Comparisons of glow discharge polymerization between hexamethyldisilazane and trimethylsilyldimethylamine

Glow discharge polymerization between hexamethyldisilazane (HMDSZ) and trimethylsilyldimethylamine (TMSDMA) was compared by means of infrared spectroscopy and ESCA analysis. Infrared spectra pointed out differences in chemical structure between the polymers prepared from the two monomers, although the two polymers were mainly composed of resembling units such as Si? CH₃, Si? CH₂, Si? H, Si? O? Si, and Si? O? C groups: (i) The polymers prepared from TMSDMA contained N → O group, but the polymers from HMDSZ did not contain this group. (ii) Influences of the W/FM parameter (W is the input energy of rf power, F the flow rate of the monomer, and M the molecular weight of the monomer) appeared on decreasing the C? N group and increasing the C?O group in the TMSDMA system, but little influence appeared in the HMDSZ system. ESCA spectra (C_1s, Si_2p, and N_1s core levels) supported the differences between the two polymers elucidated by infrared spectroscopy, and pointed out differences in susceptibility of the Si? N bond to plasma: The N? Si sequence of TMSDMA was completely ruptured in discharge to yield polymers, and the Si? NH? Si sequence of HMDSZ remained in considerable amount.     

Substituent effects of methoxy,methyl, and vinyl groups on glow discharge polymerization

Glow discharge polymerizations in systems of trimethoxymethylsilane, trimethoxyvinylsilane, tetramethylsilane, and trimethylvinylsilane were compared by elemental analysis, infrared (IR) spectroscopy, and ESCA to reveal effects of methoxyl, methyl, and vinyl substituents. The substituent effects appeared in the chemical composition of the polymers formed especially at low W/FM values. Methoxy groups depressed the C/Si and H/Si ratios of the polymers rather than the methyl groups, whereas vinyl groups increased the C/Si and H/Si ratios. On IR spectra the polymers formed from silanes that contained methoxy groups showed fewer absorptions due to Si? H groups and strong absorptions due to Si? OH groups. The polymers from those that contained no methoxy groups showed absorptions of Si? H groups and no absorptions of Si? OH groups. These differences in the environment of Si atoms of polymeric chains also appeared in the Si_2p core level spectra, thus indicating the different fragmentation patterns of the starting materials in glow discharge.     

Highly wettable films plasma-polymerized from ethylene oxide

Highly wettable films were prepared by plasma-polymerization from ethylene oxide. The surface energy of the formed films is 65.6 dyn/cm, and the contact-angle of water on the films is 12 degrees. The formation of highly wettable films is limited to the plasma-polymerization conducted at low W/FM values of below 200 MJ/kg. Analyses by infrared spectroscopy and ESCA show that the formed films contain much oxygen residues such as C? O, C? O, and C(O)? O? groups. Such polar groups would contribute high wettability of the plasma-films from ethylene oxide.     

Plasma polymers from chloromethyltrimethylsilane and their modification with sodium azide

Plasma polymerization of chloromethyltrimethylsilane (CMTMS) was investigated by elemental analysis, infrared spectroscopy, and ESCA, and the modification of Cl substituents in the plasma polymers from CMTMS with sodium azide was discussed. CMTMS was plasma polymerized to yield filmy polymers. The polymer deposition rate was faster than that from tetramethylsilane containing no Cl atom. The plasma polymers from CMTMS were mainly composed of CH₃, CH₂, Si? CH₃, Si? O? Si, and Si? O? C groups with a small amount of C? Cl groups. The Cl substituents incorporated into the plasma polymers were capable of substitution reactions with azide groups to form azide polymers.     

Glow discharge polymerization of tetramethylgermanium

A glow discharge polymerization technique was applied in the preparation of germanium-containing polymers. The colorless and transparent polymer films formed from tetramethylgermanium (TMG) were investigated by elemental analysis, infrared (IR) spectroscopy, and ESCA. The reaction of TMG was accompanied by the rupture of bonds between Ge and CH₃ groups which led to mixtures of polymers that consisted of CH₃, CH₂, Ge? CH₃, Ge? O? C, and Ge? O? Ge groups and germanium metal. Most Ge species present at the outermost layers of the films were oxidized subsequently by air, whereas the Ge species at the inner layers still existed as Ge metal. This film-forming process can be explained by the concept of atomic polymerization proposed by Yasuda.

1 See H. Yasuda, J. Polym. Sci. Macromol. Rev., 16 , 199 (1981).

     

Plasma polymerization of ethylene glycol monomethylether and water-vapor permeability

Plasma polymerization of ethylene glycol monomethylether (EGMME) was investigated by elemental analysis, infrared spectroscopy, and ESCA. The surface and permeation properties for the formed polymers were discussed. EGMME was plasma-polymerized to yield films. The films contained a large amount of oxygen-containing groups such as hydroxy, carbonyl, carboxylate ester, and ether groups. The formation of polymers having hydroxy groups was favorable in plasma polymerization at low W/FM values. Their surface energy was high (63.2–57 dyn/cm) and decreased with increasing the W/FM value. The plasma-polymers from EGMME had slightly high water-vapor permeability and low oxygen and nitrogen permeabilities. The plasma-polymers, conclusively, are characterized to have high selectivity in water-vapor permeation.     

Radiation effects on silicon-containing polyacetylenes

Si-containing mono- and disubstituted polyacetylenes(? [CMe?C(SiMe₃)] _n? , ? [CH?H(n? C₅H₁₁)SiMe₃]_n? , etc.) underwent degradation in air; many of them exhibited relatively high yields of main-chain scission (G_s > 1). The G_s values for the polymers having a long n-alkyl group were usually large (ca. 2). In contrast, no polymer degradation occurred in vacuum, indicating that oxygen is necessary for the radiolysis. The polymers irradiated in air contained C?O and Si? O groups, and dissolved in polar solvents, which are nonsolvents of the starting polymers. From the radiation sensitivity and thermal degradability of these polymers, it is concluded that disubstituted polymers with high Si contents (? [CMe?C(SiMe₃)]_n? , ? [CMe?C(SiMe₂CH₂SiMe₃)]_n? , etc.) are not only radiation-sensitive but also thermally stable.     

Plasma polymerization of tetrafluoroethylene. III. Reproducibility and effects of substrate and reactor materials

Plasma polylmerization occurs in plasmas surrounded by surfaces and polymer formation is one of the complicated interactions that take place between active species and molecules which constitute surfaces and gas phases. Effects of reactor wall, substrate materials, flow rate, and discharge power on polymer formation, and properties of polymer deposits were investigated by ESCA, IR (infrared) spectroscopy, and the measurement of system pressure. The effect of surface is important at the initial stage of plasma polymerization which can be easily detected by the system pressure change; however, integrated properties such as IR spectroscopy and the deposition rate show the effect in a less pronounced manner. ESCA, which reflects the properties of surface (approximately 20 A? in depth), showed the effect of surface in an even less sensitive manner. The amount and properties (including the effects of surfaces) are dependent on plasma polymerization parameter W/FM(W, wattage; F, volume flow rate; and M, molecualar weight of monomer) and the location of deposition within a reactor. IR and ESCA data clearly showed the dependence of polymer properties on W/FM; i.e., increase of W and decrease of M to be equivalent. When all these factors were kept under control, the reproducibility of plasma polymerization was found to be excellent.     

Mass spectometry of aralkyl compounds with a functional group—VI1: Mass spectra of 1-phenylethyanol-1, 2-phenylethanol-1 and 1-phenylpropanol-2

Mass spectra of 1-phenylethanol-1 and its analogues, specifically deuterated in the aliphatic chain, suggest that the [M? CH₃]⁺ ion is represented partly by an α-hydroxybenzyl fragment. Moreover, the molecular ion loses successively—after scrambling of all hydrogen atoms, except those of CH₃? a hydrogen atom and C₆H₆, generation the CH₃CO⁺ ion. Diffuse peaks, found in the spectra of of 2-phenylethanol-1 and its analogues, specifically deuterated in the aliphatic chain and in the phenyl ring, show that the molecular ion loses C₂H₄O, possibly via a four-center mechanism, after an exchange of aromatic and hydroxylic hydrogens. Mass spectra of 1-phenylpropanol-2 and its analogues, specifically, deuterated in the aliphatic chain, demonstrate that in the molecular ion exclusively the hydroxyl hydrogen atom is transferred to one of the ortho-positions of the phenyl ring via a McLafferty rearrangement, generating the [M ? C₂H₄O]⁺ ion. Furtherore, an eight-membered ring structure is proposed for the [M ? CH₃]⁺ ion to explain the loss of H₂O and C₂H₂O from this ion after an extensive scrambling of hydrogen atoms.     

Charakterisierung von Organokieselsäurepolymeren durch thermoanalytische Untersuchungen

Four organosilicate polymers synthesized by addition of vinyl- and H-substituted double four-ring silicic acid derivatives were characterized using DSC and simultaneous TG-DTA measurements. Thermooxidative decomposition proceeds in several steps: Oxidation of (Si?H) groups, oxidation of (Si?CH₂?CH₂?Si) bridges, and oxidation of (Si?CH₃) groups, with formation of new (Si?O?Si) bonds.²⁹Si-NMR-spectroscopic measurements confirm this interpretation. Thermoanlytical methods of investigation proved useful to characterize these organosilicate polymers.     

Spektroskopische Untersuchungen an Phenoxydimethylfloursilanen

Spectroscopie Investigations on R? C₆H₄O(CH₃)₂SiF Compounds The i.r. and Raman spectra of a number of R? C₆H₄O(CH₃)₂SiF compounds (R = H, CH₃, CH₃O, Cl, Br, NO₂, NH₂) have been recorded. The intramolecular and intermolecular interactions were discussed by means of ν SiF, ν Si? O? (C), ν C? O? (Si) and ν_s SiC₂ vibrations.     

Tautomerism of monochalcogenosilanoic acids CH3Si(O)XH (X = S,Se, Te) in the gas phase and in the polar and aprotic solution: An ab initio computational investigation

Computational investigations by an ab initio molecular orbital method (HF and MP2) with the 6‐311+G(d,p) and 6‐311++G(2df, 2pd) basis sets on the tautomerism of three monochalcogenosilanoic acids CH₃Si(?O)XH (X = S, Se, and Te) in the gas phase and a polar and aprotic solution tetrahydrofuran (THF) was undertaken. Calculated results show that the silanol forms CH₃Si(?X)OH are much more stable than the silanone forms CH₃Si(?O)XH in the gas‐phase, which is different from the monochalcogenocarboxylic acids, where the keto forms CH₃C(?O)XH are dominant. This situation may be attributed to the fact that the Si? O and O? H single bonds in the silanol forms are stronger than the Si? X and X? H single bonds in the silanone forms, respectively, even though the Si?X (X = S, Se, and Te) double bonds are much weaker than the Si?O double bond. These results indicate that the stability of the monochalcogenosilanoic acid tautomers is not determined by the double bond energies, contrary to the earlier explanation based on the incorrect assumption that the Si?S double bond is stronger than the S?O double bond for the tautomeric equilibrium of RSi(?O)SH (R?H, F, Cl, CH₃, OH, NH₂) to shift towards the thione forms [RSi(?S)OH]. The binding with CH₃OCH₃ enhances the preference of the silanol form in the tautomeric equilibrium, and meanwhile significantly lowers the tautomeric barriers by more than 34 kJ/mol in THF solution. © 2007 Wiley Periodicals, Inc. Int J Quantum Chem, 2008     

Preparation,Properties, and ESCA Characterization of Vanadium Surface Compounds on Silicagel. II

Binding energy (BE) behavior and signal intensity as function of V conc. and ligands L were critically examined in Vⁿ/SiO₂ species (where n = +5, +4, and +3) and securing of optimized products and ESCA samples is described. The results moreover demonstrate conditions and approaches whereby ESCA can provide reliable information on highly diluted surface compound systems. From aquous media 1.0–1.2 wt. % V^V and 0.4–1.2 wt. % V^III proved to be preferred ranges whereas in non aqueous (metalorganic) preparates the surprisingly low concentration of 0.4–0.15 wt. % V^III gave usable spectra and even 0.4 wt. % V^V could be measured. ESCA data with the peroxo complex (?Si? O)₃V? (O₂) (I) confirmed these trends. Superiorly subdivided surface compounds (reflected in the quality of spectra) are obtainable from V[N(SiMe₃)₂]₃ impregnations where 0.4–0.5 wt. % V^III (or V^V) are maximum/optimum conc. limits. Evidence for formulating Vⁿ/SiO₂ as three legged surface compounds is summarized and diagnostic/predictive uses of the additivity principle for surface electron states illustrated. In the (?Si? O)₃V? L series, where L = none, ?O, and ? (O₂) positive ΔBE shifts for ?Si? O? V (0.7 eV); V?O (0.6 eV); and V? (O₂) (0.4 eV) were estimated. Tentative BE contributions of some donor ligands (and ? Cl) are also suggested. In (I) ESCA indicated a formal oxidation state of approx. +4. Certain limits (precautions) with ESCA are noted and extensions of the additivity relationship discussed.     

Synthesis of comb‐type polycarbosilanes via nucleophilic substitution reactions on the main‐chain silicon atoms

A series of comb‐type polycarbosilanes of the type [Si(CH₃)(OR)CH₂]_n {where R = (CH₂)_mR′, R′ = ? O‐p‐biphenyl? X [X = H (m = 3, 6, 8, or 11) or CN (m = 11)], and R′ = (CF₂)₇CF₃ (m = 4)} were prepared from poly(chloromethylsilylenemethylene) by reactions with the respective hydroxy‐terminated side chains in the presence of triethylamine. The product side‐chain polymers were typically greater than 90% substituted and, for R′ = ? O‐p‐biphenyl? X derivatives, they exhibited phase transitions between 27 and 150 °C involving both crystalline and liquid‐crystalline phases. The introduction of the polar p‐CN substituent to the biphenyl mesogen resulted in a substantial increase in both the isotropization temperature and the liquid‐crystalline phase range with respect to the corresponding unsubstituted biphenyl derivative. For R = (CH₂)₁₁? O‐biphenyl side chains, an analogous side‐chain liquid‐crystalline (SCLC) polysiloxane derivative of the type [Si(CH₃)(O(CH₂)₁₁? O‐biphenyl)O]_n was prepared by means of a catalytic dehydrogenation reaction. In contrast to the polycarbosilane bearing the same side chain, this polymer did not exhibit any liquid‐crystalline phases but melted directly from a crystalline phase to an isotropic liquid at 94 °C. Similar behavior was observed for the polycarbosilane with a fluorocarbon chain, for which a single transition from a crystalline phase to an isotropic liquid was observed at ?0.7 °C. The molecular structures of these polymers were characterized by means of gel permeation chromatography and high‐resolution NMR studies, and the crystalline and liquid‐crystalline phases of the SCLC polymers were identified by differential scanning calorimetry, polarized optical microscopy, and X‐ray diffraction. © 2003 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 41: 984–997, 2003     

Polymerization of 1-(trimethylsilyl)-1-propyne homologs containing two silicon atoms by tantalum- and niobium-based catalysts

Polymerization of new 1-(trimethylsilyl)-1-propyne homologs containing two silicon atoms [CH₃C?CSi(CH₃)₂CH₂Si(CH₃)₃ and CH₃C?CSi(CH₃)₂CH₂CH₂Si(CH₃)₃] was investigated by use of Ta and Nb catalysts. CH₃C?CSi(CH₃)₂CH₂Si(CH₃)₃ was polymerized quantitatively by TaCl₅ alone to provide a polymer having molecular weight over 10⁶. CH₃C?CSi(CH₃)₂CH₂CH₂Si(CH₃)₃ was polymerized in good yield by an equimolar mixture of TaCl₅ with an appropriate organometallic cocatalyst such as Ph₄Sn to give a polymer with molecular weight of ca. 4 X 10⁵. Nb catalysts were less active toward these monomers than the corresponding Ta catalysts. These two kinds of polymers had alternating double bonds along the main chain according to IR and ¹³C-NMR spectra. Both polymers were white solids completely soluble in low-polarity solvents like toluene, and solution casting afforded uniform, tough films. These polymers were thermally fairly stable, and their softening points were above 350°C. Films of these polymers showed smaller oxygen permeability coefficients [P = 4 × 10^?9 – 8 × 10^?9 cm³(STP) · cm/(cm²·sec·cmHg)] but larger separation factors [(P/P) = 3.4 – 3.6] than a poly[1-(trimethylsilyl)-1-propyne] film.     

Plasma homo- and copolymerizations of tetrafluoroethylene and chlorotrifluoroethylene

The plasma homo- and copolymerizations of tetrafluoroethylene (TFE) and chlorotrifluoroethylene (CTFE) in a capacitively coupled tubular reactor (TR) with external electrodes were studied by means of microgravimetry and FT-IR and XPS analyses. The deposition rates for CTFE/TFE plasma copolymers, as well as the ratios of IR absorbances at 1180 and 1225 cm⁻¹, and the XPS-derived Cl/C and F/C ratios, varied regularly with mol % CTFE in the feed, all of which results were dependent upon the rf power at which the plasma copolymerizations were conducted. The deposition rates for the plasma homopolymers of TFE (PPTFE) and CTFE (PPTCFE) depended markedly on rf power (W) and monomer molar flow rate (F). The F/C ratio for PPTFE was nearly independent of the composite parameter,W/FM (whereM is the monomer molecular weight), while for PPCTFE, the F/C ratio decreased significantly and the Cl/C ratio increased slightly with increase inW/FM. The percentage of carbon as CF₃ was 20–24% in PPTFE and 7–14% in PPCTFE. Plots of deposition rate versusW/FM for PPTFE and PPCTFE obtained in a TR differed considerably from corresponding plots in the literature for the same homopolymers prepared in a glass-cross or bell-jar reactor.     

UV laser deposition of nanostructured Si/C/O/N/H from disilazane precursors and evolution to silicon oxycarbonitride

Megawatt ArF laser photolysis of gaseous methyldisilazanes [(CH₃)_nH_3?nSi]₂NH (n = 2, 3) in excess of Ar yields hydrocarbons (major volatile products), methylsilanes (minor volatile products) and allows chemical vapour deposition of solid amorphous Si/C/O/N/H powder containing Si? X (X? C, H, O, N) bonds. The incorporation of O is due to a high reactivity of the primarily formed products towards air moisture. The resulting solid materials possess nanometer‐sized texture and high specific area, contain Si‐centered radicals and anneal under argon to silicon oxycarbonitride, whose structure is described as a network of O‐ and N‐interconnected Si and C atoms. Copyright © 2006 John Wiley & Sons, Ltd.     

13C NMR of organosulphur compounds: I—the effects of sulphur substituents on the 13C chemical shifts of alkyl chains and of S-heterocycles

The ¹³C NMR spectra have been determined of: (i) aliphatic compounds having at one end a functionalized sulphur atom (? SH, ? S^?, ? SMe, ? S(O)Me, ? SO₂Me and ? S⁺Me₂) and (ii) saturated sulphur heterocycles variously substituted at the S-atom . The results are discussed in terms of the familiar deshielding effects for α- and β-carbons and shielding effects for γ-carbons, exerted by the sulphur atom itself and/or by the atoms or groups of which the sulphur function is made up. The γ-effect of the S-atom appears to be nearly independent of the nature of the S-function and of comparable magnitude to that of an aliphatic carbon (?2·5 + ?3·0 ppm). Surprisingly, however, a S? CH₃ group shields the carbon in γ position with respect to CH₃ by an amount (?5·4 ppm) which is more than twice that (?2·5 ppm) exerted by the aliphatic γ-carbon on the S-CH₃ carbon itself. As to the cyclic compounds, the shieldings of the α- and β-carbons can be rationalized in terms of the conformational orientation of the substituent at sulphur, and the equilibrium distribution of the conformers. The results confirm the great value of ¹³C NMR for configurational and conformational assignment of S-heterocycles.     

Ring-opening polymerization of ethylene organophosphorothioates: Stereoregular polymerization involving asymmetry at phosphorus

Stereoregular polymerization involving asymmetry at phosphorus has been obtained from ethylene methyl or phenyl phosphorothioate with R₂Mg? NH₃ catalysts, or, in some cases, with R₂Mg alone. The methyl ester gave two types of polymer: an amorphous rubber and a low-melting (75°C) crystalline polymer. The phenyl ester gave mainly a low-melting (68°C) crystalline polymer of 2.2 inherent viscosity. Proton and ³¹P NMR and infrared spectra of these polymers are in accord with the expected chain unit, ? CH₂CH₂? O? P(S)(OR)? O? . The polymerization mechanism probably involves an anionic ring-opening step with P? O cleavage. Ring opening with C? O cleavage appears to be largely excluded. This conclusion is based on the expectation that anionic ring opening with C? O cleavage should lead to a rearranged chain unit, ? CH₂CH₂? O? P(O)? (OR)? S? , because of the high nucleophilicity of sulfur as compared with oxygen. Proton and ³¹P NMR spectra give no evidence for the rearranged unit within the limit of detection (ca. 3%). However, on aging, the methyl ester polymer changes drastically to form up to 40% CH₂SP groups. Presumably, the polymer undergoes the well-known thiono-thiolo rearrangement characteristic of simple phosphorothioate esters to form ? CH₂CH₂? O? P(O)(SCH₃)? O? chain units. The phenyl ester polymer is stable under the same aging conditions.     

Characterization of plasma polymers from tetramethylsilane,octamethylcyclotetrasiloxane, and methyltrimethoxysilane

The products in inductively coupled plasma excited in organosilicic compounds were studied on chemical structures by spectroscopic methods. Plasma-polymerized tetramethylsilane (PA) contains not only Si? CH₃ groups but also Si? H groups on IR and ²⁹Si-NMR analyses. ¹³C-NMR spectrum of PA reveals that the crosslinked structure of PA is mainly constructed of Ch₂ and CH groups. Plasma-polymerized octamethyleyclotetrasiloxane (PD₄) is composed of Si? CH₃ and Si? O groups. ¹³C- and ²⁹Si-NMR spectra of PD₄ point out the highly preservation of the structural units similar to the monomer. These data of PD₄ suggest that PD₄ is formed from the ring-opening polymerization by cleavages of Si? O bonds. ¹³C-NMR spectrum of poly[methyltrimethoxysilane] (PT) indicates the existence of CH₃? O groups, meanwhile its ²⁹Si-NMR analysis concludes that PT is chiefly composed of the structural units similar to the monomer. The surface analyses by XPS of PA, PD₄ and PT suggest that these organosilicic plasma polymers resemble their starting materials.