Properties of non‐stoichiometric nitrogen doped LPCVD silicon thin films

The influence of nitrogen on the internal structure and so on the electrical properties of silicon thin films obtained by low‐pressure chemical vapor deposition (LPCVD) was studied using several investigation methods. We found by using Raman spectroscopy and SEM observations that a strong relationship exists between the structural order of the silicon matrix and the nitrogen ratio in film before and after thermal treatment. As a result of the high disorder caused by nitrogen on silicon network during the deposit phase of films, the crystallization phenomena in term of nucleation and crystalline growth were found to depend upon the nitrogen content. Resistivity measurements results show that electrical properties of NIDOS films depend significantly on structural properties. It was appeared that for high nitrogen content, the films tend to acquire an insulator behavior. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Solutocapillary convection in germanium‐silicon melts

Surface tension gradients in free crystal growth melts give rise to convective flow. If these gradients are due to thermal gradients, the well known thermocapillary (Marangoni) convection ensues. Concentration gradients due to segregation at the interface during growth can lead to additional solutocapillary convection. A system with large solutocapillary convection is Ge‐Si due to the pronounced segregation and the strong difference in surface tension; solutal buoyancy convection is also present due to the large density difference between Ge and Si. Solutocapillary convection will oppose thermocapillary convection in the Ge‐Si system since Si, having the higher surface tension, is preferentially incorporated into the crystal. A set of experiments directly proving and partially quantifying the effect has been conducted under microgravity during a parabolic flight campaign by recrystallizing Ge‐Si mixtures of different compositions, between 3% and 9% Si, in a crucible with tracers to visualize the movement. Solutocapillary flow with initial flow rates in excess of 5.5 cm/s at the onset of crystallization was measured. A slight dependence of the flow velocity on the initial Si content has been found. Experiments on the ground showed the same effect but with overall smaller speeds; this difference can be explained by the additional action of solutal buoyancy convection. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Three‐dimensional flow in a thin annular layer of silicon melt with bidirectional temperature gradients

Bidirectional temperature gradients coexist virtually in surface tension driven flows. However, the simulations have been performed to the flow with only one temperature gradient. A series of 3 D numerical simulations are conducted to investigate the Marangoni‐thermocapillary flow of silicon melt in a thin annular layer with bidirectional temperature gradients. The temperature gradients are produced by the temperature difference ΔT between walls and the constant heat flux q on the bottom, respectively. When changing q, the melt presents different state evolutions at different ΔT. Furthermore, two critical q are found, one makes the minimum melt temperature higher than the crystallization temperature and the other makes the flow unsteady. Both of the critical heat fluxes decrease with increasing ΔT. q contributes more to the elevation of the melt temperature, while ΔT contributes more to the enhancement of the melt instability. In addition, the melt on the free surface flows mainly along the radial direction.     

Investigation of the growth processes from vapor phase of silicon carbide epitaxial layers: Thermodynamic analysis of the high temperature processes in the system Si‐C‐H‐Cl

In the present work are presented the results of the thermodynamic analysis of the interaction processes in the system Si‐C‐H‐Cl in the temperature interval 1000‐3000 K. The equilibrium pressures of the components in the system Si‐C‐H‐Cl with taking account the formation of the condensed phases C, Si and SiC have been determined. The optimal conditions giving the maximum yield of silicon carbide by pyrolysis of mixture of volatile compounds of carbon and silicon have been defined. The thermodynamic analysis of the examined system showed that the increasing of the content of hydrogen in the initial mixture allows to decrease the optimal temperature for obtaining of silicon carbide by the method of pyrolysis and essentially to increase its maximum possible yield. (© 2008 WILEY ‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Effect of Cu/In ratio on properties of CuInSe2 thin films prepared by selenization of Cu‐In layers

In this paper, the chalcopyrite CuInSe2 thin films were fabricated from a selenization of electrodeposited Cu‐In layers. In this study, the electrodeposition time of the In layer was set, but that for the Cu layer was not. The thin films were selenized in a sealed glass tube with pure Se powder by three different Cu layer samples at various electrodeposition times at 500 °C for 2 hours. An FE‐SEM image of the sample shows that the copper‐rich product has irregular agglomerates with a dense surface. The X‐ray diffraction patterns show CuInSe₂ peaks for all samples. However, the X‐ray diffraction pattern reveals CuSe₂ peaks when the electrodeposition time of the Cu layer increases. On the other hand, the band gap (E_g) of the samples decreases from 1.15 to 1.07 eV when the Cu/In ratio increases.     

Influence of substrate temperature and oxygen/argon flow ratio on the electrical and optical properties of Ga‐doped ZnO thin films prepared by rf magnetron sputtering

Effects of substrate temperature and atmosphere on the electrical and optical properties of Ga‐doped ZnO thin films deposited by rf magnetron sputtering were investigated. The electrical resistivity of Ga‐doped ZnO (GZO) films decreases as the substrate temperature increases from room temperature to 300°C. A minimum resistivity of 3.3 × 10^–4 Ω cm is obtained at 300°C and then the resistivity increases with a further increase in the substrate temperature to 400°C. This change in resistivity with the substrate temperature is related to the crystallinity of the GZO film. The resistivity nearly does not change with the O₂/Ar flow ratio, R for R < 0.25 but increases rapidly with R for R > 0.25. This change in resistivity with R is also related to crystallinity. The crystallinity is enhanced as R increases, but if the oxygen partial pressure is higher than a certain level (R = 0.25 ± 0.10) gallium oxides precipitate at grain boundaries, which decrease both carrier concentration and mobility. Optical transmittance increases as R increases for R < 0.75. This change in transmittance with R is related to changes in oxygen vacancy concentration and surface roughness with R. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)