UPS and XPS studies of the chemisorption of O2, H2 AND H2O on reduced and stoichiometric SrTiO3(111) surfaces; The effects of illumination

About one monolayer of Ti³⁺ species is detectable at the surface of reduced SrTiO₃(111) single crystals by XPS and UPS. O₂, H₂ and H₂O have been adsorbed in the dark and the decrease on the concentration of the Ti³⁺ species has been monitored as a function of the gas exposures. Subsequent band gap illumination partially restores the Ti³⁺ initial concentration in the cases of O₂ and H₂ exposures but not in the case of H₂O. The Ti³⁺ photogeneration on the oxygen covered surface is associated with oxygen photodesorption as indicated by XPS and UPS. UPS measurements give evidence for surface hydroxylation resulting from water and hydrogen adsorption. The activity of the stoichiometric SrTiO₃(111) crystal face for O₂ and H₂ adsorption is very low when compared with the reduced SrTiO₃ samples.     

Penning ionization electron spectroscopy of H2O,D2O,H2S and SO2

Electron energy peak shifts and peak shapes were determined in the ionization of H₂O, D₂O, H₂S and SO₂ by Ne(³P₂) and He(2¹S, 2³S) metastable atoms. The shifts are large, especially in ionization of H₂O and D₂O into the ionic ground state and are probably mostly due to chemical interaction during the collision.In a previous paper the electron energy distribution curves for ionization of CO, HCl, HBr, N₂O, NO₂, CO₂, COS and CS₂ by helium, neon and argon metastables and the characteristics of this ionization were described¹. In this paper the series of triatomic molecules was extended to the molecules H₂O, D₂O, H₂S and SO₂. Because all these molecules have considerable dipole moments it could be expected that the peak shifts might be enhanced as compared with other triatomic molecules.     

Interaction of PH3 coadsorbed with H2, D2, O2 and H2O on Rh(100)

The coadsorption of PH₃ with H₂, D₂, O₂ and H₂O on Rh(100) has been studied using temperature programmed desorption (TPD), Auger electron spectroscopy (AES) and low energy electron diffraction (LEED). The adsorption and molecular desorption of PH₃ is not affected by preadsorbed H₂, D₂ and O₂. Preadsorbed PH₃ blocks H₂ desorption sites while postdosed PH₃ displaces H₂ (D₂₁) from the Rh(100). When D₂ and PH₃ are coadsorbed, no D appears in desorbed phosphine. Preadsorbed O₂ reduces the amount of H₂ desorption (from PH₃ decomposition) and increases the H₂ desorption temperature. There is also some reaction between O(a) and H(a) to form water. Preexposure to H₂O decreases the extent of PH₃ adsorption and of PH₃ decomposition.     

Oxidation of Al single crystal surfaces by exposure to O2 and H2O

The initial stages of oxidation of Al single crystals are studied by soft X-ray photoemission spectroscopy at photon energies hv = 30 eV and 111.13 eV using synchroton radiation. Both the valence band region and the substrate Al 2p core levels are measured with high resolution to clarify the differences between (a) the geometrical effects at different surfaces, (100) and (110), and (b) between the oxidation by pure O₂ and H₂O. There is a well established but not very dramatic differences in the O 2p induced band between the two crystal surfaces when oxidizing with O₂. The Al 2p spectra reveal an initial state of oxidation with less O atoms per Al atom than in Al₂O₃ate disappears at higher exposures with O₂ while it is absent when oxidizing with H₂O. Only about 1/4 of the exposure with H₂O is needed to obtain the same coverage as with O₂.     

Adsorption and decomposition of H2O on a K-covered Pt(111) surface

The adsorption of H₂O on clean and K-covered Pt(111) was investigated by utilizing Auger, X-ray and ultra-violet photoemission spectroscopies. The adsorption on Pt(111) at 100–150 K was purely molecular (ice formation) in agreement with previous work. No dissociation of this adsorbed H₂O was noted on heating to higher temperatures. On the other hand, adsorption of H₂O on Pt(111) + K leads to dissociation and to the formation of OH species which were characterized by a work function increase, an O 1s binding energy of 530.9 eV and UPS peaks at 4.7 and 8.7 eV below the Fermi level. The amount of OH formed was proportional to the K coverage for θ_K > 0.06 whereas no OH could be detected for θ? 0.06. Dissociation of H₂O occurred already at T = 100 K, with a sequential appearance of O 1s peaks at 531 and 533 eV representing OH and adsorbed H₂O, respectively. At room temperature and above only the OH species was observed. Annealing of the surface covered with coadsorbed K/OH indicated the high stability of this OH species which could be detected spectroscopically up to 570 K. The adsorption energy of H₂O coadsorbed with K and OH on Pt(111) is increased relative to that of H₂O on Pt. The work function due to this adsorbed H₂O increases whereas it decreases for H₂O on Pt(111). The energy shifts of valence and O1s core levels of H₂O on Pt + K as deduced from a comparison of gas phase and adsorbate spectra are 2.8–4.2 eV compared to ≈ 1.3–2.3 eV for H₂O on Pt (111). This increased relaxation energy shift suggests a charge transfer screening process for H₂O on Pt + K possibly involving the unoccupied 4a₁ orbital of H₂O. The occurrence of this mode of screening would be consistent with the higher adsorption energy of H₂O on Pt + K and with its high propensity to dissociate into OH and H.     

SiO production from Si(100) and (111) surfaces by reaction with O2 beams

Desorption kinetics of SiO in the reaction of O₂ with Si(100) and (111) surfaces were investigated at surface temperatures between 1000 and 1300 K by using a pulsed molecular beam technique. The gaseous SiO product was detected by a mass spectrometer above 1000 K. At temperatures lower than 1050 K, the SiO signal appeared with an induction time after the O₂ beam irradiation onto the surface, which means that the desorption occurs via sequential steps. The rate constants for two steps were obtained by a computer simulation of the relaxation waveforms of the SiO signal. The values obtained are in the same range as those of D'Evelyn et al. However, they are one order of magnitude larger than those of Yu and Eldridge. The activation energies for the two steps are 2.8 and 2.4 eV for both Si(100) and (111) surfaces. No significant difference between the two kinds of surfaces was found from these values. However, many etch pits were observed on the Si(100) surface after the reaction, while no such etch pits were formed on the Si(111) surface. The planes of the etch pits formed on the (100) surfaces consisted mostly of the {111} facets.     

O2、 CO2和H2O在UN(001)表面化学吸附的密度泛函理论研究

采用广义梯度近似GGA,修正Perdew-Burke-Ernzerhof交换-关联泛函,以及周期性切片模型对O₂、CO₂和H₂O在UN(001)表面的化学吸附行为进行非自旋极化水平的密度泛函理论计算. 在四个对称性化学位置条件下,对化学吸附能与分子和UN(001)表面之间距离的关系曲线进行优化. 结果表明O₂、CO₂和H₂O分子的最稳定吸附位置分别为桥式平行、空心平行和桥式H     

Spectroscopically determined potential energy surfaces of the H2O, H2O, and H2O isotopologues of water

Adiabatic potential energy surfaces (PESs) for three major isotopologues of water, H₂¹⁶O, H₂¹⁷O, and H₂¹⁸O, are constructed by fitting to observed vibration-rotation energy levels of the system using the nuclear motion program DVR3D employing an exact kinetic energy operator. Extensive tests show that the mass-dependent ab initio surfaces due to Polyansky et al. [O.L. Polyansky, A.G. Császár, S.V. Shirin, N.F. Zobov, P. Barletta, J. Tennyson, D.W. Schwenke, P.J. Knowles, Science 299 (2003) 539-542.] provide an excellent starting point for the fits. The refinements are performed using a mass-independent morphing function, which smoothly distorts the original adiabatic ab initio PESs. The best overall fit is based on 1788 experimental energy levels with the rotational quantum number J = 0, 2, and 5. It reproduces these levels with a standard deviation of 0.079 cm⁻¹ and gives, when explicit allowance is made for nonadiabatic rotational effects, excellent predictions for levels up to J = 40. Theoretical linelists for all three isotopologues of water involved in the PES construction were calculated up to 26 000 cm⁻¹ with energy levels up to J = 10. These linelists should make an excellent starting point for spectroscopic modelling and analysis.     

The adsorption of CO,H2, H2, CO2 and H2O on carburized and graphitized Ni(110)

A study of the adsorption/desorption behavior of CO, H₂O, CO₂ and H₂ on Ni(110)(4 × 5)-C and Ni(110)-graphite was made in order to assess the importance of desorption as a rate-limiting step for the decomposition of formic acid and to identify available reaction channels for the decomposition. The carbide surface adsorbed CO and H₂O in amounts comparable to the clean surface, whereas this surface, unlike clean Ni(110), did not appreciably adsorb H₂. The binding energy of CO on the carbide was coverage sensitive, decreasing from 21 to 12 $\text{kcal}\text{mol}$ as the CO coverage approached 1.1 × 10¹⁵ molecules cm^?2 at 200K. The initial sticking probability and maximum coverage of CO on the carbide surface were close to that observed for clean Ni(110). The amount of H₂, CO, CO₂ and H₂O adsorbed on the graphitized surface was insignificant relative to the clean surface. The kinetics of adsorption/desorption of the states observed are discussed.     

Total cross sections for scattering of electrons from O2, H2O, H2, O3, CO and CO2 at 100－2000eV

A complex optical model potential rewritten by the concept of bonded atom, which considers the overlap of electron clouds, is employed to calculate the total cross sections for electron scattering from several simple molecules (O_2, H_2O, H_2, O_3, CO and CO_2) consisting of C, H and O atoms in an incident energy range of 100－2000eV by the use of the additivity rule at Hartree－Fock level. In the study, the complex optical potential composed of static, exchange, correlation polarization plus absorption contributions firstly uses the bonded-atom concept. The quantitative molecular total cross section results are compared with experimental data and with the other calculations wherever available and good agreement is obtained. It is shown that the additivity rule along with the complex optical model potential rewritten by the concept of bonded atom can be used successfully to calculate the total cross section of electron－molecule scattering above 100eV, whereas the rule together with the complex optical model potential not rewritten by the concept of bonded atom is only successfully used above 300－500eV. So, the introduction of the bonded-atom concept in the complex optical potential can improve the accuracy of the total cross section calculations.     

Ion survival probabilities for 3 keV Ar+ scattering from La,Yb, and chemisorbed H2, O2, and H2O on La surfaces

TOF spectra of scattered primary and surface recoiled neutrals and ions for 3 keV Ar⁺ bombardment of clean La and Yb and H₂, O₂, and H₂O saturated La surfaces are presented. The spectra are analyzed in terms of single (SS) and multiple (MS) scattering of the primary ions and surface recoiling (SR) of adsorbate atoms. Measurement of spectra of neutrals + ions and neutrals alone allows determination of scattered ion fractions Y. The Y values for the SS event are high for clean La (37%) and lower for adsorbate covered La (32% for H₂, 13% for O₂, and 8% for H₂O); Yb exhibits a similar behavior, i.e. 16% for clean Yb and 5% for O₂ + H₂O covered Yb. Photon emission accompanying the scattering collision has been observed from clean La and Yb and adsorbate covered La. A preferential inelastic energy loss of 15 ± 3 eV for the SS event has been observed for scattered neutrals as opposed to ions for La and H₂ saturated La at 135°. These results are interpreted within the models for Auger and resonant electronic charge exchange transitions during approach or departure of an ion with a surface and the electron promotions occuring during close atomic encounters where the electron shells are interpenetrating.     

The interaction of H2S with Si(111) 7 × 7 surfaces by energy loss and Auger electron spectroscopies

Low energy electron loss spectroscopy (ELS) and Auger electron spectroscopy (AES) have been applied for the studies of the interaction of H₂S molecules with Si(111)7 × 7 surfaces. The observations are consistent with the interpretation that the room temperature non-dissociative adsorption state of H₂S molecules changes substantially after annealing at 550°C, resulting in the desorption of hydrogen and the covalent bond formation between silicon and sulfur atoms. The silicon disulfide films formed on Si(111) surfaces have been identified by the characteristic loss peaks in comparison with those of silicon dioxide.     

RHEED and Auger study of the MoO3(010) surface interaction with H2S/H2 mixture and pure H2S

Pure single crystals of MoO₃ were carefully grown by physical vapor transport. The initial stages of the interaction of H₂S with a MoO₃ (010) surface were studied by RHEED and AES at low pressure p <133 Pa and at T < 700 K. Three main stages were found: (a) The formation of either a completely disordered sulphur adiayer (with pure H₂S) or a superstructure MoO₃(010)-[2 × 1]S (with H₂S/H₂). (b) A reduction of MoO₃ producing oriented three-dimensional MoO₂ islands, (c) An epitaxial overgrowth of MoS₂ from the MoO₂ three-dimensional crystallites.     

Nitrogen release during reaction of coal char with O2, CO2, and H2O

The chemistry of char-N release and conversion to nitrogen-containing products has been probed by studying its release and reactions with O₂, CO₂, and H₂O. The experiments were performed in a fixed bed flow reactor at pressures of up to 1.0 MPa. The results show that the major nitrogen-containing products observed depend on the reactant gas; with O₂, NO, and N₂ being the major species observed. Char-N reaction with CO₂ produces N₂ with very high selectivity over a broad range of pressures and CO₂ concentrations, and reaction with H₂O gives rise to HCN, NH₃, and N₂. Observed distributions of nitrogen-containing products are little affected by pressure when O₂ and CO₂ are the reactant gases, but increasing pressures in the reaction with H₂O results in the formation of increasing proportions of NH₃. Formation of NH₃ is also promoted by increasing concentrations of H₂O in the feed gas. The results suggest that NO and HCN are primary products when O₂ and H₂O, respectively, are used as the reactant gases, and that the other observed products arise from interactions of these primary products with the char surface.     

Leed and thermal desorption studies of small molecules (H2, O2, CO,CO2, NO,C2H4, C2H2 AND C) chemisorbed on the rhodium (111) and (100) surfaces

The chemisorption of H₂, O₂, CO, CO₂, NO, C₂H₄, C₂H₂ and C has been studied on the clean Rh(111) and (100) surfaces. LEED, AES and thermal desorption were used to determine the surface structures, disordering and desorption temperatures, displacement and decomposition characteristics for each species. All of the molecules studied readily chemisorbed on both surfaces. A large variety of ordered structures was observed, especially on the (111) surface. The disordering temperatures of most ordered surface structures on the (111) surface were below 100°C. It was necessary to adsorb the gases at 25° C or below in order to obtain well-ordered surface structures. Chemisorbed oxygen was readily removed from the surface by H₂ or CO gas at crystal temperatures above 50°C. CO₂ appears to dissociate to CO upon adsorption on both rhodium surfaces as indicated by the identical ordering and desorption characteristics of these two molecules. C₂H₄ and C₂H₂ also had very similar ordering and desorption characteristics and it is likely that the adsorbed species formed by both molecules is the same. Decomposition of ethylene produced a sequence of ordered carbon surface structures on the (111) face as a result of a bulk-surface carbon equilibrium. The chemisorption properties of rhodium appear to be generally similar to those of iridium, nickel and palladium.     

GROWTH MODEL OF TEXTURED DIAMOND (111) FILM IN CH4/O2/H2 ATMOSPHERE

Partially oriented and highly textured diamond films on Si( 111 ) substrates were achieved by hot-filament chemical vapor deposition(HFCVD). High nucleation density greater than 5×10⁸cm^-2 was realiged in 3 min by near-surface glow discharge. The os-grown films were characterized by scanning electron microscopy(SEM), X-ray diffraction(XRD) and Raman spectroscopy. It was found that by adding a small amount of oxygen to the mixture of CH₄/H₂, the appearance of facet(111) was well controlled, and the secondary nucleation on the facet(111) was suppressed greatly. Growth feature of homoepitaxy on diamond (111) surface was demonstrated to be in Stranski-Krastanov model by SEM.     

Interaction of NO and O2 with Pd(111) surfaces. II

At least three different types of oxygen atoms may be present in the surface region of Pd(111) which may be distinguished by their thermal, chemical, structural and electronic properties. Exposure to O₂ at low temperatures causes the formation of 2 × 2 and $\text{3}\text{×}\text{3}\text{R30°}$ structures from chemisorbed oxygen, the latter being probably stabilized by small amounts of H_ab or CO_ab on the surface. The initial sticking coefficient was estimated to be about s₀ ≈ 0.3, the adsorption energy ~55 kcal/mole. The photoelectron spectrum exhibits an additional maximum at 5 eV below E_F. During thermal desorption dissolution of oxygen in the bulk strongly competes; on the other hand absorbed oxygen may diffuse to the surface giving rise to high temperature peaks in the flash desorption spectra. High temperature (~1000 K) treatment of the sample with O₂ causes the formation of a more tightly bound surface species also characterized by a 2 × 2 LEED pattern which is chemically rather stable and which is considered to be a transition state to PdO. The latter compound is only formed by interaction with NO at about 1000 K via the reaction $\text{Pd}\text{+}\text{NO}\text{→}\text{PdO}\text{+}\text{1}\text{2N}{}_2$ which offers a rather high “virtual” oxygen pressure. This reaction leads to drastic changes of the photoelectron spectrum and is also identified within the LEED pattern.     

Electron energy-loss spectroscopy of NO,O2 and NH3 on Si (1 1 1) surfaces

Electron energy-loss spectroscopy has been applied to the study of Si (1 1 1) surfaces covered with NO and NH₃. It is proposed that these gases are absorbed in molecular states at room temperature. The similarity of the loss spectra for NO and O₂ strongly favors with our recent proposal that O₂ is adsorbed as molecules at the initial stage of the oxidation.     

Adsorption studies on a stepped Pt(111) surface: O2, CO,C2H4, C2N2

A comparative study of the adsorption of several gases on a Pt(S)-[9(111) × (111)] surface was performed using LEED, Auger spectroscopy, flash desorption mass spectrometry and work function changes as surface sensitive techniques. Adsorption was found to be generally less ordered on the stepped surface than on the corresponding flat surface with the exception of the oxygen, where r well ordered overlayer in registry over many terraces was found. Absolute coverages were determined from flash desorption experiments for O₂, CO and C₂N₂. Similar values were obtained as on flat Pt surfaces. Two different surface species seem to be formed upon adsorption of C₂H₄ depending on the adsorption temperature. Contrary to reports from Pt(111) surfaces conversion between the two surface species is heavily restricted on the stepped surface. Work function changes revealed nonlinear adsorbate effects where the adsorbate is electronegative with respect to the substrate. Various adsorption models are discussed in the light of complementary experimental evidence. The results of this study are compared with data available from flat Pt surfaces and possible influences of steps are discussed. No general trends, however, emerge from this comparison and it seems that eventual influences of steps have to be considered individually for every adsorbate.     

Microwave linewidths of C2H4O perturbed by H2, N2, O2 and CO2

Microwave linewidths of C₂H₄O (κ = -0.41) broadened by H₂, N₂, O₂, and CO₂ and considering dipole-quadrupole interactions have been calculated using the Mehrotra-Boggs theory (1977). This theory accounts satisfactorily for observed linewidths