Selected-area sol-gel deposition of barium strontium titanate thin films on thermally oxidized silicon through mediation of self-assembled monolayers

Self-assembled monolayers (SAMs) of octadecyltrichlorosilane (OTS) and mercapto ethanol were used to modify the surface functionality of platinum/titanium or platinum/tantalum bilayer patterns on thermally oxidized silicon wafers. The attachment of OTS to the exposed oxide region made it hydrophobic, while the anchoring of mercapto ethanol to the bilayer pattern turned it hydrophilic. This patterned hydrophobicity and hydrophilicity was exploited to preferentially deposit barium strontium titanate (BST) thin films on the patterned bilayers from an aqueous sol-gel solution. The combination of the SAMs and the sol-gel film formation method allowed direct patterned deposition of BST thin films, which could be useful for on-chip electronic applications. Wet oxygen annealing at 50 °C was sufficient to stabilize the deposited sol-gel coating without adversely affecting the functionality of the OTS, thus permitting multiple dip-coatings to obtain patterned films of a desired thickness. Heat treatment at 750 °C allowed densification and conversion of the sol-gel coatings to perovskite BST films.     

水溶液法制备图案化TiO2薄膜

从硫酸钛Ti(SO4)2的水溶液出发, 采用化学浴沉积和电沉积法来制备图案化TiO2薄膜. 通过硫酸和双氧水来稳定Ti4+, 配制了pH=1.0的硫酸钛溶液和pH=1.6的过氧硫酸钛溶液. 结合微接触印刷术在硅基底上制得自组装膜预图案, 再化学浴沉积TiO2即可得规则图纹. 无机配体对钛溶液的稳定性和TiO2的晶型均有影响, 溶液的酸度关系到所得图案的质量. 过氧硫酸钛溶液同样适用于电沉积, 在导电玻璃基底上旋涂光刻胶后选择性曝光、显影, 通过控制阴极电位可获得高差达200 nm的清晰图案.     

以OTS自组装单分子膜为探针研究TiO2液相空穴氧化机理

通过引入十八烷基三氯硅烷(OTS)自组装单分子膜作为氧化反应的探针, 在排除反应物的吸附和扩散的条件下研究溶胶-凝胶制备的TiO2薄膜表面光催化空穴氧化初始过程. 研究结果表明, 在紫外光照下, 水溶液中OTS部分覆盖的TiO2表面能够很快从憎水变成亲水. 存在空穴捕获剂后, TiO2表面OTS自组装单分子膜碳链的脱除受到明显抑制, 水接触角随光照时间变化非常小; 而水中羟基自由基捕获剂或者F-的存在则对TiO2表面OTS自组装单分子膜碳链的脱除几乎无影响. 这表明, 空穴氧化在TiO2表面OTS自组装单分子膜碳链的脱除中占主要地位.     

Electrodeposition of SnO2 nanocrystalline thin film using butyl-rhodamine B as a structure-directing agent

<正>Porous SnO_2 nanocrystalline thin films were successfully electrodeposited from an oxygen-saturated acid aqueous solution of SnCl_2 containing different concentrations of butyl-rhodamine B(BRhB) at 70℃.BRhB with substitute of amidocyanogen can be dissolved in the acid deposition solution,where HCl was added to suppress hydrolysis of SnCl_2.So it was used as a structure-directing agent to promote the crystal growth of SnO_2.The formed porous morphology and tetragonal rutile crystalline structure of the electrodeposited thin films were controlled by the addition of BRhB with different amounts.     

水溶液法制备图案化TiO_2薄膜

从硫酸钛Ti(SO4)2的水溶液出发,采用化学浴沉积和电沉积法来制备图案化TiO2薄膜.通过硫酸和双氧水来稳定Ti4+,配制了pH=1.0的硫酸钛溶液和pH=1.6的过氧硫酸钛溶液.结合微接触印刷术在硅基底上制得自组装膜预图案,再化学浴沉积TiO2即可得规则图纹.无机配体对钛溶液的稳定性和TiO2的晶型均有影响,溶液的酸度关系到所得图案的质量.过氧硫酸钛溶液同样适用于电沉积,在导电玻璃基底上旋涂光刻胶后选择性曝光、显影,通过控制阴极电位可获得高差达200nm的清晰图案.     

Growth kinetics and morphology of self-assembled monolayers formed by contact printing 7-octenyltrichlorosilane and octadecyltrichlorosilane on Si(100) wafers

The growth kinetics and morphologies of self-assembled monolayers deposited by contact printing 7-octenyltrichlorosilane (OCT) and octadecyltrichlorosilane (OTS) on Si(100) were studied by ellipsometry and atomic force microscopy. We found that, for both OCT and OTS, full monolayers could be obtained at room temperature after printing times of 120-180 s; the printing-based monolayer assembly processes follow apparent Langmuir adsorption kinetics, with the measured film growth rates increasing both with the ambient humidity and with concentration of the ink used to load the stamp. At a dew point of 10 degrees C and an ink concentration (in toluene) of 50 mM, the observed film growth rate constant is 0.05 s(-)(1). When the printing was carried out at a lower ambient humidity (dew points of 1-3 degrees C), the measured rates of assembly were approximately a factor of 2 slower. Increasing the deposition temperature from 25 to 45 degrees C under these conditions increased the film growth rate only slightly. The morphology of the films depends on the identity of the ink. Uniform, high-coverage films could be obtained readily from the eight-carbon chain length adsorbate OCT, provided that the stamp was not overloaded with the ink; for high concentrations outside of the optimal range, the surface presented significant numbers of adsorbed particles ascribed, in part, to siloxane polymers formed by hydrolysis of the ink on the stamp before printing. In marked contrast, for the 18-carbon adsorbate OTS, the printed films always consisted of a mixture of a uniform monolayer plus adsorbed polysiloxane particles. The different film morphologies seen for OCT and OTS are proposed to result from the different transfer efficiencies of the organotrichlorosilane relative to polysiloxane hydrolysis products formed during the printing process. These transfer efficiencies exhibit sensitivities related to the permeation of the poly(dimethylsiloxane) (PDMS) stamp by the silane reagents. Short-chain inks such as OCT evidently permeate the PDMS stamp more deeply than longer-chain inks such as OTS. This difference, and the different diffusion rates of ink vs oligomeric silane hydrolysis products, determines the film morphology obtained by contact printing. The mass transfer dynamics of the process thus yield surface layers derived from varying quantities of siloxane oligomers, which subsequently transfer to the substrate along with unhydrolyzed silane adsorbate during the printing step. The structural evolution of the contact-printed films so obtained is strikingly different from that of SAMs prepared by immersion.     

Selective deposition in multilayer assembly: SAMs as molecular templates

Self-assembled monolayers (SAMs) on surfaces may be used as molecular templates for the selective deposition of polymer multilayer films. SAMs of ω-functionalized alkane thiolates are patterned onto gold surfaces with micron scale features using the microcontact printing method; glass substrates can also be patterned with trichloroalkylsilane SAMs. Patterned polymeric monolayer and multilayer films are adsorbed atop the SAM from dilute polymer solutions using ionic macromolecular self-assembly techniques which have been developed recently. The effects of polymer molecular weight and ionic content, as well as the use of a second SAM in the unpatterned regions to promote selectivity are discussed. Surface roughness, selectivity and other film properties are presented. It is demonstrated that this technique can be used successfully in the patterning of micron scale features with multilayers of low molecular weight upon adsorption from dilute solution.     

自组装单层膜表面制备BiFeO3图案化薄膜的研究

采用短波紫外光(UV)对十八烷基三氯硅烷(OTS)自组装单分子层(SAMs)进行刻蚀,利用化学液相法在OTS-SAMs模板表面制备出铁酸铋(BiFeO₃)图案化薄膜。通过接触角、X射线衍射(XRD)、扫描电镜(SEM)、X射线能谱(EDS)等测试手段对OTS膜和BiFeO₃薄膜进行表征。结果表明：以OTS为模板利用化学液相法成功制备出边缘轮廓清晰、条纹宽度为10~20 μm的BiFeO₃图案化薄膜。     

高效一体化脱硫脱硝催化剂

热电厂燃煤锅炉排放的烟道气中含有 SO2、 NO等有害气体 ,它们是大气污染的主要污染源之一 ,其对自然生态、环境的破坏及造成的巨大经济损失已毋庸置疑 .因此国内外投入大量人力财力开展消除 SO2和 NO的研究 .NO的消除 (deNO_x)已开发成功用 NH3为还原剂的选择催化还原过程 (简称 SCR过程 ),在德日等国家已实现了工业化 .消除 SO2(deSO_x)工业上采用石灰乳喷射吸收法 .现在国外兴起所谓 deSO_x- deNO_x一体化方案 ,实际上它只是 deSO_x过程和 deNO_x过程的简单组合 .例如石灰乳吸收法和 SCRdeNO_x法的组合, SCRdeNO_x和…     

Thick transparent rutile TiO2 films crystallized in solution

We report a novel process for the preparation of dense, transparent TiO2 films of 2.5 mum thickness on a F-doped SnO2-covered glass substrate. The starting solution contained peroxotitanate complex ions, which are relatively stable under the experimental conditions, permitting the deposition of highly textured rutile nanocrystalline films. The nanocrystals exhibit specific orientations along the (101) and (002) crystalline planes. Kinetic studies suggest that the precipitation started from the formation of amorphous solids, followed by crystallization through a dissolution-recrystallization process. Although a minor phase of anatase was detected only for powders collected from solutions after film preparation, not for films, the transformation from amorphous to anatase was believed to occur before further transformation of anatase to rutile. The present method enables film synthesis on a surface with a large area, and therefore could be integrated into the processing of electroluminescent devices.     

Application of microcontact printing to electroless plating for the fabrication of microscale silver patterns on glass

Microcontact printing (microCP) and electroless plating are combined to produce microscale patterns of silver on glass substrates. Silver patterns with feature sizes of 0.6-10 microm stripes are fabricated using two methods. (1) The printing seeding layer (PSL) method is to apply microCP to directly print the catalyst Sn pattern for further electroless plating. (2) The printing masking layer (PML) method is to use microCP to print the octadecyltrichlorosilane (OTS) self-assembled monolayer as a masking layer on glass substrates, which then become Sn-activated in the unstamped regions by immersing the substrates in stannous chloride solution. After the electroless silver plating, the PML method has a better selectivity of silver deposition than the PSL method. In addition, variation of the deposited silver thickness as a function of the plating time and temperature is discussed.     

Directed growth of poly(isobenzofuran) films by chemical vapor deposition on patterned self-assembled monolayers as templates

This paper describes a method to direct the formation of microstructures of poly(isobenzofuran) (PIBF) by chemical vapor deposition (CVD) on chemically patterned, reactive, self-assembled monolayers (SAMs) prepared on gold substrates. We examined the growth dependence of PIBF by deposition onto several different SAMs each presenting different surface functional groups, including a carboxylic acid, a phenol, an alcohol, an amine, and a methyl group. Interferometry, Fourier transform infrared (FT-IR) spectroscopy, X-ray photoelectron spectroscopy (XPS), gel permeation chromatography (GPC), and optical microscopy were used to characterize the PIBF films grown on the various SAMs. Based on the kinetic and the spectroscopic analyses, we suggest that the growth of PIBF is surface-dependent and may follow a cationic polymerization mechanism. Using the cationic polymerization mechanism of PIBF growth, we also prepared patterned SAMs of 11-mercapto-1-undecanol (MUO) or 11-mercaptoundecanoic acid (MUA) by microcontact printing (microCP) on gold substrates as templates, to direct the growth of the PIBF. The directed growth and the formation of microstructures of PIBF with lateral dimensions of 6 microm were investigated using atomic force microscopy (AFM). The average thickness of the microstructures of PIBF films grown on the MUO and the MUA patterns were 400 +/- 40 nm and 490 +/- 40 nm, respectively. SAMs patterned with carboxylic acid salts (Cu2+, Fe2+, or Ag+) derived from MUA led to increases in the average thickness of the microstructures of PIBF by 10%, 12%, or 27%, respectively, relative to that of control templates. The growth dependence of PIBF on the various carboxylic acid salts was also investigated using experimental observations of the growth kinetics and XPS analyses of the relative amount of metal ions present on the template surfaces.     

Octadecyltrichlorosilane (OTS): a resist for OMCVD gold nanoparticle growth

One application of octadecyltrichlorosilane (OTS) self‐assembled monolayers (SAMs) is its use as thin film resists. In this work, we demonstrated that OTS SAMs can be reliable resists for organo‐metallic chemical vapor deposition (OMCVD) grown gold nanoparticles (Au NPs). In optical sensing applications based on Au NPs, one candidate system consists of patterned OTS SAMs and precisely grown OMCVD Au NPs for achieving a high sensitivity. As an initial step, the OTS SAMs need to perfectly resist the OMCVD Au NP growth. Hence the optimized formation of the OTS SAMs affected by different assembly times and baking temperatures was studied by contact angle, ellipsometry, XPS, SEM, and atomic force microscopy (AFM). To demonstrate the ability of the OTS SAMs to resist OMCVD Au NP growth, the OMCVD process was carried out on two sets of samples: OTS SAMs fabricated under optimized conditions on one set and the other set without OTS SAMs. High‐resolution XPS, RBS, SEM, and ultraviolet‐visible (UV‐Vis) spectroscopy were applied to study the growth of Au NPs on the samples with and without OTS SAM resists. Copyright © 2009 John Wiley & Sons, Ltd.     

Synthesis of TiO2 nanocoral structures in ever-changing aqueous reaction systems

A far-from-equilibrium strategy is developed to synthesize coral-like nanostructures of TiO(2) on a variety of surfaces. TiO(2) nanocoral structures consist of anatase base film and rutile nanowire layers, and they are continuously formed on substrates immersed in aqueous TiOSO(4)-H(2)O(2). The sequential deposition of TiO(2) starts with hydrolysis and condensation reactions of titanium peroxocomplexes in the aqueous phase, resulting in deposition of amorphous film. The film serves as adhesive interface on which succeeding growth of rutile nanowires to occur. This initial deposition reaction is accompanied by shift in pH of the reaction media, which is favorable condition for the growth of rutile nanocrystals. During the growth of rutile nanocoral layers, the amorphous base films are transformed to anatase phase. These sequential deposition reactions occur at temperatures as low as 80 °C, and the mild synthetic condition allows the use of a wide range of substrates such as ITO (indium tin oxide), glass, and even organic polymer films. The thickness of nanocoral layer is controllable by repeating the growth reaction of rutile nanocorals. TiO(2) nanocorals show photocatalytic activity as demonstrated by site-specific reduction of Ag(I) ions, which proceeds preferentially on the rutile nanowire layer. The rutile nanowire layer also shows photocatalytic decomposition of acetaldehyde, which is promoted upon increase of the thickness of the nanowire layer. The use of temporally transforming reaction media allows the formation of biphasic TiO(2) nanocoral structures, and the concept of nonequilibrium synthetic approach would be widely applicable to developing structurally graded inorganic nanointerfaces.     

Formation of ordered self-assembled monolayers by adsorption of octylthiocyanates on Au(111)

Self-assembled monolayers (SAMs) were formed by the spontaneous adsorption of octythiocyanate (OTC) on Au(111) using both solution and ambient-pressure vapor deposition methods at room temperature and 50 degrees C. The surface structures and adsorption characteristics of the OTC SAMs on Au(111) were characterized by scanning tunneling microscopy (STM) and X-ray photoelectron spectroscopy (XPS). The STM observation showed that OTC SAMs formed in solution at room temperature have unique surface structures including the formation of ordered and disordered domains, vacancy islands, and structural defects. Moreover, we revealed for the first time that the adsorption of OTC on Au(111) in solution at 50 degrees C led to the formation of SAMs containing small ordered domains, whereas the SAMs formed by vapor deposition at 50 degrees C had long-range ordered domains, which can be described as (radical3 x 2 radical19)R5 degrees structures. XPS measurements of the peaks in the S 2p and N 1s regions for the OTC SAMs showed that vapor deposition is the more effective method as compared to solution deposition for obtaining high-quality SAMs by adsorption of OTC on gold. The results obtained will be very useful in understanding the SAM formation of organic thiocyanates on gold surfaces.     

纳米SnO2@TiO2包覆催化剂的制备及表征

采用活性层包覆法在自制细SnO2胶体粒子表面包覆TiO2,制备出SnO2@TiO2包覆型复合催化剂,以其对有机磷农药DDVP的降解效果作为评价光催化活性的标准,对制备条件进行了优化,并用XRD、TEM和BET等手段对样品进行了表征,结果表明,SnO2胶体乙醇溶液含水量20％,钛酸丁酯质量分数为34.5％。灼烧温度680℃时制得TiO2含量56.45％的包覆样品SnO2@TiO2为纳米级粒子,且其光催化活性最佳。     

In situ growth of CuS thin films on functionalized self-assembled monolayers using chemical bath deposition

Nano-structured CuS thin films were deposited on the functionalized -NH(2)-terminated self-assembled monolayers (SAMs) surface by chemical bath deposition (CBD). The deposition mechanism of CuS on the -NH(2)-terminated group was systematically investigated using field emission scanning electron microscope (FESEM), X-ray photoelectron spectroscope (XPS), UV-vis absorption. The optical, electrical and photoelectrochemical performance of CuS thin films incorporating with the X-ray diffraction (XRD) analysis confirmed the nanocrystalline nature of CuS with hexagonal crystal structure and also revealed that CuS thin film is a p-type semiconductor with high electrical conductivity (12.3Ω/□). The functionalized SAMs terminal group plays a key role in the deposition of CuS thin films. The growth of CuS on the varying SAMs surface shows different deposition mechanisms. On -NH(2)-terminated surfaces, a combination of ion-by-ion growth and cluster-by-cluster deposition can interpret the observed behavior. On -OH- and -CH(3)-terminated surfaces, the dominant growth mechanism on the surface is cluster-by-cluster deposition in the solution. According to this principle, the patterned CuS microarrays with different feature sizes were successfully deposited on -NH(2)-terminated SAMs regions of -NH(2)/-CH(3) patterned SAMs surface.     

Investigation of the mechanism of nickel electroless deposition on functionalized self-assembled monolayers

We have investigated the seedless electroless deposition (ELD) of Ni on functionalized self-assembled monolayers (SAMs) using scanning electron and optical microscopies, X-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectrometry. For all SAMs studied, the Ni deposition rate is dependent on the bath pH, deposition temperature, and complexing agent. In contrast to the physical vapor deposition of Ni on SAMs, electrolessly deposited Ni does not penetrate through the SAM. This behavior indicates that ELD is a suitable technique for the deposition of low-to-moderate reactivity on organic thin films. We demonstrate that Ni can be selectively deposited on SAMs using two different methods. First, selectivity can be imparted by the formation of Ni(II)-surface complexes. As a demonstration, we selectively deposited Ni on the -COOH terminated SAM areas of patterned -COOH/-CH(3) or -COOH/-OH terminated SAMs. Here, Ni(2+) ions form Ni(2+)-carboxylate complexes with the -COOH terminal group, which comprise the nucleation sites for subsequent metal deposition. Second, we demonstrate that nickel is selectively deposited on the -CH(3) terminated SAM areas of a patterned -OH/-CH(3) terminated SAM. In this case, the Ni(2+) ion does not specifically interact with the -CH(3) terminal group. Rather, selectivity is imparted by the interaction of the reductant, dimethylamine borane (DMAB), with the -OH and -CH(3) terminal groups.     

CO为还原剂同时还原SO2和NO的SnO2-TiO2固溶体催化剂Ⅱ.催化剂的物理化学性质

 用XRD, XPS, CO-TPR, NH3-TPD, SO2-TPD和IR等方法表征了SnO2-TiO2固溶体催化剂的物理化学性质. 不同配比的SnO2和TiO2均可形成均一的具有金红石结构的连续固溶体,其晶粒度比单纯的SnO2或TiO2的晶粒度小. SnO2-TiO2固溶体的比表面积随SnO2含量的增大呈火山形变化,说明在SnO2-TiO2固溶体中SnO2可阻止TiO2由锐钛矿型变为金红石型过程中比表面积的减小,而TiO2则提供了维持大表面的结构框架. SnO2倾向于在固溶体表面偏析,固溶体的表面氧含量高于单纯SnO2的表面氧含量而低于单纯TiO2的表面氧含量. SnO2, TiO2和SnO2-TiO2表面含有能被CO还原的吸附氧和晶格氧,被还原的SnO2, TiO2和SnO2-TiO2的表面晶格氧的数量仅占所有晶格氧的0.001%, 说明CO只使部分晶格氧还原并生成氧阴离子空穴. TiO2表面没有酸性, SnO2和SnO2-TiO2呈微弱酸性. 经CO还原的SnO2-TiO2上存在大量的强碱中心,说明SnO2和TiO2之间发生了协同作用. SnO2-TiO2固溶体的这些物化性质均十分有利于SO2+NO+CO的氧化还原反应.     

纳米SnO_2@TiO_2的制备及其光催化性能

SnCl4和 Ti(OBu)4为原料,采用活性层包覆法制备了 SnO2@TiO2包覆型复合光催化剂,并用 XPS、 IR、 XRD、 TEM和 BET等手段进行了表征,以二甲基二氯乙烯基磷酸酯（简称 DDVP）稀释液为模拟废水,考察了 SnO2@TiO2的光催化活性及降解液初始浓度对反应动力学的影响 .结果表明：包覆粒子由锐钛矿型 TiO2和金红石型 SnO2组成;与纯 SnO2、 TiO2相比, SnO2@TiO2包覆粒子的光催化活性明显提高, DDVP稀释液被光催化降解属于零级反应,但反应表观速率常数与降解液初始浓度成正比 .