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1.
Formation of Organosilicon Compounds. 96. Preparation and Structure of P-Ylides of the 1,3,5-Trisilahexanes (Influence of the Substituents) The influence of the substituents at the silicon atoms on formation and structure of ylides of 1,3,5-trisilacyclohexanesis investigated. The reactions of 1 , 2 , 3 with Me3Si? PMe2 lead via cleavage of the Si? P bond and subsequent rearrangement to the ylides 4 , 5 and 6 . The x-ray structure determination reveals, that the atoms of the ylid part of 4 are in a plane with the shortened bond distances d(C? P) = 168.6 pm and d(Si? C) = 180.1 pm, whereas the other endocyclic Si? C distances remain nearly unaffected by the ylid formation. Only the endocyclic bond angles C? Si? C of the Si atoms of the ylid are enlarged (116°). In the molecule 6 d(C? P) = 164.6 pm is much shorter, but d(P? Br) = 236.6 pm is enlarged. This enlargement is coupled with a deviation of 17 pm for the ylidic C atom from the ylid plane. Distances and angles are normal in the methylated trisilnhexane. The ring in 6 has boat conformation, in 4 a flat chair conformation.  相似文献   

2.
Formation of Organosilicon Compounds. 112. The Influence of Reaction Conditions on the Reaction of (Cl3Si)2CCl2 with Silicon. The Structures of 2,2,3,3,5,5,6,6-Octachloro-1,4-bis(trichlorosilyl)-2,3,5,6-tetrasilabicyclo[2.1.1]-hexane and 1,1,3,4,6,6-Hexakis(trichlorosilyl)hexatetraene While reactions of (Cl3Si)2CCl2 1 with Si(Cu) in a fluid bed at 320°C exclusively yield products by silylation of the CCl2 group in 1 does the reaction in a stirred bed preferrably give rize to chlorosilanes containing C? C double and triple bonds. Compounds 5, 6, 7, 8 and 9 in Tab. 1 belong to the first group, whereas 3 and 4 belong to the second one. The reaction of 1 with elemental copper under dehalogenation at carbon produces 3, 4 and 11 . In the reaction of 1 with CaSi2 no additional Si? C bonds are formed, exclusively chlorosilanes with multiple C? C bonds as 3, 4 and 10 were found besides of SiCl4. The bicyclo[2.1.1]hexane 6 (Tab. 1) crystallizes monoclinically in the space group C2/c (no. 15) with a = 1557.8, b = 857.4, c = 1727.3 pm, β = 104.34° und Z = 4 molecules per unit cell; the hexatetraene 10 (Tab. 1) crystallizes monoclinically in the space group C2/m (no. 12) with a = 1189.6, b = 1433.8, c = 983.5 pm, β = 98.75° pm, and Z = 2 molecules per unit cell. The skeleton of 6 is a system of high bond stress with 2-C2 symmetry. The strongly folded (138.8°) four-membered ring (sum of angles = 344.2°) and the presence of both a Si? Si bond length of 238.2 pm and a Si? Si non-bonding distance of 255.1 pm are remarkable aspects of this feature. The mean bond lengths in the bicyclic compound were found to be d(Si? C) = 190.9 pm and d(Si? C) = 185.1 pm for exo- and endocyclic bonds, respectively. The skeleton of 10 is of the symmetry 2/m-C2h. The six-membered chain is plane. The central C? C single bond length and the mean distance of the cumulated double bonds are 148.6 pm and 130.5 pm, respectively.  相似文献   

3.
Formation of Organosilicon Compounds. 94. Crystal Structure of Hexaphenyltrisilacyclohexane Si3C39H36 1.1.3.3.5.5-Hexaphenyl-1.3.5-trisilacyclohexane crystallizes monoclinically in the space group P21/n (No. 14) with a = 1718.3 pm, b = 1769.2 pm, c = 1091.4 pm, β = 90.72° and Z = 4 molecules per unit cell. The trisilacyclohexane sceleton is present in a flattened twist boat conformation with mean bond angles of 110.0° at the Si atoms and 117.9° at the C atoms, respectively. The mean bond lengths are d(Si? C) = 187.1 pm in the six membered ring and 187.9 pm to the substituents.  相似文献   

4.
Formation and Structure of iso-Tetraphosphane P[P(SiMe3)Me]3 The reaction of MeP(SiMe3)2 with PCl3 (molar ratio 3:1, ?78°C, n-pentane) yields by cleaving of the P? Si bond P[P(SiMe3)Me]3 1 with Cl2P? P(SiMe3)Me and ClP[P(SiMe3)Me]2 as intermediates. The reaction rate decreases by the increase of phosphorylation. The last reaction step (formation of 1 ) occurs while warming up to room temperature. 1 forms colorless hexagonal crystals, melting point 65 ± 1°C. Tris(trimethylsilyl-methyl-phosphino)phosphane 1 crystallizes monoclinically in the space group Cc (No. 8) with Z = 8 formula units per unit cell. The molecules possess approximated C3 symmetry and have (RRR) and (SSS) configurations, respectively. The bond distances d?(P? P) = 220.1 pm, d?(P? C) = 186.5 pm, and d?(P? Si) = 225.2 pm are normal and within the expected range of known distances. According to repulsive interactions between the non bonded electron pairs of the terminal P atoms and the protons of the methyl groups the angles at the central and terminal P atoms are enlarged to ? P P P = 105.1° and ? P P C = 106.9°, respectively.  相似文献   

5.
Formation of Organosilicon Compounds. 83. Formation, Reactions, and Structure of Ylides Generated from Perchlorinated Carbosilanes The CCl-moiety in perchlorinated carbosilanes as (Cl3Si)2 a, Cl3Si? CH2? SiCl2? CCl2? SiCl3 b, (Cl3Si? CCl2)2SiCl2 c or (Cl2Si? CCl2)3 d, e.g., cleaves the Si? P bond of me3Si? Pme2 e (me = CH3); and by subsequent rearrangement ylides are formed. Such, treating e with a yields (Cl3Si)2CPme2Cl 1, which also results from the reaction of me2P? Pme2 with a. The ylides also can be obtained by means of treating the carbosilanes a, b, c or d with LiPme2. Thus, c with one mole of LiPme2 yields Cl3Si? CCl2? SiCl2? C(Pme2Cl)? SiCl3 or Cl3Si? C(Pme2Cl)? SiCl2? C(Pme2Cl)? SiCl3, resp., with two moles of LiPme2. The corresponding Si-methylated derivates do not form ylides; (me3Si)2CCl2, e.g., with e in benzene yields me3Si? CH(Pme2)? Sime3. One mole of Lime methylates 1 to yield (Cl3Si)2CPme3 11. With either LiPme2, me3Si? Pme2 or Me2P? Pme2 1 forms (Cl3Si)2CPme2-Pme2. Reacting 1 with CH3OH/(C2H5)2NH, (Cl3Si)[SiCl2(OCH3)]CPme2(OCH3) is formed. Ylides also result from the reactions of partially C-chlorinated 1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexanes with me3Si? Pme2, (Cl2Si? CCl2)3 with three moles of me3Si? Pme2 or LiPme2, resp., yields (Cl2Si? CPme2Cl)3 16, the 1,1,3,3,5,5-Hexachlor-2,4,6-tris(chlordimethylphosphoranyliden)-1,3,5-trisilacyclohexan, which crystallizes with one mole of monoglyme. X-ray structure determinations revealed that 1, 11 and 16 are planar. As well the (P? C) as the (Si? C) bond lengths are remarkably shortened; in 1 (P? C) to 173.3 pm, (Si? C) to 173.3 pm, (Si? C) to 179.5 pm, in 16 (P? C) to 168.7 pm, (Si? C) to 180 pm. The (Si? C) and (P? C) bond orders amount to about 1.33, and are relatively equally distributed. Therefore, the charge of the formal carbanion is equally distributed, which shall be expressed by means of the following kind of writing for 1 and 16 see “Inhaltsübersicht”.  相似文献   

6.
Formation of Organosilicon Compounds. 103. Formation and Structure of cis and trans 2,4-Dichloro-2,4-bis(trimethylsilyl)-1,1,3,3-tetramethyl-1,3-disilacyclobutane The reaction of Me3Si? CCl2? SiMe2Cl with LiBu in THF yields 1,1,3,3-Tetramethyl-2,4-bis(trimethylsilyl) 1,3-disilabicyclo[1.1.0]butane. The product of the first reaction stage is Me3Si? CCl(Li)-SiMe2Cl. The 1,3-Disilacyclobutane 2 and 3 were isolated, when Me3Si? CCl2? SiMe2Cl was treated with LiBu in Et2O. This way the proof is given that 2 and 3 are intermediates of the formation of product 1 . The further products are 4 and 5 (CCl in 2 and 3 substituted by CH) and Me3Si? CH2? C(SiMeCl)2SiMe3. 2 crystallizes orthorhombically in the space group Fdd 2 (no. 43) with a = 2149.1 pm, b = 2229.2 pm, c = 1763.6 pm and Z = 16 molecules per cell. The central ring of disilacyclobutane is slightly folded (17.9°). The configuration of the C-Atoms in this four membered ring gets closer to a sp2 configuration built up by three Si? C bonds. The Cl-atoms approximately have orthogonal positions to these CSi3 arrangements. The extension of the C? Cl bonds (184.6 pm) and the mutual approximations of the Cl-atoms in the cis-position indicate a high reactivity of the molecule.  相似文献   

7.
Formation of Organosilicon Compounds. 86. Si-phenyl and Si-butyl Substituted 1,3,5-Trisilacyclohexanes By treating (BrHSi? CH2)3 with phMgBr or t-buLi, resp., and subsequent separation of the isomers, the pure cis-cis substituted 1,3,5-trisilacyclohexanes I are accessible which yield II (Formula see Inhaltsübersicht) by reaction with Br2. (F2Si? CH2)3 8 can be transferred into (ph2Si? CH2)3 7 with phLi. With HCl/AlCl3 7 forms (Cl2Si? CH2)3, whereas even with an excess of Br2 it only yields (phBrSi? CH2)3. Cleavage of 7 with one equivalent of Br2 yields (H2C? Si)3ph5Br 14, which with LiAlH4 forms (H2C? Si)3ph5H 10. 10 is not so easy to obtain via (H2C? Si)3ph5F 9 from the reaction of 8 with 5 equivalents of phLi. All of the SiH and SiBr groups in I and II, resp., occupy axial positions as well as the Br atom in 14 the H atom at Si in 10 and the F atom in 9.  相似文献   

8.
Formation of Organosilicon Compounds. 109. Reactions of Perhydrogenated Carbosilanes with Alkyl-Lithium Compounds Si-hydrogenated linear carbosilanes react with MeLi or nBuLi to give the Si-alkylated derivatives. In contrast to the Si-methylated derivatives of (H3Si? CH2)2SiH2 1 and (H3Si)2CH2 2 and to (Me2Si? CH2)3 no lithiation of CH2 groups is observed. Such, 1 with nBuLi yields nBuH2Si? CH2? SiH2? CH2? SiH3 5 and (nBuH2Si? CH2)2SiH2 6 . 2 reacts with nBuLi to give nBuH2Si? CH2SiH3 7 and (nBuH2Si)2CH2 8 besides of 1, 5 und 6 . The latter results from a cleavage of a Si? C bond in 2 Producing nBuSiH3 and LiCH2? SiH3 which combines with 2 to 1 . Subsequently 1 forms 5 and 6 . No higher alkylated derivatives of 1 or 2 could be detected.  相似文献   

9.
Formation of organosilicon compounds. 47. The crystal land molecular structure of 1,3,5,7-tetramethyl-tetrasila-adamantan 1,3,5,7- Tetramethyl-tetrasila-adamantan, Si4C10H24, is a pyrolysis product of Si(CH3)4. It crystallizes in the monoclinic space group P21/c with a = 8.859 Å, b = 9.844 Å, c = 18.316 Å, β = 91.04°, Z = 4. The molecule exhibits Td-symmetry within the experimental error. The mean bond lengths Si? C are 1.889 Å and 1.866 Å for the Si? CH3 and Si? CH2 bonds respectively.  相似文献   

10.
The Structures of the Heptahetero-Nortricyclenes P7(Sime3)3 and P4(Sime2)3 Tris(trimethylsilyl)heptaphospha-nortricyclene P7(Sime3)3 1 and Hexamethyl-trisila-tetraphospha-nortricyclene P4Si3me6 2 are structural analogons to the hetero-nortricyclenes P and P4S3. 1 crystallizes in the space group P21 with a = 965.7 pm, b = 1746.5 pm, c = 693.3 pm, β = 99.61° and Z = 2 formula units. In the P7 system tge P? P bond lengths differ functionally, namely 221.4 pm in the three-membered ring, 219.2 pm at the ring atoms and 217.9 pm at the bridgehead atom. The P? Si and Si? C bond lengths are 228.8 pm and 187.8 pm respectively. 2 crystallizes in the space group R3 with aR = 1129.3 pm, αR = 50.01° (hexagonal axes: a = 954.7 pm, c = 2956.9 pm) and Z = 2 formula units. In the P4Si3 systems the bond lengths are P? P = 220.2 pm, P? Si = 228.3 pm and 224.7 pm (to the bridgehead atom). The Si? C bond lengths are 187.3 pm. The structures are discussed with related compounds.  相似文献   

11.
Formation of Organosilicon Compounds. 93. Investigations of the Mechanism of the AlBr3 Initiated Formation of Cyclic Carbosilanes. The mechanism of the formation of ringsystems in carbosilanes with AlBr3 is investigated using the deuterium compounds 1a and 3a . The number of deuterium atoms in the methyl groups of the reaction products shows at which points of the molecules the regrouping occurs under formation of the ringsystem. In the first initially the reaction of 1a yields D3C? Si(CH3)3 and 2a under separation of a CD3 group. The rearrangement forming 2a occurs at the marked Si? C-bonds (formula 1a ). No Al-organic intermediate compound is observed under cleavage of Si? C bond. Therefore the formation of ring-systems is based on the polarisation by the Lewis-acid AlBr3. Compound 3a reacts in an analogous way, what is shown by the isolation of Sime4 and 4a . The cleavage of the bonds is marked in formula 3a . The reaction of 8 forming 9 and (Sime3)2CH2 follows the same mechanism; it is investigated by 1H and 27Al-NMR spectroscopy.  相似文献   

12.
Formation of Organosilicon Compounds. LX. Crystal and Molecular Structure of Heptamethyl-tetrasila-[2,2,2]-barrelan Si4C11H28 1,1,3,5,5,7,7-Heptamethyl-1,3,5,7-tetrasila-[2,2,2]-barrelan Si4C11H28 crystallizes in the orthorhombic space group Pn21a with a = 12.293, b = 9.903, c = 14.018 Å and Z = 4 formula units. The six-membered rings have the skew-boat conformation with a torsion angle of 23.5° with respect to the molecular axis. The skew-boat conformation results from the interaction of CH3- and CH2- groups. The mean value for the bond length is Si? C = 1.881 Å. The distances Si? CH2 = 1.873 Å are somewhat smaller than the others (1.887 Å).  相似文献   

13.
Contributions to the Chemistry of Silicon-Sulfur Compounds. XXX. Structure of Tetra-t-butoxy-1,3,2,4-dithiadisiletane Alcoholysis of silicon disulfide by t-butanol yielded the title compound. [(t-BuO)2SiS]2 crystallizes orthorhombically in the space group Pbca (no. 61) with a = 1708.4(5), b = 1560.8(3), c = 907.1(3) pm and Z = 4 molecules per unit cell. The molecule has the crystallographic 1 –Ci point symmetry and consequently the Si2S2 four-membered ring is rigid plane. The bond distances of this ring are Si? S = 214.2 and 213.1 pm and the bond angles S? Si? S = 97.8° and Si? S? Si = 82.2°. Related details of the structure are discussed.  相似文献   

14.
Formation of Organosilicon Compounds. LVI. Reactions of Si- and C-Chlorinated 1,3,5-Trisilapentanes with CH3MgCl (Cl3Si? CCl2)2SiCl2 (1) reacts with an excess of meMgCl (me = CH3) forming me3Si? C?C? Sime3 (2), Sime4, H2C?C(Sime3)[CH(Sime3)2] (3) as main products and (me3Si)2C? CH(Sime3) and as by-products. The cleavage reaction of (1) to (2) and (3) does not occur when the meMgCl-concentration is lowered. The reaction is started by the formation of a GRIGNARD reagent at a CCl-group in compound (1). Cl3Si? CCl2? SiCl2? CH2? SiCl3 forms with ; me3Si? CCl2? SiCl2? CHCl? SiCl3 forms (me3Si)2C?CH(Sime3). A reaction sequence is given.  相似文献   

15.
Formation of Organosilicon Compounds. 95. Crystal Structure of a Hexadecamethyloctasila-dispiro [5.1.5.1]tetradecane, Si8C22H56 1,1,3,3,5,5,7,7,9,9,11,11,13,13,14,14-Hexadecamethyl-1,3,5,7,9,11,13,14-octasila-dispiro[5.1.5.1]tetradecane crystallizes monoclinically in the space group P21/n (No. 14) with a = 1352.4 pm, b = 1215.5 pm, c = 1001.2 pm, β = 92.11° and Z = 2 molecules per unit cell. The dispiro system is formed by a central disilacyclobutane and two C-spiro connected trisilacyclohexane rings. The symmetry of the molecule is 2/m, with flattened six membered rings in chair conformation. The Si? C bonds are enlarged (192 pm) at the strained spiro region whereas the Si? C bonds are distinctly shortened (186 pm) at the opposite Si atoms in the six membered rings.  相似文献   

16.
Formation of organosilicon compounds. 84. Synthesis and thermal rearrangement of some substituted linear and cyclic silanes In part IR we report on the synthesis of substituted silanes, and in part II on their thermal rearrangement. I: me3i--Sime3(me = CH3) is formed by dropwise addition of THF to a suspension of Li powder in me3SiCl; yield ~ 80%. The mixture me3Si--Sime2Cl, me3SiCl, Li powder and THF reacts analogously to form me2Si(Sime3)2; yield 80%. By the same type of reaction the following compounds are obtained: compound 1 from Brme2Si? CH2? Sime2Br, 1 from Brme2Si? CH2? Sime2Br, 2 from Brme2Si? Sime2? CH2? Sime2Br 16 and 3 from Bret2Si? CH2? CH2? Siet2Br (et = C2H5). 2 decomposes during its isolation from THF. 16 is formed from phme2Si? Sime2? CH2? Sime2ph 17 (ph = C6H5) by reaction with HBr, 17 either from phme2SiLi and Clme2SiCH2Cl or from phme2Si? Sime2Br and LiCH2? Sime2ph. II: me2Si(Sime3)2 rearranges at 440 °C (56 h) with insertion of the CH2 group (Si? H formation) into the Si? Si bond and the formation of me3Si? Sime2? CH2? Sime2H, me2HSi? CH2? Sime2? CH2? SiHme2, and me3Si? CH2? Sime? CH2? Sime2H. 1 reacts analogously. Methylated halogenated disilanes like Brme2Si? Sime2Br react with separation of: Sime2 and its insertion into the Si-halogen bond to form trisilanes. Different from both are the phenylated derivatives, though phme2Si? Sime2ph still forms phme2Si? Sime2? Sime2ph. 3 reacts with separation of C2H4, formation of the Si? H group and insertion of C2H4 into the Si? Si bond.  相似文献   

17.
Formation of Organosilicon Compounds. 108 [1]. Thermally Induced Reactions of Amino-Substituted Disilanes Thermally induced reactions of amino-substituted disilanes yield Si rich silanes. At 300°C, Me3Si? SiMe2? NMeH 1 yields Me3Si? NMeH 2 and Me3Si? (SiMe2)2-NMeH 3 in a ratio 1 : 2 : 3 = 1,6 : 1 : 1, whereas Me3Si? SiMe2? N(iPr)H 4 at 350°C yields Me3Si? N(iPr)H 5 , Me3Si? (SiMe2)2-N(iPr)H 6 and Me3Si? (SiMe2)3? N(iPr)H 7 in a ratio of 4 : 6 : 7 = 0.8 : 1.0 : 0.6. Me3Si? SiMe2? NMe2 8 at 300°C (72 h) yields Me3Si? NMe2 9 and Me3Si-(SiMe2)2-NMe2 10 in a ratio of 9 : 8 : 10 = 1 : 0.22 : 0.44 The thermal stability of these disilanes is determined by the sterical requirements of the amino substituents NMeH < NMe2 < N(iPr)H. The introduction of a second NMe2 group decreases the stability and favours the formation of Si rich silanes. Such, Me2N? (SiMe2)2? NMe2 11 already at 250°C (2 h) yields Me2N? SiMe2? NMe2 12 , Me2N? (SiMe2)2? NMe2 13 and Me2N? (SiMe2)4? NMe2 14 in a ratio of 11 : 13 : 14 = 0.3 : 0.9 : 1.0. The reactions can be understood as insertions of thermally produced dimethylsilylene into the Si? N bond of the disilanes. This process is strongly favoured as compared to the trapping reactions with Ph? C?C? Ph or Et3SiH. The mentioned reactions correspond closely to those of the methoxy-disilanes[2]. However (MeN? SiMe2? SiMe2)2 15 , obtained from HMeN? (SiMe2)2? NMeH by condensation [3], at 400°C suffers a ring contraction to octymethyl-1,3-diaza-2,4,5-trisilacyclopentane (69 weight %), and yields also some solid residue, the composition of which corresponds to Si3C7NH21.  相似文献   

18.
Synthesis and Structure of Phosphinophosphinidene-phosphoranes tBu2P? P?P(Me)tBu2 1, tBu(Me3Si)P? P?P(Me)tBu2 2, and tBu2P? P?P(Br)tBu2 3 A new method for the synthesis of 1 and 2 (Formulae see ?Inhaltsübersicht”?) is reported based on the reaction of 5 with substitution reagents (Me2SO4 or CH3Cl). The results of the X-ray structure determination of 1 and 2 are given and compared with those of 3 . While in 3 one P? P distance corresponds to a double bond and the other P? P distance to a single bond (difference 12.5 pm) the differences of the P? P distances in 1 and 2 are much smaller: 5.28 pm in 1 , 4.68 pm in 2 . Both 1 and 2 crystallize monoclinic in the space group P21/n (Z = 4). 2 additionally contains two disordered molecules of the solvent pentane in the unit cell. Parameters of 1 : a = 884.32(8) pm, b = 1 924.67(25) pm, c = 1 277.07(13) pm, β = 100.816(8)°, and of 2 : a = 1 101.93(12) pm, b = 1 712.46(18) pm, c = 1 395.81(12) pm, β = 111.159(7)°, all data collected at 143 K. The skeleton of the three P atoms is bent (PPP angle 100.95° for 1 , 100.29° for 2 and 105.77° for 3 ). Ab initio SCF calculations are used to discuss the bonding situation in the molecular skeleton of the three P atoms of 1 and 3 . The results show a significant contribution of the ionic structure R2P? P(?)? P(+)(X)R2. The structure with (partially) charged P atoms is stabilized by bulky polarizable groups R (as tBu) as compared to the fully covalent structure R2P? P(X)? PR2.  相似文献   

19.
Formation of Organosilicon Compounds. LIX. Crystal and Molecular Structure of Dodecamethyl-heptasila-[4,4,4]-propellan Si7C19H48 1,1,3,3,7,7,9,9,11,11,13,13-Dodecamethyl-1,3,5,7,9,11,13-heptasila-[4,4,4]-propellan Si7C19H48 crystallizes in the monoclinic space group P21/c with a = 11.499, b = 11.411, c = 22.171 Å, β = 96.95° and Z = 4 formula units. The three independent six-membered rings of the molecule have the same skew-boat-conformation. Along the central Si? C? bond the mean value of the torsion angle within the six-membered rings is 19°. The mean value for the bond length is Si-C = 1.893 Å, but the bond length diminishes within the polycyclic system from the axial C-atom to the outer members of the rings (1.916; 1.880; 1.864 Å). The interatomic distances between CH3- groups and from CH3- groups to CH2- groups shows the twisted conformation to be a result of the contacts between these groups.  相似文献   

20.
Formation of Organosilicon Compounds. LXI. Crystal and Molecular Structure of 1.1.3.3.5.5.7.7-Octamethyl-1.3.5.7-tetrasila-cyclooctane Si4C12H32 Octamethyl-tetrasila-cyclooctan Si4C12H32 crystallizes in the monoclinic space group C2 with a = 17.807, b = 6.121, c = 10.856 Å, β = 126.09° und 2 molecules in the unit cell. The molecule has a C2-conformation which deviates slightly from C2v symmetry. The mean Si? C bond length is 1.879 ± 0.011 Å. The mean Si? CH2 bond length is greater than the Si? CH3 bond length (1.897(15) Å and 1.861(10) Å respectively).  相似文献   

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