Design and Fabrication of Microlens Array for Near-Field Vertical Cavity Surface Emitting Laser Parallel Optical Head

A GaP microlens for collecting laser light was developed in the tip of a near-field probe. It is important to realize a near-field optical probe head with high throughput and a small spot size. The design and fabrication results of the GaP microlens array are described. The most suitable GaP microlens with a probe was calculated as having a 10 μm radius using the two-dimensional finite difference time domain (2-D FDTD) method. The full width half maximum (FWHM) spot size variation and optical power density tolerance were calculated as 157 nm ± 5 nm and 7%, respectively. A spherical GaP microlens was fabricated with a radius of 10 μm by controlling the Cl₂/Ar gas mixture ratio. The difference between the theoretical spherical shape and the fabricated GaP microlens was evaluated as 40 nm at peak to valley. The FWHM spot size and optical throughput of the fabricated microlens were measured as 520 nm and 63%, respectively. The microlens was the same as a theoretical lens with a 10 μm radius. The micron-lens array fabrication process for a near-field optical head was demonstrated in this experiment.     

Monolithic integration technology between microlens arrays and infrared charge coupled devices

In this paper, we develop an integration technology between Si microlens and 256(H)×256(V) element PtSi Schottky-barrier infrared charge coupled device (IR-CCD) to improve the optical responsivity of CCD sensor. The refractive microlenses with the pixel size of approximately 28×28 μm² is directly fabricated on the backside of CCD substrate to focus the incident irradiation onto the active area. For the integration device the fill factor is improved by a factor of 2.1. As a result, the IR-CCD image sensors operating at 77 K indicate an approximate 0.06–0.4 increase in relative optical responsivity in the spectral range of from 1 to 5 μm. CCD imaging quality with microlens has been improved comparing to that without microlens to a great extent.     

Three-dimensional integration of microoptical components buried inside photosensitive glass by femtosecond laser direct writing

We report the three-dimensional (3D) integration of microoptical components such as microlenses, micromirrors and optical waveguides in a single glass chip by femtosecond (fs) laser direct writing. First, two types of microoptical lenses were fabricated inside photosensitive Foturan glass by forming hollow microstructures using fs laser direct writing followed by thermal treatment, successive wet etching and additional annealing. One type of lens is the cylindrical microlens with a curvature radius R of 1.0 mm, and the other is the plano-convex microlens with radius R of 0.75 mm. Subsequently, by the continuous procedure of hollow microstructure fabrication, a micromirror was integrated with the plano-convex microlens in the single glass chip. Further integration of waveguides was performed by internal refractive index modification using fs laser direct writing after the hollow structure fabrication of the microlens and the micromirror. A demonstration of the laser beam transmission in the integrated optical microdevice shows that the 3D integration of waveguides with a micromirror and a microoptical lens in a single glass chip is highly effective for light beam guiding and focusing. PACS 42.62.-b; 81.05.Kf; 42.82.Cr; 82.50.Pt; 42.79.Gn     

Soda-lime glass microlens arrays fabricated by laser: Comparison between a nanosecond and a femtosecond IR pulsed laser

We present the manufacturing of microlens arrays on soda-lime glass substrates by using two different IR pulsed lasers: a nanosecond Nd:YVO₄ laser (1064 nm) and a femtosecond laser based on Ytterbium crystal technology (1030 nm). In both cases, the fabrication technique consists of the combination of a direct-write laser process, followed by a post-thermal treatment assisted by a CO₂ laser. Through the analysis of the morphological characteristics of the generated microlenses, the different physical mechanisms involved in the glass ablation process with a nanosecond and a femtosecond laser are studied. In addition, by analyzing the optical features of the microlenses, a better result in terms of the homogeneity and quality of the spot focuses are observed for those microlenses fabricated with the Nd:YVO₄ nanosecond laser. Microlens arrays with a diameter of 80 and 90 µm were fabricated.     

Design and fabrication of a negative microlens array

An operation model of a negative microlens array is demonstrated. The array consists of two kinds of materials with different refractive indices. First of all, a positive microlens array with 256×256 elements serving as a pattern is fabricated by argon ion beam etching on the quartz. The diameter and average corona height of the element are 28 and 0.638 μm, respectively. The spacing between two neighboring elements is 2 μm. In the second phase, after being coated by epoxy, the positive microlens array pattern is spun and baked, leading to a complex negative microlens array. Surface stylus measurement shows that the surface of the positive quartz microlens array is smooth and uniform. Focal length measurement of the negative microlens array indicates that the focal length region with −731±3 μm is in good agreement with the theoretical calculation value of −729 μm.     

Optical Dispersion Characteristics of Planar Microlenses

It is essential to know the wavelength dispersion of a planar microlens in order to suitably design optical systems which use such a component. For this purpose, the measurement of focal length over a wide range of the spectrum has been performed. It was clarified that the focal length varies by about 20% from blue (ƛ=0.442 μm) to near-infra red (ƛ=1.55μm) region. The maximum index difference between the lens center and substrate, an important parameter for the characterization of planar microlenses, has been estimated as a function of wavelength using the ray equation. The effect of angled incidence has been discussed.     

Bach Fabrication of Microlens at the end of Optical Fiber using Self-photolithgraphy and Etching Techniques

This paper describes a simple batch process for fabrication of microlens and microlens array at the end of an optical fiber or an optical fiber bundle using self-photolithography and etching techniques. A photoresist micro-cylinder was exactly formed at the core of the fiber end by exposing an UV light from the other end of the fiber and conventional development, rinse processes. A photoresist microlens was formed by thermal reflowing of the fiber at 170°C for 1 h. A measurement of transmissivity showed that the fabricated photoresist microlens is applicable for a wavelength that is longer than 450 nm. Alternatively, a glass microlens was fabricated at the core of the fiber by dry etching with an SF₆ gas using the photoresist microlens as a mask. The focusing of the lensed fiber was confirmed and simulation work showed that the lensed fiber could focus the light with a beam spot of 2 μm, numerical aperture (NA) of 0.285 and a depth of focus of 16 μm.     

Model analysis of effect of diffraction focus characteristics of microlens arrays on parallel laser direct writing quality

In order to study the effect of diffraction focusing characteristics of microlens arrays on the parallel laser direct writing quality, we use nonparaxial approximation to analyze the diffraction focus characteristic of a single microlens, take into consideration the cross-talk effect of a number of microlenses on the diffraction focusing characteristics of an array, and establish a theoretical focusing intensity model of a microlens array to describe the influence of a change in F-number and/or center distance on the diffraction focusing characteristics of a parallel laser direct writing system while incident writing laser is normal. Numerical simulation results indicate that there is a cross-talk effect among microlenses which increases as the F-number increases when the center distance is the same as the smaller aperture, and parallel writing quality can be improved by reducing or totally eliminating the cross-talk effect by reducing F-number and/or increasing center distance.     

微透镜阵列反应离子束蚀刻传递研究

提出了一种微透镜阵列复制的新方法－反应离子束蚀刻法（ＲＩＢＥ）它在工作原理和参数控制等方面较传统的蚀刻方法有很大的先进性，能够实现蚀刻过程的精确控制，本文详细阐述了反应离子蚀刻过程中的蚀刻选择性的控制方法，通过对各种蚀刻参数的控制，最终实现了微透镜阵列在硅等红外材料上面形传递的深度蚀刻，口径φ１００μｍ的Ｆ／２微透镜阵列在硅基底上的传递精度达１：１．０３，无侧向钻蚀。     

Two-Dimensional Alignment-Free Optical Interconnect Using Micro Optical Bench Scheme

In this paper, we have proposed and demonstrated a novel packaging method involving a vertical cavity-surface emitting laser (VCSEL) array. The concept is based on micro optical bench (MOB) placing a laser sub-mount and two-dimensional optical fiber array to match the reference plane of MOB to provide an alignment free optical interconnect. No degradation of I-V and I-L characteristics of the packaged VCSELs was found after use of the proposed packaging process. The coupling loss was about 0.9 dB for λ = 1.55 μm and the loss deviation among channels was less than 0.5 dB in a 2 x 4 ch coupling module between planar microlens and multi-mode fibers.     

用于红外焦平面的正方形孔径球面微透镜阵列研究

针对目前红外焦平面光敏阵列中存在的占空比小、光能利用率低的实际问题,展开了正方形孔径球面微透镜阵列制作及其与红外焦平面阵列集成应用的研究.本文从红外焦平面光敏阵列特点入手,对比分析了正方形孔径相比于传统圆形孔径微透镜阵列在光能利用上的优势.提出正方形孔径微透镜阵列激光直写变剂量曝光制作技术,建立光刻胶曝光数学模型和正方形球面微透镜面型函数,以此为基础,编制直写设备变剂量曝光控制软件;利用长春理工大的学复合坐标激光直写系统和等离子刻蚀机进行相关工艺实验,制作了阵列256×256、单元尺寸40×40 μm²、球面半径60 μm、单元间距1 μm的红外石英微透镜阵列;并将其与相应阵列的碲-镉-汞红外光敏阵列进行集成.结果表明:微透镜的占空比达到95%,红外焦平面光能利用率从原来的60%提高到90% 以上.由此得出结论:变剂量曝光制作微透镜技术是可行的,正方形孔径球面微透镜阵列代替圆形孔径微透镜阵列,对于提高红外探测器的灵敏度、信噪比、分辨率等性能具备明显优势.     

High speed sub-micrometric microscopy using optical polymer microlens

We report the high speed scanning submicronic microscopy （SSM） using a low cost polymer microlens integrated at the extremity of an optical fiber. These microlenses are fabricated by a free-radical photopolymerization method. Using a polymer microlens with a radius of curvature of 250 nm, a sub-micrometric gold pattern is imaged experimentally by SSM. Different distances between the tip and the sample are used with a high scanning speed of 200 cm/s. In particular, metallic absorption contrasts are described with an optical spatial resolution of 250 nm at the wavelength of 532 nm. Moreover, finite-difference time-domain （FDTD） simulations concerning the focal lengths of microlenses with different geometries and heights support the experimental data.     

Determination of Aberration Coefficient of Microoptic Arrays from Axial Confocal Response by Neural Method

We propose a high-speed and parallel method to determine lens aberrations from its confocal axial response. This method analyzes the intensity confocal response including the aberration information of the objective lens by means of neural network algorithm. This method is designed to work parallely for many microlenses, and simultaneously determines aberrations of each element of a microlens array. A prototype system can determine spherical aberration coefficients of a microlens in the range from −0.7λ to 0.3λ with less than 1% RMS error.     

用于红外焦平面的正方形孔径球面微透镜阵列研究

针对目前红外焦平面光敏阵列中存在的占空比小、光能利用率低的实际问题,展开了正方形孔径球面微透镜阵列制作及其与红外焦平面阵列集成应用的研究.本文从红外焦平面光敏阵列特点入手,对比分析了正方形孔径相比于传统圆形孔径微透镜阵列在光能利用上的优势.提出正方形孔径微透镜阵列激光直写变剂量曝光制作技术,建立光刻胶曝光数学模型和正方形球面微透镜面型函数,以此为基础,编制直写设备变剂量曝光控制软件;利用长春理工大的学复合坐标激光直写系统和等离子刻蚀机进行相关工艺实验,制作了阵列256×256、单元尺寸40×40μm2、球面半径60μm、单元间距1μm的红外石英微透镜阵列;并将其与相应阵列的碲-镉-汞红外光敏阵列进行集成.结果表明:微透镜的占空比达到95%,红外焦平面光能利用率从原来的60%提高到90%以上.由此得出结论:变剂量曝光制作微透镜技术是可行的,正方形孔径球面微透镜阵列代替圆形孔径微透镜阵列,对于提高红外探测器的灵敏度、信噪比、分辨率等性能具备明显优势.     

Compact eye-safe laser sources based on OPOs with KTP or PPKTP crystals

We report on compact eye-safe nanosecond laser sources emitting in the 1.5 μm wavelength range based on non-critically phase-matched parametric interaction in optical parametric oscillators (OPOs) with KTP and periodically poled KTP (PPKTP) crystals, pumped by the fundamental frequency of Nd:YAG lasers. As much as 250 μJ signal pulse energy at 1.5 μm wavelength, 6.5 ns FWHM pulse-width, has been obtained in a PPKTP-OPO, extracavity pumped by a Nd:YAG microlaser oscillator–amplifier at 650 μJ pump pulse energy, 8 ns pulse-width. A single signal pulse of 2.7-mJ output energy at 1.57 μm wavelength, less than 5 ns pulse-width, was generated in a KTP-OPO, intracavity pumped by a passively Q-switched Nd:YAG laser.     

平凸型氮化硅球面微透镜的研究

介绍了用激光化学汽相沉积球面微透镜的技术，首先对激光化学汽相沉积法获得球面微透镜进行了理论分析，并用计算机分析了在一定沉积技术下的微透镜厚度剖面形状及光学聚集特性。其后介绍了激光化学汽相沉积的实验装置，用该装置在平面石英玻璃衬底上，制出了平凸型氮化硅球面微透镜，并对其参量进行了测量。     

Lens Sag Measurement of Microlens Array Using Optical Interferometric Microscope

This study attempted to develop a detection system for lens sag of the microlens array in real time using an optical automatic inspection framework to link with the computer through a camera. An image processing technique was applied to detect the spherical microlens array, and then, the results were compared.The system light source used laser light and applied CCD to collocate with the microscope array to form an automatic optical detection system for an optical interferometric microscope. It applied the principle of the Fizeau interferometer, illuminated the surface of microlens array, and formed the phase difference required by the interference of two lights through the laser light reflected by the reference plane and the surface of the microlens array, thus, forming an interference fringe.When the sag of the microlens was much longer than the wave length of the detection light source, the fringe would be densely distributed, thus, only a few central fringes were clear in the microscopic image. An image processing method was used to search the center of the interference fringe and a creative algorithm was utilized to obtain the lens sag of the microlens. As proved by the experiment, lens sag of 4 microlens arrays were detected in real time, with a minimum detection error of 0.08 μm, and a maximum detection error of 4 μm (error value 1 ~ 9%), according to different sample processes. This system featured a simple structure and is applicable to non-contact detection and detection of different-sized microlens arrays.     

Fabrication of microlens arrays in photosensitive glass by femtosecond laser direct writing

This article reports the fabrication of high-fill-factor plano-convex cylindrical and spherical microlens arrays horizontally and vertically embedded in a photosensitive Foturan glass chip by femtosecond (fs) laser micromachining. The microlens arrays were fabricated by modifying the microstructure of Foturan glass using fs laser direct writing followed by thermal treatment, wet etching, and additional annealing. The focusing ability and image quality of the microlens arrays were examined, showing that the lens arrays not only can focus light well but also provide an imaging capability that holds great potential for lab-on-a-chip applications.     

Characteristics of filament induced Dammann gratings fabricated using femtosecond laser

To establish optimal processing conditions for direct write fabrication of diffractive optical elements such as gratings, waveguides, lenses, we have investigated the effect of process parameters such as scan speed, numerical aperture (NA) of objective lens, pulse energy on the characteristics of the filament induced inside fused silica with a femtosecond Ti:sapphire laser. The optimum process parameters were used to fabricate a number of Dammann gratings, 6×6 array, having different thicknesses and number of layers. The performance of these optical elements was evaluated by measuring their diffraction efficiencies. All gratings fabricated were strongly birefringent, the zero order spot with high intensity was not separated from the spot array, and the intensity distribution of 6×6 spot array exhibited some degree of nonuniformity. The single layer Dammann grating fabricated with a thickness of 80 μm attained a maximum diffraction efficiency of 38.8%.     

Real-time focus control in broad flat field laser material processing

Broad flat field laser scanning is critical to the success of laser material processing, used in techniques such as rapid prototyping & manufacturing (RP&M) and micro-machining. For these techniques it is necessary to produce high-performance optical systems that can fulfill the need for a smaller focused spot size over broad, flat field scanning areas. This paper concentrates on the issues of defocus error compensation. A dynamic focusing system is designed, intended primarily for broad flat field galvanometric laser scanning applications. Key technologies are described in detail; corresponding solutions have been used to design and produce a CO₂ infrared optical focusing system, which is capable of scanning a focused spot size of 120 μm or less over areas up to 500 mm².