The impact of molecular emission in compositional depth profiling using Glow Discharge-Optical Emission Spectroscopy

The scope of this paper is to investigate and discuss how molecular emission can affect elemental analysis in glow discharge optical emission (GD-OES), particularly in compositional depth profiling (CDP) applications. Older work on molecular emission in glow discharges is briefly reviewed, and the nature of molecular emission spectra described. Work on the influence of hydrogen in the plasma, in particular elevated background due to a continuum spectrum, is discussed. More recent work from sputtering of polymers and other materials with a large content of light elements in a Grimm type source is reviewed, where substantial emission has been observed from several light diatomic molecules (CO, CH, OH, NH, C₂). It is discussed how the elevated backgrounds from such molecular emission can lead to significant analytical errors in the form of “false” depth profile signals of several atomic analytical lines. Results from a recent investigation of molecular emission spectra from mixed gases in a Grimm type glow discharge are presented. An important observation is that dissociation and subsequent recombination processes occur, leading to formation of molecular species not present in the original plasma gas. Experimental work on depth profiling of a polymer coating and a thin silicate film, using a spectrometer equipped with channels for molecular emission lines, is presented. The results confirm that molecular emission gives rise to apparent depth profiles of elements not present in the sample. The possibilities to make adequate corrections for such molecular emission in CDP of organic coatings and very thin films are discussed.     

Precise determination of manganese in steel by dc glow discharge optical emission spectrometry associated with voltage modulation technique

A voltage modulation technique was applied for the precise and accurate determination of manganese in steels in dc glow discharge optical emission spectrometry. Emission signals from the glow discharge plasma are modulated by a cyclic variation of the discharge voltage so that only the desired signals can be detected at very low noise levels by using a lock-in amplifier. Mn determination in low-alloyed steels was performed to estimate the repeatability of the analytical result. For each measurement, the relative standard deviation (R.S.D.) of the intensities of the Mn I 403.08-nm line was ca 0.1% when a steel sample containing 0.329 mass% Mn was employed. Averaging all analytical values, which are obtained in various discharge conditions, yields statistical information on the precision and accuracy of the analytical values obtained. The relative error from the recommended value is calculated to be 0.5%. The R.S.D. over the analytical values is 1.5%, representing the overall analytical performance of this technique.     

Spectroscopic evaluation of a compact magnetically boosted radiofrequency glow discharge for time-of-flight mass spectrometry

A compact magnetically boosted radiofrequency glow discharge (GD) has been designed, constructed and its analytical potential evaluated by its coupling to a mass spectrometer (MS). Simple modifications to the original source configuration permitted the insertion of permanent magnets. Small cylindrical Nd–Fe–B magnets (∅ = 4 mm, h = 10 mm) were placed in an in-house-modified GD holder disc that allows easy and fast exchange of the magnets. The different processes taking place within the GD plasma under the influence of a magnetic field, such as sputtering, ionisation processes and ion transport into the MS, were studied using different GD operating conditions. Changes to the ionisation and ion transport efficiency caused by the magnetic field were studied using an rf-GD-TOFMS setup. A magnetic field of 60–75 gauss (G) was found not to affect the sputtering rates but to enhance the analyte ion signal intensities while decreasing the Ar species ion signals. Moreover, magnetic fields in this range were shown not to modify the crater shapes, enabling the fast and sensitive high depth resolved analysis of relatively thick coated samples (micrometre) by using the designed compact magnetically boosted rf-GD-TOFMS.

辉光放电光谱法在深度分析上的应用现状

本文简单地介绍了辉光放电光谱法（GD-OES）的基本原理。分别对深度分析的定量方式、放电方式、应用领域和相关标准进行了详细地阐述。重点描述了商品化仪器中使用的SIMR深度分析定量方法。分别对三种放电方式（如直流、射频和脉冲）在深度分析中的特点进行了介绍。综述了GD-OES在金属镀层、复杂涂镀层、纳米级薄膜和样品制备领域的具体应用。最后,介绍了GD-OES在深度分析方面的标准     

Endogenous and exogenous hydrogen influence on amorphous silicon thin films analysis by pulsed radiofrequency glow discharge optical emission spectrometry

During the last decade the photovoltaic industry has been growing rapidly. One major strategy to reduce the production costs is the use of thin film solar cells based on hydrogenated amorphous silicon (a-Si:H). The potential of pulsed radiofrequency glow discharge coupled to optical emission spectrometry (rf-PGD-OES) for the analysis of such type of materials has been investigated in this work. It is known that when hydrogen is present in the argon discharge, even in small quantities, significant changes can occur in the emission intensities and sputtering rates measured. Therefore, a critical comparison has been carried out by rf-PGD-OES, in terms of emission intensities, penetration rates and depth resolution for two modes of hydrogen introduction in the discharge, manually external hydrogen in gaseous form (0.2% H₂–Ar) or internal hydrogen, sputtered as a sample constituent. First, a comparative optimisation study (at 600 Pa and 50 W) was performed on conducting materials and on a silicon wafer varying the pulse parameters: pulse frequency (500 Hz–20 kHz) and duty cycle (12.5–50%). Finally, 600 Pa, 50 W, 10 kHz and 25% duty cycle were selected as the optimum conditions to analyse three types of hydrogenated samples: an intrinsic, a B-doped and a P-doped layer based on a-Si:H. Enhanced emission intensities have been measured for most elements in the presence of hydrogen (especially for silicon) despite the observed reduced sputtering rate. The influence of externally added hydrogen and that of hydrogen sputtered as sample constituent from the analysed samples has been evaluated.     

Time-resolved measurement of emission profiles in pulsed radiofrequency glow discharge optical emission spectroscopy: Investigation of the pre-peak

Radiofrequency glow discharge coupled to optical emission spectroscopy has been used in pulsed mode in order to perform a detailed study of the measured temporal emission profiles for a wide range of copper transitions. Special attention has been paid to the early emission peak (or so-called pre-peak), observed at the beginning of the emission pulse profile. The effects of the important pulse parameters such as frequency, duty cycle, pulse width and power-off time, have been studied upon the Cu pulse emission profiles. The influence of discharge parameters, such as pressure and power, was studied as well.     

Improved voltage transfer coefficients for nonconductive materials in radiofrequency glow discharge optical emission spectrometry

In radiofrequency glow discharge emission spectrometry (RF-GDOES), the excitation voltage used to create the plasma is applied to the back or front end of the sample to be analyzed. In this paper we focus on back-applied voltage systems (a configuration that represents about half of the instruments available on the market), and on applied voltage problems (the power coupling efficiency and materials analysis are beyond the scope of this study). In the RF-GDOES of nonconductive samples, a voltage drop develops inside the material. The voltage transfer coefficient is defined as the ratio between the peak voltage in front of the sample (facing the plasma) and the peak voltage applied to the back of the sample. In this work, we show that it is possible to increase the voltage transfer coefficient by increasing the capacitance of the sample. The capacitance of a given nonconductive material depends on its surface, its thickness and its permittivity. Increasing the voltage transfer coefficient permits higher power deposition in the plasma. This study is based on an electrical equivalent circuit for the discharge device, which takes into account the sample and reactor capacitances as well as the voltage probes used for the measurements. This circuit, when modeled by a commercial electrical circuit simulator, gives the voltage transfer coefficient as a function of the sample capacitance. Different approaches to increasing the sample capacitance and their influence on the voltage transfer coefficient are presented and related to the 750.4 nm argon line intensity, which is correlated to the electron density.     

Present and future of glow discharge — Time of flight mass spectrometry in analytical chemistry

The coupling of glow discharges (GDs) as ion sources for time of flight mass spectrometry (TOFMS) chemical analysis has been extensively investigated during the last two decades. However, important instrumental advances in GD-TOFMS as well as demonstration of unique analytical applications (particularly quasi-simultaneous production of elemental, structural and molecular information from organics in gas phase, multielemental depth profile analysis with high depth resolution of layered materials, direct speciation in solid samples and identification of polymers) are rocketing in the last years.In the present review, instrumental developments and recent applications of GD-TOFMS are presented, both for the elemental and molecular direct solid analyses of materials and for analytes in gaseous phase (including permanent gases, vaporized compounds and GD-TOFMS uses as detector for gas chromatography). Also, GD-TOFMS analytical potential in important fields of modern research is critically discussed.     

Comparison in the analytical performance between krypton and argon glow discharge plasmas as the excitation source for atomic emission spectrometry

The emission characteristics of ionic lines of nickel, cobalt, and vanadium were investigated when argon or krypton was employed as the plasma gas in glow discharge optical emission spectrometry. A dc Grimm-style lamp was employed as the excitation source. Detection limits of the ionic lines in each iron-matrix alloy sample were compared between the krypton and the argon plasmas. Particular intense ionic lines were observed in the emission spectra as a function of the discharge gas (krypton or argon), such as the Co II 258.033 nm for krypton and the Co II 231.707 nm for argon. The explanation for this is that collisions with the plasma gases dominantly populate particular excited levels of cobalt ion, which can receive the internal energy from each gas ion selectively, for example, the 3d⁷4p ³G₅ (6.0201 eV) for krypton and the 3d⁷4p ³G₄ (8.0779 eV) for argon. In the determination of nickel as well as cobalt in iron-matrix samples, more sensitive ionic lines could be found in the krypton plasma rather than the argon plasma. Detection limits in the krypton plasma were 0.0039 mass% Ni for the Ni II 230.299-nm line and 0.002 mass% Co for the Co II 258.033-nm line. However, in the determination of vanadium, the argon plasma had better analytical performance, giving a detection limit of 0.0023 mass% V for the V II 309.310-nm line.     

The concept of constant emission yield in GDOES

This review paper describes the evolution of the quantification procedure for compositional depth profiling (CDP) in glow discharge optical emission spectrometry (GD-OES), based on the constant emission yield concept. The concept of emission yield (EY) is defined and ways of measuring it experimentally are discussed. The history of the development of quantitative CDP is reviewed, which shows that all of the different approaches depend on the assumption that the EY is essentially a matrix-independent quantity. Particular emphasis is placed on the dependence of the EY on the plasma parameters of current, voltage, power and pressure. In short, impedance changes (current voltage) can significantly affect the emission yield and should either be corrected mathematically or the impedance should be kept constant by pressure regulation in order to obtain reliable results from GDOES CDP. On the other hand, the effect of varying the pressure on the emission yield can be considered to be minor within the limits of practical operating conditions for most CDP applications. It is worth, however, bearing in mind that varying the discharge pressure has a significant effect on the plasma processes, and does affect the emission yield when these variations are large. The experimental results obtained for the emission yield are related to the results from theoretical model calculations published on the subject.     

Modifying argon glow discharges by hydrogen addition: effects on analytical characteristics of optical emission and mass spectrometry detection modes

An overview of the effects produced by the presence of hydrogen in a glow discharge (GD), generated either in argon or in neon, is given. Extensive work related to the addition of hydrogen to GDs, coupled with optical emission spectrometry (OES) and mass spectrometry (MS), has been published in the last few years in an attempt to explain the processes involved in the discharge of mixed gases. Although numerous experimental results have already been explained theoretically, a complete understanding of the effects brought about by mixing hydrogen with argon (or another discharge inert gas) has not been reported yet. The use of theoretical models implemented using a computer has allowed the importance of some collisional and radiative processes in the inert gas plasma when hydrogen is present to be evaluated. This review shows, however, that both experimental work and theoretical work are still needed. The influence of small quantities of hydrogen on discharge parameters, such as electrical current or dc bias voltage, on crater shapes and on sputtering rates is thoroughly reviewed along with the effect on the analytical signals measured by OES and MS. Also, hydrogen-effect corrections needed to carry out proper calibrations for direct solid quantitative analyses are discussed. Figure Hydrogen induced changes in the Ar glow discharge reactions.     

Hydrogen effects on copper,zinc and nickel atomic emission lines in argon radiofrequency glow discharge optical emission spectrometry

The effect of hydrogen (0.5%, 1% and 10% v/v) added to the argon plasma gas on the emission spectra of selected atomic lines for copper, zinc and nickel has been studied by radiofrequency glow discharge optical emission spectrometry (rf-GD-OES). Conductive homogeneous samples containing different concentrations of the elements under study in different matrices have been investigated. Results show different trends of the emission intensity lines with increasing hydrogen concentration in the rf-GD, depending on the line characteristics. In most cases, the emission yields of the lines under study did not change or increased when hydrogen was added to the discharge (no decreases were observed). The emission yields of certain lines showed much higher increases than other lines of the same element (for example, lines 213.86 nm of Zn and 231.10 nm of Ni). Our experiments indicate that such notorious increases could be related with the possible decrease of the self-absorption when hydrogen is added to the discharge. Overall, the results obtained for the emission yield changes of certain lines of a given element in different matrices (with different analyte content) showed that while for resonance emission lines very notorious increases are observed, the values for non-resonance lines do not change significantly (specially if the matrices employed are similar).     

Quantitative depth profile analysis of metallic coatings by pulsed radiofrequency glow discharge optical emission spectrometry

In recent years particular effort is being devoted towards the development of pulsed GDs because this powering operation mode could offer important analytical advantages. However, the capabilities of radiofrequency (rf) powered glow discharge (GD) in pulsed mode coupled to optical emission spectrometry (OES) for real depth profile quantification has not been demonstrated yet. Therefore, the first part of this work is focussed on assessing the expected advantages of the pulsed GD mode, in comparison with its continuous mode counterpart, in terms of analytical emission intensities and emission yield parameters. Then, the capability of pulsed rf-GD-OES for determination of thickness and compositional depth profiles is demonstrated by resorting to a simple multi-matrix calibration procedure. A rf forward power of 50 W, a pressure of 600 Pa, 1000 Hz pulse frequency and 50% duty cycle were selected. The quantification procedure used was validated by analysing conductive layers of thicknesses ranging from a few tens of nanometer up to about 20 μm and varied compositions (hot-dipped zinc, galvanneal, back contact of thin film photovoltaic solar cells and tinplates).     

Direct analysis of glass powder samples by radio frequency glow discharge atomic emission spectrometry (rf-GD-AES)

A method is described for the elemental analysis of glass powder samples by rf-GD-AES. Glass powder samples were pressed without binder to form sample disks. A brass sample holder was designed to hold the pellet onto the source and provide a good vacuum seal. Sample preparation conditions and particle sizes are shown to influence spectral characteristics and plasma stabilization times. The discharge operating parameters were optimized based on both raw analyte signal intensity (S) and signal-to-background ratio (S/B), the latter was found more useful in terms of sample-to-sample precision and quantification. A NIST Standard Reference Material (SRM 89 Lead-Barium Glass) was used to evaluate the method. The limits of detection for trace components ranged from 1–10 g/g for several elements, depending on the concentrations of the analytes in the SRM. Sample-to-sample reproducibilities were better than 10% RSD and linear calibration curves were obtained using either the Si (I) optical emission as an internal standard or the individual analyte's S/B characteristics.     

Multielemental characterisation of cobalt by glow discharge quadrupole mass spectrometry

Multielemental determination and the assessment of purity of cobalt metal used in the preparation of Ni-based super-alloys have been carried out by glow discharge quadrupole mass spectrometry (GD-QMS). Relative sensitivity factors (RSF) generated from certified iron matrix reference samples (NIST 663 and 664 low alloy steel pin standards) could be used for the determination of different trace element constituents of the sample. Different wet chemical procedures were also carried out for the determination of the trace constituents in the sample. The GD-QMS results are in reasonably good agreement with those obtained from wet chemical procedures, validating the use of the RSF values generated on low alloy steel standards for the computation of trace element concentrations in cobalt metal. A variety of molecular ions formed through the reaction of cobalt (matrix) with the discharge gas (argon) were also detected.     

Analysis of semiconducting materials by high-resolution radiofrequency glow discharge mass spectrometry

The analytical capabilities of a high-resolution mass spectrometer in combination with a 13.56 MHz glow discharge ion source for the analysis of semiconducting materials (silicon carbide and gallium arsenide) were studied. It was shown that single positively charged ions of sample material have about 10 eV higher average energy than the ions of the discharge and residual gas. Therefore effective energy separation of the ions of analyte from the ions of the discharge and residual gas was achieved by adjusting the ion transfer optics (breadth and position of energy slit), which improves the analytical capabilities of the developed method.Some analytical applications are presented to illustrate the performance of r.f. GDMS for the bulk analysis of semiconducting materials. The results of the trace element analysis of gallium arsenide and silicon carbide samples are compared with data of independent methods (LIMS, ICP-AES, SIMS).Dedicated to Professor Dr. rer. nat. Dr. h.c. Hubertus Nickel on the occasion of his 65th birthdayOn leave from the Institute of Inorganic Chemistry, 630090 Novosibirsk, Russia     

Depth profile studies of ZrTiN coatings by laser ablation inductively coupled plasma mass spectrometry

The feasibility of depth profiling was studied by using a 193-nm ArF* excimer laser ablation system (GeoLas, MicroLas, Goettingen, Germany) with a lens array-based beam homogenizer in combination with an ICP-QMS Agilent 7500. Two ablation cells (20 and 1.5 cm³) were compared at the laser repetition rate of 1 Hz, laser beam energy of 135 mJ and the carrier gas flow rate 1.5 L min^–1 He + 0.78 L min^–1 Ar. The ablation cell dimensions are important parameters for signal tailing; however, very small cell volumes (e.g. 1.5 cm³) may cause memory effects, which can be probably explained by dominant inertial losses of aerosol on cell walls with its delayed mobilization. The 20-cm³ ablation cell seems to be appropriate for depth profiling by continuous single-hole drilling. The study of the influence of the pit diameter magnitude on the waning and emerging signals under small crater depth/diameter aspect ratios, which range between 0.75 and 0.0375 for the 3-m-thick coatings and pit diameters 4–80 m, revealed that the steady-state signals of pure coating and pure substrate (out of interface) were obtained at crater diameters between 20 and 40 m. Depth resolution defined by means of slopes of tangents in the layer interface region depend on the pit diameter and has an optimum value between 20 and 40 m and gives 0.6 m for the 20-m pit. In-depth variation of concentration of coating constituent (Ti) was proved to be almost identical with two different laser/ICP systems.Viktor Kanický performed this work while on leave at ETH Zurich     

辉光放电质谱仪期间核查控制图在实验室质量控制中的应用

仪器设备的期间核查是实验室管理及实验室认证认可的一项基本要求,辉光放电质谱仪主要应用于高纯金属材料的分析,标样研制较为困难,使用高纯标准物质进行质量控制及期间核查的方法难以实现。对用液氮低温冷却离子源型的辉光放电质谱仪,使用纯钽片在进行日常仪器调试信号时得到的钨元素含量数据,用于绘制平均值-极差控制图作为实验室质量控制及期间核查的判定依据,以此评价仪器日常工作的性能状态,以保证检测结果的正确性和可靠性。     

辉光放电质谱法测定高纯铟中痕量元素

采用辉光放电质谱法(GDMS)对高纯铟中铁、铜、铅、锌、铊、镉、锡等14种元素进行了测定,对仪器工作参数进行了优化,对预溅射过程时间的确定和质谱干扰的排除进行了讨论,结果表明,GDMS是目前具有足够灵敏度对高纯导电材料进行直接分析的有效手段。     

Role of cathode identity in liquid chromatography particle beam glow discharge mass spectrometry

A detailed evaluation of the role of cathode identity on the analytical and spectral characteristics of various organic, organometallic and metal analytes using liquid chromatography–particle beam/glow discharge mass spectrometry (LC–PB/GDMS) has been carried out. A d.c. discharge, operating with argon as the support gas, was used throughout this work. In this study, Cu which has a relatively high sputtering rate, Ni which has moderate sputtering rate and Ta which has very low sputtering rate, are taken as cathode materials to study the ionization, fragmentation, and analytical characteristics of organic (caffeine, epigallocatechin gallate, peptide as representative compounds), organometallic (selenomethionine, triethyl lead chloride as representative compounds) and metal (Fe, La, Cs and Pb) species. A range of discharge gas pressures (26.6–106.4 Pa) and currents (0.2–1.5 mA) were investigated with the test cathodes to determine their influence on the spectral composition and overall analytical response for the various test species. Calibration plots were obtained for all of the species for each of the three cathodes to determine the respective limits of detection. Relative detection limits in the range of 0.02 to 15 ng mL^− 1 (0.002–1.5 ng, absolute) for the test species were found to be in the order of Cu > Ni > Ta; which follows the order of the sputtering characteristics of the respective cathodes. These studies rendered information about the respective discharge parameters' role in choosing the most appropriate cathode identity in PB-GDMS for application in the areas of organic, organometallic and inorganic species analysis.