Colloidal sol/gel processing of ultra-low expansion TiO2/SiO2 glasses

A series of titania-silica glasses with 0–9% TiO₂ were fabricated using a sol/gel process. The sol was prepared by dispersing colloidal silica fume in an aqueous solution of titania which was synthesized through the acid-catalyzed hydrolysis of titanium isopropoxide. The sols gelled in 2–4 days, and then were dried for 6–8 days. The dry gels were sintered at 1450–1500°C to produce clear, dense, microstructure-free glasses. The gels underwent a total shrinkage of 50% to yield glass rods about 50 mm long and 5 mm in diameter, or glass discs about 4 cm in diameter and 5 mm thick. The drying step was most critical in the production of crack-free specimens.

In the gel, the transmission electron microscope (TEM) revealed the presence of 1–5 nm rutile microcrystallites uniformly distributed within a network of colloidal silica particles. After sintering to 1450–1500°C, though, a dense, transparent, microstructure-free glass was created. Fourier transform infrared spectroscopy (FTIR) verified the formation of an amorphous solid-solution of titania and silica after sintering.

The thermal expansion of the glasses was measured using a differential dilatometer. The average linear coefficients of thermal expansion (CTE @ 25–675°C) varied between +5 × 10⁻⁷ and −0.2 × 10⁻⁷°C⁻¹ in the range 0 to 9% TiO₂. The glass with 7.2% TiO₂ exhibited a zero thermal expansion coefficient at 150–210°C. The hysteresis in CTE on heating and cooling was of the order of 0.01–0.02 ppm.     

Hydrolytic resistance of Na2O---B2O3---SiO2 gels prepared by sol-gel process

Alkoxide derived gels were prepared in the system Na₂O---B₂O₃---SiO₂. The gel compositions were situated in the liquid-liquid immiscibility area of the phase equilibrium diagram.

Hydrolytic resistance tests were performed on the gels heat-treated at temperatures ranging between 120 to 850 °C. The Na₂O, B₂O₃ and SiO₂ extracted from the attack gels were analyzed. The experimental results indicate that the amount of B₂O₃ has a significant influence on the chemical durability of the heat-treated gels. At temperatures of 850 °C the greater the B₂O₃ mol% the greater are the amounts of Na₂O and B₂O₃ extracted. Different behaviour was observed for gels heat-treated at 600 °C where the amounts of B₂O₃ and Na₂O extracted slightly increases as the B₂O₃ mol% increases. Small amounts of extracted SiO₂ were always observed.

These results are complemented with other measurements so that an explanation of the controlling mechanism is given.     

Synthesis of fluorine doped silica gel and its properties at high temperature

Fluorine doped silica gels were synthesized by using the sol-gel processes of (A) SiF₄(g) and H₂O(1) and (B) the mixed solution of Si(OC₂H₅)₄, C₂H₅OH, H₂O and H₂SiF₆. By the former process we obtained a gel of relatively high fluorine content (8–12 at.%F), while we could synthesize the gel of 0–12 at.% F by adjusting the F/Si ratio of the starting solution mixtures by the latter process.

The defluorination behavior and the structural change of these gels at high temperature were studied by heating-mass spectrometry, IR and ESR measurements. The results revealed the following: (1) defluorination by liberation of SiF₄(g) was admitted from temperatures at about 400°C and was controlled by the diffusion of fluorine in the gel bulk. (2) The peak separation analysis for the IR band of 1300-900 cm⁻¹, where the stretching vibrations of Si---O and Si---F appear, showed that the change of the band shape resulted from the increase or the decrease of the Si---F bonds and the change of the bond angle of Si---O---Si as well as the change of the force constant accompanied by fluorination or defluorination. (3) The defects of the Si E′ center were induced by X-ray irradiation depending on the degree of the defluorination, and were reduced by the heat treatment. However, with the heat treatment at temperatures higher than 1000°C, the E′ center increased again. The IR spectra suggest that this behavior might correspond to the gel-glass trasition.     

TiO2-SiO2 monolithic glass formation from sol-gel

This study demonstrates that hydrolysis should be carried out in a step manner in gel synthesis. The key to the increase in the amount of water added is the control of the hydrolysis rate of Ti(OC₄H₉)₄. The hydrolysis of Si(OC₂H₅)₄ can be carried out at about 75°C. The amount of added water (γ_WI), which varied with TiO₂ content (in mol%), was about 64–88% of the total amount of added water. The hydrolysis reaction should be performed at room temperature while Ti(OC₄H₉)₄ is added. The total amount of added water (γ_W) is related to the amount of solvent (R). For example, if TiO₂ is 40mol%, γ_W will vary from 3.2 to 8.0 when R varies from 0.8 to 2.0. The amount of added water was affected by the distribution of solvent in the metal alkoxides. The amount of added water can be increased when R_Si(OC2H5)4 = 1, R_Ti(OC4H9)4 > 1. The rate of rise in temperature of the thermolysis of the dried gel should be less than 10°C per hour, and the heat treatment temperatyre is related to the TiO₂ content (in mol%). Gel glasses without devitrification can only be obtained by thermolysis at 600°C from the gel with no less than 20 mol% TiO₂.     

Sintering of silica gel derived from the alkoxysilane solution containing N,N-dimethylformamide

The sintering of three kinds of dried gels with different microstructures prepared from the tetramethoxysilane (TMOS) solutions containing N,N-dimethylformamide (DMF) with varying [H₂O]/[TMOS] mole ratios and different catalysts was investigated by measuring the pore size distribution, the Vickers hardness, the linear shrinkage and the apparent density of the gels heated to various temperatures. The marked shrinkage of the pores started at temperatures above 900 °C. The temperature required for the conversion of a gel to a pore-free silica glass depended on the average size of the pores contained in the dried gels; the average pore sizes of about 50 Å, 75 Å and 100 Å corresponded to 1040 °C, 1060°C and 1080°C, respectively. The Vickers hardness, the linear shrinkage and the density of the gel showed a corresponding change with a change in heating temperature.     

Al2O3-TiO2 and Al2TiO5 ceramic materials by the sol-gel process

Ceramic materials with a very low thermal expansion coefficient are synthesized by the sol-gel process. The binary gel is obtained by hydrolysis and polycondensation reactions of organometallic compounds of aluminium and titanium. The thermal evolution of the amorphous powder is followed by DTA and TGA measurements. Structural evolution is followed using X-ray diffraction. The crystallization of the TiO₂ rutile and Al₂O₃ corindon starts at 700 and 900°C respectively. The transformation of Al₂O₃ and TiO₂ into Al₂TiO₅ appears between 1200 and 1300°C. The densification of the powder is performed by the hot pressing process. The shrinkage of the powder was previously followed by dilatometric measurements. The physical properties of the final material are studied as a function of pressing parameters.     

Effect of dehydration on the viscosity of sol-gel processed silica

For short times and low temperatures, the dehydration of silica gels is limited by the diffusion of water species. For long times and temperatures 600°C and higher, dehydration shows first order kinetics. That is dehydration rates decrease with increasing temperature where silica gels have less surface area and consequently fewer hydroxyls.

For comparison with samples treated isothermally, samples were heated to 600, 700, 800 and 850°C at 100°C intervals and held 4 h at each temperature starting with 500°C. Comparison of isothermal and multistep treatments shows the contributions of structural relaxation and dehydration to the viscosity. At a given temperature, two gels of different water content may show the same viscosity, because the difference in water is matched by the difference in degree of structural relaxation. More complete dehydration is accomplished by constant rate heating to a single isothermal treatment rather than heating in steps.     

A study of Raman spectroscopy and low-temperature specific heat in gel-synthesized amorphous silica

A comparative study of low-temperature specific heat (1.5–25 K), C_p, and low-frequency Raman scattering (<150 cm⁻¹) has been performed in amorphous silica samples synthesized by sol–gel method (xerogels) and thermally densified in a range of densities, from ρ=1250 kgm⁻³ to ρ=2100 kgm⁻³, close to the density of the melt quenched vitreous silica (v-SiO₂). The present analysis concerns the application of the low-energy vibrational dynamics as an appropriate tool for monitoring the progressive thermal densification of silica gels. By comparison with v-SiO₂, the Raman and thermal properties of xerogels with increasing thermal treatment temperature revealed the following important results: (i) the existence of a critical treatment temperature at about 870°C, where a homogeneous viscous sintering produces full densification of the samples. This effect is detected by the observations of the Boson peak in Raman spectra at about 45 cm⁻¹ and of a peak in C_p(T)/T³, very close to those observed in v-SiO₂; (ii) in silica xerogels treated at temperatures less than about 800°C, the low-frequency Raman scattering is greater, with a continuous decreasing unstructured shape, and the Boson peak is not detected in the spectra.     

Characteristics of ZnO–B2O3–CaO–Na2O–P2O5 glass powders prepared by spray pyrolysis

Fine-sized ZnO–B₂O₃–CaO–Na₂O–P₂O₅ glass powders with spherical shape were directly prepared by high temperature spray pyrolysis. The ZnO–B₂O₃–CaO–Na₂O–P₂O₅ powders prepared by spray pyrolysis at temperatures above 1200 °C had broad peaks at around 30° in the XRD patterns. The glass transition temperatures (T_g) of the glass powders obtained by spray pyrolysis at preparation temperatures between 900 °C and 1400 °C were near 480 °C regardless of the preparation temperatures. The dielectric layers formed from the glass powders prepared by spray pyrolysis at preparation temperatures above 1300 °C had clean surface and dense inner structure at the firing temperature of 580 °C. The transmittance of the dielectric layer formed from the glass powders obtained by spray pyrolysis at preparation temperature of 1400 °C was 90% at the firing temperature of 580 °C, in which the thickness of the dielectric layer was 13 μm. The UV cutoff edges gradually shift towards longer wavelength with increasing the preparation temperature of glass powders and the firing temperature of dielectric layers.     

ZrO2-SiO2 materials prepared by sol-gel

Gels with composition xZrO₂−(100−x)SiO₂, X = 10−55, were prepared in different conditions using zirconium acetylacetonate and TEOS as precursors.

Gels treated at different temperatures up to 1100°C were characterized by X-ray diffraction, IR spectroscopy and TEM. Preparation conditions determined the subsequent development of crystalline phases following thermal treatment.

Monoclinic zirconia segregation dispersed in a silica matrix occurred when the gels were prepared in a strong hydrocloric acid medium. Preparation with a lower acid content favours instead the formation of very small crystals of tetragonal zirconia.     

Structural transformation of the TiO2---SiO2 system gel during heat-treatment

The gel formation of the (100-x)TiO₂·xSiO₂ (x = 0–10 mol%) system has been studied. The progressive elimination of residues was followed by DTA and TGA curves. DTA curves showed that the formation of anatase during heat treatment could be sensibly slowed down with the increase of SiO₂. The relationship between the gel composition and crystallization temperature of anatase has been systematically investigated. The X-ray diffraction spectra demonstrated that the crystallization temperature of anatase is 400°C for TiO₂ gel and 430°C for 90TiO₂ - 10SiO₂ gel. The infrared absorption spectra were used to follow the structural transformation of gels heat-treated at different temperatures. With the help of EPR it is evident that titanium ions exist only in tetravalence.     

Low temperature synthesis of monolithic silica glass from the system Si(OC2H5)4---H2O---HCl---HOCH2CH2OH by the sol-gel method

To avoid breaking of the gel during drying any organic solvent such as ethanol has not been used. When the amount of HCl is increased and the mixture is stirred vigorously, a transparent silica sol can be prepared immediately with only Si(OC₂H₅)₄ and H₂O. By adjusting the amount of HCl and the temperature, the sol may gel at any time, even in 5 min at room temperature. Such a gel may be dried without cracking under completely open conditions. The addition of glycol as a complex agent can apparently increase the pore size of the gel and decrease its capillary force and surface tension. So, large dried gels can be made in a rather short time. For example, a dried gel of diameter 68 mm and thickness 13 mm can be made in only 4 days. Because of the large pores, the dried gels can be sintered to monolithic silica glasses of practical size with a rather fast heating rate. The mechanisms in the whole process have been explored.     

Toughened glass-ceramics containing ZrO2 and Al2O3 prepared by the sol-gel process from metal alkoxides

Glasses of compositions 5ZrO₂·5SiO₂(ZS), 5ZrO₂·Al₂O₃·4SiO₂(ZAS) and 5 5ZrO₂·0.5Al₂O₃·0.5Na₂O·4SiO₂(ZANS) were prepared by the sol-gel process from metal alkoxides and sintered to make glass-ceramics. Tetragonal ZrO₂ was precipitated by heat treatment at 900 to 1300°C. The activation energy for tetragonal ZrO₂ crystal growth was extremely high in Al₂O₃ containing glasses. ZAS and ZS were sintered to the near theoretical densities above 1200°C, at which the predominant phase was tetragonal ZrO₂. On the other hand, for ZANS, high densification was not attained owing to the large pores enclosed by the glass phase. Strength and fracture toughness increased with the densification and the crystal growth of tetragonal ZrO₂, reaching 450 MPa and 9 MN/m^1.5, respectively.     

Multilayer SiO2 and TiO2 coatings on glasses by the sol-gel process

Glass films of pure SiO₂ and TiO₂ have been prepared on sodalime silica flat slide glasses by the sol-gel process using the dip-coating technique from TEOS and Ti(OC₃H₇)₄ solutions. The various parameters such as chemicals concentrations, viscosity, type of catalyst, withdrawal speed and temperature of densification leading to the obtention of good and adherent coatings with definite film thicknesses are reported. The same technique has been used for the depositon of layers of colored films SiO₂---M_xO_y (M = Co, Mn, Nd and Cr). Brilliant yellow coatings have been obtained with TiO₂---CeO₂.     

Migration of Cu ions in Cu2O---Al2O3---SiO2 glasses on heating in air

The behavior of copper ions in the Cu₂O·Al₂O₃·4SiO₂ (in moles) glass on heating in air at temperatures up to 500°C was studied. When the glass, in which about 90% of Cu was present as Cu⁺ ions, was heated in air above 300°C, a CuO layer was formed on the surface. The amount of CuO was increased with heating temperature and time, corresponding to the decrease in weight of the glass. Furthermore, the fraction of Cu²⁺ ions in the glass increased. These observations suggest that oxygens do not diffuse into the glass, but Cu⁺ ions migrate to the surface from the interior to balance the surplus positive charge produced by the oxidation of Cu⁺ to Cu²⁺ ions inside the glass. The following reaction scheme for the formation of the CuO layer was proposed; 2Cu⁺(interior) + ₂¹O₂(surface) → Cu²⁺(interior) + CuO(surface).     

A new method for fabricating water repellent silica films having high heat-resistance using the sol–gel method

There has been a great demand in the field of kitchen appliances to develop transparent water repellent films which have high heat-resistance around 300°C. However, those films have not been obtained by conventional sol–gel methods. In this paper, we propose a new method for fabricating transparent water repellent films with high heat-resistance using the sol–gel method, in which silicon or germanium substrates were coated with a solution including tetraethoxysilane (Si(OC₂H₅)₄) and (2-perfluorooctyl)ethyltrimethoxysilane (CF₃(CF₂)₇C₂H₄Si(OCH₃)₃), followed by ‘ammonia-treatment' and annealed at 300°C. The contact angles of water on the ammonia-treated film maintained its initial value, 110° after the heat treatment at 300°C for 250 h while those on the untreated film decreased to 70°, indicating that the ammonia-treatment improves heat-resistance on the film. The mechanism of ammonia-treatment was inferred from FT-IR results; the ammonia-treatment should accelerate hydrolysis and polymerization of FAS and TEOS molecules, resulting in high density of siloxane bonds between FAS and silica glass. These bonds suppress the evaporation of FAS molecules from the film during the heat treatment at 300°C, thus the film has high heat-resistance.     

The growth kinetics of (SmY)3(FeGa)5O12 epitaxial layers in the 920–980°C range

The growth kinetics of (SmY)₃(FeGa)₅O₁₂ garnets obtained by liquid phase epitaxy on Gd₃Ga₅O₁₂ substrates are discussed in the 920 to 980°C. range. The experiments have been carried out with the substrates in a horizontal plane and with unidirectional rotation ranging from 30 to 300 rotations per minute (rpm). A sharp increase in the growth velocity at temperatures higher than 960°C is interpreted on the basis of a diffusion-reaction theory. It is found that the diffusion constant increases steeper at higher temperatures and that the linear law of the growth rate as a function of the square root of the rotation rate holds to much higher rotation rates at these temperatures. The influence of the surface incorporation is too small to be detectable. The results are compared with published data concerning other compositions.     

RHEED studies of the growth of Si(001) by gas source MBE from disilane

The growth of Si(001) from a gas source molecular beam epitaxy system (Si-GSMBE) using disilane (Si₂H₆) was investigated using reflection high-energy electron diffraction (RHEED). The surface reconstructions occurring between 100 and 775°C were studied as a function of both substrate temperature and surface coverage. We report the first observation of (2x2) and c(4x4) reconstructions during growth at substrate temperatures near 645°C using Si₂H₆. All growth was found to be initiated by the formation of three-dimensional (3D) islands which coalesced at substrate temperatures above 600°C. The surface reconstruction was found to change from a disordered to an ordered (2x1)+(1x2) structure at 775°C via intermediate (2x2) and c(4x4) phases. Thereafter, growth was found to proceed in a 2D layer-by-layer fashion, as evidenced by the observation of RHEED intensity oscillations. This technique has been used, for the first time, to calibrate growth rates during Si-GSMBE. The intensity oscillations were measured as a function of both substrate temperature and incident beam flux. Strong and damped oscillations were observed between 610 and 680°C, in the two-dimensional growth regime. At higher temperatures, growth by step propagation dominated while at lower temperatures, growth became increasingly three-dimensional and consequently oscillations were weak or absent. Similarly, there was a minimum flux limit ( <0.16 SCCM), below which no oscillations were recorded.     

Hydrolysis and condensation reactions of Si(OC2H5)4 related to silica fiber drawing

The hydrolysis and condensation reactions of Si(OC₂H₅)₄ (TEOS) at 80°C in the TEOS---H₂O---C₂H₅OH---HCl solutions with H₂O/TEOS molar ratios (r) from 1.0 to 2.0 were followed by gas chromatography (GC) and measurement of molecular weight ( ) of the hydrolyzates, in order to explain the viscosity change of the solutions. It has been found that the siloxane oligomers with average polymerization degree (n) from 2 to 7 are formed in the early stage of reaction and undergo condensation to form higher polymers. The n and the number of silanol groups of the oligomers are increased with increasing r. The fact that the solution viscosity increased once rapidly around the so-called gelation point followed by a sluggish increase with the increase of reaction time for an r of 1.7, while it increased rapidly without a break till gelation for an r of 2.0, was attributed to fewer silanol groups and higher steric hindrance as a result of more −OC₂H₅ groups remaining in the oligomers for an r of 1.7.     

Correlation between interfacial structure and c-axis-orientation of LiNbO3 films grown on Si and SiO2 by electron cyclotron resonance plasma sputtering

Thin films of crystalline lithium niobate (LN) grown on Si(1 0 0) and SiO₂ substrates by electron cyclotron resonance plasma sputtering exhibit distinct interfacial structures that strongly affect the orientation of respective films. Growth at 460–600 °C on the Si(1 0 0) surface produced columnar domains of LiNbO₃ with well-oriented c-axes, i.e., normal to the surface. When the SiO₂ substrate was similarly exposed to plasma at temperatures above 500 °C, however, increased diffusion of Li and Nb atoms into the SiO₂ film was seen and this led to an LN–SiO₂ alloy interface in which crystal-axis orientations were randomized. This problem was solved by solid-phase crystallization of the deposited film of amorphous LN; the degree of c-axis orientation was then immune to the choice of substrate material.