Development of Al-based multilayer optics for EUV

We report on the development of multilayer optics for the extreme ultra-violet (EUV) range. The optical performance of Al-based multilayer mirrors is discussed with regard to promising reflectivity and selectivity characteristics and the problems of the interfacial roughness for this type of multilayers. We demonstrate a possibility to reduce the average roughness by introducing additional metal layer (W or Mo) rather than depositing a buffer layer at each interface. We have prepared and tested Al/SiC, Al/W/SiC and Al/Mo/SiC multilayers of various periods for the spectral range from 15 to 40 nm, which is the range of increasing interest for high-order harmonic generation, synchrotron radiation and astrophysics. The structure of the three-component systems has been optimized in order to obtain the best reflectivity for each wavelength within the spectral range. We have shown that introduction of refractory metal in Al-based periodic stack can improve the optical performance of multilayer reflecting coatings designed for the EUV applications.     

PVP掺杂-ZrO2溶胶-凝胶工艺制备多层激光高反射膜的研究

以丙醇锆(ZrPr)为锆源,二乙醇胺(DEA)为络合剂,原位引入聚乙烯吡咯烷酮(PVP),在乙醇体系中成功地合成了PVP掺杂-ZrO2溶胶.采用旋涂法在K9玻璃基片上制备了PVP-ZrO2单层杂化薄膜.用不同掺杂量的PVP-ZrO2高折射率膜层与相同的SiO2低折射率膜层交替沉积四分之一波堆高反射膜.借助小角X射线散射研究胶体微结构,用红外光谱、原子力显微镜、紫外/可见/近红外透射光谱、椭圆偏振仪以及1064nm的强激光辐照实验对薄膜的结构、光学和抗激光损伤性能进行表征.研究发现,体系组成的适当配置可以在溶胶稳定的前提下实现ZrPr的充分水解,赋予薄膜良好的结构、光学和抗激光损伤性能.杂化体系中,DEA与ZrPr之间强的配合作用大大降低了ZrO2颗粒表面羟基的活性,使得PVP大分子只是以微弱的氢键与颗粒的表面羟基作用而均匀分散于ZrO2颗粒的周围,对颗粒的形成和生长无显著影响.因而在实验研究范围内,随PVP含量的增大,PVP-ZrO2杂化膜层的折射率和激光损伤阈值均无显著变化.但是,薄膜中均匀分布的PVP柔性链可以有效促进膜层应力松弛,显著削弱不同膜层之间的应力不匹配程度、大大方便多层光学薄膜的制备.当高折射率膜层中PVP的质量分数达到15%-20%时,膜层之间良好的应力匹配使得多层高反射膜的沉积周期数可达到10以上.沉积1O个周期的多层反射膜,在中心波长1064nm处透射率约为1.6%-2.1%,接近全反射特征,其激光损伤阈值为16.4-18.2J/cm2(脉冲宽度为1ns).     

Effect of anomalous transmittance in EUV multilayer optics

In this paper the effect of anomalous transmittance in the EUV spectral region is considered theoretically. The effect consists in a resonant enhancement of the transmittance of a periodic multilayer structure compared with that of a uniform film. The physical reason of the effect lies in the fact that the minima of the wave field intensity of a certain wavelength are placed just in the center of thin absorbing layers resulting in a resonant decrease of wave absorption. The condition of this appearance is analyzed: it is necessary the absorption coefficient (imaginary part of the dielectric constant) of two materials composing a multilayer structure to differ by a factor of 10, at least. A possibility of the use of a multilayer filter in metrology of broadband EUV sources is discussed.     

Interface engineering to decrease interdiffusion and improve thermal stability of EUV multilayer

We use interface engineering technology to obtain high interface quality of extreme ultraviolet （EUV） multilayer. By inserting ultrathin （〈0.5 nm） B4C layer between Mo and Si layers in Mo/Si multilayer, the interdiffusion in the multilayer is decreased obviously and the reflectivity can be estimated to increase by 2%. By inserting a new inert material barrer between Mo and Si layers, the thermal stability of new forming Mo/X/Si/X multilayer is increased significantly. The multilayer is annealed at 500 ℃ for 100 h with the fluctuation of period thickness smaller than 0.1 nm, and the high resolution transmission electron microscopy image also shows that the mirostructure of the multilaver is not changed obviously.     

Dynamic compliance of multilayer coatings

The algorithm for calculation of dynamic compliance of multilayer coatings was developed. The compliance modulus and phase lag of coating surface motion vs. the current pressure depend on viscoelastic properties of materials, ratio of wavelength to layer thickness λ/H, and ratio of wave velocity to propagation velocity of shear vibrations in the base layer V / C _t,2 ⁰ Dynamic compliance of the two-layer coating consisting of a thick base layer and thin durable outer layer was calculated. The elasticity modulus of the outer layer ranged up to eight values of elastic modulus of the inner layer; the density of the outer layer either remained equal to the density of the inner layer or increased proportionally to the elastic modulus. Depending on V / C _t,2 ⁰ two scenarios of compliant coating interaction with the turbulent flow were distinguished: resonant and broadband ones. It is shown that the vibration properties of two-layer coatings can be significantly better than the properties of the monolayer coatings. This makes it possible either to increase the coating strength or to work efficiently at lower velocities.     

PVP掺杂-ZrO2溶胶-凝胶工艺制备多层激光高反射膜的研究

以丙醇锆(ZrPr)为锆源，二乙醇胺(DEA)为络合剂，原位引入聚乙烯吡咯烷酮(PVP)，在乙醇体系中成功地合成了PVP掺杂-ZrO₂溶胶.采用旋涂法在K9玻璃基片上制备了PVP-ZrO₂单层杂化薄膜.用不同掺杂量的PVP-ZrO₂高折射率膜层与相同的SiO₂低折射率膜层交替沉积四分之一波堆高反射膜.借助小角X射线散射研究胶体微结构，用红外光谱、原子力显微镜、紫外/可见/近红外透射光谱、椭圆偏振仪以及1064nm的强激光辐照实验对薄膜的结构、光学和抗激光损伤性能进行表征.研究发现，体系组成的适当配置可以在溶胶稳定的前提下实现ZrPr的充分水解，赋予薄膜良好的结构、光学和抗激光损伤性能.杂化体系中，DEA与ZPr之间强的配合作用大大降低了ZrO₂颗粒表面羟基的活性，使得PVP大分子只是以微弱的氢键与颗粒的表面羟基作用而均匀分散于ZrO₂颗粒的周围，对颗粒的形成和生长无显著影响.因而在实验研究范围内，随PVP含量的增大，PVP-ZrO₂杂化膜层的折射率和激光损伤阈值均无显著变化.但是，薄膜中均匀分布的PVP柔性链可以有效促进膜层应力松弛，显著削弱不同膜层之间的应力不匹配程度、大大方便多层光学薄膜的制备.当高折射率膜层中PVP的质量分数达到15%—20%时，膜层之间良好的应力匹配使得多层高反射膜的沉积周期数可达到10以上.沉积10个周期的多层反射膜，在中心波长1064nm处透射率约为1.6%—2.1%，接近全反射特征，其激光损伤阈值为16.4—18.2J/cm²(脉冲宽度为1ns). 关键词： 溶胶-凝胶 2')" href="#">PVP-ZrO₂ 高反射膜 激光损伤     

EUV damage threshold measurements of Mo/Si multilayer mirrors

We present 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. The experiments were performed on different types of Mo/Si mirror, showing no significant difference in single pulse damage thresholds. However, the damage threshold for ten pulses is ??60?% lower than the single pulse threshold, implying a defect dominated damage process. Using Nomarski (DIC) and atomic force microscopy (AFM) we analysed the damage morphologies, indicating a primarily thermally induced damage mechanism. Additionally, we studied the radiation-induced change of reflectivity upon damage of a multilayer mirror.     

19.5nm极紫外反射镜的研制

介绍了一种用于太阳观测19.5nm极紫外多层膜的研究工作。利用软件对规整的Mo/Si膜系结构进行了优化,拓宽了反射带宽,提高了积分反射率。采用双离子束溅射技术,时间控厚,成功制备了该反射镜。通过同步辐射反射率计测试表明,峰值反射率27.5%,均匀性在1%以内,已初步达到预设要求。     

Computer simulation of blistering in multilayer mirrors for EUV lithography

Progress in extreme UV lithography depends on the quality of multilayer radiation collecting mirrors (made of Mo/Si), in which radiation damage can cause porosity. Accumulation of bulk defects (blisters) is represented by the model of the first order phase transition at a fluctuation stage. Computer simulation of defect distribution functions depending on the sizes and arrangement in layers allows the determination of possible ways for the properties of the layer material properties to deteriorate.     

Design and performance of two-channel EUV multilayer mirrors with enhanced spectral selectivity

In this paper, we present a study on two-channel multilayer mirrors which can operate at two wavelengths in Extreme Ultraviolet (EUV) spectral range. We propose a new method to design two-channel EUV multilayer mirrors with enhanced spectral selectivity. The mirror structure is a stack of two periodic multilayers separated by a buffer layer. We have defined the main parameters which allow adjustment of the distance between different order Bragg’s peak and of wavelength positions of reflectivity minima. Two mirrors have been designed and deposited for solar EUV telescope applications by using this method. The first mirror reflects Fe IX–X line (17.1 nm) and Fe XVI (33.5 nm) lines with attenuation of the He II line (30.4 nm). The second mirror reflects Fe IX–X and He II lines with attenuation of Fe XV (28.4 nm) and Fe XVI lines. Measurements with synchrotron radiation source confirm that, in both cases, for these mirrors, we are able to adjust reflectivity maxima (Bragg peak position) and minima. Such multilayers offer new possibilities for compact design of multi-wavelength EUV telescopes and/or for high spectral selectivity.     

Plasma cleaning of multilayer mirrors in EUV lithography from amorphous carbon contaminations

The feasibility of plasma cleaning of the multilayer mirrors used in 13.5-nm EUV lithography from carbon contaminations is studied. Experiments conducted in electrodeless plasma of the surface-wave low-pressure discharge in helium and hydrogen demonstrated the high rate, efficiency, and selectivity of this cleaning without any damage of the mirror’s upper protection layer, even at the atomic level. The optimal working parameters of plasma cleaning are determined and its possible mechanism is discussed.     

Evolutionary algorithm for optimization of multilayer coatings

In this paper, a new evolutionary algorithm, the well-known imperialist competition algorithm, is proposed for optimizing the optical thin-films. In this method, the process is modeled of the competition between countries as imperialists and their colonizing of others as colonies. This algorithm could be an appropriate alternative to some of the more popular algorithms for optimizing the optical thin-films for good performance. The polarizer and edge filter for example are designed by using the imperialist competition algorithm method and the results are compared with those from two optimization high-performance methods: the genetic algorithm and differential evolutionary algorithm. Based on these results,the performance of the imperialist competition algorithm method shows that this algorithm is not sensitive to the change of its parameters and it can be an important advantage for quickly achieving a global optimal point. On the other hand the results show a better ratio of P-polarization transmittance to S-polarization transmittance in the design of a 1540-nm polarizer, which is more appropriate than the results from the other two methods. In the second design, an edge filter with a lower number of layers and more uniform bandpass spectrum than the counterparts of those methods is obtained. These results indicate that the imperialist competition algorithm is a robust method for optical thin-film designs.     

EUV reflectometry for thickness and density determination of thin film coatings

An EUV reflectometer for the analysis of surfaces and thin films regarding refractive index, surface roughness, and mass density at the wavelength of 12.98?nm was developed. The setup uses a laser produced plasma source with an oxygen gas puff target for the generation of narrow-band EUV radiation and a flexible Kirkpatrick–Baez optics for focusing. We present EUV reflectometry (EUVR) measurements conducted on a series of carbon thin films to determine thickness and mass density of the coatings. In case of the thickness measurements results are compared to data obtained from nondestructive standard methods, i.e., grazing incidence X-ray reflectometry and spectroscopic ellipsometry. In addition, we propose a method to deduce the mass density of a sample directly from the fitted index of refraction obtained from EUVR measurements.     

Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth

Our aim was to produce EUV multilayer mirrors with a small spectral bandwidth ΔE≤3 eV at 70 eV peak energy using UHV electron beam evaporation by varying the thickness ratio (Γ=) between the absorber layer and the bilayer. The deposition process was controlled by in situ soft X-ray reflectometry, and ion-beam polishing as well as substrate-heating methods were applied to reduce the interface roughness. The reflection properties of the Mo–Si multilayer mirrors prepared were characterized by hard and soft X-ray reflectometry and details of the multilayer structure were revealed from cross-sectional transmission electron microscopy. Received: 22 September 2000 / Accepted: 4 October 2000 / Published online: 30 November 2000     

High-temperature oxidation of CrN/AlN multilayer coatings

Experiments are reported on sputter depth profiling of CrN/AlN multilayer abrasive coatings by secondary ion mass spectrometry (SIMS) coupled with sample current measurements (SCM). The coatings were deposited by a closed-field unbalanced magnetron sputtering. It is shown that after oxidation tests, performed in air at 900 °C for 2 h and at 1100 °C for 4 h, the layered structure begins to degrade but is not destroyed completely. Oxidation at 1100 °C for 20 h causes total destruction of the coatings that can be attributed to a fast diffusion of oxygen, nickel, manganese and other elements along defect paths (grain boundaries, dislocations, etc.) in the coating. There are practically no nitrides in the near-surface layer after such a treatment and all the metallic components are in the oxidized form as follows from the data obtained by X-ray photoelectron spectroscopy (XPS). According to XPS and mass-resolved ion scattering spectrometry (MARISS), the surface content of Al in the heat-treated coatings has decreased in comparison with the as-received sample and that of Cr increased. Both XPS and MARISS data exhibit real increase in superficial concentration of the substrate materials (Mn and Ni) that is controversial if using SIMS alone. SCM turned out to be an informative depth profiling method complementary to more expensive and complicated SIMS, being particularly useful for structures with different secondary electron emission properties of the layers. SCM with predetermined SIMS calibration allows a routine characterization of coatings and other multilayer structures, particularly, in situations where the expenses of analysis can be justified.     

帽层对极紫外多层膜反射特性影响分析

介绍了在极紫外波段，利用帽层材料来减少多层膜反射镜因外部环境干扰而造成的反射率降低，使多层膜光学元件能够长时间稳定工作.计算了在139nm波长处Mo/Si极紫外多层膜反射镜在表面镀制不同帽层材料时的理论最大反射率，利用单纯形调优法，对帽层和多层膜的周期厚度进行优化，同时把分层理论用于多层膜帽层优化,可使多层膜的反射率得到进一步提高.分析了在加入帽层前后多层膜外层电场强度的分布变化情况. 关键词： 多层膜 反射率 帽层 极紫外     

氧化物薄膜的离子束溅射沉积

用离子束溅射沉积的方法制备的TiO_2、ZrO_2薄膜的光吸收损耗明显降低,对其折射率、光吸收和抗激光损伤阈值等特性进行了分析.     

Transfer process of multilayer optical coatings for patterned components

The capability to transfer a multilayer coating from the initial substrate on which it was deposited to another one is an interesting technique for the manufacturing of patterned components with a high number of different filters such as stripe filters. The two major technological steps of the transfer, namely the removal from the initial substrate, and the bonding onto the new one, are described in this paper. The principle of this approach is validated by the transfer of a band-pass filter with the typical sizes of a stripe.