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1.
Formation of Organosilicon Compounds. LIV. Crystal and Molecular Structure of Tetramethyl-octasila-dodecascaphan 3,7,11,15-Tetramethyl-1,3,5,7,9,11,13,15-octasila-dodecascaphan crystallizes in the cubic space group F4 3c–T with a = 17.074(10) Å. In the unit cell there are four molecules of each of the two chiral forms which are arranged in the way of the NaCl-structure. The molecules have the symmetry 23-T with torsion angles of 19° in the twelve six-membered rings with skew-boat conformation. In the polycyclic skeleton the bond length Si? C are nearly the same (1.885(2) Å, 1.893(5) Å and 1.888(6) Å), whereas the bond length Si? CH3 is slightly shorter (1.874(8) Å). The shortest distances between H-atoms are 2.59 and 2.68 Å (intramolecular) and 2.72 and 2.73 Å (intermolecular) respectively. The thermal motions of all atoms can be reduced to a rigid-body motion. Diffuse scattering (dependent on temperature) is observed and discussed.  相似文献   

2.
Si7C16H36 (1) can be separated from the pyrolysis products of Si(CH3)4 by columnchromatography. Its structure is shown to consist of two 1,3,5,7-tetrasilaadamantane skeletons which are connected through the C-atoms 2 and 4 and the Si-atom 3, by analysis of the 100 and 220 MHz PMR spectra in connection with double resonance. Except for the framework bonds carbon atoms are saturated by hydrogen, silicon atoms by CH3 groups. (1) is a very stable compound (m.p. 225°C without decomposition).  相似文献   

3.
Formation of Organosilicon Compounds. 95. Crystal Structure of a Hexadecamethyloctasila-dispiro [5.1.5.1]tetradecane, Si8C22H56 1,1,3,3,5,5,7,7,9,9,11,11,13,13,14,14-Hexadecamethyl-1,3,5,7,9,11,13,14-octasila-dispiro[5.1.5.1]tetradecane crystallizes monoclinically in the space group P21/n (No. 14) with a = 1352.4 pm, b = 1215.5 pm, c = 1001.2 pm, β = 92.11° and Z = 2 molecules per unit cell. The dispiro system is formed by a central disilacyclobutane and two C-spiro connected trisilacyclohexane rings. The symmetry of the molecule is 2/m, with flattened six membered rings in chair conformation. The Si? C bonds are enlarged (192 pm) at the strained spiro region whereas the Si? C bonds are distinctly shortened (186 pm) at the opposite Si atoms in the six membered rings.  相似文献   

4.
Formation of Organosilicon Compounds. LXI. Crystal and Molecular Structure of 1.1.3.3.5.5.7.7-Octamethyl-1.3.5.7-tetrasila-cyclooctane Si4C12H32 Octamethyl-tetrasila-cyclooctan Si4C12H32 crystallizes in the monoclinic space group C2 with a = 17.807, b = 6.121, c = 10.856 Å, β = 126.09° und 2 molecules in the unit cell. The molecule has a C2-conformation which deviates slightly from C2v symmetry. The mean Si? C bond length is 1.879 ± 0.011 Å. The mean Si? CH2 bond length is greater than the Si? CH3 bond length (1.897(15) Å and 1.861(10) Å respectively).  相似文献   

5.
Formation of Organosilicon Compounds. LIX. Crystal and Molecular Structure of Dodecamethyl-heptasila-[4,4,4]-propellan Si7C19H48 1,1,3,3,7,7,9,9,11,11,13,13-Dodecamethyl-1,3,5,7,9,11,13-heptasila-[4,4,4]-propellan Si7C19H48 crystallizes in the monoclinic space group P21/c with a = 11.499, b = 11.411, c = 22.171 Å, β = 96.95° and Z = 4 formula units. The three independent six-membered rings of the molecule have the same skew-boat-conformation. Along the central Si? C? bond the mean value of the torsion angle within the six-membered rings is 19°. The mean value for the bond length is Si-C = 1.893 Å, but the bond length diminishes within the polycyclic system from the axial C-atom to the outer members of the rings (1.916; 1.880; 1.864 Å). The interatomic distances between CH3- groups and from CH3- groups to CH2- groups shows the twisted conformation to be a result of the contacts between these groups.  相似文献   

6.
Formation of Organosilicon Compounds. LX. Crystal and Molecular Structure of Heptamethyl-tetrasila-[2,2,2]-barrelan Si4C11H28 1,1,3,5,5,7,7-Heptamethyl-1,3,5,7-tetrasila-[2,2,2]-barrelan Si4C11H28 crystallizes in the orthorhombic space group Pn21a with a = 12.293, b = 9.903, c = 14.018 Å and Z = 4 formula units. The six-membered rings have the skew-boat conformation with a torsion angle of 23.5° with respect to the molecular axis. The skew-boat conformation results from the interaction of CH3- and CH2- groups. The mean value for the bond length is Si? C = 1.881 Å. The distances Si? CH2 = 1.873 Å are somewhat smaller than the others (1.887 Å).  相似文献   

7.
Formation of Organosilicon Compounds. L. Investigations on Hydrogenation, Methylation, and Decomposition of Octachlorohexasila-asteran Si6Cl8C6H8 Compound (a) reacts with LiAlH4 (1:2) to form (b), respectively (c) (ratio 1:5). (b), (c) and the intermediates containing Si? H-groups can be rechlorinated to (a) by means of Cl2. With a excess of LiAlH4 (1:10) (a) is cleaved to compound (d) under hydrogenation. (a) is methylated to (e) resp. (f) by CH3MgCl. (a) doesn't react with Cl2 and Br2; (f) is cleaved by HBr to yield (g). The different sterical conditions of the secondary and teriary Si---Cl-groups allow preparation of the partially chlorinated compounds (b) and (e).  相似文献   

8.
Formation of Organosilicon Compounds. 92. Formation and Structure of Octamethylhexasila-hexascaphane By rearrangement and abstraction of CH4 at the presence of AlBr3 2 forms 3 , and 6 forms 7 , which is also obtained reacting 8 and 9 under the same condition. Lithination of 1, 1, 3, 5, 5, 7, 7, 9, 9-Nonamethyl-1, 3, 5, 7, 9-pentasiladecaline yields 12 , which is trapped with me3SiCl to form 6 . Convertation of 13 to 14 leads to 8 by reaction with ClSi(CH2—Sime3)3. Compound 7 is characterized by NMR and mass spectroscopy as well as X-ray structural analysis. 1, 3, 5, 7, 9, 9, 11, 11-Octamethyl-1, 3, 5, 7, 9, 11-hexasila-hexascaphane 7 crystallizes in the monoclinic space group P21/n (No. 14) with a = 3296.7 pm, b = 1536.2 pm, c = 891.9 pm, β 91.71° and Z = 8 formular units. Both crystallographic independent molecules have approximately the symmetry C2. The differences of corresponding bond lengths, bond angles and torsion angles are unimportant. But there is a distinct dependence of the Si? C bond length relative to the function of the bond in the molecule (Averages: Si? C) (endo) = 188.4 pm, Si? C (exo) = 187.6 (pm).  相似文献   

9.
Formation of Organosilicon Compounds. 101. Preparation, Structure, and Properties of an Octamethyl-octasilaheptacyclooctadecane, Si8C18H40 The title compound Si8C18H40 1 (systematic name: 1,3,5,7,9,11,11,15-Octamethyl-1,3,5,7,9,11,13,15-octasila-heptacyclo[7,7,1,13,15, 02,7, 04,13, 05,10, 013,17]octadecane) can be derived from a polycyclic frame of condensed trisilacyclohexane rings presenting the chair-as well as the boat-conformation. This frame is a part of the very frequent 4H-III modification of silicon carbide and represents the smallest molecular unit, which shows all the essential details of this structure namely the adamantane-frame and the wurtzitane-frame. The mean Si? C bond distance is 188.6 pm. Particularly the six-membered rings form nearly ideal conformations.  相似文献   

10.
Formation of Organosilicon Compounds. LXII. Partial Brominated Carbosilanes The photobromination of 1 leads to compound 2 as well as to C-chlorinated derivatives if the time of reaction is prolonged. Compound 2 is also formed from (Br2Si–CH2)3; Gl. (1) see ?Inhaltsübersicht”?. In a corresponding reaction (Cl3Si–CH2)2SiCl2 gives successively Cl3Si–CHBr–SiCl2–CH2–SiCl3, Cl3Si–CBr2–SiCl2–CH2–SiCl3 and Cl3Si–CCl2–SiCl2–CH2–SiCl3. (Cl3Si)2CBr2 is accessible through the photobromination of (Cl3Si)2CH2. The reactivity of the CBr2-group is quite obvious in the reaction of Cl2Si–CBr2–SiCl2–CH2–SiCl3 with LiAlH4 yielding (H3Si–CH2)2SiCl2 as well as in the reaction of compound 2 with CH3MgCl yielding [(CH3)2Si–CH2]3. By treatment of the SiH groups with bromine the preparation of compounds with the general formulas CH3SiHnBr3?n; (H3?nSiBrn)2CH2; (H3?nSiBrn? CH2)2SiH2?nBrn; (H2?nBrnSi? CH2)3 and (H3?nSiBrn)2CCl2 is possible. Analysis of the nmr spectra shows that 1,3-Dibromo-1,3,5-trisilacyclohexane is formed to 67% in the trans and to 33% in the cis configuration; 1,3,5-Tribromo-1,3,5-trisilacyclohexane is formed to 80–90% in teh cis-trans configuration. The results of 1H and 29Si NMR investigations are reported.  相似文献   

11.
Formation of Organosilicon Compounds. LVIII. Synthesis of a Carbosilane with Propellane Structure 1 (· ? C resp. CH2; x ? Si(CH3)2 resp. Si) is formed by a coupling reaction of BrSi(CH2? Sime2? CH2? Sime2Br)3 2 with CCl4 and Li. The reaction of C6H5me2Si? CH2Li with Clme2Si? CH2Br leads to C6H5me2Si? CH2? Sime2? CH2Br. Metallation with lithium and succeeding reaction with Cl3SiC6H5 produces compound C6H5Si(CH2? Sime2? CH2? Sime2C6H5)3, which than forms 2 by cleavage with bromine.  相似文献   

12.
1. Photochlorination in CCl4 of the Si-chlorinated carbosilanes (Cl3Si? CH2)2SiCl2 and (Cl2Si? CH2)3 leads to totally chlorinated compounds, e. g. (Cl3Si? CCl2)2SiCl2. After chlorination has started at one CH2 group, formation of a CCl2 group is preferred before another CH2 group is involved into the reaction. Thus preparation of compounds a, b, c is possible. Cl3Si? CCl2? SiCl2? CH2? SiCl3 (a) for (b) and (c) (see “Inhaltsübersicht”). SO2Cl2 (benzoyl peroxide) as chlorinating agent reacts more slowly, and opens an access to carbosilanes containing CHCl groups such as (d), Cl3Si-CHCl? SiCl2? CH2? SiCl3 (e). Reactions of compounds (a) to (d) with LiAlH4 yields carbosilanes with SiH groups, and partially chlorinated C atoms. 2. By the high reactivity of Si? CCl2? Si groups an exchange of Cl atoms of CCl groups in perchlorinated carbosilanes is possible for H atoms of Si? H groups in perhydrogenated carbosilanes, thus allowing the preparation of compounds containing CHCl and SiHCl groups, e. g. according to Gl.(1) (Inhaltsübersicht). Further reactions, formulated as the last equations in Inhaltsübersicht, are reported as well as the rearrangement of H3Si? CHCl? SiH3.  相似文献   

13.
Formation of organosilicon compounds. XXXXVI. Si-fluorinated carbosilanes Compounds (1)–(7) (see “Inhaltsübersicht”) are obtained by reaction of carbosilanes containing Si? Cl groups with ZnF2. The linear compounds (8) and (9) are prepared from ZnF2 and (Cl3Si)2CCl2, and (Cl3Si? CCl2)SiCl2, respectively, whereas the cyclic compounds are formed by photochemical chlorination. Photochemical chlorination of (3) goes via compounds (13) and (14) (isolation is possible); both of them can be prepared too by reaction of Si? Cl derivatives with ZnF2. Compounds (16) and (17) are obtained from the corresponding Si? Cl derivatives.  相似文献   

14.
Formation of Organosilicon Compounds. 98. Reaction of Silylated Phosphorus Ylides with PCl3 The reaction of Si-substituted phosphorus ylides as Me2Si(CH2? SiMe2)2C?PMe3Br 1 , Cl2Si(CH2? SiCl2)2C?PMe2Cl 2 , and (Cl3Si)2C?PMe2Cl 3 with PCl3 yields (Cl2P)2C?PMe2Cl 5 by chlorinating cleavage of the Si-ylid-C bond. Besides 5 also (ClMe2SiCH2)2SiMe2, (Cl3SiCH2)2SiCl2, resp. SiCl4 result from the reaction of 1, 2 and 3 with PCl3. (Cl2P)2C?PMe2Cl forms colourless crystals, mp. 84°C.  相似文献   

15.
This paper contains:
  • 1 The synthesis of the 1.3-disilacyclopentenes (a)(b)(2) and of the 1.3-disilacyclo-butane (c); formulas see above.
  • 2 The synthesis of the 1.3-disilacyclopentane skeleton (d) and of the SiCl-functional derivatives (e) (f ) (g) (h) (i) as well as of SiH-containing derivatives, e.g. (j).
  • 3 The chlorination of (i) with SO2,Cl2, yielding (k) and (l), and the formation of (m) from (k) with K-methypyrrolidine.
  • 4 The synthesis of the spirane (n).
  • 5 The synthesis of the ten-membered ring(o) and of the unsaturated derivatives (p)and (q). Besides the synthetic routes, spectroscopic data (ir, pmr, and mass spectra) of the cyclic compounds as well as of the intermediate products are given.
  相似文献   

16.
Formation of Organosilicon Compounds. 77. Formation of Carbosilanes from Methylsilanes The products formed by pyrolysis of me3SiH, me2SiH2, and meSiH3 are reported. Sime4 and the mentioned methylsilanes were reacted in a plasma, and the products are compared to those of the pyrolysis. The pyrolysis of me3SiH and me2SiH2 essentially yields the same groups of carbosilanes which are accessible by thermal decomposition of Sime4, if the range is restricted to compounds with 4 Si atoms at most. Cylic carbosilanes are the main products of the pyrolysis of me3SiH, and amoung these, 1,3,5-trisilacyclohexanes and 1,3,5,7-tetrasilaadamantanes are preferrently formed. From me2SiH2 above all linear compounds as 1,3-disilapropanes are obtained. This is attributed to the chosen experimental procedure in which they not subject to further reaction. In the pyrolysis of meSiH3 a yellow solid is formed besides little amounts of meH2Si? SiH2me. Compared to the compounds formed by pyrolysis of Sime4, the carbosilasen obtained from me3SiH and me2SiH2 possess more SiH substituents. Also the decomposition of Sime4 in a plasma preferrently yields carbosilanes, mainly linear compounds with 2 or 3 Si atoms.  相似文献   

17.
Formation of Organosilicon Compounds. 111. The Hydrogenation of Si-chlorinated, C-spiro-linked 2,4-Disilacyclobutanes with LiAlH4 or iBu2AlH. The Access to Si8C3H20 The hydrogenation of Si-chlorinated, C-spiro-linked 2,4-disilacyclobutanes containing C(SiCl3)2 terminal groups with LiAlH4 in Et2O proceeds under complete cleavage of the fourmembered rings and under elimination of one SiH3 group. Such, Si8C3Cl20 4 forms (H3Si)2CH? SiH2? CH(SiH3)? SiH2? CH(SiH3)2 4 α, and even Si8C3H20 4a with LiAlH4 forms 4 α. The hydrogenation of related compounds containing however CH(SiCl3) terminal groups similarly proceeds under ring cleavage but no SiH3 groups are eliminated. Such, (Cl3Si)CH(SiCl2)2CH(SiCl3) 41 forms (H3Si)2CH? SiH2? CH2(SiH3) 41 α. However, in reactions with iBu2AlH in pentane neither the disilacyclobutane rings are cleaved nor are SiH3 groups eliminated. Only by this method Si8C3H20 is accessible from 4 , Si6C2H16 3a from Si6C2Cl16 3 and Si4C2H12 41a from 41 . C(SiCl3)4 cleanly produces C(SiH3)4. Based on the knowledge about the different properties of LiAlH4 and iBu2AlH in hydrogenation reactions of disilacyclo-butanes it was possible to elucidate the composition and the structures of the hydrogenated derivatives of the product mixture from the reaction of MeCl2Si? CCl2? SiCl3 with Si(Cu) [1] and to trace them back to the initially formed Si chlorinated disilacyclobutanes Si6C2Cl15Me 34 , Si6C2Cl14Me2 35 , Si8C3Cl19Me 36 and Si8C3Cl18Me2 37 . Compound 4a forms colourless crystals of space group P1 with a = 799.7(6), b = 1263.6(12), c = 1758.7(14) pm, α = 103.33(7)°, β = 95.28(6)°, γ = 105.57(7)° and Z = 4.  相似文献   

18.
Formation of Organosilicon Compounds. 105. Reactions of (Cl3Si)2C?PMe2Cl with Silylphosphanes The reaction of (Cl3Si)2C?PMe2Cl 1 with MeP(SiMe3)2 proceeds at 130°C (15 hrs.), by cleavage of all Si? P bonds to compounds 2, 3, 4, 5 . The course of this reaction incorporates a number of stages of which the compounds (Cl3Si)2C? PMe2? P(Me)SiMe3, (Cl3Si)2C?PMe2? PMe? P(Me)SiMe3 and ClP(Me)SiMe3 are important and are yet to be isolated. The reaction of (Cl3Si)2C?PMe2Cl with LiP(SiMe2)2 produces compound 2 as well as p2(SiMe3)4 and P(SiMe3)3. The formation of 2 can be explained by the initial formation of the intermediate (Cl3Si)2C?PMe2? P(SiMe2)2 with reacts with 1 to produce 2 and (ClP(SiMe)3)2. The formation of P2(SiMe3)4 is also explained by the reaction of ClP(SiMe3)2 with LiP(SiMe3)4. The reaction of (Cl3Si)2C?PMe2C(H)PMe2 at 130°C/15–20 hrs. is related to the formation of (Me3Si)2C(H)Pme2 from corresponding Si-methylated phosphorylides with the exception that, at 0°C, this reaction goes to completion within a few minutes.  相似文献   

19.
Further separation of the pyrolysis products of (CH3)3SiCl can be achieved by reaction with LiAlH4/LiH (transfer of SiCl to SiH groups). By means of adsorptions chromatography a separation is obtained into 4 groups of components. By application of gel chromatography (sephadex LH 20) separation is improved, thus fractions of carbosilanes are found with average molecular weights between 5000 and 200. A given mixture of the compounds [5], [9], [10] has been separated by means of gel chromatography so that pure compounds were obtained. The mixture of the 1,3,5,7-Tetrasila-adamantanes, which are formed in the pyrolysis of (CH3)3SiCl, is separated by gel chromatography (efficiency control of separation is performed by NMR and mass spectrography of the different fractions), a concentration of some compounds is obtained, some of them are isolated purely by further operations. The ratio of the compounds [1], [2], [3], [4], found in the pyrolysis products, is 170:26:3:1. Derivatives are formed with SiH, SiCl, and SiCH3 groups by complete or respectively partial hydrogenation. Comparing the values of the chemical shift of the CH3-protones [measured in τ) a linear decrease is found in the compounds [9], [4], [3], [2].  相似文献   

20.
Formation of Organosilicon Compounds. 80. Si-Metalation of 1,3,5-Trisilacyclohexanes by Means of Trisition Metal Complexes Several Si-transition metal-substituted 1,3,5-trisilacyclohexanes are reported. l-Bromo-1,3,5-trisilacyclohexane reacts with the metal carbonyl anions W(CO)5cp?, Mo(CO)3cp-, Cr(CO)3cp?, Mn(CO)3?, Fe(CO)2cp?, or Co(CO)4minus;, resp., yielding monosubstituted derivatives as 6, e. g.(cp = π-cyclopentadienyl). 1,3-Dibromo-1,3,5-trisilacyclohexane forms disubstituted compounds aa 7, e. g., with 2 moles of the metal carbonyl anions Fe(CO)2cp?, Mn(CO)5? or Co(CO)4?. Starting from (H2c? SiHBr)3 compound 13 is accessible by reaction with KCo(CO)4. In the soluted compounds the metal carbonyl groups occupy the equatorial positions in the chair form of the six membered ring. The reaction of 13 with Co2(CO)8 yields 17 , whereas 6 preferrably forms 18 . Starting from (H2C? SiH2)3 the reaction with Co2(CO)2 preferrably yields 19. The reported compounds are crystalline, air – and moisture – sensitive. The reported formulae are assured by analysis, IR, and NMR investigations.  相似文献   

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