has been investigated as a function of the amount of liquid crystal molecules that are infiltrated into the constricted geometry of the porous silicon films. A typical nematic liquid crystal 4-pentyl-4′-cyanobiphenyl was employed in our experiment as the filler to modify the PL of porous silicon. It is found that the originally red PL of porous silicon films can be tuned to blue by simply adjusting the amount of liquid crystal molecules in the microchannels of the porous films. The chromaticity coordinates are calculated for the recorded PL spectra. The mechanism of the tunable PL is discussed. Our results have demonstrated that the luminescent properties of porous silicon films can be efficiently tuned by liquid crystal infiltration.     

Effect of pore size on ferroelectric properties of multiferroic BiFeO3 films prepared on porous silicon

The ferroelectric properties of BiFeO₃ (BFO) films spray deposited on porous silicon have been studied. The analysis of XRD and FESEM investigations show that the crystalline strain in the BFO films increases with pore size. The BFO films on porous silicon substrate showed improvement in ferroelectric fatigue behavior, remanent polarization and ferroelectric switching time. A maximum memory window of 5.54 V at 1 MHz and a large remanent polarization (P_r) of 13.1 μC/cm² have been obtained at room temperature. The improvement in the ferroelectric properties of these films has been correlated to the crystalline strain.     

Getter formation in silicon by implantation of antimony ions

A porous silicon layer as a getter of uncontrolled impurities has been prepared by implantation of Sb⁺ into silicon and subsequent thermal treatments. The lifetime of nonequilibrium charge carriers in n- and p-type silicon wafers with a getter layer is 3–4 times longer than that without a getter.     

Organic thin films based on a dicyanovinyl-quaterthiophene: Influence of electrode configuration on third-order nonlinear optical properties measured by electroabsorption spectroscopy

Electroabsorption (EA) studies at room temperature on organic thin films based on a dicyanovinyl-quaterthiophene 4T-V(CN)₂ are reported. An electric field modulation is applied to the samples for two different electrode geometries, i.e. sandwich and coplanar versus the organic layer. Changes in optical absorption coefficient of 4T-V(CN)₂ based thin films are measured and analyzed to determine the character of the optical transition in the visible range (400-800 nm). Depending on the experimental electrode configuration, magnitude of electroabsorption responses are different, possibly due to different distribution of the externally applied electric field. The results indicate a higher resolution of EA response for the sandwich electrode configuration and confirm the charge transfer exciton character of 4T-V(CN)₂ in contrast to the unsubstituted quaterthiophene 4T. Finally, a third-order nonlinear susceptibility χ⁽³⁾ (−ω; ω, 0, 0) of 16 × 10⁻¹² e.s.u. is obtained.     

Synthesis and properties of fluorescent hybrid nanocomposites based on copolyacrylates with dansyl semicarbazide units

Our study examined a series of hybrid composites containing copolyacrylate with semicarbazide-dansyl groups prepared by conventional radical polymerization of monomers in the organic montmorillonite modified with alkyl chains of variable length or using the sol-gel technique. The structure and the chemical composition of the copolymers N‐methacryloyloxyethylcarbamoyl-5-(dimethylaminonaphtalene-1-sulfonohydrazine)-co-methyl metahacrylate (DnsSA-co-MMA) and N‐methacryloyloxyethylcarbamoyl-5-(dimethylaminonaphtalene-1-sulfonohydrazine)-co-dodecylacrylamide (DnsSA-co-DA) as well as their nanocomposites (HC-P1, HC-P2, HC-P3, HC-P4) were confirmed by spectral analysis (¹H NMR, FTIR, UV/vis), thermal methods and atomic force microscopy. To quantify the effect of the inorganic component compared to pure photopolymers we evaluated the properties of hybrid composites, including dielectric characterization. Additionally, these materials have been tested in experiments of fluorescence quenching by acids (HCl, p-toluenesulfonic acid, 1-S-camphorsulfonic acid), metallic cation (Cu²⁺) and nitrobenzene. The results suggest that such nanocomposites could find applications as fluorescence-based chemosensors in homogeneous organic solutions or thin films.     

Properties of magnesium silicate doped with chromium in porous silicon

Forsterite doped with Cr⁴⁺ ions is prepared in silicon-based structures according to a simple technique. These structures are of interest due to the characteristic luminescence in the near-IR range. Forsterite is synthesized by impregnation of porous silicon layers on n⁺-Si and p⁺-Si substrates with subsequent annealing in air. A photoluminescence response at a wavelength of 1.15 μm is observed at room temperature in porous silicon layers doped with magnesium and chromium for which the optimum annealing temperature is close to 700°C. The photoluminescence spectrum of porous silicon on the p⁺-Si substrate contains a broad band at a wavelength of approximately 1.2 μm. This band does not depend on the annealing temperature and the magnesium and chromium content and is most likely associated with the presence of dislocations in silicon. The experimental EPR data and eletrical properties of the structures are discussed. It is found that layers of pure porous silicon and chromium-doped porous silicon on n⁺-Si subtructures exhibit indications of discrete electron tunneling.     

Structural and optical properties of porous silicon prepared from a p +-epitaxial layer on n-Si(111)

The structural and optical properties of porous silicon prepared by anodic etching of an n-Si(111) wafer with a p ⁺-homoepitaxial layer on one side are studied by scanning electron microscopy and multiple-crystal X-ray diffraction. A considerable difference between the microstructures on the sides of the wafer is found. Upon aging for 4.5 months, diffraction peaks of the por-Si structures shift from that of the substrate by δθ = ?42″ for the n-Si porous layer and ?450″ for the p ⁺-Si porous layer. The photoluminescence band associated with the p ⁺-layer is twice as narrow as the band associated with the n-layer and is shifted toward shorter wavelengths (higher energies) by 0.4 eV, with the intensities of the bands being the same.     

Luminescence of porous silicon films with an europium-containing complex

We obtained porous silicon films modified at room temperature by an Eu³⁺-containing polymer complex. The most intense photoluminescence of Eu³⁺ implanted in the porous silicon was observed at the wavelengths of 611, 618, 691, and 704 nm. In this case, the intensity of the intrinsic photoluminescence of strongly irradiated specimens of porous silicon decreased, while the intensity of weakly emitting films multiply increased. An investigation of the photoexcitation spectra made it possible to establish the effect of Eu³⁺-containing complexes on the mechanism underlying the excitation of photoluminescence of porous silicon. Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 64, No. 4, pp. 499–501, July–August, 1997.     

Microstructures, surface bonding states and room temperature ferromagnetisms of Zn0.95Co0.05O thin films doped with copper

Zn_0.95−xCo_0.05Cu_xO (ZCCO, where x = 0, 0.005, 0.01 and 0.015) thin films were deposited on Si (1 0 0) substrates by pulsed laser deposition technique. Crystal structures, surface morphologies, chemical compositions, bonding states and chemical valences of the corresponding elements for ZCCO films were characterized by X-ray diffraction (XRD), field emission scanning electron microscope (FESEM) and X-ray photoelectron spectroscopy (XPS). XRD and FESEM results indicate that crystallite sizes of the highly (0 0 2)-oriented ZCCO films slightly decrease with increasing Cu content. When the Cu content increases from 0 to 0.015, Zn 2p_3/2, Co 2p, Cu 2p_3/2 and O 1s peaks of the ZCCO film shift towards higher or lower binding energy regions, and the reasons for these chemical shifts are investigated by fitting the corresponding XPS narrow-scan spectra. Both in-plane and out-of-plane magnetization-magnetic field hysteresis loops of the ZCCO films reveal that all the films have room temperature ferromagnetisms (RTFMs). The conceivable origin of the RTFM is ascribed to the combined effects of the local structural disorder resulted from (Co²⁺, Cu²⁺, Cu¹⁺)-cations which substitute Zn²⁺ ions in the ZnO matrices, ferromagnetic coupling between coupled dopant atoms caused by Co²⁺ (3d⁷4s⁰) and Cu²⁺ (3d⁹4s⁰) spin states, and exchange interactions between the unpaired electron spins originating from lattice defects induced by Cu doping in the Zn_0.95Co_0.05O matrices.     

Boron-doped nanocrystalline silicon thin films for solar cells

This article reports on the structural, electronic, and optical properties of boron-doped hydrogenated nanocrystalline silicon (nc-Si:H) thin films. The films were deposited by plasma-enhanced chemical vapour deposition (PECVD) at a substrate temperature of 150 °C. Crystalline volume fraction and dark conductivity of the films were determined as a function of trimethylboron-to-silane flow ratio. Optical constants of doped and undoped nc-Si:H were obtained from transmission and reflection spectra. By employing p⁺ nc-Si:H as a window layer combined with a p′ a-SiC buffer layer, a-Si:H-based p-p′-i-n solar cells on ZnO:Al-coated glass substrates were fabricated. Device characteristics were obtained from current-voltage and spectral-response measurements.     

Laser printing of polythiophene for organic electronics

We report on the development of hybrid organic/inorganic thin-film transistors using regioregular poly-3-hexylthiophene (P3HT) semiconductor material deposited by means of the solid-phase Laser Induced Forward Transfer (LIFT) technique. P3HT pixels were LIFT-printed onto Au/Ti source and drain electrodes formed on silicon dioxide/p⁺-type Si substrate. Deposition of the P3HT pixels was investigated as a function of the laser fluence using donor substrates with and without a dynamic release layer. Device electrical characterization reveals efficient field-effect action of the bottom gate on the organic channel. The transfer I_DS-V_GS characteristics exhibit well-defined sub-threshold, linear and saturation regimes designating LIFT as a promising technique for hybrid organic/inorganic transistor technology.     

Influences of the iron ion (Fe)-doping on structural and optical properties of nanocrystalline TiO2 thin films prepared by sol-gel spin coating

Titanium dioxide (TiO₂) thin films doping of various iron ion (Fe³⁺) concentrations were deposited on silicon (Si) (100) and quartz substrates by sol-gel Spin Coating technique followed by a thermal treatment at 600 °C. The structure, surface morphology and optical properties, as a function of the doping, have been studied by X-ray diffractometer (XRD), Raman, ultraviolet-visible (UV-vis) and Spectroscopic Ellipsometry (SE). XRD and Raman analyzes of our thin films show that the crystalline phase of TiO₂ thin films comprised only the anatase TiO₂, but the crystallinity decreased when the Fe³⁺ content increased from 0% to 20%. During the Fe³⁺ addition to 20%, the phase of TiO₂ thin film still maintained the amorphous state. The grain size calculated from XRD patterns varies from 29.3 to 22.6 nm. The complex index and the optical band gap (E_g) of the films were determined by the spectroscopic ellipsometry analysis. We have found that the optical band gap decreased with an increasing Fe³⁺ content.     

Optical Analysis of Nanocrystalline ZnO Films Coated on Porous Silicon by Radio Frequency (RF) Magnetron Sputtering

Zinc oxide thin films have been deposited onto porous silicon (PSi) substrates at high growth rates by radio frequency (RF) sputtering using a ZnO target. The advantages of the porous Si template are economical and it provides a rigid structural material. Porous silicon is applied as an intermediate layer between silicon and ZnO films and it contributed a large area composed of an array of voids. The nanoporous silicon samples were adapted by photo electrochemical (PEC) etching technique on n-type silicon wafer with (111) and (100) orientation. Micro-Raman and photoluminescence (PL) spectroscopy are powerful and non-destructive optical tools to study vibrational and optical properties of ZnO nanostructures. Both the Raman and PL measurements were also operated at room temperature. Micro-Raman results showed that the A₁(LO) of hexagonal ZnO/Si(111) and ZnO/Si(100) have been observed at around 522 and 530 cm^–1, re- spectively. PL spectra peaks are distinctly apparent at 366 and 368 cm^–1 for ZnO film grown on porous Si(111) and Si(100) substrates, respectively. The peak luminescence energy in nanocrystalline ZnO on porous silicon is blue-shifted with regard to that in bulk ZnO (381 nm). The Raman and PL spectra pointed to oxygen vacancies or Zn interstitials which are responsible for the green emission in the nanocrystalline ZnO.     

Current-voltage characteristics of structures with a porous silicon layer at adsorption of carbon monoxide

The current-voltage characteristics of structures with a layer of porous silicon of 73% porosity were measured at adsorption of gas (carbon monoxide) at room temperature. Estimations are performed of the height of potential heterobarrier at the interface between porous silicon and p ⁺-type single-crystal silicon, of the perfectness factor and the resistance of a layer of porous silicon in air, in air with 0.4% CO, and in air with 2% CO. Physical causes explaining the experimental data are discussed.     

Residual gas and the optical properties of silver films

Silver films evaporated and maintained at room temperature in a variety of controlled residual gas environments are studied. Experimental techniques include: (1) precise in situ polarization-modulation ellipsometry $\text{(λ = 5461}\text{A}\text{?}\text{)}$ and dc resistivity as functions of time (after deposition) and pressure; (2) mass spectroscopy of residual gas; (3) optical spectra (1.8–3.8 eV) taken ellipsometrically on several films in situ; (4) Auger electron spectroscopy of the silver surfaces; and (5) absolute reflectance $\text{(λ = 5461}\text{A}\text{?}$ and 10.6 microm) and scattered light (5461 Å) measured after exposure of the films to air. H₂, N₂, CO, CO₂, or CH₄ present during deposition (p? 10^?5torr) shows no effects on the optical properties in the visible or infrared. Water vapor or oxygen present during deposition increases the scattered light (surface roughness) and optical absorption of the films in the visible. Films prepared in high partial pressures of O₂ (about 10^?5 torr) show significantly shorter optical and dc relaxation times and slightly enhanced infrared (λ = 10.6 microm) absorption. These results for stabilized films are understood better by considering the surface dynamical changes occurring in the films prior to stabilization. In the first few hours after deposition, the films anneal principally by surface self-diffusion. During this time the reflectance and dc conductivity increase typically by 0.4% and 10% respectively. The presence in the films of dissolved oxygen can enhance or inhibit self-diffusion depending on whether the oxygen is mobile or immobile. When dissolved oxygen diffuses to the surface, it resides there in an optically-absorbing chemisorbed state, inducing a surface state within about 2.5 eV of the Fermi level. These surface-dynamical changes often continue for more than a day before diminishing to a level beneath the sensitivity of the ellipsometer. Upon exposure to air the Ag films physisorb about 20 Å of water vapor and undergo further optically-absorbing oxygen chemisorption. All of the measurements are discussed in a consistent way to reveal further details of the mechanisms contributing to light scattering and optical absorption in the films as a function of oxygen partial pressure.