基于直流磁控溅射室温制备ZnO薄膜研究

采用直流磁控溅射法在P型<100>晶向单晶硅衬底上室温制备ZnO薄膜,对室温制备的ZnO薄膜分别在500℃、600℃、700℃进行高温退火,通过采用X射线衍射(XRD)、拉曼光谱和场发射扫描电子显微镜(SEM)、HP4145B型半导体参数测试仪分析不同退火温度对室温生长ZnO薄膜微结构、表面形貌和,Ⅰ-Ⅴ特性影响.实验结果表明,室温生长的ZnO薄膜为非晶态,随退火温度增加,ZnO薄膜出现(002)、(100)、(101)晶面衍射峰且逐渐增强,晶粒大小相对增加,在700℃退火后,呈高度c轴择优取向,晶粒间界明显,拉曼光谱E2模增强.     

生长和退火温度对磁控溅射法制备的ZnO薄膜性能的影响

利用磁控溅射法于500 ℃、550 ℃、600 ℃和650 ℃下在Al2O3(001)衬底上生长ZnO薄.对生长的ZnO薄膜后分别进行了800 ℃退火和1000 ℃退火处理.利用X射线衍射(XRD)、霍尔测试仪和透射谱仪对薄膜的结构、电学和光学性质进行了研究,结果表明合适的生长温度和退火温度能够提高ZnO薄膜的结晶质量和性能.     

退火对Si(111)衬底上ZnO薄膜的结构和发光特性的影响

采用磁控溅射法在硅(111)衬底上制备了C轴高度取向的ZnO薄膜,并研究了退火温度和氧气气氛对ZnO薄膜晶体质量、晶粒度大小和光致发光谱的影响.X射线衍射表明,所有薄膜均为高度C轴择优取向,当退火温度低于900℃时,随着退火温度的升高,薄膜的取向性和结晶度都明显提高.室温下对ZnO薄膜进行了光谱分析,退火后的样品均可观测到明显的紫光发射.在一定的退火温度范围内,还可以观测到明显的紫外双峰.空气中退火的样品,当退火温度达到或高于600℃还可观测到绿光发射.实验结果表明,发光峰强度随退火温度和氧气气氛不同而不同,通过改变退火时的温度和氧气气氛可以改变ZnO薄膜的微结构和发光性质.     

直流磁控溅射工艺对ZnO薄膜结构影响的研究

ZnO是一种新型的Ⅱ-Ⅵ族直接带隙化合物材料,是一种很有潜力的短波长光电器件材料.当ZnO薄膜具有良好的c轴取向和晶格结构时,可得到优良的光电性能比如紫外光受激发射.本实验用XRD和SEM研究了工艺条件如基片温度、氩氧比及退火工艺对ZnO薄膜结构特性的影响.结果表明在基片温度250℃、氩氧比为1∶4的条件下,可得到结晶质量良好的ZnO薄膜;通过退火可以使薄膜应力得到驰豫,降低缺陷浓度,改善薄膜的结构特性.本实验采用直流磁控溅射的方法,最终在(100)硅衬底基片上制备出了高c轴取向、晶粒尺寸约70nm的ZnO薄膜.     

衬底温度对直流磁控溅射法制备掺锆氧化锌透明导电薄膜性能的影响

利用直流磁控溅射法在石英衬底上制备出了高透明导电的掺锆氧化锌(ZnO:Zr)薄膜.研究了衬底温度对ZnO:Zr薄膜结构、形貌及光电性能的影响.XRD表明实验中制备的ZnO:Zr为六方纤锌矿结构的多晶薄膜,具有垂直于衬底方向的c轴择优取向.实验所制备ZnO:Zr薄膜的晶化程度和导电性能对衬底温度有很强的依赖性.当衬底温度为300 ℃时, ZnO:Zr薄膜具有最小电阻率7.58×10-4 Ω·cm,其可见光平均透过率超过了91;.     

衬底温度对直流反应磁控溅射法制备的N掺杂p型ZnO薄膜性能的影响

利用直流反应磁控溅射法(纯金属锌作为靶材,Ar-N2-O2混合气体作为溅射气体)在石英玻璃衬底上制备了N掺杂p型ZnO薄膜.通过XRD、Hall和紫外可见透射谱分别研究了衬底温度对ZnO薄膜结构性能、电学性能和光学性能的影响.XRD结果显示所有制备的薄膜都具有垂直于衬底的c轴择优取向,并且随着衬底温度的增加,薄膜的晶体质量得到了提高.Hall测试表明衬底温度对p型ZnO薄膜的电阻率具有较大影响,400℃下生长的p型ZnO薄膜由于具有较高的迁移率(1.32 cm2/Vs)和载流子浓度(5.58×1017cm-3),因此表现出了最小的电阻率(8.44Ω·cm).     

Al-H共掺杂ZnO薄膜的形貌及光致发光性能研究

在不同衬底温度条件下采用RF磁控溅射法在石英玻璃上沉积Al-H共掺杂ZnO薄膜.对所有样品进行晶体结构、表面形貌、电学、光学以及室温光致发光性能分析.结果表明:随着衬底温度的升高,ZnO薄膜的结晶度增加,晶粒增大,薄膜致密度增加;薄膜表面起伏变化减小;同时,电阻率最低达到7.58×10-4Ω·cm,透过率保持在75;左右.所有ZnO薄膜样品都以本征发光为主,Al-H共掺杂在一定程度降低ZnO薄膜缺陷发光的强度;随着衬底温度的升高,ZnO薄膜的本征发光强度明显增大;同时在能量为3.45 eV附近观察到了一个紫外发光峰.     

衬底温度对磁控溅射法制备掺Ta氧化锌薄膜性能的影响

采用射频磁控溅射法,在不同的衬底温度下制备了钽(Ta)掺杂的氧化锌(ZnO)薄膜,采用X射线能谱(EDS)、X射线衍射(XRD)、扫描电镜(SEM)、紫外-可见分光光度计和光致发光(PL)光谱研究了衬底温度对制备的Ta掺杂ZnO薄膜的组分、微观结构、形貌和光学特性的影响.EDS的检测结果表明,Ta元素成功掺入到了ZnO薄膜;XRD图谱表明,掺入的Ta杂质是替代式杂质,没有破坏ZnO的六方晶格结构,随着衬底温度的升高,(002)衍射峰的强度先增大后降低,在400℃时达到最大;SEM测试表明当衬底温度较高时(400℃和500℃),Ta掺杂ZnO薄膜的晶粒明显变大;紫外-可见透过光谱显示,在可见光范围,Ta掺杂ZnO薄膜的平均透光率均高于80;,衬底不加热时制备的Ta掺杂ZnO的透光率最高;制备的Ta掺杂ZnO薄膜的禁带宽度范围为3.34~3.37eV,衬底温度为500℃时制备的Ta掺杂ZnO薄膜的禁带宽度最小,为3.34eV.PL光谱表明衬底温度为500℃时制备的Ta掺杂ZnO薄膜中缺陷较多,这也是造成薄膜禁带宽度变小的原因.     

Eu3+,Tb3+掺杂对RF磁控溅射ZnO薄膜结构的影响

利用RF磁控溅射技术,不同条件下在不同衬底上制备了纯ZnO及Eu3+,Tb3+共掺ZnO薄膜.研究了薄膜的衬底、沉积时间和衬底温度对ZnO薄膜结构及形貌的影响.使用X射线衍射仪(XRD)对样品的结构进行了表征,结果表明:玻璃和石英衬底上的薄膜分别在300℃、镀膜0.5h和常温下、镀膜lh时薄膜具有良好的c轴择优取向,单品质量较好;而硅衬底上的薄膜在300℃、镀膜lh时具有良好的(103)轴择优取向,单品质量略有降低.     

热退火对电子束蒸镀方法制备的ZnO:Al薄膜光电性质的影响

采用电子束蒸镀方法在Si(100)衬底上沉积了ZnO:Al(ZAO)薄膜.在氧气气氛下对ZnO:Al薄膜进行了退火处理,退火温度的范围为400～800℃.X射线衍射(XRD)图样表明所制备的ZnO:Al薄膜具有六方结构,为c轴(002)择优取向的多晶薄膜.用Van der Pauw法测量了ZAO薄膜的电学特性,结果显示其电导率在500℃达到最大值.测量了ZAO薄膜的室温微区光致发光和变温发光光谱,观测到了ZnO自由激子、束缚在中性施主中心(D0)上的束缚激子以及束缚在离化施主中心(D+0)上的束缚激子发射.     

First-principles coexistence simulations of supercooled liquid silicon

We perform first-principles coexistence simulations of the low-density and the high-density phases of supercooled liquid silicon and find a negative slope for the coexisting line in the temperature-pressure plane. Electron density maps and electron-localization function plots of the two phases of silicon show marked differences. The calculated differences suggest more localized electrons in the low-density liquid compared to the high-density liquid, coming from an increased population of covalent bonds, which further explain the calculated negative slope in the two phase coexistence regime. This is consistent with the presence of a pseudo-gap in low-density liquid silicon, absent in the high-density liquid which shows a metallic behavior.     

Triethyl ammonium salt of O,O′-bis(p-tolyl)dithiophosphate, [Et3NH]+[(4-MeC6H4O)2PS2]−

Triethyl ammonium Salt of O,O′-bis(p-tolyl)dithiophosphate and O,O′-bis(m-tolyl)dithiophosphate have been obtained by reaction of p- and m-cresol, respectively with P₂S₅ in toluene and have been characterized by elemental analysis, IR, ¹H and ³¹P NMR spectroscopy. The molecular structure of O,O′-bis(p-tolyl)dithiophosphate has been determined. Crystal data: [Et₃NH]⁺[(4-MeC₆H₄O)₂PS₂]⁻: Monoclinic, P2₁/c, a=15.2441(9) ?, b=10.415(2) ?, c=3.9726(9) ?, β=91.709(7)°, V=2217.5(1) ?⁻³, Z=4.Supplementary materials Additional material available from the Cambridge Crystallographic Data Centre (CCDC no. 600927 for [Et₃NH]⁺[(4-MeC₆H₄O)₂PS₂]⁻ comprises the final atomic coordinates for all atoms, thermal parameters, and a complete listing of bond distances and angles. Copies of this information may be obtained free of charge on application to The Director, 12 Union Road, Cambridge CB2 2EZ, UK (fax: +44-1223-336033; email: deposit@ccdc.cam.ac.uk or www:http://www.ccdc.cam.ac.uk).     

Crystal structures of thecis andtrans isomers of dithiahexahydro[3.3]metacyclophane

Structures of both thecis andtrans isomers of dithiahexahydro[3.3]metacyclophane, ?C₆H₄?CH₂SCH₂?C₆H₁₀?CH₂SCH₂?, have been determined, wherecis andtrans refer to the attachments to the cyclohexane ring. Thecis form crystallizes in the monoclinic space groupP2₁/c witha=8.4299(11)Å,b=21.772(2)Å,c=8.9724(13)Å, β=116.574(11)^o, andZ=4. Thetrans isomer packs into the monoclinic space groupP2₁ witha=8.159(16)Å,b=10.185(5)Å,c=9.558(2)Å, β=112.435(18)^o, andZ=2. The cyclohexane ring of thecis isomer is in the chair conformation, while the cyclohexane of thetrans isomer is found in a twisted boat conformation.     

CTAB与SDBS对碳酸锶粒子生长形态调控及机理研究

以表面活性剂CTAB和SDBS为化学添加剂,采用化学共沉淀法对碳酸锶晶体的生长形态进行调控,成功地制备出了实心的树枝状和花瓣为空心的花状碳酸锶粉体,并用X射线衍射(XRD)、扫描电子显微镜(SEM)和傅里叶变换红外光谱(FT-IR)等分析手段对样品进行了表征;最后重点对化学添加剂可能产生的影响机理进行了初步的探讨.结果表明,CTAB和SDBS在晶体生长的过程中能起到显著的影响作用,两者对粒子分散性能的作用效果相反,而且后者对晶体(013)和(213)晶面表面能降低的贡献明显大于前者.     

Crystal structures of the cis and trans isomers of a tetrathia[3.3.3.3]cyclophane

Both the cis and trans isomers of 3,11,18,26-tetrathiatricyclo[26.2.2.1^5,9.2^13,16.1^20,24] hexatriaconta-5,7,9,20,22,24-hexene have been prepared and structurally characterized. Each of these centrosymmetric tetrathia dimers includes two cyclohexane rings in chair conformations with either 1,4-cis or 1,4-trans bonding and two meta-substituted benzene rings. The cis isomer packs into the monoclinic space group P2₁/a with a = 10.485(3)Å, b = 10.3956(18)Å, c = 14.1343(10)Å, = 105.200(13)°, Z = 2 and refined to an R factor of 0.046. The trans isomer crystallizes in the monoclinic space group P2₁/c with a = 10.7217(12)Å, b = 5.6797(7)Å, c = 25.415(5)Å, = 96.001(12)°, Z = 2 and refined to an R factor of 0.043. In the cis structure each benzene ring faces a cyclohexane ring while in the trans structure the cyclohexane rings face one another.     

Crystal structure of Zn4Na(OH)6SO4Cl·6H2O

The structure of Zn₄Na(OH)₆SO₄Cl·6H₂O, a secondary mineral from Hettstedt, Germany, was determined by single-crystal X-ray diffraction. The crystals are hexagonal,a=8.413(8),c=13.095(24) Å, space group $P\bar 3$ , Z=2. The structure was refined to R=0.0554 and R_w=0.0903 for 970 reflections with I≥3σ(I). The structure can be described as zinc hydroxide layers perpendicular toc, from which sulfates and chlorides extend. The layers are held together by a system of hydrogen bonds involving hexaaquo Na⁺ ions which occupy the interlayer space.     

Synthesis and Crystal Structure of 5-[2-(6-bromonaphthalenyloxymethyl)]-3-(4-morpholinomethyl)-1,3,4-oxadiazole-2(3<Emphasis Type="Italic">H</Emphasis>)-thione

Abstract  The title compound, C₁₈H₁₈BrN₃O₃S, a derivative of 1,3,4-oxadiazole, crystallizes in the triclinic space group P-1 with unit cell parameters a = 6.8731(3), b = 8.9994(4), c = 15.7099(6) ?, α = 92.779(3)°, β = 130.575(3)°, γ = 107.868(4)°, Z = 2. The dihedral angle between the mean planes of the planar naphthyl and morpholine (chair) rings with the planar oxadiazol ring is 50.1(8) and 76.8(6)°, respectively. The planar naphthyl ring is twisted 52.2(5)° with the mean plane of the morpholine ring. A group of four intermolecular close contacts are observed between a bromine atom and hydrogen atoms from the closely packed naphthyl, morpholine and oxy–methyl groups in the unit cell. These molecular interactions in concert with an additional series of π–π stacking interactions that occur between the center of gravity of the two 6-membered rings of the naphthalene group influence the twist angles of each of these three groups. A MOPAC AM1 calculation of the conformation energy of the crystal structure [226.0128(9) kcal] compared to that of the minimum energy structure after geometry optimization [29.9744(1) kcal] reveals a significantly reduced value. The twist angles of the three groups above also change after the AM1 calculation giving support to the influence of both intermolecular C–H···Br short-range interactions and Cg π–π stacking interactions on these angles which therefore play a role in stabilizing crystal packing. Graphical Abstract  Crystal structure of 5-{[(6-bromonaphthalen-2-yl)oxy]methyl}-3-(morpholin-4-ylmethyl)-1,3,4-oxadiazole-2(3H)-thione, C₁₈H₁₈BrN₃O₃S, is reported and its geometric and packing parameters described and compared to a MOPAC computational calculation. Electronic supplementary material  The online version of this article (doi:) contains supplementary material, which is available to authorized users.     

Crystal structure of irisolidone from the flowers of Pueraia lobata

Irisolidone (5,7-dihydroxy-6,4′-dimethoxyisoflavone) was isolated from the flowers of Pueraia lobata and its crystal structure was examined by X-ray single crystal diffraction. The crystal structure of irisolidone is monoclinic, space group P2₁/c with a = 15.491(9) ?, b = 7.895(4) ?, c = 13.321(7) ?, β = 110.546(9)° and Z = 4. Hydrogen bonding and aromatic π–π stacking assemble the title compound into a three-dimensional networking structure.     

电沉积法制备ZnO纳米棒阵列及其发光特性

本文以掺F的SnO2导电玻璃为基板,以硝酸锌水溶液为电解液,采用三电极恒电位体系电沉积制备ZnO纳米棒阵列,系统考察了硝酸锌浓度和沉积电位等工艺参数对ZnO纳米棒阵列的微观形貌及其发光性能的影响规律.结果表明,硝酸锌浓度和沉积电位对纳米棒阵列的形貌有显著影响,控制适宜的工艺条件可以制备出直径分布均匀、结晶性好且纯度高的六方纤锌矿ZnO纳米棒阵列.荧光光谱分析表明,电沉积制备出的ZnO纳米棒阵列在385 nm附近有一个强荧光发射峰,且发光性能稳定、对纳米棒阵列微观形貌的细微变化不敏感,使其在发光二极管和激光器等领域具有广阔的应用前景.