Nature of the band gap of In2O3 revealed by first-principles calculations and x-ray spectroscopy

Bulk and surface sensitive x-ray spectroscopic techniques are applied in tandem to show that the valence band edge for In2O3 is found significantly closer to the bottom of the conduction band than expected on the basis of the widely quoted bulk band gap of 3.75 eV. First-principles theory shows that the upper valence bands of In2O3 exhibit a small dispersion and the conduction band minimum is positioned at Gamma. However, direct optical transitions give a minimal dipole intensity until 0.8 eV below the valence band maximum. The results set an upper limit on the fundamental band gap of 2.9 eV.     

Observation of high energy photoelectrons from solids at moderate laser intensity

We investigate the photoemission for a set of wide band-gap crystals irradiated by femtosecond Ti-Sapphire laser pulses at intensities varying from 0.5 to 6 TW/cm² (below the optical breakdown threshold). The measured total electron yield increases linearly with the laser intensity in this intensity range. An intense and wide plateau of high energy electrons appears in the photoelectron spectra at excitation intensities larger than 1 TW/cm². The exponential cut-off of this plateau reaches 40 eV at maximal applied intensities. In order to explain such a behavior, we propose a mechanism where the heating is due to a sequence of direct interbranch one- and multi-photon transitions in the conduction band. PACS 79.60.-i; 79.20. Ds; 42.50. Hz     

PbWO4闪烁晶体的发光动力学模型

在对PbWO₄闪烁晶体的光谱特性、发光衰减及其温度依赖以及热释光的研究基础上,并结合理论计算,提出了PbWO₄晶体发光的动力学模型,给出了PbWO₄晶体的基本能带结构及激子发光中心能态、陷阱能级在能隙中的位置。用此模型可以完整说明PbWO₄的发光过程,特别是导致室温下发光效率低的原因。最后还对其主发射成分蓝、绿发光中心的起源作了简要讨论。     

Transition to a virtually incompressible oxide phase at a shock pressure of 120 GPa (1.2 Mbar): Gd3Ga5O12

Cubic, single-crystal, transparent Gd(3)Ga(5)O(12) has a density of 7.10 g/cm(3), a Hugoniot elastic limit of 30 GPa, and undergoes a continuous phase transition from 65 GPa to a quasi-incompressible (QI) phase at 120 GPa. Only diamond has a larger Hugoniot elastic limit. The QI phase of is more incompressible than diamond from 170 to 260 GPa. Electrical conductivity measurements indicate the QI phase has a band gap of 3.1 eV. Gd(3)Ga(5)O(12) can be used to obtain substantially higher pressures and lower temperatures in metallic fluid hydrogen than was achieved previously by shock reverberation between Al(2)O(3) disks.     

基于自洽GW方法的碳化硅准粒子能带结构计算

在多体微扰理论的框架下, 分别采用G₀W₀方法和准粒子自洽GW方法计算3C-SiC和2H-SiC的准粒子能级. 由一个平均Monkhorst-Pack网格点上的准粒子能级和准粒子波函数出发, 结合最局域Wannier函数插值, 得到3C-SiC和2H-SiC的自洽准粒子能带结构. 3C-SiC的价带顶在Γ点, 导带底在X点. DFT-LDA, G₀W₀和准粒子自洽GW给出的3C-SiC间接禁带宽度分别为 1.30 eV, 2.23 eV和2.88 eV. 2H-SiC价带顶在Γ 点, 导带底在K点. 采用DFT-LDA, G₀W₀和准粒子自洽GW方法得到的间接禁带宽度分别为2.12 eV, 3.12 eV和 3.75 eV. 计算基于赝势方法, 对于3C-SiC和2H-SiC的准粒子自洽GW计算给出的禁带宽度均比实验值略大.     

Strain effect on the electronic properties of 1T-HfS2 monolayer

We perform first-principles based on the density function theory to investigate electronic and magnetic properties of 1T-HfS₂ monolayer with biaxial tensile strain and compressive strain. The results show that HfS₂ monolayer under strains doesn’t display magnetic properties. When the strain is 0%, the HfS₂ monolayer presents an indirect band gap semiconductor with the band gap is about 1.252 eV. The band gap of HfS₂ monolayer decreases quickly with increasing compressive strain and comes to zero when the compressive strain is above −7%, the HfS₂ monolayer system turns from semiconductor to metal. While the band gap increases slowly with increasing tensile strain and comes to 1.814 eV when the tensile strain is 10%. By comparison, we find that the compressive strain is more effective in band engineering of pristine 1T-HfS₂ monolayer than the tensile strain. And we notice that the extent of band gap variation is different under tensile strain. The change of band gap with strain from 1% to 5% is faster than that of the strain 6–10%. To speak of, the conduction band minimum (CBM) is all located at M point with different strains. While the valence band maximum (VBM) turns from Γ point to K point when the strain is equal to and more than 6%.     

Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures

We report the use of an amplified femtosecond laser for single-shot two-photon exposure of the commercial photoresist SU-8. By scanning of the focal volume through the interior of the resist, three-dimensional (3-D) structures are fabricated on a shot-by-shot basis. The 800-nm two-photon exposure and damage thresholds are 3.2 and 8.1TW/cm(2), respectively. The nonlinear nature of the two-photon process allows the production of features that are smaller than the diffraction limit. Preliminary results suggest that Ti:sapphire oscillators can achieve single-shot two-photon exposure with thresholds as low as 1.6TW/cm(2) at 700 nm, allowing 3-D structures to be constructed at megahertz repetition rates.     

First-principle study of nanostructures of functionalized graphene

We present first-principle calculations of 2D nanostructures of graphene functionalized with hydrogen and fluorine, respectively, in chair conformation. The partial density of states, band structure, binding energy and transverse displacement of C atoms due to functionalization (buckling) have been calculated within the framework of density functional theory as implemented in the SIESTA code. The variation in band gap and binding energy per add atom have been plotted against the number of add atoms, as the number of add atoms are incremented one by one. In all, 37 nanostructures with 18C atoms, 3 × 3 × 1 (i.e., the unit cell is repeated three times along x-axis and three times along y-axis) supercell, have been studied. The variation in C–C, C–H and C–F bond lengths and transverse displacement of C atoms (due to increase in add atoms) have been tabulated. A large amount of buckling is observed in the carbon lattice, 0.0053–0.7487 Å, due to hydrogenation and 0.0002–0.5379 Å, due to fluorination. As the number of add atoms (hydrogen or fluorine) is increased, a variation in the band gap is observed around the Fermi energy, resulting in change in behaviour of nanostructure from conductor to semiconductor/insulator. The binding energy per add atom increases with the increase in the number of add atoms. The nanostructures with 18C+18H and 18C+18F have maximum band gap of 4.98 eV and 3.64 eV, respectively, and binding energy per add atom –3.7562 eV and –3.3507 eV, respectively. Thus, these nanostructures are stable and are wide band-gap semiconductors, whereas the nanostructures with 18C+2H, 18C+4H, 18C+4F, 18C+8F, 18C+10F and 18C+10H atoms are small band-gap semiconductors with the band gap lying between 0.14 eV and 1.72 eV. Fluorine being more electronegative than hydrogen, the impact of electronegativity on band gap, binding energy and bond length is visible. It is also clear that it is possible to tune the electronic properties of functionalized graphene, which makes it a suitable material in microelectronics.     

The optical gap of NiO

The nature of the optical absorption gap in NiO at 4.0 eV is investigated. It is found that this gap is due to a band to band transition, where an electron is taken out of the valence band and placed into the conduction band. The optical gap of 6.0 eV found in NiMgO is of a nature, where an electron is taken out of the oxygen 2p band and placed into the first affinity level of the Ni²⁺ ion (3d ⁸L»3d ⁹L^–1). The impurity band created in Ni_1–x Li _x O by the Li ions is found 2.3 eV below the bottom of the conduction band in agreement with model predictions.     

Sulfurization temperature effects on the growth of Cu2ZnSnS4 thin film

We made Cu₂ZnSnS₄ (CZTS) thin films by sulfurization of Cu/Sn/Cu/Zn metallic films. Sulfurizations were carried out under different thermal annealing conditions, where maximum temperatures were 440 °C (LT-CZTS) and 550 °C (HT-CZTS). For LT-CZTS films, secondary phases such as SnS₂ and Cu_2?xS were observed, whereas for HT-CZTS films secondary impurities were not detected. Chemical composition of LT-CZTS film was observed to be very non-uniform. Highly Sn-rich and Zn-rich regions were found on the film surface of LT-CZTS. However, averaged chemical composition for larger area was close to stoichiometry. The HT-CZTS film showed homogeneous structural and chemical composition features. But, for HT-CZTS film, the Sn composition was observed to be decreased, which was due to the Sn-loss. By UV–Visible spectroscopy, optical band gaps of LT- and HT-CZTS films were measured to be ～1.33 eV and ～1.42 eV, respectively. The band gap of LT-CZTS film was also observed to be smaller by photoluminescence measurement. The depressed band gap of LT-CZTS film may be ascribed to some defects and low band gap impurities such as Cu₂SnS₃ and Cu_2-xS in the LT-CZTS film.     

Electronic band structure and Fermi surface of CaB6 studied by angle-resolved photoemission spectroscopy

We report high-resolution angle-resolved photoemission spectroscopy (ARPES) on CaB6. The band structure determined by ARPES shows a 1 eV energy gap at the X point between the valence and the conduction bands. We found a small electron pocket at the X point, whose carrier number is estimated to be (4-5) x 10(19) cm(-3), in good agreement with the Hall resistivity measurement with the same crystal. The experimental results are discussed in comparison with band structure calculations and theoretical models for the high-temperature ferromagnetism.     

Growth and structural characterization of semiconducting Ru2Si3

Recent band structure calculations indicate that ruthenium silicide (Ru₂Si₃) is semiconducting with a direct band gap. Electrical measurements lead to a band gap around 0.8 eV which is technologically important for fiber communications. This makes Ru₂Si₃ a promising candidate for silicon based optical devices, namely LEDs. We present first results on the epitaxial growth of ruthenium silicide films on Si(1 0 0) and Si(1 1 1) fabricated by the template method, a special molecular beam epitaxy technique. Orientational relationships on Si(1 1 1) have been determined. We characterized the films by Rutherford Backscattering and Channeling, X-ray diffraction and transmission electron microscopy.     

（110）应变对立方相Ca2Si能带结构及光学性质的影响

采用第一性原理贋势平面波方法对(110)应变下立方相Ca2P0.25Si0.75的能带结构及光学性质进行模拟计算,全面分析了应变对Ca2P0.25Si0.75能带结构、光学性质的影响。计算结果表明：在92%~100%压应变范围内随着应变的逐渐增大导带向低能方向移动,价带向高能方向移动,带隙呈线性逐渐减小,但始终为直接带隙;在100%~102%张应变范围内随着应变的增加,带隙呈逐渐增大,应变达到102%直接带隙最大Eg=0.54378eV;在102%~104%应变范围内随着应变的增加,带隙逐渐减小;当应变大于104%带隙变为间接带隙且带隙随着应变增大而减小。施加应变Ca2P0.25Si0.75的介电常数、折射率均增大;施加压应变吸收系数增加,反射率减小;施加张应变吸收系数减小,反射率增加。综上所述,应变可以改变Ca2P0.25Si0.75的电子结构和光学常数,是调节Ca2P0.25Si0.75光电传输性能的有效手段。     

（110）应变对立方相Ca2Si能带结构及光学性质的影响

采用第一性原理贋势平面波方法对(110)应变下立方相Ca2P0.25Si0.75的能带结构及光学性质进行模拟计算,全面分析了应变对Ca2P0.25Si0.75能带结构、光学性质的影响。计算结果表明：在92%~100%压应变范围内随着应变的逐渐增大导带向低能方向移动,价带向高能方向移动,带隙呈线性逐渐减小,但始终为直接带隙;在100%~102%张应变范围内随着应变的增加,带隙呈逐渐增大,应变达到102%直接带隙最大Eg=0.54378eV;在102%~104%应变范围内随着应变的增加,带隙逐渐减小;当应变大于104%带隙变为间接带隙且带隙随着应变增大而减小。施加应变Ca2P0.25Si0.75的介电常数、折射率均增大;施加压应变吸收系数增加,反射率减小;施加张应变吸收系数减小,反射率增加。综上所述,应变可以改变Ca2P0.25Si0.75的电子结构和光学常数,是调节Ca2P0.25Si0.75光电传输性能的有效手段。     

TiO2/SnO2复合氧化物的制备和光谱特性

为了研究TiO2/SnO2复合氧化物的光学特性,用胶体化学方法制备了以SnO2为内核的TiO2/SnO2复合氧化物,并且用紫外-可见光吸收光谱、X射线衍射和红外光谱对TiO2/SnO2复合氧化物的特性进行了分析.结果显示TiO2和TiO2/SnO2的能带宽度分别为4.13和3.86 eV,表现出量子尺寸效应;TiO2/SnO2在紫外区域具有宽的强吸收带.X射线衍射中TiO2的(110)衍射峰的位置移动了1.6°,强度也发生了变化;与TiO2红外光谱相比,TiO2/SnO2中Ti-O键的伸缩振动由500cm-1移到了656 cm-1,并有560 cm-1的肩峰,与吸附水相应的1650 cm-1附近的吸收峰和3420 cm-1的吸收峰均有所增加.     

氧空穴导致二氧化钒低温相带隙变窄

具有一定能量的光照导致低温绝缘二氧化钒(VO_2)发生绝缘体金属转变.本文通过密度泛函理论的Heyd-Scuseria-Ernzerhof杂化泛函方法对含氧空穴的低温绝缘VO_2非磁M1相进行第一性原理研究.研究发现,含氧空穴的M1的晶格参数几乎不变,但氧空穴附近的长的V—V键长却变短了.进一步研究发现,尽管纯的非磁M1的带隙是0.68 eV,但含O1和O2位的氧空穴非磁M1带隙分别为0.23 eV和0.20 eV,同时含有O1和O2位氧空穴非磁M1带隙为0.15 eV,这很好地解释了实验结果.     

B-cation effect on the electronic and magnetic properties of CeBO3 (B=Ga, In) compounds from first principles study

The ab initio APW+lo method is used to study the cation effect on the electronic structure of CeBO₃ (B=Ga, In) compounds. High-pressure structural behavior, magnetic phase stabilities and electronic properties of both materials have been investigated. The observed most stable phases are the orthorhombic (Pnma) and hexagonal (P6₃cm) for CeGaO₃ and CeInO₃, respectively. It is shown that the ferromagnetic (FM) state in CeGaO₃ is energetically more favorable than the anti-ferromagnetic (AFM) one, unlike CeInO₃ where the AFM-III configuration is the lowest in energy. LSDA+U calculation shows that the valence band maximum is located at T point and the conduction band minimum is located at the center of the Brillouin zone, resulting in a wide indirect energy band gap of about 3.6 eV in the ferromagnetic ordering CeGaO₃ which is typical of semiconductor with large gap. CeInO₃ compound keeps the metallic character using DFT+U calculation.     

立方氮化硼单晶紫外吸收光谱的研究

对于在高温、高压下合成的人工立方氮化硼(cBN)片状单晶进行了紫外吸收光谱和第一性原理的能带结构研究。实验中采用了UV WINLAB光谱分析仪,数据分析由MOLECULAR SPECTROSCOPY软件进行拟合运算,通过特殊的石英夹具对样品的测试表明cBN的紫外吸收波长限为198 nm,带隙为6.26 eV。结合第一性原理计算的cBN的能带结构和电子态密度的计算,可以证实导致紫外光吸收的过程是价带电子吸收光子到导带的间接跃迁。文章实验结果与目前报道的cBN能带结构中禁带宽度的吻合较好,表明cBN具有良好的紫外特性,是一种具有发展前景的紫外光电和高温半导体器件材料。     

Coherent anti-stokes Raman spectroscopy of highly compressed solid deuterium at 300 K: evidence for a new phase and implications for the band gap

Coherent anti-Stokes Raman spectroscopy has been used to study deuterium at ambient temperature to 187 GPa, the highest pressure this technique has ever been applied. The pressure dependence of the nu1 vibron line shape indicates that deuterium has a rho direct=0.501 and rho exciton=0.434 mol/cm3 for a band gap of 2omega P=4.66 eV. The extrapolation from the ambient pressure band gap yields a metallization pressure of 460 GPa, confirming earlier measurements. Above 143 GPa, the Raman shift data provide clear evidence for the presence of the ab initio predicted I' phase of deuterium.     

过渡区p型氢化硅氧薄膜结构和光电特性的研究

采用射频等离子体增强化学气相沉积技术,利用二氧化碳(CO_2)、氢气(H_2)、硅烷(SiH_4)和乙硼烷(B_2H_6)作为气源,制备出一系列p型氢化硅氧薄膜.利用拉曼光谱、傅里叶变换红外光谱和暗电导测试,研究了不同二氧化碳流量对薄膜材料结构和光电特性的影响,获得了从纳米晶相向非晶相转变的过渡区P层.研究表明:随着二氧化碳流量从0增加到1.2 cm~3·min~(-1),拉曼光谱的峰值位置从520 cm~(-1)逐渐移至480 cm~(-1).材料红外光谱表明,随着二氧化碳流量的增加,薄膜中的氧含量逐渐增加,氢键配置逐渐由硅单氢键转换为硅双氢键.P层SiO:H薄膜电导率从3S/cm降为8.3×10~(-6)S/cm.所有p型SiO:H薄膜的光学带隙(Eopt)都在1.82—2.13 eV之间变化.在不加背反射电极的条件下,利用从纳米晶相向非晶相转变的过渡区P层作为电池的窗口层,且在P层和I层之间插入一定厚度的缓冲层,制备出效率为8.27%的非晶硅薄膜电池.