Subpicosecond excimer laser ablation of thick gold films of ultra-fine particles generated by a gas deposition technique

The results of UV laser ablation of gold nanoparticle films on glass substrates using femtosecond pulses are presented. Films of ultra-fine gold particles were prepared by an inert gas evaporation and deposition technique, resulting in a well-defined log-normal particle size distribution of (7ǃ) nm. The pulse length of the laser was 500 fs at a wavelength of 248 nm. Ablation thresholds, ablation rates at different fluxes, and the morphology of the ablated structures are presented. For the nanoparticle films studied an ablation rate five times higher than that of gold films prepared by the conventional evaporation technique was found. The ablation thresholds and rates are supposed to depend on the particle size and also on the evaporation pressure. These results are explained by taking into account the energy transport properties of nanocrystalline and conventionally evaporated gold films.     

Shock waves generated by confined XeCl excimer laser ablation of polyimide

We investigate shock waves generated by excimer laser ablation of sheet polyimide confined in water. The velocities of the ablation-induced pressure waves in the water are determined by an optical probe system. We measure supersonic velocities up to a few hundred microns away from the irradiated surface, indicating the formation of shock waves. We use these velocities to calculate the corresponding pressures. They are already in the kbar range at fluences comparable to the threshold of ablation. The shock pressure varies as the square root of the incident laser fluence, a behavior that is explained by the rapid heating of the confined gaseous products of ablation.The initially planar shock waves propagate, become spherical, and decay within a few hundred microns in the surrounding water to acoustic waves. During spherical expansion the shock pressure drops as the inverse of the square of the propagation distance.The shock waves generated may be relevant in explaining photoacoustic damage observed in biological tissue after excimer-ablation at corresponding irradiances. They may also be important in material processing applications of excimer laser ablation of polymers as they can lead to plastic deformation.     

Wavelength dependent mass-specific optical absorption coefficients of laser generated coal aerosols determined from multi-wavelength photoacoustic measurements

Applied Physics A - Mass-specific optical absorption coefficients (MSOAC) of aerosols generated from samples of coal used for residential purposes by UV laser ablation are measured as a function of...     

Femtosecond uv excimer laser ablation

Experiments on the ablation of polymethylmethacrylate (PMMA) with 300 fs uv excimer laser pulses at 248 nm are reported for the first time. With these ultrashort pulses, ablation can be done at fluences up to five times lower than the threshold fluence for 16 ns ablation of PMMA, and the surface morphology is improved, also for several other materials. A model for ablation is proposed, assuming a non-constant absorption coefficient _eff depending on the degree of incubation of the irradiated material and the intensity of the incoming excimer laser pulse. The agreement between our model and our experimental observations is excellent for 16 ns excimer laser pulses, also predicting perfectly the shape of a pulse transmitted through a thin PMMA sample under high fluence irradiation. Qualitative agreement for 300 fs excimer laser pulses is obtained so far.     

Underwater excimer laser ablation of polymers

In this paper, we study the photoablation kinetic of poly (ethylene terephthalate) (PET), polycarbonate (PC), polyimide (PI) and polystyrene (PS) in both air and water. Compared to the results obtained in air, we highlight the decrease of the ablation threshold (AT) of polyesters in contact with water as a function of polymer chemical structure. In order to check the expected hydrolytic reaction of polyesters near the ablation threshold, the chemical modification of the polymer surfaces, as well the composition of the ablation products, were investigated after irradiation near the fluence of ablation threshold in air (air-F _t ) by X-ray photoelectron spectroscopy (XPS) and confocal Raman microspectroscopy. The morphology of polymers obtained by underwater irradiation and near the air-F _t was also examined using scanning electron microscopy (SEM). To understand the process and its dynamics in contact with water, we consider the model of temperature at the polymer-water interface based on the semi-analytical solution of the transit heat-diffusion equation.     

Projection ablation of glass-based single and arrayed microstructures using excimer laser

Ablation of single and arrayed microstructures using an excimer laser is studied. The single feature microstructures are fabricated for evaluating the ablation mechanism, threshold fluence, and associated material removing (ablation) rate. The morphology changes during ablation are investigated with the focus on the formation of the ablation defects, debris or recast. The possibility of removing these defects is also evaluated and demonstrated. The present study concentrates on the borosilicate glass, although ablation of polyimide and silicon are performed and discussed for comparison. Polyimide and silicon are the most popular polymer or semiconductor material used in the electronics industry. The arrayed microstructures are ablated to demonstrate the fact that, by repetition of a simple-patterned mask associated with synchronized laser pulses and substrate movement, arrayed and more complex structures can be cost-effectively manufactured. The potential applications of these arrayed microstructures are discussed and illustrated. A low-cost replication technique that uses the arrayed microstructure presently machined as the forming mold for making electroforming nickel microneedles is specifically presented. Finally, the potential areas of using excimer laser in micromachining of glass-based structures for future research are also briefly covered.     

Evaluation of laser ablation threshold in polymer samples using pulsed photoacoustic technique

The acoustic signals generated in solids due to interaction with pulsed laser beam is used to determine the ablation threshold of bulk polymer samples of teflon (polytetrafluoroethylene) and nylon under the irradiation from a Q-switched Nd:YAG laser at 1.06μm wavelength. A suitably designed piezoelectric transducer is employed for the detection of photoacoustic (PA) signals generated in this process. It has been observed that an abrupt increase in the amplitude of the PA signal occurs at the ablation threshold. Also there exist distinct values for the threshold corresponding to different mechanisms operative in producing damages like surface morphology, bond breaking and melting processes at different laser energy densities.     

Micro-humps formed in excimer laser ablation of polyimide using mask projection system

In this paper we report the results of an investigation into surface deformation caused by thermal effects during excimer laser ablation of polyimide. Obvious surface deformation around hole entrances was observed during the experiment. The surface topology and cross section of the ablated holes were analyzed using topography measurement tool and scanning electron microscopy. It was shown that a micro-hump of 17 to 150 nm in height and 1 to 3 μm in width was formed above the level of the unablated surface. The deformed surface showed rough and color-changed characteristics. An optical diffraction model was employed to explain the cause of this kind of deformation. It was found that the ablating and heating by a near- and under-threshold laser beam became a thermal effect in polyimide material ablation, which was contributed to by a diffraction effect of the optical projection system. Received: 9 October 2001 / Accepted: 17 October 2001 / Published online: 23 January 2002     

Influence of laser fluence and irradiation timing of F2 laser on ablation properties of fused silica in F2-KrF excimer laser multi-wavelength excitation process

A collinear irradiation system of F₂ and KrF excimer lasers for high-quality and high-efficiency ablation of hard materials by the F₂ and KrF excimer lasers’ multi-wavelength excitation process has been developed. This system achieves well-defined micropatterning of fused silica with little thermal influence and little debris deposition. In addition, the dependence of ablation rate on various conditions such as laser fluence, irradiation timing of each laser beam, and pulse number is examined to investigate the role of the F₂ laser in this process. The multi-wavelength excitation effect is strongly affected by the irradiation timing, and an extremely high ablation rate of over 30 nm/pulse is obtained between -10 ns and 10 ns of the delay time of F₂ laser irradiation. The KrF excimer laser ablation threshold decreases and its effective absorption coefficient increases with increasing F₂ laser fluence. Moreover, the ablation rate shows a linear increase with the logarithm of KrF excimer laser fluence when the F₂ laser is simultaneously irradiated, while single KrF excimer laser ablation shows a nonlinear increase. The ablation mechanism is discussed based on these results. Received: 16 July 2001 / Accepted: 27 July 2001 / Published online: 2 October 2001     

Pulsed laser ablation of pepsin on an inorganic substrate

Pressed pepsin pellets used as targets were ablated with the pulses of the Nd-YAG laser. The activity of the pepsin thin layer, deposited on a glass substrate, was successfully detected by analyzing the proteolytic degradation areas on the polyacrylamide gel (PA-gel) copolymerized with albumin from the hen egg white (ovalbumin), used as an enzymatic substrate.     

Dopant-induced excimer laser ablation of poly(tetrafluoroethylene)

Clean ablation of poly(tetrafluoroethylene) (PTFE) at etch rates in excess of 7µm/pulse has been achieved with an excimer laser using 308nm radiation and a 25 ns pulse width. This was accomplished by doping the ultraviolet-transparent PTFE polymer with polyimide. Ablation rates were investigated as a function of fluence in the range from 1 to 12J/cm² and dopant levels up to 15% (wt/wt). Results show that at a given fluence there exists an optimum absorption coefficient _max, for which maximum ablation rates are achieved. The value of _max was found to decrease with increasing fluence. The relationship between _max and fluence was determined from existing ablation rate models and found to compare favorably with empirical results.     

High-power Lyman-alpha source generated with an ArF excimer laser

We report high-power vacuum-ultraviolet (vuv) generation at the Lyman- alpha wavelength of 121.6nm , using a simple experimental system. vuv radiation is produced through two-photon-resonant difference-frequency mixing with a tunable ArF excimer laser and a Nd:YAG-pumped dye laser. Using phase-matched mixtures of Kr and Ar at a total pressure of 650 mbar, we produced 7-microJ energies at Lyman- alpha in approximately 5ns (1.3kW) , as measured directly with a pyroelectric energy probe. Measurements indicate that higher powers are possible with system optimization. A tuning range of 0.1nm was achieved for a fixed gas mole fraction at a total pressure of 650 mbar. Qualitative agreement is found between measured tuning profiles and theoretical predictions.     

Nanosecond and femtosecond excimer laser ablation of fused silica

Ablation of fused silica using standard excimer lasers (20–30 ns pulse duration at 193, 248, and 308 nm) and a short pulse laser system (500 fs at 248 nm) is reported. Ablation rates range from several hundred nm/pulse (193 nm or fs-laser) up to about 6 m/pulse (308 nm). The performance of the ablation is found to depend not only on wavelength and pulse duration but also on the existing or laser induced surface quality (e.g., roughness) of the material. Special ablation phenomena are observed. At 193 nm and moderate fluence (3 J/cm²) ablation takes place at the rear side of a plate without affecting the front side, whereas at higher fluence normal ablation at the front side occurs. At 248 nm (standard excimer) the existence of two consecutive ablation phases is observed: smooth ablation at low rate is followed by explosive ablation at high rate. Using fs-pulses smooth shaped holes are formed during the first pulses, whereas high pulse numbers cause the development of a ripple structure in the ablation craters.The results lead to the conclusion that two different ablation mechanisms are involved: the first is based on two photon bulk absorption, the second on controlled surface damage in relation with (partially laser induced) singularity conditions at the surface.Presented at LASERION '91, June 12–14, 1991, München (Germany)     

Characterisation of combined positive-negative photoresists by excimer laser ablation

Novel photopolymers containing side groups based on o-methoxycinnamylidenemalonic acid, which undergo selective photo-crosslinking without destruction of the polymer backbone upon irradiation at 5>395 nm, have been developed for potential applications as combined positive-negative resists and multilayer resists. An XeCl excimer laser (5=308 nm, F=20 ns) was used as the irradiation source to study the ablation and microstructuring characteristics of the polymers. The materials were structured before and after crosslinking. The ablation rate was analysed by varying the fluence (0.01-10 J/cm²) and the number of pulses for a given irradiation area. Etch rates of about 2 7m per pulse at a fluence of 9 J/cm² could be achieved for all polymers. The polymer with triazene groups reveals a higher etch rate at low fluences (less than 300 mJ/cm²) than the polymer without a triazene group. The experimentally observed threshold fluence for the triazene-containing polymer is about 30 mJ/cm². Using a Schwarzschild-type reflection objective (152), microstructures with a resolution in the micron range were produced on both polymer films. The quality of the structures was evaluated by scanning electron microscopy. The results indicate that the new polymers could be used as resists for excimer laser ablation lithography.     

Dopant-induced excimer laser ablation of Poly(tetrafluoroethylene)

Poly(tetrafluoroethylene) (PTFE) does not exhibit excimer laser etching behavior at conventional, e.g., single photon absorption, emissions of 193, 248, and 308 nm, due to the lack of polymer/photon interaction. This is not surprising since the electronic transitions available to the PTFE molecule are high energy and thus require short wavelength the radiation However, by incorporating a small quantity of material into the non-absorbing fluoropolymer matrix that interacts strongly with the emitted laser energy, e.g., a dopant, successful ablation, both in terms of etch rate and structuring quality occurs. Specifically, excimer laser ablation of PTFE films containing 5, 10, and 15% polyimide (wt/wt) as a dopant was achieved at 308 nm in a fluence range of 1 to 12 J/cm². Ablation rates for the materials increased with increasing fluence and, at the polyimide levels investigated, varied inversely with dopant concentration. All compositions exhibited excellent structuring quality.     

Correction of a coherent image during KrF excimer laser ablation using a mask projection

Using masks for laser ablation has proven useful in the fabrication of prototypes for the manufacturing of micro-fluidic devices. In this work, an excimer laser was used to engrave microscopic channels on the surface of polyethylene terephthalate (PET), which showed a high absorption ratio for an excimer laser beam with a wavelength of 248 nm. When 50 μm wide rectangular microscopic channels were made using a 500×500 μm square mask and a magnification ratio of 1/10, ditch-shaped defects were found at both corners. The calculation of the laser beam intensity showed that a coherent image in the PET specimen caused the defects. An analysis based on the Fourier diffraction theory enabled the prediction of a coherent shape at the image plane, as well as a diffracted beam between the mask and the image plane. The analysis also showed that the diameter of the aperture was a predominant factor toward the elimination of ditch-shaped defects in the rectangular microscopic channels on the PET produced by an excimer laser ablation.     

FWM-based multi-wavelength erbium-doped fiber laser using Bi-EDF

We experimentally demonstrate a simple structure but efficient multi-wavelength erbium-doped fiber laser (EDFL) using a 49 cm Bismuth-based erbium-doped fiber (Bi-EDF) as gain medium. The Bi-EDF provides erbium amplification and FWM effect in the cavity to generate a stable multi-wavelength comb operating in C-band region. We have achieved more than 5 lines with peak power of more than −35 dBm and channel spacing of 0.5 nm by incorporating a broadband fiber Bragg grating and polarization controller in the ring cavity.     

SOA-based multi-wavelength laser using fiber Bragg gratings

We propose and experimentally demonstrate a triple-wavelength fiber ring laser using a semiconductor optical amplifier (SOA) in conjunction with a series of fiber Bragg gratings (FBGs). The three channels operate at 1554.4, 1555.3, and 1556.1 nm with a peak power above ?25 dBm and optical signal-to-noise (OSNR) above 30 dB at SOA drive current of 350 mA under the room temperature. The proposed laser configuration has the advantages of a simple and compact structure, multi-wavelength operation and the system can be upgraded to generate more wavelengths by increasing the number of FBG used.     

Packaging multi-wavelength DFB laser array using REC technology

Packaging of Distributed feedback （DFB） laser array based on reconstruction=equivalent-chirp （REC） tech- nology is a bridge from chip to system, and influences the practical process of REC chip. In this letter, DFB laser arrays of 4 channel @1 310 nm and 8 channel @1 550 nm are packaged. Experimental results show that both 4 channel @1 310 nm and 8 channel @1 550 nm have uniform wavelength spacing and average side mode suppression ratio （SMSR）〉35 dB. When I=35 mA, we get the total output power 1 mW of 4 channel @1 310 nm, and 227 μW of 8 channel @1 550 nm, respectively. The high frequency characteristic of the packaged chips is also demonstrated, and the requirements of 4× 10 G or even 8× 10 G system can be reached, we demonstrate the practical and low cost performance of REC technology and indicates its potential application in the future fiber-to-the-home （FTTH）.     

准分子激光轰击Y-Ba-Cu-O高温超导靶的空间分辨光谱研究

采用WP4-光学多道分析仪对准分子激光轰击Y_1Ba_2Cu_3O_x超导靶产生的等离子体辐射进行了空间分辨测量和研究。实验结果表明,在靶面的邻近区(d<0.4mm),等离子体辐射为较强的连续谱,并迭加有Y、Ba原子和Y~+、Ba~+离子基态电子跃迁的自吸收线。Y、Ba、Cu原子和相应的一价离子以及金属氧化物分子激发态的发射谱线仅在距靶面为0.4mm以外的区域出现。光谱的测量结果支持靶面表层发生爆炸、出射分子簇团和固体微粒的激光烧蚀沉积动力学机制解释。