K-stabilized high-oxygen-coverage states on Rh(110): a low-pressure pathway to formation of surface oxide

Using scanning tunneling microscopy, low-energy electron diffraction, and X-ray photoelectron spectroscopy, we studied the evolution of the structure and chemical state of a Rh(110) surface, modified by K adlayers and exposed to high O2 doses at elevated temperatures. We find that oxygen coadsorption on the K-covered Rh(110) leads to massive reconstruction of the Rh(110) surface. Stable reconstructed (10 x 2) and (8 x 2) segmented phases with a local coverage of more than two oxygen atoms per surface Rh atom were observed. Formation of surface oxide, which coexists with the (10 x 2) and (8 x 2) segmented adsorption phases, is evidenced at the highest O2 doses. The development of strongly reconstructed adsorption phases with oxide-like stoichiometry and surface oxide under UHV conditions is explained in terms of the stabilization of the (1 x 2) reconstruction and promotion of O2 dissociation by the K adatoms.     

Ultrathin Rh films on Ru(0001): oxidation in confinement

Ultrathin rhodium films with a thickness ranging from 1 to a few monolayers were deposited on a single-crystal Ru(0001) surface in order to investigate the oxidation behavior of ultrathin epitaxial films on a dissimilar substrate. It is found that rhodium grows on Ru(0001) initially layer by layer, adapting the in-plane lattice parameters of Ru(0001). When exposing Rh films to oxygen environment (approximately 4.8 x 10(6) L O2 exposure) at 660 K, 2-4 ML Rh films form a surface oxide composed of (9 x 9) O-Rh-O trilayers. Quite in contrast, oxidation of the 1 ML RhRu(0001) film leads to a poorly ordered oxide with a rutile structure reminiscent of RuO2(110) on Ru(0001). The oxidized 1 ML RhRu(0001) film contains much more oxygen than the oxidized thicker Rh films. Lower temperatures (535 K) and high doses of oxygen lead to a (1 x 1)-O overlayer on the 1 ML RhRu(0001) surface, whose atomic geometry resembles closely that of the (1 x 1)-O phase on clean Ru(0001).     

Ab initio thermodynamics examination of sulfur species present on Rh, Ni, and binary Rh-Ni surfaces under steam reforming reaction conditions

The stable form of adsorbed sulfur species and their coverage were investigated on Rh, Ni, and Rh-Ni binary metal surfaces using density functional theory calculations and the ab initio thermodynamics framework. S adsorption, SO(x) (x = 1-4) adsorption, and metal sulfide formation were examined on Rh(111) and Ni(111) pure metals. Both Rh and Ni metals showed a preference for S surface adsorption rather than SO(x) adsorption under steam reforming conditions. The transition temperature from a clean surface (<(1)/(9) ML) to S adsorption was identified on Rh(111), Ni(111), Rh(1)Ni(2)(111), and Rh(2)Ni(1)(111) metals at various P(H(2))/P(H(2)S) ratios. Bimetallic Rh-Ni metals transition to a clean surface at lower temperatures than does the pure Rh metal. Whereas Rh is covered with (1)/(3) ML of sulfur under the reforming conditions of 4-100 ppm S and 800 °C, Rh(1)Ni(2) is covered with (1)/(9) ML of sulfur at the lower end of this range (4-33 ppm S). The possibility of sulfate formation on Rh catalysts was examined by considering higher oxygen pressures, a Rh(221) stepped surface, and the interface between a Rh(4) cluster and CeO(2)(111) surface. SO(x) surface species are stable only at high oxygen pressure or low temperatures outside those relevant to the steam reforming of hydrocarbons.     

Initial oxidation of the Rh(110) surface: ordered adsorption and surface oxide structures

The initial oxidation of the Rh(110) surface was studied by scanning tunneling microscopy, core level spectroscopy, and density functional theory. The experiments were carried out exposing the Rh(110) surface to molecular or atomic oxygen at temperatures in the 500-700 K range. In molecular oxygen ambient, the oxidation terminates at oxygen coverage close to a monolayer with the formation of alternating islands of the (10x2) one-dimensional surface oxide and (2x1)p2mg adsorption phases. The use of atomic oxygen facilitates further oxidation until a structure with a c(2x4) periodicity develops. The experimental and theoretical results reveal that the c(2x4) structure is a "surface oxide" very similar to the hexagonal O-Rh-O trilayer structures formed on the Rh(111) and Rh(100) substrates. Some of the experimentally found adsorption phases appear unstable in the phase diagram predicted by thermodynamics, which might reflect kinetic hindrance. The structural details, core level spectra, and stability of the surface oxides formed on the three basal planes are compared with those of the bulk RhO2 and Rh2O3.     

Density functional theory study of CHx (x=1-3) adsorption on clean and CO precovered Rh(111) surfaces

CH(x) (x=1-3) adsorptions on clean and CO precovered Rh(111) surfaces were studied by density functional theory calculations. It is found that CH(x) (x=1-3) radicals prefer threefold hollow sites on Rh(111) surfaces, and the bond strength between CH(x) and Rh(111) follows the order of CH(3)相似文献   

The first layer of water on Rh(111): microscopic structure and desorption kinetics

The adsorption states and growth process of the first water (D2O) layer on Rh(111) were investigated using infrared reflection absorption spectroscopy, temperature programed desorption, and spot-profile-analysis low energy electron diffraction. Water molecules wet the Rh(111) surface intact. At the early stage of first layer growth, a (square root 3 x square root 3)R30 degrees commensurate water layer grows where "up" and "down" species coexist; the up and down species represent water molecules which have free OD, pointing to a vacuum and the substrate, respectively. The up domain was a flatter structure than an icelike bilayer. Water desorption from Rh(111) was a half-order process. The activation energy and the preexponential factor of desorption are estimated to be 60 kJ/mol and 4.8 x 10(16) ML(1/2)/s at submonolayer coverage, respectively. With an increase in water coverage, the flat up domain becomes a zigzag layer, like an ice bilayer. At the saturation coverage, the amount of down species is 1.3 times larger than that of the up species. In addition, the activation energy and the preexponential factor of desorption decrease to 51 kJ/mol and 1.3 x 10(14) ML(1/2)/s, respectively.     

CO adsorption and CO and O coadsorption on Rh(111) studied by reflection absorption infrared spectroscopy and density functional theory

The adsorption of carbon monoxide on Rh(111) and on oxygen modified Rh(111) was investigated using thermal desorption spectroscopy, reflection absorption infrared spectroscopy (RAIRS), and density functional theory. The results show that CO adsorbs on Rh(111) in on top sites at low coverages. With increasing coverage hollow sites and bridge sites get occupied according to the RAIRS results. A new vibrational feature at high wave numbers was found in the on top region of the CO stretching frequency. This feature can be explained by a local high density CO structure where two CO molecules are adsorbed in the ( radical3x radical3)R30 degrees structure. The coadsorption of oxygen and carbon monoxide leads to a shift of the CO stretching frequency to higher wave numbers with increasing O to CO ratio. CO adsorption on a (2x1) oxygen layer is possible and RAIRS shows that the CO adsorbs in on top and most likely in bridge sites in this case.     

Interaction of oxygen with TiN(001): N<-->O exchange and oxidation process

This work presents a detailed experimental and theoretical study of the oxidation of TiN(001) using a combination of synchrotron-based photoemission and density functional theory (DFT). Experimentally, the adsorption of O2 on TiN(001) was investigated at temperatures between 250 and 450 K. At the lowest temperature, there was chemisorption of oxygen (O(2,gas)-->2O(ads)) without significant surface oxidation. In contrast, at 450 K the amount of O2 adsorbed increased continuously, there was no evidence for an oxygen saturation coverage, a clear signal in the Ti 2p core level spectra denoted the presence of TiOx species, and desorption of both N2 and NO was detected. The DFT calculations show that the adsorption/dissociation of O2 is highly exothermic on a TiN(001) substrate and is carried out mainly by the Ti centers. A high oxygen coverage (larger than 0.5 ML) may induce some structural reconstructions of the surface. The exchange of a surface N atom by an O adatom is a highly endothermic process (DeltaE=2.84 eV). However, the overall oxidation of the surface layer is thermodynamically favored due to the energy released by the dissociative adsorption of O2 and the formation of N2 or NO. Both experimental and theoretical results lead to conclude that a TiN+mO2 -->TiOx + NO reaction is an important exit channel for nitrogen in the oxidation process.     

Theoretical study of adsorption of O((3)P) and H(2)O on the rutile TiO(2)(110) surface

The adsorption of oxygen atoms O(3P) on both ideal and hydrated rutile TiO(2)(110) surfaces is investigated by periodic density functional theory (DFT) calculations within the revised Perdew-Burke-Ernzerhof (RPBE) generalized gradient approximation and a four Ti-layer slab, with (2 x 1) and (3 x 1) surface unit cells. It is shown that upon adsorption on the TiO(2) surface the spin of the O atom is completely lost, leading to stable surface peroxide species on both in-plane and bridging oxygen sites with O-binding energies of about 1.0-1.5 eV, rather than to the kinetically unstable terminal Ti-O and terminal O-O species with smaller binding energies of 0.1-0.7 eV. Changes in O-atom coverage ratios between 1/3 and 1 molecular layer (ML) and coadsorption of H(2)O have only minor effects on the O-binding energies of the stable peroxide configurations. High O-atom diffusion barriers of about 1 eV are found, suggesting a slow recombination rate of adsorbed O atoms on TiO(2)(110). Our results suggest that the TiOOTi peroxide intermediate experimentally observed in photoelectrolysis of water should be interpreted as a single spinless O adatom on TiO(2) surface rather than as two Ti-O* radicals coupled together.     

Surface products and coverage dependence of dissociative ethane adsorption on Pt{110}-(1 x 2)

The dissociation of ethane on Pt{110}-(1 x 2) has been studied using supersonic molecular beam and temperature-programmed reaction techniques. The study unequivocally shows that the stable dissociation product of ethane on Pt{110}-(1 x 2) at all coverages is CCH2 at 350-400 K and CCH at 440 K. Temperature-programmed-reaction (TPR) experiments indicate that the CCH2 species decomposes to CCH with a reaction-limited peak temperature of 430 K. Above 450 K, the CCH species becomes unstable and decomposes with a peak temperature of 540 K. By 600 K, ethane dehydrogenates completely to form a surface carbon layer. The sticking probability is initially 0.02 at 370 K and 0.03 at 600 K and follows a linear (1-2theta) dependence for coverages of up to theta = 0.4 ML, where theta is defined as the number of C2Hx units per (1 x 2) unit cell. However, a much weaker coverage dependence at 800 K suggests that the carbon agglomerates into high-density islands.     

First principles analysis of H2O adsorption on the (110) surfaces of SnO2, TiO2 and their solid solutions

Both associative and dissociative H(2)O adsorption on SnO(2)(110), TiO(2)(110), and Ti-enriched Sn(1-x)Ti(x)O(2)(110) surfaces have been investigated at low ((1)/(12) monolayer (ML)) and high coverage (1 ML) by density functional theory calculations using the Gaussian and plane waves formalism. The use of a large supercell allowed the simulation at low symmetry levels. On SnO(2)(110), dissociative adsorption was favored at all coverages and was accompanied by stable associative H(2)O configurations. Increasing the coverage from (1)/(12) to 1 ML stabilized the (associatively or dissociatively) adsorbed H(2)O on SnO(2)(110) because of the formation of intermolecular H bonds. In contrast, on TiO(2)(110), the adsorption of isolated H(2)O groups ((1)/(12) ML) was more stable than at high coverage, and the favored adsorption changed from dissociative to associative with increasing coverage. For dissociative H(2)O adsorption on Ti-enriched Sn(1-x)Ti(x)O(2)(110) surfaces with Ti atoms preferably located on 6-fold-coordinated surface sites, the analysis of the Wannier centers showed a polarization of electrons surrounding bridging O atoms that were bound simultaneously to 6-fold-coordinated Sn and Ti surface atoms. This polarization suggested the formation of an additional bond between the 6-fold-coordinated Ti(6c) and bridging O atoms that had to be broken upon H(2)O adsorption. As a result, the H(2)O adsorption energy initially decreased, with increasing surface Ti content reaching a minimum at 25% Ti for (1)/(12) ML. This behavior was even more accentuated at high H(2)O coverage (1 ML) with the adsorption energy decreasing rapidly from 145.2 to 101.6 kJ/mol with the surface Ti content increasing from 0 to 33%. A global minimum of binding energies at both low and high coverage was found between 25 and 33% surface Ti content, which may explain the minimal cross-sensitivity to humidity previously reported for Sn(1-x)Ti(x)O(2) gas sensors. Above 12.5% surface Ti content, the binding energy decreased with increasing coverage, suggesting that the partial desorption of H(2)O is facilitated at a high fractional coverage.     

Zn adsorption on Pd(111): ZnO and PdZn alloy formation

The adsorption and thermal desorption of Zn and ZnO on Pd(111) was studied in the temperature range between 300 and 1300 K with TDS, LEED, and CO adsorption measurements. At temperatures below 400 K, multilayer growth of Zn metal on the Pd(111) surface takes place. At a coverage of 0.75 ML of Zn, a p(2 x 2)-3Zn LEED structure is observed. Increasing the coverage to 3 ML results in a (1 x 1) LEED pattern arising from an ordered Zn multilayer on Pd(111). Thermal desorption of the Zn multilayer state leads to two distinct Zn desorption peaks: a low-temperature desorption peak (400-650 K) arising from upper Zn layers and a second peak (800-1300 K) originating from the residual 1 ML Zn overlayer, which is more strongly bound to the Pd(111) surface and blocks CO adsorption completely. Above 650 K, this Zn adlayer diffuses into the subsurface region and the surface is depleted in Zn, as can be deduced from an increased amount of CO adsorption sites. Deposition of >3 ML of Zn at 750 K leads to the formation of a well-ordered Pd-Zn alloy exhibiting a (6 x 4 square root 3/3)rect. LEED structure. CO adsorption measurements on this surface alloy indicate a high Pd surface concentration and a strong reduction of the CO adsorption energy. Deposition of Zn at T > 373 K in 10(-6) mbar of O2 leads to the formation of an epitaxial (6 x 6) ZnO overlayer on Pd(111). Dissociative desorption of ZnO from this overlayer occurs quantitatively both with respect to Zn and O2 above 750 K, providing a reliable calibration for both ZnO, Zn, and oxygen coverage.     

DFT study of a weakly pi-bonded C2H4 on oxygen-covered Ag(100)

The coadsorption of ethylene, C2H4, and atomic oxygen on Ag(100) was studied using density-functional theory. As for the adsorption of oxygen alone, the on-surface hollow sites are predicted to be the most stable adsorption sites at low coverage (< or =1/2 ML). Above this coverage, mixed on-surface + subsurface oxygen configurations become more stable. The binding of ethylene to the clean Ag(100) is weak and little affected by oxygen when it is adsorbed on-surface. On the other hand, we find that the adsorption energy of C2H4 may increase considerably when oxygen is adsorbed into subsurface sites. Our results indicate that the increased reactivity of surface Ag atoms is because of their decreased coordination due to the push out effect of oxygen underneath, more than to their oxidation.     

Water dissociation associated with NO2 coadsorption on Mo(110)-(1 x 6)-O: effect of coverage and electronic properties of oxygen

Water dissociation on an oxygen-covered Mo(110) surface was investigated using temperature-programmed reaction spectroscopy (TPRS) and infrared reflectance absorbance spectroscopy (IRAS). Adsorbed hydroxyl formation is enhanced by increasing the coverage of chemisorbed oxygen prior to exposure to water up to saturation (0.66 ML). Additional oxidation of the surface using NO(2) suppresses the formation of hydroxyl species (OH). There is no detectable change in the reaction of NO(2) on Mo(110)-(1 x 6)-O when either the water or hydroxyl is adsorbed on the Mo(110)-(1 x 6)-O surface prior to NO(2) adsorption. In contrast, NO(2) induces the displacement of water into the gas phase and the conversion of hydroxyl species to molecular water. Infrared spectra show that the dissociation of NO(2) populates three types of terminal oxygen sites on Mo(110)-(1 x 6)-O, and the population of the terminal oxygen at step sites increases with respect to the amount of NO(2) deposited. Overall, these results suggest that the oxidic property of oxygen results in a lack of activity for the water dissociation.     

Initial oxidation of a Rh(110) surface using atomic or molecular oxygen and reduction of the surface oxide by hydrogen

The formation conditions, morphology, and reactivity of thin oxide films, grown on a Rh(110) surface in the ambient of atomic or molecular oxygen, have been studied by means of laterally resolved core level spectroscopy, scanning tunneling microscopy and low energy electron diffraction. Exposures of Rh(110) to atomic oxygen lead to subsurface incorporation of oxygen even at room temperature and facile formation of an ordered, laterally uniform surface oxide at approximately 520 K, with a quasi-hexagonal structure and stoichiometry close to that of RhO(2). In the intermediate oxidation stages, the surface oxide coexists with areas of high coverage adsorption phases. After a long induction period, the reduction of the Rh oxide film with H(2) is very rapid and independent of the coexisting adsorption phases. The growth of the oxide film by exposure of a Rh(110) surface to molecular oxygen requires higher pressures and temperatures. The important role of the O(2) dissociation step in the oxidation process is reflected by the complex morphology of the oxide films grown in O(2) ambient, consisting of microscopic patches of different Rh and oxygen atomic density.     

Acetone and water on TiO2(110): H/D exchange

Isotopic H/D exchange between coadsorbed acetone and water on the TiO2(110) surface was examined using temperature programmed desorption (TPD) as a function of coverage and two surface pretreatments (O2 oxidation and mild vacuum reduction). Coadsorbed acetone and water interact repulsively on reduced TiO2(110) on the basis of results from the companion paper to this study, with water exerting a greater influence in destabilizing acetone and acetone having only a nominal influence on water. Despite the repulsive interaction between these coadsorbates, about 0.02 monolayers (ML) of a 1 ML d6-acetone on the reduced surface (vacuum annealed at 850 K to a surface oxygen vacancy population of 7%) exhibits H/D exchange with coadsorbed water, with the exchange occurring exclusively in the high-temperature region of the d6-acetone TPD spectrum at approximately 340 K. The effect was confirmed with combinations of d0-acetone and D2O. The extent of exchange decreased on the reduced surface for water coverages above approximately 0.3 ML due to the ability of water to displace coadsorbed acetone from first layer sites to the multilayer. In contrast, the extent of exchange increased by a factor of 3 when surface oxygen vacancies were pre-oxidized with O2 prior to coadsorption. In this case, there was no evidence for the negative influence of high water coverages on the extent of H/D exchange. Comparison of the TPD spectra from the exchange products (either d1- or d5-acetone depending on the coadsorption pairing) suggests that, in addition to the 340 K exchange process seen on the reduced surface, a second exchange process was observed on the oxidized surface at approximately 390 K. In both cases (oxidized and reduced), desorption of the H/D exchange products appeared to be reaction limited and to involve the influence of OH/OD groups (or water formed during recombinative desorption of OH/OD groups) instead of molecularly adsorbed water. The 340 K exchange process is assigned to reaction at step sites, and the 390 K exchange process is attributed to the influence of oxygen adatoms deposited during surface oxidation. The H/D exchange mechanism likely involves an enolate or propenol surface intermediate formed transiently during the desorption of oxygen-stabilized acetone molecules.     

First-principles study of CO adsorption and vibration on Au surfaces

A CO stretching frequency analysis is presented for the adsorption of CO on various Au(110) surfaces from density functional theory calculations. The structure sensitivity of the adsorption has been studied by considering the unreconstructed (1 x 1) surface, the missing-row reconstructed (1 x 2) surface, the vicinal stepped (20) surface, and the adsorption on adatoms deposited on the (110)-(1 x 2) surface. The calculated CO stretching frequencies are compared with infrared reflection-absorption spectroscopy (IRAS) measurements carried out at room temperature and pressure below 1 atm. The overall stability of the systems is discussed within the calculations of surface free energies at various coverages. At room temperature, the adsorption of CO on the ridge of the missing-row reconstructed surface competes in the high pressure regime with more complex adsorption structures where the molecule coadsorbs on the ridge and on adatoms located along the empty troughs of the reconstruction. This result is supported by the CO stretching frequency analysis.     

Interfacial oxidation of ultrathin nickel and chromium films on yttria-stabilized zirconia

The substrate-induced oxidation upon prolonged annealing in UHV of ultrathin films of Ni and Cr vapor deposited on yttria-stabilized zirconia YSZ(100) was studied by X-ray photoelectron spectroscopy (XPS) to obtain information about the oxidation mechanism, determine the available quantity of reactive oxygen in YSZ, and investigate the thermal stability of the thin oxide films. Up to about 0.8 ML of Ni deposited at room temperature was oxidized to NiO at a constant rate at 650 K via the substrate, whereas at slightly higher coverage, the oxidation rate under identical conditions was drastically reduced. In contrast to Ni, up to 4.8 ML of Cr deposited at 275 K could be oxidized via the substrate to Cr2O3 upon extensive UHV annealing at increasing temperature up to 820 K, indicating a reactive oxygen content of at least 4 x 10(-6) with respect to the lattice oxygen in the YSZ specimen. The Cr2O3 decomposed to metallic Cr above about 800 K, whereas NiO was stable up to the maximum temperature of 875 K. These results indicate that the oxidation via the substrate is kinetically analogous to the gas-phase oxidation of bulk Ni and Cr. The reactive oxygen content of the single-crystal YSZ is larger than expected, and part of it is accommodated at the surface of the substrate. The thermal stability of the thin oxide films is determined by the oxygen exchange with YSZ and not by the respective bulk oxide thermodynamic decomposition temperature.     

金属簇X (X=Pt-Au,Au-Au)负载在(3×2) TiO2(110)完整表面上的覆盖度效应

采用自旋极化密度泛函和广义梯度近似的方法并结合周期平板模型, 探讨了不同覆盖度(θ)下双金 属簇X (X=Pt-Au, Au-Au)在(3×2)TiO₂(110)完整表面上的吸附行为. 另外, 在本文给出的所有覆盖度模式下(θ= 1/6-1 ML), 我们仅研究其基态构型. 计算结果表明: 当θ<1/2 ML时, 金属簇X在TiO₂(110)表面上吸附能随覆盖 度的增加而增加; 当θ>1/2 ML时, 除了饱和覆盖度下, 吸附能随覆盖度的增加而减小; 当θ=1/2 ML时, 吸附能最 大. 即使Pt-Au/TiO₂体系的吸附能比Au-Au/TiO₂体系的小, 但相对于Au-Au 簇, Pt-Au 簇更容易在TiO₂(110)表 面上形成双金属单分子层. 在半覆盖和全覆盖下, X簇的峰与TiO₂的峰在-3.0 eV到费米能级之间产生明显重 叠, 表明簇与底物之间存在化学作用. 且当覆盖度小时, X-TiO₂相互作用是成簇的主要因素; 随着覆盖度的增 大, X-X原子间相互作用就逐渐变成了成簇的主要动力.     

Microcalorimetry of oxygen adsorption on fcc Co{110}

The coverage dependent heats of adsorption and sticking probabilities for oxygen on fcc Co{110} have been measured at 300 K using single crystal adsorption calorimetry (SCAC). Initial adsorption is consistent with dissociative chemisorption at low coverage followed by oxide formation above 0.6 ML coverage. The initial heat of adsorption of 633 kJ mol(-1) is similar to heat values calorimetrically measured on other ferromagnetic metal surfaces, such as nickel and iron. As the coverage increases, the heat of adsorption and sticking probability drop very rapidly up to the onset of oxidation. As already observed for other oxygen-metal surface systems, strong lateral adatom repulsions are responsible for the transition from the chemisorption regime to oxide film formation at higher coverage. The heat of oxide formation at the onset is 475 kJ mol(-1), which is consistent with the formation of CoO crystallites. The oxide film formation is discussed in terms of nucleation and island growth, and the Mott-Cabrera mechanisms, the latter being evidenced by the relatively constant heat of adsorption and sticking probability in contrast to the nickel and iron oxidation cases.