结构参数对p-i-n结构InGaN太阳能电池性能的影响及机理

研究了器件结构参数对p-i-n结构InGaN单结太阳能电池性能的影响及物理机制. 模拟结果发现: 随着InGaN禁带宽度的增加, InGaN电池的短路电流减小, 但同时开路电压增加, 当InGaN层的禁带宽度为1.5 eV左右时, 同质p-i-n结InGaN电池的效率最高, 并计算了不同厚度的i层对InGaN电池效率的影响. 进一步的计算表明, 适当采用带宽更大的p-InGaN层形成异质p-i-n结InGaN电池可以获得更高效率, 但是p-InGaN层带宽过大也会导致电池的效率急剧下降. 研究还发现, 采用禁带宽度更大的n-InGaN层可以形成背电场, 从而增加p-i-n结InGaN太阳电池的效率. 研究结果表明, 适当选择p-InGaN和n-InGaN禁带宽度形成异质p-i-n结可以提高InGaN太阳能电池效率.     

渐变带隙氢化非晶硅锗薄膜太阳能电池的优化设计

利用一维微电子-光电子结构分析软件(AMPS-1D)在AM1.5G(100 mW/cm2)、室温条件下模拟和比较了有、无渐变带隙氢化非晶硅锗(a-SiGe:H)薄膜太阳能电池的各项性能.计算结果表明:渐变带隙结构电池具有较高的开路电压(V oc)和较好的填充因子(FF),转换效率(E ff)比非渐变带隙电池提高了0.477%.研究了氢化非晶硅(a-Si:H)、氢化非晶碳化硅(a-SiC:H)和氢化纳米晶硅(nc-Si:H)三种不同材料的窗口层对a-SiGe:H薄膜太阳能电池性能的影响.结果显示:在以nc-Si:H为窗口层的电池能带中,费米能级E F已经进入价带,使得窗口层电导率及电池开路电压有所提高,又由于ITO与p-nc-Si:H的接触势垒较低,使得接触处的电场降低,更有利于载流子的收集.另一方面,窗口层与a-SiGe:H薄膜之间存在较大的带隙差,在p/i界面由于能带补偿作用形成了价带势垒(带阶)?E v,阻碍了空穴的迁移,因此我们在p/i界面引入缓冲层,使得能带补偿作用得到释放,更有利于空穴的迁移和收集,得到优化后单结渐变带隙a-SiGe:H薄膜结构太阳能电池的转换效率达到了9.104%.     

量子阱渐变层材料及结构对GaN基LED性能的影响

In组分渐变InGaN/GaN量子阱结构可以有效解决晶格失配所带来的LED发光效率降低的问题。采用Silvaco软件建立了In组分渐变量子阱结构数值计算模型,研究了量子阱中渐变层In组分及渐变层厚度对极化电荷密度、载流子浓度及LED功率谱密度的影响。研究结果表明：随着渐变层中In组分的增加,载流子浓度以及极化电荷密度都在增大,但极化电荷密度增幅较小,峰值功率谱密度随着In组分增加的增长幅度逐渐减小;功率谱密度随着渐变层顶层厚度的增加先增大后减小,渐变层非顶层厚度不均匀时的功率谱密度比均匀时的功率谱密度小。     

高效InGaN/AlInGaN发光二极管的结构设计及其理论研究（英文）

利用Advanced Physical Models of Semiconductor Devices(APSYS)理论对比研究了InGaN/AlInGaN和InGaN/GaN多量子阱作为有源层的InGaN基发光二极管的结构和电学特性。与InGaN/GaN基LED中GaN作为垒层材料相比,在AlInGaN材料体系中,通过调节AlInGaN中Al和In的组分可以优化器件的性能。当InGaN阱层材料中In组分为8%时,可以实现无应力的In0.08Ga0.92N/AlInGaN基LED。在这种无应力结构中可以进一步降低大功率LED的"效率下降"(Effciency droop)问题。理论模拟结果显示,四元系AlInGaN作为垒层可以进一步减少载流子泄露,增加空穴注入效率,减少极化场对器件性能的影响。在In0.08Ga0.92N/AlInGaN量子阱中的载流子浓度、有源层的辐射复合率、电流特性曲线和内量子效率等方面都优于InGaN/GaN基LED。无应变AlInGaN垒层代替传统的GaN垒层后,能够得到高效的发光二极管,并且大电流注入下的"效率滚降"问题得到改善。     

采用高传导率银铜镍网格电极的柔性聚合物太阳能电池

采用一种新的阳极材料:银、铜、镍的复合金属网格阳极,利用旋涂法制成了活性层为P3HT (poly(3-hexylthiophene)):PCBM([6,6]-phenylC61-butyricacidmethylester)的柔性衬底聚合物太阳能电池.制备了5种不同结构的柔性聚合物太阳能电池器件,将采用新型阳极材料的柔性衬底聚合物太阳能电池与传统ITO(Indium tin oxide)阳极的柔性衬底聚合物太阳能电池进行对比,发现新型阳极材料所制成的器件性能得到大幅度的提高,其电池器件在50 mW/cm~2强度光照下,开路电压(V_(oc))为0.54 V,短路电流密度(J_(sc))为5.39 mA/cm~2,能量转换效率为2.060%.     

高效InGaN/AlInGaN发光二极管的结构设计及其理论研究

利用Advanced Physical Models of Semiconductor Devices (APSYS)理论对比研究了InGaN/AlInGaN 和 InGaN/GaN多量子阱作为有源层的InGaN基发光二极管的结构和电学特性。与InGaN/GaN 基LED 中GaN作为垒层材料相比,在AlInGaN材料体系中,通过调节AlInGaN中Al和In的组分可以优化器件的性能。当InGaN阱层材料中In组分为8%时,可以实现无应力的In_0.08Ga_0.92N/AlInGaN基 LED。在这种无应力结构中可以进一步降低大功率LED的"效率下降"(Effciency droop)问题。理论模拟结果显示,四元系AlInGaN作为垒层可以进一步减少载流子泄露,增加空穴注入效率,减少极化场对器件性能的影响。在In_0.08Ga_0.92N /AlInGaN量子阱中的载流子浓度、有源层的辐射复合率、电流特性曲线和内量子效率等方面都优于InGaN/GaN基LED。无应变AlInGaN垒层代替传统的GaN垒层后,能够得到高效的发光二极管,并且大电流注入下的"效率滚降"问题得到改善。     

高压射频等离子体增强化学气相沉积制备高效率硅薄膜电池的若干关键问题研究

报道了采用高压射频等离子体增强化学气相沉积(RF-PECVD) 制备高效率单结微晶硅电池和非晶硅/微晶硅叠层电池时几个关键问题的研究结果, 主要包括: 1)器件质量级本征微晶硅材料工艺窗口的确定及其结构和光电性能表征; 2)孵化层的形成机理以及减小孵化层的有效方法; 3)氢稀释调制技术对本征层晶化率分布及其对提高电池性能的作用; 4)高电导、高晶化率的微晶硅p型窗口层材料的获得, 及其对减小微晶硅电池p/i界面孵化层厚度和提高电池性能的作用等. 在解决上述问题的基础上, 采用高压RF-PECVD制备的单结微晶硅电池效率达8.16%, 非晶硅/微晶硅叠层电池效率11.61%.     

n型掺杂层结构对n-i-p型微晶硅电池性能和光致衰退特性的影响

采用射频化学气相沉积法,制备了一系列具有不同晶化率n型掺杂层的n-i-p结构微晶硅薄膜太阳电池.发现本征层的结构很大程度上依赖于n型掺杂层的结构,特别是n/i界面处的孵化层厚度以及本征层的晶化率.该系列太阳电池在100 mW/cm²的白光下照射400 h,实验结果证实了本征层晶化率最大（X_c(i)=65%）的电池性能表现出最低的光致衰退率.拥有非晶/微晶过渡区n型掺杂层的电池（本征层晶化率X_c(i)=54%）分别 关键词： 微晶硅 n-i-p结构太阳电池 光致衰退 晶化率     

In组分渐变提高InGaN/GaN多量子阱发光二极管发光性能

利用金属有机物化学气相沉积系统在蓝宝石衬底上通过有源层的变温生长,得到In组分渐变的量子阱结构,从而获得具有三角形能带结构的InGaN/GaN多量子阱发光二极管(LED)(简称三角形量子阱结构LED).变温光致发光谱结果表明,相对于传统具有方形能带结构的量子阱LED(简称方形量子阱结构LED),三角形量子阱结构有效提高了量子阱中电子和空穴波函数的空间交叠,从而增加了LED的内量子效率;电致发光谱结果表明,三角形量子阱结构LED器件与传统结构LED器件相比,明显改善了发光峰值波长随着电流的蓝移现象.通过以上     

Rubrene作电子传输层的异质结有机太阳能电池

以Rubrene为电子传输层(ETL),制备了结构为ITO/MoO3(5nm)/Rubrene(50nm)/C60(45nm)/Rubrene(0,3,5.5,9.5nm)/Al(130nm)的有机太阳能电池.与没有ETL的器件相比,含5.5nmRubrene的电池的开路电压、填充因子、功率转换效率分别从0.68V,0.488,0.315%增加到0.86V,0.574,0.490%.实验结果分析表明:热的Al原子直接沉积在C60上,破坏了C60层,形成高功函数的C60/Al阴极,弱化内建电场,降低电池性能;当插入ETL后,C60层得到保护,热的Al原子沉积破坏了Rubrene层,形成了缺陷态能级,提高电池的内建电场,促进了电子的传输.进一步的单电子电池实验表明,缺陷态能级低于C60的最低未占据分子轨道.     

Numerical investigation on the enhanced carrier collection efficiency of Ga-face GaN/InGaN p-i-n solar cells with polarization compensation interlayers

The impact of the polarization compensation InGaN interlayer between the heterolayers of Ga-face GaN/InGaN?p-i-n solar cells is investigated numerically. Because of the enhancement of carrier collection efficiency, the conversion efficiency is improved markedly, which can be ascribed to both the reduction of the polarization-induced electric field in the InGaN absorption layer and the mitigation of potential barriers at heterojunctions. This beneficial effect is more remarkable in situations with higher polarization, such as devices with a lower degree of relaxation or devices with a higher indium composition in the InGaN absorption layer.     

Avalanche mechanism analysis of 4H-SiC n-i-p and p-i-n avalanche photodiodes working in Geiger mode

Understanding detailed avalanche mechanisms is critical for design optimization of avalanche photodiodes(APDs). In this work, avalanche characteristics and single photon counting performance of 4 H-Si C n-i-p and p-i-n APDs are compared. By studying the evolution of breakdown voltage as a function of incident light wavelength, it is confirmed that at the deep ultraviolet(UV) wavelength region the avalanche events in 4 H-Si C n-i-p APDs are mainly induced by hole-initiated ionization,while electron-initiated ionization is the main cause of avalanche breakdown in 4 H-Si C p-i-n APDs. Meanwhile, at the same dark count rate, the single photon counting efficiency of n-i-p APDs is considerably higher than that of p-i-n APDs. The higher performance of n-i-p APDs can be explained by the larger impact ionization coefficient of holes in 4 H-Si C. In addition, this is the first time, to the best of our knowledge, to report single photon detection performance of vertical 4 H-Si C n-i-p-n APDs.     

Effect of In_x Ga_(1-x )N “continuously graded” buffer layer on InGaN epilayer grown by metalorganic chemical vapor deposition

In this paper we report on the effect of an In x Ga1-x N continuously graded buffer layer on an InGaN epilayer grown on a GaN template.In our experiment,three types of buffer layers including constant composition,continuously graded composition,and the combination of constant and continuously graded composition are used.Surface morphologies,crystalline quality,indium incorporations,and relaxation degrees of InGaN epilayers with different buffer layers are investigated.It is found that the In x Ga1-x N continuously graded buffer layer is effective to improve the surface morphology,crystalline quality,and the indium incorporation of the InGaN epilayer.These superior characteristics of the continuously graded buffer layer can be attributed to the sufficient strain release and the reduction of dislocations.     

Comparision between Ga- and N-polarity InGaN solar cells with gradient-In-composition intrinsic layers

Performances of Ga-and N-polarity solar cells(SCs) adopting gradient-In-composition intrinsic layer(IL) are compared.It is found the gradient ILs can greatly weaken the negative influence from the polarization effects for the Gapolarity case,and the highest conversion efficiency(η) of 2.18%can be obtained in the structure with a linear increase of In composition in the IL from bottom to top.This is mainly attributed to the adsorptions of more photons caused by the higher In composition in the IL closer to the p-GaN window layer.In contrast,for the N-polarity case,the SC structure with an InGaN IL adopting fixed In composition prevails over the ones adopting the gradient-In-composition IL,where the highest η of 9.28%can be obtained at x of 0.62.N-polarity SC structures are proven to have greater potential preparations in high-efficient InGaN SCs.     

The effects of InGaN layer thickness on the performance of InGaN/GaN p-i-n solar cells

InGaN/GaN p-i-n solar cells, each with an undoped In0.12Ga0.88N absorption layer, are grown on c-plane sapphire substrates by metal-organic chemical vapor deposition. The effects of the thickness and dislocation density of the absorp- tion layer on the collection efficiency of InGaN-based solar cells are analyzed, and the experimental results demonstrate that the thickness of the InGaN layer and the dislocation density significantly affect the performance. An optimized InGaN- based solar cell with a peak external quantum efficiency of 57% at a wavelength of 371 nm is reported. The full width at half maximum of the rocking curve of the （0002） InGaN layer is 180 arcsec.     

平面异质结有机-无机杂化钙钛矿太阳电池研究进展

高效低成本太阳电池的研发是太阳能光伏技术大规模推广应用的关键. 近年来兴起的有机- 无机杂化钙钛矿(以下简称钙钛矿)太阳电池因具有光电能量转换效率高、制备工艺简单等优点, 引起了学术界和产业界的广泛关注, 具有广阔的发展前景. 其中平面异质结钙钛矿太阳电池因具有结构简单, 可低温制备等诸多优点, 成为目前研究的一个重要方向. 平面异质结钙钛矿太阳电池分为n-i-p型和p-i-n型两种结构. 其中钙钛矿分别与电子传输层和空穴传输层形成两个界面, 在这两个界面上实现电子和空穴的快速分离. 电子传输层和空穴传输层分别为电子和空穴提供了独立的输运通道. 平面异质结结构有利于钙钛矿太阳电池中电子和空穴的分离、传输和收集. 此外, 该结构不需要高温烧结的多孔结构氧化物骨架, 扩大了电子和空穴传输材料的选择范围. 可以根据钙钛矿材料的能带分布及载流子传输特性, 来选择能级和载流子传输速率更为匹配的传输材料. 本文对钙钛矿的材料特性, 平面异质结结构的由来及发展进行了简要的概述. 其中重点介绍了平面异质结钙钛矿太阳电池的结构特征、工作机理、钙钛矿/电荷传输层的界面特性, 以及电池性能的优化, 包括钙钛矿薄膜制备、空穴和电子传输层的优化等. 最后对钙钛矿电池的发展前景及存在问题进行了阐述, 为今后高效、稳定钙钛矿太阳电池的研究提供参考.     

Modeling of polarization effects on n-GaN/i-InGaN/p-Gan solar cells with ultrathin GaN interlayers

We report the numerical study of n-GaN/i-InGaN/p-GaN solar cells on Ga-face substrates with thin GaN interlayers present in the intrinsic InGaN region. These interlayers have recently been shown to significantly increase the crystal quality of thick InGaN layers $(>\!\!\!120\,\text{ nm})$ . We find that tunneling is efficient in n-i-p structures having interlayers $\le \! 1.5\,\text{ nm}$ thick if polarization charges are sufficiently screened. If left unscreened, the large polarization charges naturally formed at the heterointerfaces degrades n-i-p performance, at a given interlayer thickness, because polarization charges increase the distance that carriers must tunnel. Simulations identify favorable parameter ranges.     

Dependence of InGaN solar cell performance on polarization-induced electric field and carrier lifetime

The effects of Mg-induced net acceptor doping concentration and carrier lifetime on the performance of a p-i-n InGaN solar cell are investigated. It is found that the electric field induced by spontaneous and piezoelectric polariza- tion in the i-region could be totally shielded when the Mg-induced net acceptor doping concentration is sufficiently high. The polarization-induced potential barriers are reduced and the short circuit current density is remarkably increased from 0.21 mA/cm2 to 0.95 mA/cm2 by elevating the Mg doping concentration. The carrier lifetime determined by defect density of i-InGaN also plays an important role in determining the photovoltaic properties of solar cell. The short circuit current density severely degrades, and the performance of InGaN solar cell becomes more sensitive to the polarization when carrier lifetime is lower than the transit time. This study demonstrates that the crystal quality of InGaN absorption layer is one of the most important challenges in realizing high efficiency InGaN solar cells.     

InN分凝的InGaN薄膜的光致发光与吸收谱

我们用低压MOCVD在蓝宝石衬底生长了InGaN/GaN外延层.用X射线衍射(XRD),光致发光谱(PL),光吸收谱等测量手段,研究了InGaN的辐射发光机制.In组分利用Vegard定理和XRD测量得到.我们发现随着In组分的增加,在光吸收谱上发现吸收边的红移和较宽的Urbach带尾;PL谱中低能端的发射渐渐成为主导,并且在PL激发谱中InGaN峰也变宽.我们认为压电效应改变了InGaN的能带结构,从而影响了光学吸收特性.而在InN量子点中的辐射复合则是InGaN层发光的起源.