渐变型量子阱垒层厚度对GaN基双波长发光二极管发光特性调控的研究

采用软件理论分析的方法对渐变型量子阱垒层厚度的InGaN双波长发光二极(LED)的载流子浓度分布、 能带结构、自发发射谱、内量子效率、发光功率及溢出电子流等进行研究.分析结果表明, 增大量子阱垒层厚度会影响空穴在各量子阱的注入情况, 对双波长LED各量子阱中空穴浓度分布的 均衡性及双波长发光光谱的调控起到一定作用,但会导致内量子效率严重下降; 而当以特定的方式从n电极到p电极方向递减渐变量子阱垒层厚度时, 活性层量子阱的溢出电子流 得到有效的控制, 双发光峰强度达到基本一致, 同时芯片的内量子效率下降得到了有效控制, 且具备大驱动电流下较好的发光特性.     

Blue InGaN light-emitting diodes with dip-shaped quantum wells

InGaN based light-emitting diodes (LEDs) with dip-shaped quantum wells and conventional rectangular quantum wells are numerically investigated by using the APSYS simulation software. It is found that the structure with dip-shaped quantum wells shows improved light output power, lower current leakage and less efficiency droop. Based on numerical simulation and analysis, these improvements on the electrical and the optical characteristics are attributed mainly to the alleviation of the electrostatic field in dip-shaped InGaN/GaN multiple quantum wells (MQWs).     

Enhanced performance of GaN-based light-emitting diodes with InGaN/GaN superlattice barriers

GaN-based multiple quantum well light-emitting diodes （LEDs） with conventional and superlattice barriers have been investigated numerically. Simulation results demonstrate using InGaN/GaN superlattices as barriers can effectively enhance performances of the GaN-Based LEDs, mainly owing to the improvement of hole injection and transport among the MQW active region. Meanwhile, the improved electron capture decreases the electron leakage and alleviates the efficiency droop. The weak polarization field induced by the superlattice structure strengthens the intensity of the emission spectrum and leads to a blue-shift relative to the conventional one.     

The enhancement of light-emitting efficiency using GaN-based multiple quantum well light-emitting diodes with nanopillar arrays

The quest for higher modulation speed and lower energy consumption has inevitably promoted the rapid development of semiconductor-based solid lighting devices in recent years. GaN-based light-emitting diodes （LEDs） have emerged as promising candidates for achieving high efficiency and high intensity, and have received increasing attention among many researchers in this field. In this paper, we use a self-assembled array-patterned mask to fabricate InGaN/GaN multi- quantum well （MQW） LEDs with the intention of enhancing the light-emitting efficiency. By utilizing inductively coupled plasma etching with a self-assembled Ni cluster as the mask, nanopillar arrays are formed on the surface of the InGaN/GaN MQWs. We then observe the structure of the nanopillars and find that the V-defects on the surface of the conventional structure and the negative effects of threading dislocation are effectively reduced. Simultaneously, we make a comparison of the photoluminescence （PL） spectrum between the conventional structure and the nanopillar arrays, achieved under an experimental set-up with an excitation wavelength of 325 mm. The analysis demonstrates that MQW-LEDs with nanopillar arrays achieve a PL intensity 2.7 times that of conventional LEDs. In response to the PL spectrum, some reasons are proposed for the enhancement in the light-emitting efficiency as follows： 1） the improvement in crystal quality, namely the reduction in V-defects; 2） the roughened surface effect on the expansion of the critical angle and the attenuated total reflection; and 3） the enhancement of the light-extraction efficiency due to forward scattering by surface plasmon polariton modes in Ni particles deposited above the p-type GaN layer at the top of the nanopillars.     

Comparison of nitride-based dual-wavelength lightemitting diodes with an InAIN electron-blocking layer and with p-type doped barriers

The advantages of nitride-based dual-wavelength light-emitting diodes （LEDs） with an InA1N electron blocking layer （EBL） are studied. The emission spectra, carrier concentration in the quantum wells （QWs）, energy band and internal quantum efficiency （IQE） are investigated. The simulation results indicate that an LED with an InA1N EBL performs better over a conventional LED with an A1GaN EBL and an LED with p-type-doped QW barriers. All of the advantages are due to the enhancement of carrier confinement and the lower electron leakage current. The simulation results also show that the efficiency droop is markedly improved and the luminous intensity is greatly enhanced when an InAlN EBL is used.     

Status of GaN-based green light-emitting diodes

GaN-based blue light emitting diodes(LEDs) have undergone great development in recent years,but the improvement of green LEDs is still in progress.Currently,the external quantum efficiency(EQE) of GaN-based green LEDs is typically30%,which is much lower than that of top-level blue LEDs.The current challenge with regard to GaN-based green LEDs is to grow a high quality In GaN quantum well(QW) with low strain.Many techniques of improving efficiency are discussed,such as inserting Al GaN between the QW and the barrier,employing prestrained layers beneath the QW and growing semipolar QW.The recent progress of GaN-based green LEDs on Si substrate is also reported:high efficiency,high power green LEDs on Si substrate with 45.2% IQE at 35 A/cm2,and the relevant techniques are detailed.     

Comparison of nitride-based dual-wavelength light- emitting diodes with an InAlN electron-blocking layer and with p-type doped barriers

The advantages of nitride-based dual-wavelength light-emitting diodes (LEDs) with an InAlN electron blocking layer (EBL) are studied. The emission spectra,carrier concentration in the quantum wells (QWs),energy band and internal quantum efficiency (IQE) are investigated. The simulation results indicate that an LED with an InAlN EBL performs better over a conventional LED with an AlGaN EBL and an LED with p-type-doped QW barriers. All of the advantages are due to the enhancement of carrier confinement and the lower electron leakage current. The simulation results also show that the efficiency droop is markedly improved and the luminous intensity is greatly enhanced when an InAlN EBL is used.     

Investigation of blue InGaN light-emitting diodes with step-like quantum well

The concept of a step-like quantum well is proposed with the purpose to reduce the influence of electrostatic field resulting from the piezoelectric effect on the optical performance of blue InGaN light-emitting diodes. Particularly, the optical properties of the LED structures with the In_0.23Ga_0.77N single quantum well, In_0.20Ga_0.80N/In_0.26Ga_0.74N step-like quantum well, and In_0.26Ga_0.74N/In_0.20Ga_0.80N step-like quantum well are numerically investigated in detail. Simulation results show that the In_0.20Ga_0.80N/In_0.26Ga_0.74N step-like-quantum-well LED structure has the best optical performance in virtue of the improvement in spatial overlap of electrons and holes in the quantum well.     

Modeling and simulation of efficiency droop in GaN-based blue light-emitting diodes incorporating the effect of reduced active volume of InGaN quantum wells

The efficiency droop of InGaN-based blue light-emitting diodes (LEDs) is analyzed using numerical simulations with a modified ABC carrier recombination model. The ABC model is modified to include the effect of reduced effective active volume of InGaN quantum wells (QWs) and incorporated into the numerical simulation program. It is found that the droop of internal quantum efficiency (IQE) can be well explained by the effect of reduced light-emitting active volume without assuming a large Auger recombination coefficient. A simulated IQE curve with the modified ABC model is found to fit quite well with a measured efficiency curve of an InGaN LED sample when the effective active volume takes only 2.5% of the physical volume of QWs. The proposed numerical simulation model incorporating the reduced effective active volume can be advantageous for use in the modeling and simulation of InGaN LEDs for higher efficiency.     

Improved light extraction of GaN-based light-emitting diodes with surface-patterned ITO

The surface patterning of the indium tin oxide (ITO) transparent current layer has been investigated to improve the light extraction efficiency of GaN-based light-emitting diodes (LEDs). LEDs with periodic micro-hexagon patterned ITO have been fabricated utilizing standard lithography techniques and inductively coupled plasma (ICP) technology. The luminance intensity of the LED chips with patterned ITO following 160 s ICP etching was enhanced by about 50% compared to the LED chips with unpatterned ITO. Detailed processing parameters are provided. scanning electron microscopy (SEM) and atomic force microscopy (AFM) are used to examine the micro-structures. The results indicate that the surface-patterned ITO technique could have potential applications in high-power GaN-based LEDs.     

Simulation of current spreading for GaN-based light-emitting diodes

Uniform current spreading is crucial for the performance of light-emitting diodes (LEDs). It has been reported that the reliability and light distribution are affected by non-uniform current spreading. In this paper, the impact of different electrode patterns on the performance of LED chips is investigated. A hybrid modeling method is employed to analyze the electrical and thermal characteristics of LEDs with two different electrode mesa structures. Corresponding experiments are also carried out to validate the calculation results. It is found that increasing amount of p-electrodes in interdigitated electrode patterns is effective in improving the performance of LEDs.     

The advantage of blue InGaN multiple quantum wells light-emitting diodes with p-AlInN electron blocking layer

InGaN based light-emitting diodes (LEDs) with different electron blocking layers have been numerically investigated using the APSYS simulation software. It is found that the structure with a p-AlInN electron blocking layer showes improved light output power, lower current leakage, and smaller efficiency droop. Based on numerical simulation and analysis, these improvements of the electrical and optical characteristics are mainly attributed to the efficient electron blocking in the InGaN/GaN multiple quantum wells (MQWs).     

Investigation of InGaN green light-emitting diodes with chirped multiple quantum well structures

The effect of using chirped multiple quantum-well (MQW) structures in InGaN green light-emitting diodes (LEDs) is numerically investigated. An active structure, which is with both thick QWs with low indium composition on the p-side and thin QWs with high indium composition next to the n-region, is presented in this study. The thickness and indium composition in each single QW is specifically tuned to emit the same green emission spectrum. Comparing with conventional active structure design of green LEDs, which is using uniform MQWs, the output power is increased by 27% at 20 mA, and by 15% at 100 mA current injections. This improvement is mainly attributed to the enhanced efficiency of carrier injection into QWs and the improved capability of carrier transport.     

Temperature-dependent efficiency droop behaviors of GaN-based green light-emitting diodes

The efficiency droop behaviors of GaN-based green light-emitting diodes (LEDs) are studied as a function of temperature from 300 K to 480 K. The overall quantum efficiency of the green LEDs is found to degrade as temperature increases, which is mainly caused by activation of new non-radiative recombination centers within the LED active layer. Meanwhile, the external quantum efficiency of the green LEDs starts to decrease at low injection current level (<1 A/cm2 ) with a temperature-insensitive peak-efficiency-current. In contrast, the peak-efficiency-current of a control GaN-based blue LED shows continuous up-shift at higher temperatures. Around the onset point of efficiency droop, the electroluminescence spectra of the green LEDs also exhibit a monotonic blue-shift of peak energy and a reduction of full width at half maximum as injection current increases. Carrier delocalization is believed to play an important role in causing the efficiency droop in GaN-based green LEDs.     

Design of patterned sapphire substrates for GaN-based light-emitting diodes

A new method for patterned sapphire substrate(PSS) design is developed and proven to be reliable and cost-effective.As progress is made with LEDs' luminous efficiency,the pattern units of PSS become more complicated,and the effect of complicated geometrical features is almost impossible to study systematically by experiments only.By employing our new method,the influence of pattern parameters can be systematically studied,and various novel patterns are designed and optimized within a reasonable time span,with great improvement in LEDs' light extraction efficiency(LEE).Clearly,PSS pattern design with such a method deserves particular attention.We foresee that GaN-based LEDs on these newly designed PSSs will achieve more progress in the coming years.     

Analysis on electrical characteristics of high-voltage GaN-based light-emitting diodes

<正>In order to investigate their electrical characteristics,high-voltage light-emitting-diodes(HV-LEDs) each containing four cells in series are fabricated.The electrical parameters including varying voltage and parasitic effect are studied. It is shown that the ideality factors(IFs) of the HV-LEDs with different numbers of cells are 1.6,3.4,4.7,and 6.4.IF increases linearly with the number of cells increasing.Moreover,the performance of the HV-LED with failure cells is examined.The analysis indicates that the failure cell has a parallel resistance which induces the leakage of the failure cell.The series resistance of the failure cell is 76.8Ω,while that of the normal cell is 21.3Ω.The scanning electron microscope(SEM) image indicates that different metal layers do not contact well.It is hard to deposit the metal layers in the deep isolation trenches.The fabrication process of HV-LEDs needs to be optimized.     

GaN基多量子阱蓝光LED的γ辐照效应

本文用4×104Ci(1Ci=3.7×1010Bq)的60Co源(剂量率2×105rad(Si)/h)对GaN基InGaN/GaN多量子阱蓝光LED进行5种剂量的γ射线的辐照实验.通过辐照前后蓝光LED的波长、色纯度、最大半峰宽(FWHM)和电流-电压(I-V)、电流-光通量(I-F)等电光学特性分析,得到γ射线对GaN基LED器件的辐照效应.结果发现,辐照后LED器件的发光一致性和均匀性变差,在20mA工作电流下,最大剂量下器件发光强度衰减近90%,光通量衰减约40%,并得到器件的抗辐照能力的参数τ0Kγ为4.039×10-7rad.s-1,发现较低的正向偏压下(小于2.6V)器件的饱和电流随辐照总剂量增大而增大.     

Internal quantum efficiency of GaN-based light-emitting diodes grown on silicon substrates determined from rate equation analyses

We present a convenient and reliable method for determining the internal quantum efficiency (IQE) in GaN-based blue light-emitting diodes (LEDs) grown on Si(111) substrates based on the carrier rate equation model. By using the peak point of the efficiency curve in photoluminescence (PL) measurements as the parameter of the rate equation analysis, the IQE can be unambiguously determined without any pre-assumed parameters. The theoretical IQE model is used to fit the measured PL efficiency curves and the IQE of LED samples are determined. The maximum IQE of the LED sample grown on the Si substrate was obtained to be 0.74, which is found to agree well with the results obtained by conventional temperature-dependent PL measurements.