反应磁控溅射ZnO/MgO多量子阱的光致荧光光谱分析

采用反应射频磁控溅射方法，在Si(001)基片上制备了具有高c轴择优取向的ZnO/MgO多量子阱.利用X射线反射、X射线衍射、电子探针，光致荧光光谱等表征技术，研究了ZnO/MgO多量子阱的结构、成份和光致荧光特性.研究结果表明，多量子阱的调制周期在1.85—22.3 nm之间，所制备的多量子阱具有量子限域效应，导致了室温光致荧光峰的蓝移，并观测到了量子隧穿效应引起的荧光效率下降.建立了基于多声子辅助激子复合跃迁理论的室温光致荧光光谱优化拟合方法，通过室温光致荧光光谱拟合发现，ZnO/MgO比ZnO/ZnMgO多量子阱具有更大的峰位蓝移，探讨了导致光致荧光光谱展宽的可能因素. 关键词： ZnO/MgO 多量子阱 磁控溅射 光致荧光 量子限域效应     

AlyGa1—yAs／AlxGa1—xAs量子阱激光器材料的光致荧光谱

测量了ＡｌｙＧａ１－ｙＡｓ／ＡｌｘＧａ１－ｘ量子阱激光材料的光致荧光谱，发现在室温连续激光器材料的光致荧光谱中有两上峰，而不能激射的材料中则只有一个很宽的峰，将高能峰归属于准费密能级电子的跃迁。     

MBE生长PbSe/PbSrSe量子阱结构的光致中红外发光的研究

研究了分子束外延技术生长的PbSe/PbSrSe多量子阱结构的中红外光致荧光现象.高分辨率X射线衍射（HRXRD）谱观察到了多量子阱所特有的多级卫星峰,表明量子阱界面陡峭.变温光致荧光谱测量显示量子阱结构对电子空穴有强的限制效应,在相同温度下,量子阱样品的荧光峰峰位相对PbSe体材料有一定的蓝移.发现量子阱样品的荧光强度同温度有关,温度从150 K上升到230 K时,荧光强度逐渐增大,温度继续升高,荧光强度缓慢下降,但在高于室温时,仍能观察到较强的荧光发射,这说明该量子阱结构材料具有应用于室温工作的中红外 关键词： PbSe/PbSrSe多层量子阱（MQWs） 光致中红外荧光 高分辨X射线衍射（HRXRD）     

AlyGa1-yAs/AlxGa1-xAs量子阱激光器材料的光致荧光谱

测量了Al_yGa_1-yAs/Al_xGa_1-xAs量子阱激光材料的光致荧光谱.发现在室温连续激光器材料的光致荧光谱中有两个峰,而不能激射的材料中则只有一个很宽的峰.将高能峰归属于准费密能级电子的跃迁. 关键词：     

SiGe/Si多量子阱中的光致子带间吸收研究

本文论述了硅锗量子阱中的光致子带间吸收的机理,并在实验中探测SiGe/Si量子阱价带间的红外光致吸收.载流子由氩离子激光器作为光泵浦源产生,所导致的红外吸收由一个步进式傅里叶变换光谱仪来探测.在硅锗量子阱中的光致吸收有两个来源:类似单一掺杂的SiGe薄层的体吸收的自由载流子吸收,及量子阱价带的子带间吸收.实验探测了TE和TM偏振方向的吸收.TM偏振方向的吸收是由偏离布里渊带中心的载流子的跃迁所造成的.我们认为这种光致吸收技术在研究价带耦合效应及其对子带间吸收的影响是非常有效的.     

CdSe/HgSe/CdSe量子点量子阱(QDQW)晶粒的光学性质和电子结构

以CdSe纳米晶体为核,用胶体化学的方法,通过化学替代反应,获得了不同阱层或不同垒层的CdSeHgSeCdSe量子点量子阱(QDQW)晶体.紫外可见光吸收谱研究表明,通过调节QDQW中间HgSe阱层的厚度从0.9nm至0,可以调节QDQW颗粒的带隙从1.8变化至2.1eV,实现QDQW纳米晶体的剪裁.光致荧光(PL)谱研究显示,QDQW形成后,CdSeHgSe纳米颗粒表面态得到钝化,显现出发光强度加强的带边荧光峰.利用有效质量近似模型,对QDQW晶粒内部电子的1s—1s态进行了估算,估算结果总体趋势与实验数据相符 关键词： 量子点量子阱晶体 能带剪裁 加强的带边荧光峰     

InGaAs/GaAs应变量子阱的光谱研究

分别用光致发光谱（PL），光伏谱（PV）及时间分辨谱（TRPL）的方法，测量了应变InGaAs/GaAs单量子阱和多量子阱在不同温度下的光谱，发现单量子阱与多量子阱有不同的光学4性质。多量子阱PL谱发光峰和PV谱激子峰的强度与半高宽都比单量子阱的大，但单量子阱的半高宽随着温度的升高增大很快，这是由激子－声子耦合引起的，通过时间分辨谱研究发现了量子阱子能级之间的跃迁，多量子阱的发光寿命明显比单量子阱的长，我们利用形变势模型对量子阱的能带进行了计算，很好地解释了实验结果。     

GaAs/GaAlAs多量子阱的光致荧光诊断

利用光致荧光技术对GaAs/GaAlAs多量子阱质量进行了诊断。讨论了量子阱厚度涨落,铝成份涨落,各种缺陷和非故意掺杂等对量子阱光致荧光谱的影响,并反过来,又由光致荧光谱来推断引起量子阱质量退化的原因。在一定程度上为分子束外延工艺的改进提供了依据。 关键词：     

半导体超晶格和量子阱中量子态的光谱研究

本文讨论半导体超晶格及量子阱导带和价带的量子化亚带或子能级之间的带间光跃迁过程。所讨论的光跃迁过程或光谱研究方法有吸收光谱、光电流谱、光荧光和荧光激发谱、调制光谱以及喇曼散射光谱。关于亚带能量状态将着重讨论量子阱中的激子效应和价带亚带混和及其对带间光跃迁的影响。     

半导体超晶格和量子阱中量子态的光谱研究

本文讨论半导体超晶格及量子阱导带和价带的量子化亚带或子能级之间的带间光跃迁过程。所讨论的光跃迁过程或光谱研究方法有吸收光谱、光电流谱、光荧光和荧光激发谱、调制光谱以及喇曼散射光谱。关于亚带能量状态将着重讨论量子阱中的激子效应和价带亚带混和及其对带间光跃迁的影响。     

Absorption and photoluminescence studies of the temperature dependence of exciton life time in lattice-matched and strained quantum well systems

We present systematic studies of the temperature dependence of linewidths and lifetimes of excitonic transitions in quantum wells grown by molecular beam epitaxy using both photoluminescence(PL) and optical absorption. The temperature ranged from 6K to room temperature. Samples under investigation were lattice-matched GaAs/AlGaAs and InGaAs/InAlAs, and strained InGaAs/GaAs and InGaAs/AlGaAs quantum wellssystems. In addition, the effects of well-size variations in GaAs/AlGaAs quantum wells were measured and analyzed. In all cases we were able to observe the excitonic transitions up to room temperature. By a careful fitting of the experimental data we separated the exciton transitions from band-to-band transitions. By deconvoluting the excitonic transitions we obtained the homogeneous and inhomogeneous linewidths. The homogeneous linewidths were used to calculate the exciton lifetimes as a function of temperature using the Heisenberg uncertainty principle. We found the lifetime decreases significantly with temperature and increases with increasing well size. These results are interpreted in terms of the exciton-phonon interaction and are expected to be very useful for the design of semiconductor optical devices operating at different temperatures.     

Deuterium in In-based quantum wells

The photoluminescence (PL) of high quality InGaAs/GaAs typically shows one strong intrinsic band, due to the heavy-bole free-exciton (HHFE) recombination. After sample irradiation with deuterium, two bands appear at energies below that of HHFE: a deeper band, D, due to radiative recombination at a deuterium-related site, and a shallower band, (D,X), attributed to an exciton bound to the same state. A maximum of the binding energy has been observed as a function of the well width for both states. As the indium molar fraction x increases, the strength of the D band decreases, together with its binding energy, until the band becomes no more detectable at x=0.37. The (D,X) band cannot be resolved for x ≥ 0.19. Deuterium diffusion has no beneficial effect on the PL intensity of InGaAs/GaAs quantum wells. Different is the case of InAs/GaAs quantum wells having well width below 2 monolayers. Although no strain relaxation occurs in the samples, the PL of the virgin samples is typical of structures with a high number of defects. After deuterium diffusion, the PL intensity increases by one to three orders of magnitude, depending whether non-radiative centers or thermal escape of carriers from the well rule the PL efficiency.     

Investigating the charge relaxation in semiconductor heterostructures with quantum wells by means of admittance spectroscopy

Charge is evaluated as a function of temperature, based on the analysis and nmathematical processing of experimental capacitance-voltage characteristics obtained in frequency range of 1 kHz to 1 MHz and temperature range of 320 to 10 K for samples of InGaAs/GaAs heterostructures with quantum wells (QWs) and ultrathin InAs/GaAs wetting layers specially prepared for admittance measurements. It is found that the charge in the QW determined by the apparent concentration profiles from experimental C-V characteristics monotonically increases compared with the charge in quantum wells.     

InGaAsN量子阱的光致发光谱研究(英文)

我们测量了低N组分的InGaAsN/InGaAs/GaAs量子阱材料的光致发光(PL)谱,测量温度范围从13K到300K。实验结果显示,InGaAsN的PL谱的主峰值的能量位置随温度的变化呈现出反常的S型温度依赖关系。用Varshni经验公式对实验数据进行拟合之后,发现在低温下InGaAsN量子阱中的载流子是处于局域态的。此外,我们还测量了样品在不同的温度、不同的能量位置的瞬态谱,结果进一步证实了:在低温下,InGaAsN的PL谱谱峰主要是局域态激子的复合发光占据主导地位,而且InGaAsN中的载流子局域态主要是由N等电子缺陷造成的涨落势引起的。     

Comparative study of the band-offset ratio of conventionally strained and strain-compensated InGaAs/GaAs QW lasers

In order to achieve good high temperature laser performance, it is essential to have very deep electron wells. InGaAs system on GaAs substrate suffers from poor temperature characteristics due to the electron overflow over the rather small conduction band offset. By means of the Harrison's model, we investigate the effect of the strain compensation on band alignments of InGaAs/GaAs laser system and show that strain compensation improves the band alignments of this laser system. The use of GaAsP or InGaP barrier instead of GaAs barrier results the strain-compensated laser system having better band alignment than that of the conventionally strained InGaAs. Therefore, high temperature operation has been anticipated in these laser systems with strain compensated barriers due to better electron and hole confinement as a result of the increased band offset and a more favorable band offset ratio.     

Growth of strain-compensated InGaAs/GaAsP multiple quantum wells by MOVPE

InGaAs/GaAsP strain-compensated multiple quantum wells (SCMQWs) and strained InGaAs/GaAsmultiple quantum wells (MQWs) were grown on GaAs substrates by metal organic vapor phase epitaxy(MOVPE). The results of double crystal X-ray diffraction (DCXRD) revealed that strain relief had beenpartly accommodated by the misfit dislocation formation in the strained MQW material. It led to thatthe full width half maximums (FWHMs) of superlattice satellite peaks are broader than those of SCMQWstructures, and there was no detectable room temperature photoluminecence(RT-PL)for the strained     

The dependence of relaxation kinetics of photoluminescence from interband transitions in InGaAs/GaAs quantum wells on their distance from an interface with Au

Kinetics of relaxation of photoluminescence from the interband transition between dimensionalquantization levels of electrons and holes in InGaAs/GaAs quantum wells as a function of their distance to an interface with Au is investigated. It is demonstrated that the photoluminescence relaxation time becomes several times shorter when the distance from the quantum well to the interface decreases to several tens of nanometers. It is established that the photoluminescence relaxation time at a shorter wavelength corresponding to a recombination transition between excited states of electrons and holes in the quantum well is shorter than that at a longer wavelength corresponding to a recombination transition between the ground states. A theoretical model explaining this phenomenon is proposed.     

Enhanced photoluminescence intensity of 1.3-μm multi-layer InAs/InGaAs dots-in-well structure using the high growth temperature spacer layer step

The effects of growth temperature of the GaAs spacer layers (SPLs) on the photoluminescence (PL) efficiency of multi-layer GaAs-based 1.3-μm InAs/InGaAs dots-in-well (DWELL) structures have been investigated. It is found that the PL intensity of DWELLs is enhanced by incorporating a high growth temperature step for GaAs SPLs. This improved PL efficiency could be understood in term of reducing the non-radiative recombination centers. An extremely low continuous-wave room-temperature threshold current density of 35 A/cm² is achieved for an as-cleaved 5-layer device with emission at 1.31 μm by using this growth technique.     

金辅助催化方法制备GaAs和GaAs/InGaAs纳米线结构的形貌表征及生长机理研究

利用金（Au）辅助催化的方法,通过金属有机化学气相沉积技术制备了GaAs纳米线及GaAs/InGaAs纳米线异质结构.通过对扫描电子显微镜（SEM）测试结果分析,发现温度会改变纳米线的生长机理,进而影响形貌特征.在GaAs纳米线的基础上制备了高质量的纳米线轴、径向异质结构,并对生长机理进行分析.SEM测试显示,GaAs/InGaAs异质结构呈现明显的“柱状”形貌与衬底垂直,InGaAs与GaAs段之间的界面清晰可见.通过X射线能谱对异质结样品进行了线分析,结果表明在GaAs/InGaAs轴向纳米线异质结构样品中,未发现明显的径向生长.从生长机理出发分析了在GaAs/InGaAs径向纳米线结构制备过程中伴随有少许轴向生长的现象.     

A study of GaInP/GaAs interfaces: metallurgical coupling of successive quantum wells

We present a study of GaInP/GaAs interfaces by means of photoluminescence (PL) of multi quantum wells (MQW), embedded in GaInP, or asymmetric structures having an AlGaAs barrier GaInP/GaAs/AlGaAs. The PL energies of quantum wells were compared with calculations based on the transfer matrix envelope function approximation, well suited for asymmetric structures. GaInP/GaAs/AlGaAs MQW structures (GaInP grown first) are in reasonably good agreement with calculations. Reverse ones, AlGaAs/GaAs/GaInP, present a lower PL energy than calculated. But the agreement with theory is recovered on single quantum well samples, or in MQW when the GaInP thickness is increased up to 100 nm. We interpret this phenomenon as a diffusion of arsenic atoms from the next GaAs well through the GaInP barrier. Arsenic atoms exchange with phosphorus atoms at the GaInP-on-GaAs interface of the former well, leading to a small gap strained InGaAs region responsible for the lowering of PL energies.