角度调谐滤光片偏振控制的间隔层折射率寻优算法

斜入射滤光片的S偏振和P偏振的中心波长会发生分离,而通过调整间隔层的有效折射率,可使有角度入射滤光片两个偏振分量的中心波长相重合。由相位关系分析着手,利用多层膜的特征矩阵关系式,推导出间隔层中间折射率和P偏振及S偏振的中心波长的两个隐函数表达式,由此可快速解出所寻找的中间折射率及对应的中心波长数值。单腔和三腔的两个具体实例的模拟计算表明:采用此算法,对于调谐到一特定角度入射的滤光片能很快地求出准确的中间折射率数值,应用此中间折射率即可使P偏振和S偏振的中心波长很好地重合。入射角从0°到30°的实例偏差分析表明此算法的精确度高,这对于减少偏振分量特性之间的分离以及滤光片的宽角度调谐有着良好的意义。     

Design Method for Optical Waveguide Filters Having Corrugation Structures by Corrugation Width Modulation

A method to design a corrugated optical waveguide filter by modulating the corrugation width profile is proposed. This method is based on combined applications of the Fourier transformation and the F-matrix formalism. The method achieves the spatial profile of the corrugation width required to design a filter with any specified spectral profile of the reflection coefficient. The idea of the technique is that the spatial variation of the effective refractive index can be transformed, with the help of the F-matrix formalism, to variation of the corrugation width while maintaining a constant amplitude of the refractive index variation. Two examples are given applying the technique to the design of optical waveguide filters with reflectivity profiles of two- and four-rejection bands.     

Thin multilayers characterization by grazing X-ray reflectometry and use of Fourier transform

Grazing X-ray reflectometry is used in order to characterize thin layer stacks, in particular periodic multilayers. The specular reflectivity depends on the thickness, the complex refractive index of each layer and on the roughness of the interfaces. By a trial and error method, the experimental reflectivity curve can be fitted with a theoretical one, and so, the parameters of the stack can be obtained. This numerical method needs usually initial guess of the kind of results.Fourier transform method allows to obtain directly the values of distances between interfaces, with a good approximation depending on the maximum angular scan of the measure. It can also reveal some particularity of the multilayer, i.e. periodic multilayered structures with more than two layers per period. As an illustration of this characterization method, some examples in XUV optical domain will be shown. This method can also be used for the characterization of many kinds of multilayer stacks, in particular semi-conductor heterostructures ones, under the condition that adjacent layers have sufficient contrast index at the wavelength of the X-ray source.     

Antireflective properties of porous Si nanocolumnar structures with graded refractive index layers

We report on the antireflective characteristics of porous silicon (Si) nanocolumnar structures consisting of graded refractive index layers and carry out a rigorous coupled-wave analysis simulation. The refractive index of Si is gradually modified by a tilted angle electron beam evaporation method. For the fabricated Si nanostructure with a Gaussian index profile of 100 nm, reflectivity (R) of less than 7.5% is obtained with an average value of approximately 2.9% at the wavelength region of 400-800 nm. The experimental results are reasonably consistent with the simulated results for the design of antireflective Si nanostructures.     

Interferometric determination of the refractive indices and birefringence of some highly oriented fibres

Variable wavelength interferometric technique (VAWI) is a direct method for determining the refractive indices and birefringence of highly oriented fibres. This method uses the polarizing interference Pluta microscope with a monochromatic light from wedge interference filter that provides a continuously variable wavelength. The standard calibration process of the Pluta polarizing interference microscope is carried out and a calibration graph is obtained. The refractive indices and birefringence of PEN, CONEX and TECHNORA were measured over the visible range of the spectrum and the constants for the Cauchy's dispersion formula were determined. The oscillation and dispersion energies were calculated from the measurements of the refractive index.     

Optical properties of Cantor nanostructures made from porous silicon: A sensing application

The fabrication and characterization of pSi based triadic Cantor multilayer structures is reported. Transfer matrix method was used to calculate the corresponding reflectivity spectrum and was compared with the experimental data. A good agreement between the theoretical and experimental reflectivity spectra is reported for the wavelengths corresponding to the non-absorbing region for silicon. The reduction in the quality of the transmission modes has been attributed to the dispersion and backscattering from the interfaces of the complete structure. As the optical response of pSi based sensor depends on the characteristics of the multilayered photonic structure, a comparison of sensitivity of 3rd order Cantor structure with a regular microcavity structure of similar optical thickness resulted in an optical response dependent on the choice of the refractive indices. An optimal choice of the refractive indices for the Cantor structures resulted in an increased red-shift (due to the enhancement of the refractive indices of the corresponding layers), after the surface modification of the photonic device. Such structures offer the possibility to improve the sensing response of the pSi-based photonic structures.     

Electrical and structural characterization of inhomogeneously doped semiconductors by infrared spectroscopy

An optical method is presented for thenon-destructive electrical and structural characterisation of multilayer structures. The presented concept yields the complex refractive index profiles within an arbitrary composed layer system by using the symmetrical transmission and the asymmetrical reflectivity caused by the optical inhomogeneity of a material. This method includes the superimposition of coherent multiple reflections within the refractive index profile as well as incoherent multiple reflections within the whole wafer. This analysis yields the spacial distribution of free carrier density profiles within the sample as well as the transitions between different crystal phases by using the least squares fit procedures. The results of the optical analysis are compared with other methods used to quantitatively determine density profiles and phase transitions such as SIMS, spreading resistance, stripping Hall and RBS.     

ZnS/ZnSe周期性迭层介质中光的反射特性分析

基于光在多层介质中的传输理论,对ZnS/ZnSe周期迭层介质结构中光的反射特性作了分析和计算,由得到的Bragg反射率与光波长的关系曲线,发现当ZnS/ZnSe的折射率改变时,其Bragg反射率曲线将发生平移,平移的方向与Δn为“正”或“负”有关.据此,提出了利用ZnS/ZnSe的光学非线性特性,可能研制出光控“开关”或“光逻辑门”,用于光计算和光互连.     

小尺度表面粗糙度与介质吸收对介质折射率测量的影响

将介质表面的小尺度粗糙度等效为覆盖在理想光滑表面上的多层等厚折射率渐变的薄膜,并通过特征矩阵计算多层等效膜模型的P光反射率与入射角的关系.将吸收介质的折射率虚部带入菲涅尔公式进行计算.运用COMSOL Mutiphysics软件对表面粗糙度和介质吸收进行建模和仿真计算.计算结果表明,小尺度表面粗糙度与介质吸收都会导致折射率测量产生误差.分别考虑以布儒斯特角和全反角作为折射率测量的手段,为了得到优于10-5的测量准确度,测量表面粗糙介质的折射率时,采用全反角进行判定;测量具有吸收效应的介质折射率时,采用布儒斯特角进行判定.     

倾斜入射薄膜滤光片偏振控制的优化算法

利用多层膜的特征矩阵关系式和有效界面法,推导出间隔层的厚度和有效折射率与两个偏振分量的中心波长差值和通带半宽差值之间的三个隐函数表达式.通过调整薄膜滤光片间隔层的厚度和有效折射率,控制两个偏振分量中心波长的相对位置.模拟计算表明:改变间隔层的有效折射率和厚度,可以调整中心波长差值和通带半宽差值,实现两个偏振分量截止偏振不分离或中心波长偏振不分离.优化算法可以实现对倾斜入射薄膜滤光片的偏振控制.     

4.48 nm正入射软X射线激光用Cr/C多层膜高反射镜的研制

针对4.48nm类镍钽软X射线激光及其应用实验,设计制备了工作于这一波长的近正入射多层膜高反射镜。选择Cr/C为制备4.48nm高反射多层膜的材料对,通过优化设计,确定了多层膜的周期、周期数以及两种材料的厚度比。模拟了多层膜非理想界面对高反射多层膜性能的影响。采用直流磁控溅射方法在超光滑硅基片上实现了200周期Cr/C多层膜高反射镜的制备。利用X射线衍射仪测量了多层膜结构,在德国BessyⅡ同步辐射上测量了在工作波长处多层膜反射率,测量的峰值反射率达7.5%。对衍射仪测量的掠入射反射曲线和同步辐射测量的反射率曲线分别进行拟合,得到的粗糙度和厚度比的结果相近。测试结果表明,所制备的Cr/C多层膜样品结构良好,在指定工作波长处有较高的反射峰,达到了设计要求。     

Reflectometry of absorbing uniaxial multilayer media

A novel reflection technique for index determination of isotropic or uniaxial absorbing multilayer on a lower refractive index substrate is presented. Above the angle of total reflection at the layer-substrate interface characteristic minima occur in the reflectivity which are suitable for high accuracy fitting of the layer parameters. The 4 × 4 transfer matrices of uniaxial multilayer are given for computer evaluation. Refraction index determination of a poled polymeric layer on an indium-tin-oxide coated glass is demonstrated. Advantages of the new method are outlined.     

High Flattened Comb Filter with Precise Channel Spacing Based on Linearly Chirped Fiber Bragg Grating and Phase Compensation

Abstract

A novel approach to implement high flattened comb filters with precise channel spacing based on DC phase compensation is proposed. Channel wavelength error and peak reflectivity variation are discussed and calculated. A phase compensation method by simply changing the DC refractive index is proposed. Fiber Bragg gratings with different DC phase shifts are fabricated, which indicates that an arbitrary DC phase shift can be introduced precisely. A high flattened comb filter with precise 50-GHz channel spacing is realized with the help of a micrometer-precision translation stage. Then the peak reflectivity variation with and without phase compensation for different chirp coefficients is researched.     

硅表面抗反射纳米周期阵列结构的纳米压印制备与性能研究

硅表面固有的菲涅耳反射, 使得硅基半导体光电器件(如太阳能电池、红外探测器)表面有30%以上的入射光因反射而损失掉, 严重影响着器件的光电转换效率. 寻找一种方法降低硅基表面的反射率, 进而提高器件的效率成为近年来研究的重点.本文基于纳米压印光刻技术, 在2 英寸单晶硅表面制备出周期530 nm, 高240 nm的二维六角截顶抛面纳米柱阵列结构. 反射率的测试表明, 当入射光角度为8° 时, 有纳米结构的硅片相对于无纳米 结构的硅片来讲, 在400到2500 nm波长范围内的反射率有很明显的降低, 其中, 800到2000 nm波段的反射率都小于10%, 在波长1360 nm附近的反射率由31%降低为零. 结合等效介质理论和严格耦合波理论对结果进行了分析和验证. 关键词： 纳米压印 截顶抛物面阵列 抗反射 等效介质理论     

Design and Fabrication of Chirped Mirror

Chirped mirrors （CMs） are designed and manufactured. The optimized CM provides a group delay dispersion （ODD） of around -60fs^2 and average reflectivity of 99.4% with bandwidth 200 nm at a central wavelength of 800nm. The CM structure consists of 52 layers of alternating high refractive index Ta2O5 and low refractive index SiO2. Measurement results show that the control of CM manufacturing accuracy can meet our requirement through time control with ion beam sputtering. Because the ODD of CMs is highly sensitive to small discrepancies between the layer thickness of calculated design and those of the manufactured mirror, we analyze the error sources which result in thickness errors and refractive index inhomogeneities in film manufacture.     

拉锥型啁啾光纤光栅滤波器的研究

本文主要对拉锥型啁啾光纤光栅滤波器进行详细的理论分析和实验研究. 结合传输矩阵法, 谐振理论和耦合模理论, 深入细致地分析了啁啾光纤光栅自身参数 (光栅长度, 折射率调制幅度, 啁啾系数), 拉锥参数和锥区损耗对拉锥型啁啾光纤光栅滤波器透射谱的影响, 并研究拉锥对啁啾光纤光栅各波长反射率影响. 在此基础之上进行相应的数值仿真及实验验证, 数值仿真与实验结果基本一致. 关键词： 光栅拉锥 啁啾光栅 传输矩阵法 滤波器     

基于等离子体增强化学气相沉积技术的光电子器件多层抗反膜的设计和制作

针对光电子器件端面抗反镀膜的要求,研究了基于等离子体增强化学气相沉积(PECVD)技术的多层抗反膜的设计和制作.首先,对影响SiN_x折射率的因素进行了实验研究,确定了具有大折射率差的SiO₂/SiN_x材料的PECVD沉积条件.根据理论计算分析,设计了四层SiO₂/SiN_x抗反膜结构,能够在70 nm的波长范围内实现低于10^-4的反射率     

Optimized procedure for the manufacture of thin film filter prototypes

A simple procedure to minimize the number of trial-and-error high-vacuum depositions required to manufacture a thin film filter prototype is presented. For optical coatings obtained by thermal evaporation, the main difficulty is the accurate characterization (refractive index and thickness) of the layers under the actual deposition conditions. The proposed method is able to describe dispersion as well as inhomogeneity in the refractive index of the component layers. It requires only a suitable substrate holder attachment and standard thin film measurement equipment: a spectrophotometer and a three wavelength ellipsometer. The technique is illustrated with the development of an anti-reflection (AR) coating for glass which also includes an inhomogeneous layer.     

周期结构薄膜在折射率色散下反射区特性研究

周期性结构是光学薄膜设计的基本物理模型,给出了反射区中心波长的一般性条件,研究了在膜层材料存在折射率色散情况下,等厚周期结构和非等厚周期结构的薄膜反射区中心波长与带宽特性.研究结果表明:在等厚和非等厚周期结构中,考虑膜层材料折射率色散与忽略色散情况相比,中心波长向长波方向移动,反射级次与相对波数的线性关系偏离;在薄膜光学厚度一定的非等厚周期结构中,高折射率层光学厚度大于低折射率层时,反射级次与相对波数的线性关系偏离度高;非等厚周期结构薄膜的带宽在低反射级次上小于等厚周期结构,同时膜层的色散对反射带宽影响不大.     

Gradient-index narrow-bandpass filter fabricated with glancing-angle deposition

Glancing-angle deposition (GLAD) is a fabrication method capable of producing thin films with engineered nanoscale porosity variations. GLAD can be used to create optical thin-film interference filters from a single source material by modification of the film refractive index through control of film porosity. We present the effects of introducing a layer of constant low density into the center of a rugate thin-film filter fabricated with the GLAD technique. A rugate filter is characterized by a sinusoidal refractive-index profile. Embedding a layer of constant refractive index, with a thickness equal to one period of the rugate index variation, causes a narrow bandpass to appear within the filter's larger stop band. Transmittance measurements of such a gradient-index narrow-bandpass filter, formed with titanium dioxide, revealed an 83% transmittance peak at a vacuum wavelength of 522 nm, near the center of the stop band, with a FWHM bandwidth of 15 nm.