Superconductivity and normal electrical conductivity of amorphous lead films nucleated with molybdenum

Lead films vapor quenched onto nucleating monolayers of Mo or W exhibit strong lattice disorder and can be considered to be amorphous. The amorphous-to-crystalline transformation temperatureT _tr is indicated by a sharp drop of the electrical resistivity in the course of annealing.T _tr is found to be proportional tod ^–2 for Pb thicknessd smaller than 30 nm. The superconducting transition temperatureT _c is by 0.6 to 1 K smaller in the amorphous state than after crystallization. In both states,T _c is proportional tod ^–1. Prenucleation with about half a monolayer of Mo leads to quite the sameT _c depression as observed earlier by Strongin et al. on Pb films vapor quenched onto predeposited films of SiO, Ge or Al₂O₃. For comparison, experiments have been carried out with 2.5 nm Ge predeposits. As with Mo prenucleation, a well defined transformation temperatureT _tr of about the same value has been observed.T _c of bulk amorphous Pb can be extrapolated to be about 6.6 K.     

Structural,optical and electrical properties of sulfur-incorporated amorphous carbon films

Amorphous carbon–sulfur (a-C:S) composite films were prepared by vapor phase pyrolysis technique. The structural changes in the a-C:S films were investigated by electron microscopy. A powder X-ray diffraction (XRD) study depicts the two-phase nature of a sulfur-incorporated a-C system. The optical bandgap energy shows a decreasing trend with an increase in the sulfur content and preparation temperature. This infers a sulfur incorporation and pyrolysis temperature induced reduction in structural disorder or increase in sp ² or π-sites. The presence of sulfur (S 2p) in the a-C:S sample is analyzed by the X-ray photoelectron spectroscopy (XPS). The sp ³/sp ² hybridization ratio is determined by using the XPS C 1s peak fitting, and the results confirm an increase in sp ² hybrids with sulfur addition to a-C. The electrical resistivity variation in the films depends on both the sulfur concentration and the pyrolysis temperature.     

非晶FezZn1-xO薄膜的结构、磁性和电性能：

采用射频共溅射方法制备了FezZn1-xO（x=0．80,0．86,0．93）非晶薄膜,该薄膜具有较强的室温铁磁性,制备态的Fe093Zn0．07O的饱和磁化强度Ms可达333．29emu／cm3,磁性能是各向同性的．与多晶的FezZn1-xO（z≤20％）不同的是样品出现了明显的异常霍尔效应（AHE）,样品均为n型半导体,载流子浓度约为10^19-10^20cm^-3．退火后的样品在低温222K下存在着电阻极小值现象．薄膜的低温电阻导电机理属于自旋依赖的电子变程跃迁机理,上述实验结果表明高Fe含量的非晶FeZnO体系有作为新型自旋电子学器件材料的可能．     

Laser-stimulated conductivity of amorphous germanium films

It is shown that metastable states are created in evaporated -Ge films by laser irradiation. The lifetime of the metastable state is a strong function of the incident laser power density.Supported by IRSIA (Brussels)     

Structural, electrical, and optical properties of ZnInO alloy thin films

Indium zinc oxide (IZO) thin films with different percentages of In content (In/[In+Zn]) are synthesized on glass substrates by magnetron sputtering, and the structural, electrical and optical properties of IZO thin films deposited at different In₂O₃ target powers are investigated. IZO thin films grown at different In₂O₃ target sputtering powers show evident morphological variation and different grain sizes. As the In₂O₃ sputtering power rises, the grain size becomes larger and electrical mobility increases. The film grown with an In₂O₃ target power of 100 W displays the highest electrical mobility of 13.5 cm·V^-1·s^-1 and the lowest resistivity of 2.4 × 10^-3 Ω·cm. The average optical transmittance of the IZO thin film in the visible region reaches 80% and the band gap broadens with the increase of In₂O₃ target power, which is attributed to the increase in carrier concentration and is in accordance with Burstein-Moss shift theory.     

Hopping conductivity in amorphous carbon films

The electrical resistivity of amorphous carbon films getter-sputtered at 95°K is well fitted between 300 and 20°K by the relation $\text{? = ?}{}_0\text{exp}\text{[(T}{}_0\text{/T)}{}^{\mathrm{<mtext>1</mtext><mtext>4</mtext>}}\text{]}$ with T₀ ? 7 × 10⁷K. This behavior suggests a hopping conductivity very similar to that found in other amorphous semiconductors.     

Structure of amorphous Ge alloy films

Structural details of amorphous alloy films of Ge with Al, Cu and Fe up to 30 at.% metal concentrations have been studied. As determined by the electron diffraction studies, the short range order in these alloy films is essentially similar to that of amorphous (a-)Ge films. Electron microscopy and electrical resistivity measurements show that the concentration of voids and associated dangling bonds in a-Ge is reduced considerably on alloying. It is concluded from these studies that the metal atoms are accommodated in the tetrahedral network of a-Ge.     

Structural relaxation of FeNiB amorphous alloy

Young's modulus was measured in rapidly quenched ribbons of Fe₄₄Ni₃₈B₁₈ annealed at a rate of 5 K/min up to different temperatures. An oscillating behavior was observed. Samples annealed up to temperatures that correspond to maxima and minima values of Young's modulus were studied with Mössbauer spectroscopy in order to correlate the macroscopic parameter with the hyperfine field distribution.     

Ac and Dc conductivity in amorphous silicon-hydrogen films

The ac conductivity of glow discharge deposited amorphous silicon-hydrogen films with metal, semiconducting, or insulating contacts have been measured in the frequency range 2 Hz – 30 MHz at temperatures between 170 and 300 K. In addition, the dc conductivity has been determined for most samples. The frequency and temperature dependences of the measured conductivity are compared quantitatively with the predictions of the quantum-mechanical tunneling theory and with the results obtained from a numerical analysis of a more recent selfconsistent theory of the ac and dc conductivity in disordered hopping systems.     

Certain features of the thickness and temperature dependences of the electrical conductivity of amorphous LiBiTe2 films

Amorphous films of ternary semiconducting compound LiBeTe₂ are obtained by the method of discrete atomization. The electrophysical properties of the films are studied in a broad temperature range. The thickness dependence of the conductivity is explained by a jump charge-transfer mechanism and structural amorphous film transformations (polyamorphism).Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 9, pp. 8–12, September, 1985.The authors are grateful to V. B. Lazarev and A. F. Trippel' for providing the bulk LiBiTe₂ specimens.     

The thermal conductivity of disordered and amorphous metal films

The thermal conductivity of quenched condensed polycrystalline and amorphous Pb and Pb_0.9Cu_0.1 films has been measured between 0.5 and 11 K, i.e. in the superconducting (T7 K) and in the normal state (T7 K). Whereas, in agreement with previous results, phonon heat transport is very small for crystalline films, a considerable portion of heat is carried by phonons in amorphous films, owing to the absence of extended lattice defects. Phonon scattering in these latter films is analyzed in terms of scattering from conduction electrons aboveT _c, whereas well belowT _c it is very likely due to low energy excitations inherent in the amorphous structure.Work performed within the research program of the Sonderforschungsbereich 125 — Aachen/Jülich/Köln     

Ac electrical conductivity and dielectric relaxation behavior of amorphous Selinum36 Antimony31Cubber33 thin films

ABSTRACT

The alternating-current (Ac) conductivity measurements and dielectric behaviors were observed in the range of temperature (from 303 to 393?K) and in the frequency range from 10² to10⁶?Hz for amorphous films of Selinum₃₆ Antimony₃₁ Cubber₃₃ chalcogenide glass. The ac conductivity has temperature dependency and the frequency dependency. The reduction of the exponent S values with raising temperature was introduced with the correlated barrier hopping model. The maximum height of the barrier W_M for Sellinum₃₆ Antimony₃₁Cubber₃₃ films is reliable with carrier hopping over a potential barrier. The number of localized states per unit volume at the Fermi level enhances with the elevation of ambient temperature of the film sample. Both dielectric constant ε₁ and loss ε₂ increase with the rise of temperature rising and decrease with frequency. The computation of the dielectric modulus M^/ and M^// revealed that the interfacial is the most suitable polarization type.     

Structure and electrical conductivity of ultrathin Ni-Cu films

The structure, phase composition, morphology, and electrical conductivity of Ni-Cu alloy ultrathin films having a thickness of d = 1?10 nm and a Cu concentration of 10–95 at % have been studied. All films are shown to be fcc Ni-Cu alloys; they have an island structure with an island size of 1.5–2 nm in the as-deposited films and of about 20 nm in the films annealed to 700 K. The electrical conductivity of the films depends on their thickness and morphology. For films with d ≈ 1 nm, the electrical conductivity is thermally activated with an activation energy E _a ≈ 0.086?0.095 eV. Films with d > 3 nm exhibit the metallic temperature dependence of electrical conductivity with a positive temperature coefficient of resistivity.     

Preparation and electrical conductivity of LISICON thin films

LISICON thin films have been prepared with RF sputtering and subsequent heat-treatment. The crystal phases of sputtered films depend on the sputtering conditions, especially the target composition and ambient gas atmosphere. Though the as-sputtered films in Ar-O₂ mixed gas (target composition: Li₃Zn_0.5GeO₄+0.5 ZnO, gas pressure: 9×10^-2 Torr, oxygen gas content: 74.6%) were amorphous; LISICON single phase thin films were obtained after annealing at 600°C for 6 h. The conductivity of the film at 500°C is 5×10^-3ω^-1cm^-1 which is slightly lower than that for ceramic Li₃Zn_0.5GeO₄.     

Magnetic behavior of amorphous Sm-Co alloy films

Amorphous films of Sm_100–x Co _x with 70x90 were made by vapor deposition on flat glass substrates kept at 300 K. The films crystallize above 700 K. The film plane is the easy plane with the planar anisotropy of the order of 10⁷ erg cm^–3, indicating a local anisotropy of the order 10⁸ erg cm^–3. With regard to local anisotropy and magnetization, the films appear to correspond to the random anisotropy concept of amorphous magnets. Films evaporated in a magnetic field parallel to the film plane have an induced uniaxial anisotropy of the order of 10⁶ erg cm^–3. Hysteresis loops in fields parallel to the easy axis are perfectly rectangular with coercive fieldsH _c in the range 30 Oe<H _c<3000 Oe, depending on composition, temperature and heat treatment. The magnetization reverses by a thermally activated domain nucleation and growth process having a narrow distribution of time constants. Aging at temperatures below the crystallization temperature reduces the anisotropies andH _c.     

Thermomagnetic hysteresis and electrical transport in amorphous films

We report resistivity and magnetization measurements on an amorphous Ni₇₄Mn₂₄Pt₂ thin film in the temperature range of 3–300 K. Two significant features are apparent in both the magnetic susceptibility and electrical resistivity. A low-temperature (low-T) anomaly is observed at about 40 K, where a cusp appears in the resistivity, while a concomitant step-like increase in zero-field-cooled (ZFC) magnetization (M) appears with increasing temperature. The low-T anomaly is attributed to a crossover from a pure re-entrant spin-glass within individual domains to a mixed ferro-spin-glass regime at lower temperatures. By contrast, the high-temperature (high-T) anomaly, signaled by the appearance of hysteresis below 250 K, corresponds to the freezing of transverse spins in individual domains acting independently. Between the low-T and high-T anomalies a small but discernable magnetic hysteresis is observed for warming vs. cooling in the field-cooled (FC) case. This behavior clearly indicates the presence of domain structure in the sample, while the disappearance of this hysteresis at lower temperatures indicates the complete freezing of the spin orientation of these domains. According to these results, we have divided the magnetic state of this sample into three regions: at temperatures above 250 K, the sample behaves like a soft ferromagnet, exhibiting M vs. H loops with very small hysteresis (less than 5 Oe). As the temperature is lowered into the intermediate region (the range 40–250 K), spins become frozen randomly and progressively within the individual domains. These domains behave independently, rather than as a cooperative behavior of the sample. Weak irreversibility sets in, indicating the onset of transverse spin freezing within the domains. At temperatures below 40 K, the M vs. H loops exhibit larger hysteresis, for both the ZFC and FC cases, as in a pure spin-glass. We have also demonstrated giant noise in the resistivity at temperatures just below 250 K. Such noise can originate from fluctuations of the domains near the film surface because of competing effective bulk and surface anisotropy fields. The large observed amplitude may be explained by means of a large ferromagnetic anisotropy in the resistivity due to the large spin–orbit effect seen in NiMn systems. Finally, the low-T peak in the resistivity has been analyzed using Fisher and Langer's expression based on the Friedel Model proposed for critical transitions in transition metals (s–d systems). The fitted results are in satisfactory agreement with the predictions of this model.     

Ac conductivity in boron doped amorphous carbon films

Experimental results on frequency and temperature dependence of ac conduction in boron doped amorphous carbon films are analyzed in the framework of available microscopic models. Depending on the response, the conductivity plot is divided into three regimes (low frequency high temperature; moderate frequency intermediate temperature; high frequency low temperature) and the data in the respective regimes are corroborated with the various theoretical models accordingly. The conductivity data at high frequency and low temperature suggests that relaxation via quantum mechanical tunneling might be the dominant conduction mechanism. At intermediate temperatures and moderate frequencies, the conductivity data is in good agreement with extended pair approximation model with interaction correction. Signature of enhanced interaction effect is observed at low temperature.     

氢化非晶硅薄膜的热导率研究

采用铂电极为加热电阻,研究了厚度为300—370nm等离子体化学气相沉积(PECVD)工艺制备的氢化非晶硅(a-Si：H)薄膜的热导率随衬底温度的变化规律.用光谱式椭偏仪拟合测量薄膜的厚度,得到了沉积速率随衬底温度变化规律,傅里叶红外(FTIR)表征了在KBr晶片衬底上制备的a-Si：H薄膜的红外光谱特性,SiH原子团键合模的震动对热量的吸收降低了薄膜热导率.从动力学角度分析了薄膜热导率随平均温度升高而增大的原因,并比较了声子传播和自由电子移动在a-Si：H薄膜热导率变化上的作用差异. 关键词： 非晶硅 热导率 薄膜 热能     

Thermal stability and electrical characteristics of NiSi films with electroplated Ni(W) alloy

In this study, an electroplating method to deposited Ni, crystalline NiW(c-NiW), amorphous NiW (a-NiW) films on P-type Si(1 0 0) were used to form Ni-silicide (NiSi) films. After annealed at various temperatures, sheet resistance of Ni/Cu, c-NiW/Cu and a-NiW/Cu was measured to observe the performance of those diffusion barrier layers. With W added in the barrier layer, the barrier performance was improved. The results of XRD and resistance measurement of the stacked Si/Ni(W)/Cu films reveal that Cu atom could diffuse through Ni barrier layer at 450 °C, could diffuse through c-NiW at 550 °C, but could hardly diffuse through a-NiW barrier layer. c-NiW layer has a better barrier performance than Ni layer, meanwhile the resistance is lower than a-NiW layer.     

Microstructures and electrical conductivity of nanocrystalline ceria-based thin films

Ceria-based thin films are potential materials for use as gas-sensing layers and electrolytes in micro-solid oxide fuel cells. Since the average grain sizes of these films are on the nanocrystalline scale (< 150 nm), it is of fundamental interest whether the electrical conductivity might differ from microcrystalline ceria-based ceramics. In this study, CeO₂ and Ce_0.8Gd_0.2O_1.9−x thin films have been fabrication by spray pyrolysis and pulsed laser deposition, and the influence of the ambient average grain size on the total DC conductivity is investigated. Dense and crack-free CeO₂ and Ce_0.8Gd_0.2O_1.9−x thin films were produced that withstand annealing up to temperatures of 1100 °C. The dopant concentration and annealing temperature affect highly the grain growth kinetics of ceria-based thin films. Large concentrations of dopant exert Zener drag on grain growth and result in retarded grain growth. An increased total DC conductivity and decreased activation energy was observed when the average grain size of a CeO₂ or Ce_0.8Gd_0.2O_1.9−x thin film was decreased.