拓扑绝缘体(Bi0.5Sb0.5)2Te3薄膜中的线性磁阻

本文报道了拓扑绝缘体(Bi_0.5Sb_0.5)₂Te₃薄膜中线性磁阻问题的系统性研究工作. 此体系中, 线性磁阻在很宽的温度和磁场范围内出现: 磁场高达18 T时磁阻仍没有饱和趋势, 并且当温度不高于50 K时, 线性磁阻的大小对温度的变化不敏感. 栅压调控化学势可明显改变线性磁阻的大小. 当化学势接近狄拉克点时, 线性磁阻最为显著. 这些结果说明电荷分布的不均匀性是引起该材料线性磁阻的根源.     

反铁磁拓扑绝缘体与轴子绝缘体——MnBi2Te4系列磁性体系的研究进展

拓扑物质态是21世纪以来凝聚态物理领域最重要的前沿课题之一。它不仅深化了人们对宏观量子物质态的认识,同时也具有极大的潜在应用价值。目前,非磁性拓扑物质态的研究已经较为完善,而磁性拓扑物质态的研究仍处于初始阶段。近两年来,以MnBi₂Te₄系列体系为代表的本征磁性拓扑绝缘体的出现,迅速掀起了磁性拓扑绝缘体的研究热潮。文章从拓扑物质态的基本理论出发,介绍了近期反铁磁拓扑绝缘体方面的一些重要研究进展,着重阐述了MnBi₂Te₄系列的反铁磁拓扑绝缘体、静态轴子绝缘体以及动态轴子绝缘体,并对磁性拓扑绝缘体的下一步研究进行了展望。

     

铁磁绝缘体间的极薄Bi2Se3薄膜的相变研究

研究一个极薄三维拓扑绝缘体Bi₂Se₃薄膜处于两个铁磁绝缘体层之间, 其铁磁层的磁化方向都处于竖直平面, 系统拓扑性质随磁化方向夹角的变化. 从表面态电子低能有效哈密顿量出发计算系统的Chern 数, 和运用一个具有Armchair边界的单层六角晶格带的紧束缚模型模拟系统的体能带和边缘态, 来确定系统所处的拓扑相. 发现两个铁磁层的磁化方式从平行转到反平行的某一临界角度, 系统经历从反常量子霍尔相到普通绝缘相的转变.     

从磁性掺杂拓扑绝缘体到内禀磁性拓扑绝缘体——通往高温量子反常霍尔效应之路

量子反常霍尔效应被认为是已知的拓扑量子效应中最有希望获得广泛实际应用的一个。阻碍其应用的主要障碍是其很低的实现温度。文章介绍了在磁性拓扑绝缘体中量子反常霍尔效应的机理和决定其实现温度的因素,回顾了过去几年在提高量子反常霍尔效应实现温度方面的研究进展,尤其是最近内禀磁性拓扑绝缘体MnBi₂Te₄的相关工作。在此基础上提出在磁性拓扑绝缘体系统中进一步提高量子反常霍尔效应温度的路线图。

     

拓扑绝缘体/超导体异质结中的近邻效应

拓扑超导体自身具有对量子退相干天然的免疫性以及可编织性,这使得它在现代量子计算领域中受到了越来越多的重视,并且成为了下一代计算技术中最有希望的候选者之一。由于拓扑超导态在固有拓扑超导体中相当罕见,因此,当前大部分实验上的工作主要集中在由 s 波超导体与拓扑绝缘体之间通过近邻效应所诱导的拓扑超导体上。本论文中,我们回顾了基于拓扑绝缘体/超导体异质结的拓扑超导体的研究进展。在理论上,Fu 和 Kane 提出,通过近邻效应将 s 波超导体的能隙引入到拓扑绝缘体,可以诱导出拓扑超导电性。在实验上,我们也回顾了一些不同体系中的拓扑超导近邻效应的研究进展。文章的第一部分,我们介绍了一些异质结,包括：三维拓扑绝缘体 Bi2Se3和 Bi2Se3 与 s 波超导体NbSe2 以及 d 波超导体 Bi2Sr2CaCu2O8+δ 的异质结,拓扑绝缘体 Sn1−xPbxTe 与 Pb 的异质结,二维拓扑绝缘体 WTe2 与NbSe2 的异质结。此外,还介绍了 TiBiSe2 在 Pb 上的拓扑绝缘近邻效应。另一部分中,我们对基于拓扑绝缘体的约瑟夫森结进行了回顾,包括著名的基于 Fu-Kane 体系的拓扑绝缘体约瑟夫森结,以及基于约瑟夫森结的超导量子干涉器件。     

轴子拓扑绝缘体候选材料层状Eu1-xCaxIn2As2的物性研究

二维磁性材料的研究推动了现代纳米电子器件的发展.寻找本征的具有磁性的层状材料,为探索研究新的二维磁性材料、制备二维电子器件提供了重要的材料基础.近来,本征二维反铁磁拓扑材料的发现引起了人们的广泛关注和兴趣.EuIn₂As₂被预言是一种轴子拓扑绝缘材料,它具有典型的反铁磁序和层状的晶体结构,其潜在的多种拓扑量子效应可以为未来新型电子学器件提供新的发展思路.实验结果表明EuIn₂As₂处于金属态,而非绝缘态.本文通过掺杂Ca来调节体系的费米能级和磁性,发现Eu_1-xCa₂As₂中仍然存在与母体类似的长程反铁磁的结果.反铁磁矩沿面内方向,符合理论预言的轴子态磁结构.在反铁磁转变温度以上发现了铁磁极化子.由此可见,非磁性杂质掺杂对体系的磁性影响不大,但是载流子浓度却降低了一个数量级,费米能级沿电子型方向进行调制.本文的研究为在二维磁性材料中探索和诱导非平庸拓扑态提供了重要信息.     

纳米尺度下超导体和拓扑绝缘体的电输运特性

超导体和拓扑绝缘体研究是当前凝聚态物理领域中的重大课题.文章重点介绍了作者所在实验室在纳米超导和拓扑绝缘体电输运领域的实验进展,其中包括金属和铁磁纳米线中的超导近邻效应、半金属纳米线中的新奇超导特性、拓扑绝缘体薄膜中的量子输运以及超导态-拓扑量子态的相互作用等,并对该领域的进一步发展进行了展望.     

二维拓扑绝缘体退相干效应研究

拓扑绝缘体是当前凝聚态物理研究的热点.退相干效应对该体系的影响的研究不仅有重要的理论意义,而且也是实现未来量子器件的不可或缺的前期工作.文章作者从理论上研究了退相干对二维拓扑绝缘体特别是量子自旋霍尔效应的影响.研究结果表明,作为量子自旋霍尔效应的标志的量子化纵向电阻平台对不破坏自旋记忆的退相干效应(普通退相干)不敏感,但却对破坏自旋记忆的退相干效应(自旋退相干)非常敏感.因此,该量子化平台只能在尺寸小于自旋退相干长度的介观样品中存在,从而解释了量子自旋霍尔效应实验中所观测到的结果(见Science,2007,318:766).同时,文章作者还定义了一个新的物理量,即自旋霍尔电阻,并发现该自旋霍尔电阻也有量子化平台.特别是该量子化平台对两种类型的退相干都不敏感.这说明在宏观样品中也能观测到自旋霍尔电阻的量子化平台,因此更能全面地反映量子自旋霍尔效应的拓扑特性.     

应变调控下Tl2Ta2O7中的拓扑相变

拓扑电子材料因为具有非平庸的拓扑态,所以会展现出许多奇异的物理性质.本文通过第一性原理计算对应变调控下的烧绿石三元氧化物Tl₂Ta₂O₇中的拓扑相变进行了研究.首先分析了原子轨道投影能带,发现体系费米能级附近O原子的(px+py)与pz轨道发生了能带反转,再构造了紧束缚模型计算得到体系的Z₂拓扑不变量确定了其拓扑非平庸性,最后研究了表面态等拓扑性质.研究发现未施加应变的Tl₂Ta₂O₇是一个在费米能级处具有二次能带交叉点的半金属,而平面内应变会破缺晶体对称性进而使体系发生拓扑相变.当对体系施加–1%的压缩应变时,它会转变为狄拉克半金属;当对体系施加1%的拉伸应变时,体系相变为拓扑绝缘体.本研究对于在三维材料中调控拓扑相变有着较重要的指导意义,并且为低能耗电子器件的设计提供了良好的材料平台.     

拓扑绝缘体基铁磁/f-波超导隧道结Andreev反射研究

基于Bogoliubov-de Gennes方程和Blonder-Tinkham-Klapwijk理论研究了三维拓扑绝缘体基铁磁/各向异性f-波超导隧道结的Andreev反射,其中f-波超导体选取f₁和f₂-波两种配对势.研究发现,对于f₁和f₂波,铁磁体中的磁能隙可以增强传统的Andreev逆向反射,但对Andreev镜面反射有抑制作用;但随着施加在超导体顶部电极上的栅极电位的增加,两种类型的反射都会增强.通过改变磁能隙,可以调节两种反射在准粒子输运过程中占有优势的程度.这些结果提供了一种实验检测拓扑绝缘体薄膜中镜面Andreev反射的方法.此外,隧穿电导和散粒噪声谱的差异可用于区分f₁和f₂波配对势.     

A computational investigation of topological insulator Bi2Se3 film

Topological insulators have a bulk band gap like an ordinary insulator and conducting states on their edge or surface which are formed by spin–orbit coupling and protected by time-reversal symmetry. We report theoretical analyses of the electronic properties of three-dimensional topological insulator Bi₂Se₃ film on different energies. We choose five different energies (–123, –75, 0, 180, 350 meV) around the Dirac cone (–113 meV). When energy is close to the Dirac cone, the properties of wave function match the topological insulator’s hallmark perfectly. When energy is far way from the Dirac cone, the hallmark of topological insulator is broken and the helical states disappear. The electronic properties of helical states are dug out from the calculation results. The spin-momentum locking of the helical states are confirmed. A 3-fold symmetry of the helical states in Brillouin zone is also revealed. The penetration depth of the helical states is two quintuple layers which can be identified from layer projection. The charge contribution on each quintuple layer depends on the energy, and has completely different behavior along K and M direction in Brillouin zone. From orbital projection, we can find that the maximum charge contribution of the helical states is p_z orbit and the charge contribution on p_yand p_x orbits have 2-fold symmetry.     

Proximity effects in topological insulator heterostructures

Topological insulators （Tls） are bulk insulators that possess robust helical conducting states along their interfaces with conventional insulators. A tremendous research effort has recently been devoted to TI-based heterostructures, in which con- ventional proximity effects give rise to a series of exotic physical phenomena. This paper reviews our recent studies on the potential existence of topological proximity effects at the interface between a topological insulator and a normal insu- lator or other topologically trivial systems. Using first-principles approaches, we have realized the tunability of the vertical location of the topological helical state via intriguing dual-proximity effects. To further elucidate the control parameters of this effect, we have used the graphene-based heterostructures as prototypical systems to reveal a more complete phase diagram. On the application side of the topological helical states, we have presented a catalysis example, where the topo- logical helical state plays an essential role in facilitating surface reactions by serving as an effective electron bath, These discoveries lay the foundation for accurate manipulation of the real space properties of the topological helical state in TI- based heterostructures and pave the way for realization of the salient functionality of topological insulators in future device applications.     

Spatially resolved gap closing in single Josephson junctions constructed on Bi_2Te_3 surface

Full gap closing is a prerequisite for hosting Majorana zero modes in Josephson junctions on the surface of topological insulators.Previously,we have observed direct experimental evidence of gap closing in Josephson junctions constructed on Bi_2Te_3 surface.In this paper we report further investigations on the position dependence of gap closing as a function of magnetic flux in single Josephson junctions constructed on Bi_2Te_3 surface.     

Superconductivity and non-metallicity induced by doping the topological insulators Bi2Se3 and Bi2Te3

We show that by Ca doping the Bi₂Se₃ topological insulator, the Fermi level can be fine tuned to fall inside the band gap and therefore suppresses the bulk conductivity. Non-metallic Bi₂Se₃ crystals are obtained. On the other hand, the Bi₂Se₃ topological insulator can also be induced to become a bulk superconductor, with T_c∼3.8 K, by copper intercalation in the van der Waals gaps between the Bi₂Se₃ layers. Likewise, an as-grown crystal of metallic Bi₂Te₃ can be turned into a non-metallic crystal by slight variation in the Te content. The Bi₂Te₃ topological insulator shows small amounts of superconductivity with T_c∼5.5 K when reacted with Pd to form materials of the type Pd_zBi₂Te₃.     

压力诱导酌拓扑绝缘体化合物Bi2Te3常压相的超导性

通过高压电阻测量,发现了拓扑绝缘体化合物BizTe3压力诱导的超导性,在3-6GPa的压力范围内,超导临界温度L约为3K．高压下原位同步辐射的结果证明这个超导相来源于常压相结构．通过霍尔效应的测量,发现超导的Bi2Te3样品的载流子为P型．对高压同步辐射结果Reitveld精修得到的晶格参数和原子位置,并以此进行第一性...     

Bi(110)薄膜在NbSe_2衬底上的扫描隧道显微镜研究

二维拓扑绝缘体因其特殊的能带结构带来的新奇物理性质,成为近年来凝聚态物理的研究热点.尤其是在引入超导电性之后,二维拓扑绝缘体中可能存在马约拉纳费米子(Majorana fermion),因此在量子计算方面具有重大应用前景.在Bi(111)薄膜被证实为二维拓扑绝缘体之后, Bi(110)薄膜引起了广泛关注,然而其拓扑性质还存在争议.本文利用分子束外延技术在室温低生长速率环境下成功制备出了高质量的单晶Bi(110)薄膜.通过扫描隧道显微镜测量发现,薄膜以约8个原子层厚度为分界,从双层生长转变为单层生长模式.结合隧道谱测量发现,在NbSe_2衬底上生长的Bi(110)薄膜因为近邻效应而具有明显的超导性质,但并未显示出拓扑边缘态的存在.此外,对薄膜中特殊的量子阱态现象也进行了讨论.     

Ferromagnetic barrier-induced negative differential conductance on the surface of a topological insulator

The effect of the negative differential conductance of a ferromagnetic barrier on the surface of a topological insulat（ is theoretically investigated. Due to the changes of the shape and position of the Fermi surfaces in the ferromagnetic barrie the transport processes can be divided into three kinds： the total, partial, and blockade transmission mechanisms. The bias voltage can give rise to the transition of the transport processes from partial to blockade transmission mechanisms, which results in a considerable effect of negative differential conductance. With appropriate structural parameters, the currenl voltage characteristics show that the minimum value of the current can reach to zero in a wide range of the bias voltag and then a large peak-to-valley current ratio can be obtained.