a-SiNx/nc-Si/a-SiNx双势垒结构中的电荷隧穿和存储效应

在等离子体增强化学气相沉积系统中利用大氢稀释逐层淀积技术制备nc-Si量子点阵列,用硅烷和氨气混合气体淀积氮化硅层,制备了a-SiN_x/nc-Si/a-SiN_x不对称双势垒结构,其中隧穿和控制a-SiN_x层的厚度分别为3和20 nm.利用电导-电压和电容-电压测量研究结构中的载流子隧穿和存储特性.在同一样品中观测到由于电荷隧穿引起的电导峰和由于电荷存储引起的电容回滞现象.研究结果表明,合理地选择隧穿层和控制栅层的厚度,就能够实现载流子发生共振隧穿进入到nc-Si量子点中,并被保存在nc-Si量子点中. 关键词： nc-Si量子点 电导峰 存储效应     

双栅调控的硅量子线中的库仑振荡效应

基于单电子隧穿和库仑阻塞效应,研究了硅量子线中的单电子输运特性.利用绝缘体上硅薄膜材料作为衬底构建侧栅结构的硅量子线单电子晶体管,通过背栅和侧栅对量子线的电子输运特性进行调制.实验发现,在硅量子线中分别观察到背栅和侧栅调制的单电子效应和库仑振荡现象.从微分电导的二维灰度轮廓图,清楚地观察到了库仑阻塞区,说明由于栅压导致在硅量子线中形成了库仑岛. 关键词： 库仑振荡 单电子效应 硅量子线     

一种纳米硅薄膜的传导机制

基于对实验和理论的分析，提出一种异质结量子点隧穿（HQD）模型，并导出了纳米硅薄膜电导率完整的表达式．其主要思想是，纳米硅薄膜中的微晶粒（几个纳米大小）具有量子点特征，在微晶粒与界面之间由于两者能隙的差异构成晶间势垒，这类似于多晶硅中经常使用的晶间势垒模型（GBT）．考虑到量子点中的单电子隧穿特征，认为纳米硅薄膜中的电传导是由微晶粒中电子弹道式输运与单电子越过势垒的隧穿构成的．这就是HQD模型的主要内容，理论结果与实验相符 关键词：     

多岛单电子晶体管的实现及其源漏特性分析

在淀积有纳米间隙栅电极、源电极和漏电极的衬底上生长量子点，制作出多岛结构的单电子晶体管.在77K温度下对源漏特性进行了测试，得到了库仑阻塞特性.并且成功抑制了单岛单电子晶体管中易出现的共隧穿效应，观察到较大的库仑阈值电压.对试验数据进行了分析，阐明了岛的不同结构组态产生的不同输运效果. 关键词： 单电子晶体管 量子点 库仑阻塞     

超薄栅氧化层n-MOSFET软击穿后的导电机制

研究了恒压应力下超薄栅氧化层n型金属-氧化物-半导体场效应晶体管（n-MOSFET）软击穿 后的导电机制.发现在一定的栅电压V_g范围内，软击穿后的栅电流I_g符合Fowl er-Nordheim隧穿公式，但室温下隧穿势垒_b的平均值仅为0936eV，远小于S i/Si O₂界面的势垒高度315eV.研究表明，软击穿后，处于Si/SiO₂界 面量子化能级上的 电子不隧穿到氧化层的导带，而是隧穿到氧化层内的缺陷带上._b与缺陷带能 级和电 子所处的量子能级相关；高温下，激发态电子对隧穿电流贡献的增大导致_b逐 渐降低. 关键词： 软击穿 栅电流 类Fowler-Nordheim隧穿 超薄栅氧化层     

薄栅氧化层经时击穿的实验分析及物理模型研究

通过衬底热载流子注入技术,对薄SiO₂层击穿特性进行了研究.与通常的F-N应力实验相比较,热载流子导致的薄栅氧化层击穿显示了不同的击穿特性.通过计算注入到氧化层中的电子能量和硅衬底的电场的关系表明,热电子注入和F-N隧穿的不同可以用氧化层中电子的平均能量来解释.热空穴注入的实验结果表明薄栅氧化层的击穿不仅由注入的空穴数量决定.提出了全新的热载流子增强的薄栅氧化层经时击穿模型 关键词： 薄栅氧化层 经时击穿 衬底热载流子 击穿电荷 模型     

利用N型半导体纳米材料抑制单量子点的荧光闪烁特性

利用N型半导体纳米材料氧化铟锡(ITO)作为单CdSe/ZnS量子点的基质来抑制单量子点的荧光闪烁特性. 实验采用激光扫描共聚焦显微成像系统测量了单量子点荧光的亮、暗态持续时间的概率密度分布的指数截止的幂律特性, 并与直接吸附在SiO₂玻片上的单CdSe/ZnS量子点的荧光特性进行比较. 研究发现处于ITO中的单量子点比SiO₂玻片上的单量子点荧光亮态持续时间提高两个数量级, 掺杂于ITO中的单量子点的荧光寿命约减小为SiO₂玻片上的单量子点的荧光寿命的41%, 并且寿命分布宽度变小50%.     

小尺寸MOSFET隧穿电流解析模型

基于表面势解析模型，通过将多子带等效为单子带，建立了耗尽/反型状态下小尺寸MOSFET直接隧穿栅电流解析模型.模拟结果与自洽解及实验结果均符合较好，表明此模型不仅可用于SiO₂、也可用于高介电常数(k)材料作为栅介质以及叠层栅介质结构MOSFET栅极漏电特性的模拟分析，计算时间较自洽解方法大大缩短，适用于MOS器件电路模拟. 关键词： 隧穿电流 MOSFET 量子机理 解析模型     

一种新型的高频半导体量子点单电子泵

除了直流负电压外,还在浅法刻蚀出的GaAs/AlGaAs量子线上的两个金属指形门上分别叠加两个相位相差π的正弦信号,从而对形成量子点的两个势垒作不等幅调制.在无源漏偏压的情况下,通过周期形成的量子点实现了单电子的搬运.由于新的半导体量子点单电子泵不是依赖库仑阻塞效应通过隧穿进行单电子输运,因此,该器件就不会受到固定隧穿时间引起的低工作频率限制.在1.7K温度下,频率达到3GHz仍然可以观测到量子化电流平台,对应的电流值达到0.5nA量级.这种新器件提供了实现高速度、高精度搬运单电子的另一种可能途径. 关键词： 单电子输运 单电子旋转门 单电子泵 量子化电流平台     

InAs自组装量子点GaAs肖特基二极管中的电流输运特性

设计了含有InAs自组装量子点(SAQDs)的新型金属半导体金属隧穿结构,研究了其直流输运特性,观察到了电流迟滞回路现象.这种回路现象是由于紧邻金属肖特基接触的量子点充电和放电引起的,也可以说是由外加电压控制的量子点的单电子过程引起的.分析了量子点总体的充放电特性,量子点中电子在高电场下隧穿出量子点的概率变化决定了量子点的放电过程,而充电过程是由流过量子点层的二极管正向电流决定.理论拟合结果显示充电过程主要由于量子点基态能级俘获电子照成的,激发态对量子点充放电过程只有微弱影响. 关键词： 迟滞现象 自组装量子点 单电子过程     

Confocal microscopy of electrostatic properties of Si quantum dots and silica surfaces by charge-sensitive dye molecules

An aminonaphthylethenylpyridinium dye (ANEPPS) has been used to investigate the photoinduced charging of SiO₂ surfaces via fluorescence shifts. Confocal microscopy allows for a localization of the charge distributions of better than 250 nm. The surface becomes negatively charged upon photoexcitation. This effect is enhanced by silicon nanocrystals (quantum dots) of less than 20 nm in diameter. Experiments suggest that ANEPPS occupies the SiO₂ surface in an oriented way.     

氧化硅稳定的氧化锡量子点薄膜的制备及其光学性能

 用溶胶-凝胶-水热过程制备了氧化硅稳定的氧化锡量子点,然后将其分散到氧化硅溶液中,用旋转涂膜的方法制备光学性能良好的氧化硅稳定的氧化锡量子点薄膜。X射线衍射和高分辨透射电镜表征显示氧化锡量子点具有良好的四方金红石晶型,平均粒径约4.0 nm。室温光致发光显示这种氧化硅稳定的氧化锡量子点薄膜在356 nm和388 nm处分别有很强的激子发光和缺陷态发光。根据透射谱拟合得到了氧化锡量子点薄膜的光学禁带宽度,其值约为3.96 eＶ。     

Photoluminescence of germanium quantum dots grown in silicon on a SiO<Subscript>2</Subscript> submonolayer

The photoluminescence of quantum dots in Si/Ge/SiO₂/Si and Si/Ge/Si structures is investigated as a function of temperature. The low activation energies for the temperature quenching of photoluminescence of germanium quantum dots in both structures are explained in terms of the thermally stimulated capture of holes from quantum dots to the energy levels of defects localized in their vicinity.     

Luminescence studies and formation mechanism of symmetrically dispersed ZnO quantum dots embedded in SiO2 matrix

Surface effects significantly influence the functionality of semiconductor nanocrystals. In the current work we present synthesis of ZnO quantum dots (QD) vis-a-vis symmetrically dispersed ZnO quantum dots embedded in SiO₂ matrix and discussed their optical properties to understand the role of the surface effects. These nanomaterials were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), fourier transform infrared (FTIR), absorption (UV-visible) and photoluminescence (PL) spectroscopy. TEM studies confirm the formation of ZnO nanophosphors inside the SiO₂ matrix in highly symmetrical manner. These symmetrically dispersed ZnO@SiO₂ nanophosphors exhibited enhanced stable emission over uncoated sample and would permit the conjugation of the nanocrystals to biological entities after functionalization. Furthermore, the mechanism behind the formation of symmetrically dispersed ZnO quantum dots embedded in SiO₂ matrix was discussed in detail.     

Emission and percolation of excitons in dense sensembles of quantum dots on the spherical surface

We study core/shell heterostructures in which a core (SiO₂) is overcoated with a shell of ZnO quantum dots, randomly distributed on the sphere surface with the surface filling factor P∼0.45. Due to the high surface energy of SiO₂ spheres, ZnO quantum dots have the shape of disks in which, in spite of the large radii, quantum size effects of excitons are retained. The height of ZnO disks estimated by the effective mass approximation is comparable with the exciton diameter in bulk ZnO. Analysis of optical spectra has shown that, at the given density of ZnO quantum dots, the exciton system is above the percolation threshold. The quantitative parameters characterizing such phenomenon are obtained using the elements of percolation theory and the topology of the samples.     

Intrinsic quantum conductances and capacitances of nanowires and nanocables

Here we calculate the intrinsic quantum capacitance of RuO₂ nanowires and RuO₂/SiO₂ nanocables (filled interiors, or nanotubes, which are empty), based upon available ab initio density of states values, and their conductances allowing determination of transmission coefficients. Comparisons are made to the intrinsic quantum capacitance of carbon nanotubes, and to RuO₂ and RuO₂/SiO₂ Schottky and p-n junction capacitances. We find that the intrinsic quantum capacitance of RuO₂ based nanostructures dominates over its junction capacitances by an order of magnitude or more, having important implications for energy and charge storage.     

Temperature dependence of photoluminescence of semiconductor quantum dots upon indirect excitation in a SiO2 dielectric matrix

The processes of excitation and relaxation of confined excitons in semiconductor quantum dots upon indirect high-energy excitation have been considered. The temperature behavior of photoluminescence of quantum dots in a SiO₂ dielectric matrix has been described using a model accounting for the process of population of quantum-dot triplet states upon excitation transfer through mobile excitons of the matrix. Analytical expressions that take into account the two-stage and three-stage schemes of relaxation transitions have been obtained. The applicability of these expressions for analyzing fluorescence properties of semiconductor quantum dots has been demonstrated using the example of silicon and carbon nanoparticles in the thin-film SiO₂ matrix. It has been shown that the complex character of the temperature dependences of the photoluminescence upon indirect excitation can be an indication of a multistage relaxation of excited states of the matrix and quantum dots. The model concepts developed in this study allow one to predict the form of temperature dependences of the photoluminescence for different schemes of indirect excitation of quantum dots.

     

非晶Si/SiO2超晶格结构的交流电致发光

设计并用磁控溅射方法制备了非晶Si/SiO     

Resonant Raman scattering by strained and relaxed germanium quantum dots

This paper reports on the results of resonant Raman scattering investigations of the fundamental vibrations in Ge/Si structures with strained and relaxed germanium quantum dots. Self-assembled strained Ge/Si quantum dots are grown by molecular-beam epitaxy on Si(001) substrates. An ultrathin SiO₂ layer is grown prior to the deposition of a germanium layer with the aim of forming relaxed germanium quantum dots. The use of resonant Raman scattering (selective with respect to quantum dot size) made it possible to assign unambiguously the line observed in the vicinity of 300 cm^?1 to optical phonons confined in relaxed germanium quantum dots. The influence of confinement effects and mechanical stresses on the vibrational spectra of the structures with germanium quantum dots is analyzed.     

Studies on the performances of silica aerogel electrodes for the application of supercapacitor

Silica aerogel (SiO₂ aerogel) was prepared by sol–gel method from tetraethyl orthosilicate hydrolyzation and has been characterized by scanning electron microscopy and N₂ adsorption for its surface structure, surface area, and pore-size distribution. Constant current charge–discharge technique, cyclic voltammetry, and electrochemical impedance spectrum were employed for its specific capacitance and equivalent series resistance. The results showed that the maximum specific capacitance of SiO₂ aerogel electrode in 1 M Et₄NBF₄/PC electrolyte was 62.5 F g⁻¹. In addition, the SiO₂ aerogel capacitor exhibits excellent long-term stability with no significant degradation after 500 charging and discharging cycles. Therefore, the application of high surface area SiO₂ aerogel as electrodes in supercapacitor devices is promising.