硼硫协同掺杂金刚石的高压合成与电学性能研究

FeNiMnCo-C体系中,在压力6.5 GPa、温度1280—1300℃的极端物理条件下,采用温度梯度法成功合成了硼(B)、硫(S)协同掺杂金刚石大单晶.通过傅里叶红外光谱测试对高温高压所制备金刚石中的杂质进行了表征.借助霍尔效应对典型金刚石样品的电输运性能进行了测试,测试结果表明:硼硫协同掺杂有利于提高p型金刚石的电导率,而且硼硫在合成体系中的添加比例可以决定金刚石的p, n特性.此外,第一性原理计算结果表明,合成体系中不同比例的硼硫协同掺杂对金刚石的p, n特性以及电导率有着直接的影响,计算结果与实验测试结果相吻合.     

硼氢协同掺杂Ib型金刚石大单晶的高温高压合成与电学性能研究

在压力6.0 GPa和温度1600 K条件下, 利用温度梯度法研究了(111)晶面硼氢协同掺杂Ib型金刚石的合成. 傅里叶红外光谱测试表明: 氢以sp³杂化的形式存在于所合成的金刚石中, 其对应的红外特征吸收峰位分别位于2850 cm^-1和2920 cm^-1处. 此外, 霍尔效应测试结果表明: 所合成的硼氢协同掺杂金刚石具有p型半导体材料特性. 相对于硼掺杂金刚石而言, 由于氢的引入导致硼氢协同掺杂金刚石电导率显著提高. 为了揭示硼氢协同掺杂金刚石电导率提高的原因, 对不同体系进行了第一性原理理论计算, 计算结果表明其与实验结果符合. 该研究对金刚石在半导体领域的应用有重要的现实意义.     

表面悬挂键导致硅纳米线掺杂失效机理的第一性原理研究

利用第一性原理方法, 本文计算了B/N单掺杂SiNWs, 以及含有表面悬挂键的B/N单掺杂硅纳米线的总能和电子结构, 计算结果表明, 悬挂键的出现会导致单原子掺杂失效. 能带结构分析表明, B/N掺杂的H钝化的SiNWs表现出正常的p/n特性, 而表面悬挂键(dangling binding, DB)的存在会导致p型(B原子)或者n型(N原子)掺杂失效; 其失效的原因主要是因为表面悬挂键所引入的缺陷能级俘获了n型杂质(p型杂质)所带来的电子(空穴); 利用小分子(SO₂)吸附饱和悬挂键可以起到激活杂质的作用, 进而实现Si纳米线的有效掺杂.     

B/N掺杂对双层石墨烯电子特性影响的第一性原理研究

利用平面波超软赝势方法研究了B/N原子单掺杂和共掺杂对双层石墨烯电子特性的影响.对掺杂双层石墨烯进行结构优化,并计算了能带结构、态密度、分波态密度等.分析表明,层间范德瓦尔斯相互作用对双层石墨烯的电子特性有比较明显的影响;B/N原子单掺杂分别对应p型和n型掺杂,会使掺杂片层的能带平移,使得体系能带结构产生较大分裂;双层掺杂的石墨烯能带结构与掺杂原子的相对位置和距离有关,对电子特性有明显的调控作用.其中特别有意义的是,B/N双层共掺杂在不同位置情况下会得到金属性或禁带宽度约为0.3 eV的半导体能带.     

B、N单掺杂3C-SiC电子结构和光学性质的第一性原理研究

采用第一性原理的密度泛函理论赝势平面波方法,计算了未掺杂与B、N单掺杂3C-SiC的电子结构和光学性质.结果表明:掺杂改变了3C-SiC费米面附近的电子结构;B掺杂使得禁带宽度减小,价带顶上移,费米能级进入价带,形成p型半导体;N掺杂使得禁带宽度减小,导带底下移,费米能级进入导带,形成n型半导体.B、N掺杂均提高了3C-SiC在低能区的折射率、消光系数和吸收系数,增强了对红外光谱的吸收.     

B,N协同掺杂金刚石电子结构和光学性质的第一性原理研究

基于金刚石的稳定结构, 在实验研究的基础上, 本文采用基于周期性密度泛函理论计算了B/N单掺杂、共掺杂金刚石的晶体结构, 并就掺杂方式和掺杂后形成能进行了对比研究, 得到了B/N双掺杂的最稳定结构. 在此基础上, 进一步计算了N单掺杂及B/N共掺杂最稳定结构的吸收光谱、电子结构和态密度. 通过与实验结果对比可以看出, 较N单掺杂, B/N共掺杂的吸收光谱发生明显红移, 与实验符合较好. 计算结果表明: N原子单掺杂优先于B原子; 由于原子间的协同作用, B/N近邻共掺杂体系的形成能最低, 为掺杂的最可能结构.     

掺杂CVD金刚石薄膜的应力分析

在不同实验条件下，用微波等离子体化学气相沉积(MPCVD)技术在Si基体上制备了S掺杂和B-S共掺杂CVD金刚石薄膜，利用X射线衍射仪和拉曼光谱仪研究掺杂对CVD金刚石薄膜的应力影响.研究结果发现，随着S掺杂浓度的增加，薄膜中sp²杂化碳含量和缺陷增多，CVD金刚石薄膜压应力增加；小尺寸的B原子与大尺寸的S原子共掺杂时，微量B的加入改变了CVD金刚石薄膜的应力状态，共掺杂形成B-S复合体进入金刚石晶体后降低金刚石晶体的晶格畸变程度，减少S原子在晶界上偏聚数量和晶体中非金刚石结构相含量，降低由于杂质、缺陷及sp²杂化碳含量产生的晶格畸变和薄膜压应力，提高晶格完整性. 关键词： 金刚石薄膜 掺杂 应力     

电子辐照金刚石的光致发光研究

本文利用488 nm及325 nm激光器比较了超纯、氮掺杂及硼掺杂三种金刚石经电子辐照所形成的光学中心. 结果表明, 金刚石中引入施主或受主原子后, 形成了新的光学中心, 如NV, DB1中心.     

表面活性剂和n型载流子对钴掺杂氧化锌薄膜铁磁性的双重调控

本文提出了一种利用表面活性剂钝化和电子载流子掺杂来调制钴掺杂氧化锌稀磁半导体薄膜固有铁磁性的"双重操纵效应"新方法.第一性原理计算表明,氢表面钝化作为薄膜表面Co-O-Co磁耦合的磁开关,可以控制掺杂钴原子的自旋极化.同时,电子载流子掺杂可以进一步用作类层状铁磁性媒介来调节薄膜内部原子层的铁磁性.该双重操纵效应揭示了n型钴掺杂氧化锌稀磁半导体薄膜的本质铁磁性来源,并且还有可能用作其他n型稀磁半导体氧化物薄膜增强铁磁性的替代策略.     

表面活性剂和n型载流子对钴掺杂氧化锌薄膜铁磁性的双重调控（英文）

本文提出了一种利用表面活性剂钝化和电子载流子掺杂来调制钴掺杂氧化锌稀磁半导体薄膜固有铁磁性的"双重操纵效应"新方法.第一性原理计算表明,氢表面钝化作为薄膜表面Co-O-Co磁耦合的磁开关,可以控制掺杂钴原子的自旋极化.同时,电子载流子掺杂可以进一步用作类层状铁磁性媒介来调节薄膜内部原子层的铁磁性.该双重操纵效应揭示了n型钴掺杂氧化锌稀磁半导体薄膜的本质铁磁性来源,并且还有可能用作其他n型稀磁半导体氧化物薄膜增强铁磁性的替代策略.     

Effect of excess hydrogen on the electronic properties of passivated diamond

Recently, Yan et al. reported a theoretical approach to overcome the n-type doping problem of diamond by passivating the B acceptor and the reduction of ionization energy of dopants. Using the proposed approach, we have systemically investigated the effect of excess H atoms on the electronic properties of a passivated system [diamond doped with (B+H) complex] based on the variation of Fermi level from first-principle calculations. The results show that the excess H atom is responsible for n-type behavior when all valence electrons of substitutional B atom participate in the hybridization between substitutional B and H atoms. On the contrary, when part of valence electrons of the substitutional B atom participates in the hybridization, H atoms make the passivated system show p-type or insulator behavior. Further study indicates that the excess H atoms are more apt to make the passivated system show p-type rather than n-type behavior under the same conditions. It leads to a much more comprehensive understanding of the interaction between the excess H atoms and the passivated system compared with that of Yan et al. The results may be useful to provide guidance for experimental work on obtaining n-type diamond in the future.     

Electronic and structural properties of black phosphorene doped with Si,B and N

The electronic and structural properties of substitutional and doped phosphorene with B, N and Si were studied using first principles calculations based on density functional theory. Moreover, electronic and structural properties of functionalized phosphorene slowly increasing the concentration of doping was investigated. Phosphorene strongly binds with doped functionalization; B doped phosphorene is the most stable configuration studied. Si doped phosphorene maintains the semiconductor characteristic. B and N doped phosphorene present n-type and p-type semiconductors, respectively. Doped phosphorene with odd number of Si is a semiconductor material, doped phosphorene with an odd number of B has n-type semiconductor characteristic, and doped phosphorene with odd number of N atoms has a p-type semiconductor behaviour. Doped phosphorene with even number of Si has a metallic characteristic, while B and N doped phosphorene with even number present a semiconductor behaviour. This work reveals that phosphorene electronic properties could be changed by introducing the dopants on the system, and the properties are affected by the increasing number of dopants on phosphorene sheet.     

A molecular dynamics study of boron and nitrogen in diamond

Based upon molecular dynamics simulation via the Tersoff many-body potential, we proposed the co-doping method for fabricating n-type diamond. We calculated the optimal co-doping configurations of n-type (nitrogen) and p-type (boron) dopants, the stable structure of a boron atom in diamond is associated with four nitrogen atoms placed at the nearest neighbour positions, the total energy of the system with the stable structure is 136 MeV lower than that of the system with the nitrogen atoms placed in others positions. The results indicated that the co-dopants of nitrogen and boron were the perfect candidates to make n-type diamond, and additional boron would increase the solubility limit of nitrogen in diamond, reduce the lattice-relaxation energy of crystal and improve its doping efficiency in diamond.     

High-performance inverters based on ambipolar organic-inorganic heterojunction thin-film transistors

This work reports on the integration of organic and inorganic semiconductors as heterojunction active layers for highperformance ambipolar transistors and complementary metal-oxide-semiconductor(CMOS)-like inverters. Pentacene is employed as a p-type organic semiconductor for its stable electrical performance, while the solution-processed scandium(Sc) substituted indium oxide(Sc In O) is employed as an n-type inorganic semiconductor. It is observed that by regulating the doping concentration of Sc, the electrical performance of the n-type semiconductor could be well controlled to obtain a balance with the electrical performance of the p-type semiconductor, which is vital for achieving high-performance inverters. When the doping concentration of Sc is 10 at.%, the CMOS-like logic inverters exhibit a voltage gain larger than 80 and a wide noise margin(53% of the theoretical value). The inverters also respond well to the input signal with frequency up to 500 Hz.     

Electronic Structures and Thermoelectric Properties of ZnSb Doped with Cd and In from First Principles Calculations

Thermoelectric properties of pure,Cd-and In-doped ZnSb are studied by first principles calculations of electronic structures and the semi-classical Boltzmann transport theory.The doping of Cd or In at the Zn lattice site slightly increases the lattice parameters due to the larger atomic radii of Cd and In compared with that of Zn.Cd or In doping also apparently increases the interatomic distances between the dopant atoms and the surrounding atoms.The power factor of n-type ZnSb is much larger than that of p-type ZnSb,indicating that n-type ZnSb has better thermoelectric performance than p-type ZnSb.After the doping of Cd or In,the power factor reduces mainly due to the decrease of the electrical conductivity.The temperature dependences of the Seebeck coefficient and the power factor of pure,Cd-and In-doped ZnSb are related to carrier concentrations.     

掺杂GaN/AlN超晶格第一性原理计算研究

第一性原理计算方法在解释实验现象和预测新材料结构及其性质上有着重要作用. 因此, 通过基于密度泛函理论的第一性原理的方法, 本文系统地研究了Mg和Si掺杂闪锌矿和纤锌矿两种晶体结构的GaN/AlN超晶格体系中的能量稳定性以及电学性质. 结果表明: 在势阱层(GaN 层)中, 掺杂原子在体系中的掺杂形成能不随掺杂位置的变化而发生变化, 在势垒层(AlN层)中也是类似的情况, 这表明对于掺杂原子来说, 替代势垒层(或势阱层)中的任意阳离子都是等同的; 然而, 相比势阱层和势垒层的掺杂形成能却有很大的不同, 并且势阱层的掺杂形成能远低于势垒层的掺杂形成能, 即掺杂元素(Mg_Ga, Mg_Al, Si_Ga和Si_Al)在势阱区域的形成能更低, 这表明杂质原子更易掺杂于结构的势阱层中. 此外, 闪锌矿更低的形成能表明: 闪锌矿结构的超晶格体系比纤锌矿结构的超晶格体系更易于实现掺杂; 其中, 闪锌矿结构中, 负的形成能表明: 当Mg原子掺入闪锌矿结构的势阱层中会自发引起缺陷. 由此, 制备以闪锌矿结构超晶格体系为基底的p型半导体超晶格比制备n型半导体超晶格需要的能量更低并且更为容易制备. 对于纤锌矿体系来说, 制备p型和n型半导体的难易程度基本相同. 电子态密度对掺杂体系的稳定性和电学性质进一步分析发现, 掺杂均使得体系的带隙减小, 掺杂前后仍然为第一类半导体. 综上所述, 本文内容为当前实验中关于纤锌矿结构难以实现p型掺杂问题提供了一种新的技术思路, 即可通过调控相结构实现其p型掺杂.     

Significant enhancement of ferromagnetism in Zn1-xCrxTe doped with iodine as an n-type dopant

The effect of additional doping of charge impurities was investigated in a ferromagnetic semiconductor Zn1-xCrxTe. It was found that the doping of iodine, which is expected to act as an n-type dopant in ZnTe, brought about a drastic enhancement of the ferromagnetism in Zn1-xCrxTe, while the grown films remained electrically insulating. In particular, at a fixed Cr composition of x=0.05, the ferromagnetic transition temperature TC increased up to 300 K at maximum due to the iodine doping from TC=30 K of the undoped counterpart, while the ferromagnetism disappeared due to the doping of nitrogen as a p-type dopant. The observed systematic correlation of ferromagnetism with the doping of charge impurities of both the p and n type, suggesting a key role of the position of Fermi level within the impurity d state, is discussed on the basis of the double-exchange interaction as a mechanism of ferromagnetism in this material.