室温下ZnS－ZnTe应变超晶格的带间跃迁

本文报导了ＺｎＳ－ＺｎＴｅ应变超晶格中的载流子在室温下跃迁复合性质．通过测量室温下光致发光光谱，对载流子在超晶格带间跃迁的过程进行了研究．     

ZnSe—ZnTe应变层超晶格的光吸收研究

在室温下测量了Znse-ZnTe应变层超晶格的光吸收谱,观测到对应于第一轻重空穴跃迁的吸收台阶.根据测量所得的超晶格带隙确定了ZnSe-ZnTe的价带不连续为1.10eV.     

室温下ZnCdSe-ZnSe组合超晶格的子带跃迁

通过在室温下对ZnCdSe-ZnSe组合超晶格结构的电调制反射谱的测量,观测到分别来自两组超晶格的激子跃迁,由曲线拟合出的跃迁能量与由包络函数近似计算得到的能量相符合。     

静压下Znse/Zn1-xCdxSe应变超晶格的光致发光研究

本文首次在室温和0-2.5GPa静压范围内研究了Znse/Zn0.74Cd0.26Se应变超晶格的静压光致发光,观察到了室温条件下的超晶格阱层的重空穴激子跃迁随压力的亚线性变化的特性.经过计算机拟合实验数据得到了一阶和二阶压力系数.理论计算得到的一阶压力系数与实验得到的压力系数符合得较好.     

GaAs/AlGaAs Fibonacci准周期超晶格带间跃迁的光谱研究

运用光致荧光,光调制反射和光电流谱等方法研究了11级的GaAs/AlGaASFibonacci准周期超晶格的带间跃迁,并用转移矩阵方法计算了Fibonacci准周期超晶格和相应的周期性超晶格的子能级和子能带.理论计算与实验结果符合得很好. 关键词：     

静压下Znse／Zn_（1－x）Cd_xSe应变超晶格的光致发光研究

本文首次在室温和０—２．５ＧＰａ静压范围内研究了Ｚｎｓｅ／Ｚｎ０．２６Ｃｄ０．２６Ｓｅ应变超晶格的静压光致发光，观察到了室温条件下的超晶格阱层的重空穴激子跃迁随压力的亚线性变化的特性．经过计算机拟合实验数据得到了一阶和二阶压力系数．理论计算得到的一阶压力系数与实验得到的压力系数符合得较好。     

ZnSe—ZnS应变层超晶格的激子吸收谱

在16K至室温范围内测量了ZnSe-ZnS应变层超晶格的激子吸收谱.观测到对应于1E-1HH1E-1LH及1E-3HH跃迁的三个激子吸收峰.     

石墨烯莫尔超晶格

石墨烯莫尔超晶格来源于六方氮化硼衬底对石墨烯的二维周期势调控. 由于这种外加的周期势对石墨烯能带具有显著的调制作用, 近年来引发了人们广泛的关注. 利用氮化硼衬底上外延的单晶石墨烯薄膜, 我们系统研究了基底调制下的莫尔超晶格以及相关的物理特性. 首先, 我们在电子端和空穴端都观测到了超晶格狄拉克点, 并且超晶格狄拉克点同本征狄拉克点类似, 都表现出绝缘体的特性. 在低温强磁场下, 可以观测到到单层石墨烯和双层石墨烯的量子霍尔效应. 并且, 从朗道扇形图中, 可以清晰的看到磁场下形成的超晶格朗道能级. 此外, 利用红外光谱的方法研究了强磁场下石墨烯超晶格体系不同朗道能级之间的跃迁, 发现这种跃迁满足有质量狄拉克费米子的行为, 对应38 meV的本征能隙. 在此基础上, 我们在380 meV位置发现一个同超晶格能量对应的光电导峰. 通过利用旋量势中三个不同的势分量对光电导峰进行拟合, 发现赝自旋杂化势起主导作用. 进一步研究表明赝自旋杂化势强度随载流子浓度的增大显著降低, 表明电子-电子相互作用引起的旋量势的重构.     

高组分稀磁半导体Cd1-xMnxTe/CdTe超晶格的荧光谱研究

报道用分子束外延(MBE)技术生长的x=0.4,0.8的高组分稀磁半导体Cd1-xMnxTe/CdTe超晶格低温和室温荧光谱研究结果.基态激子跃迁能级荧光谱实验结果显示高组分超晶格中具有高量子效率和高质量光发射.对激子能级随温度的变化进行了详细研究,给出激子跃迁能量的温度系数.激子能级线型的展宽随温度变化关系可用激子-纵向光学声子耦合模型解释.与光调制反射谱实验结果进行了比较.     

ZnCdSe-ZnSe组合超晶格的受激发射

77K下首次观测到了来自ZnCdSe-ZnSe组合超晶格的受激发射过程。在组合超晶格中由于载流子转移过程的存在,受激发射出现在具有宽阱的超晶格中。     

Nanomechanical characteristics of annealed Si/SiGe superlattices

In this study, the nanomechanical damage was investigated on the annealed Si/SiGe strained-layer superlattices (SLSs) deposited using an ultrahigh-vacuum chemical vapor deposition (UHVCVD). Nanoscratch, nanoindenter, atomic force microscopy (AFM), and transmission electron microscopy (TEM) techniques were used to determine the nanomechanical behavior of the SiGe films. With a constant force applied, greater hardness number and larger coefficients of friction (μ) were observed on the samples that had been annealed at 600 °C, suggesting that annealing of the Si/SiGe SLSs can induce greater shear resistance. AFM morphological studies of the Si/SiGe SLSs revealed that pile-up phenomena occurred on both sides of each scratch, with the formation of some pellets and microparticles. The Si/SiGe SLSs that had been subjected to annealing under various conditions exhibited significantly different features in their indentation results. Indeed, the TEM images reveal slight dislocation propagation in the microstructures. Thus, the hardness and elastic modulus can be increased slightly after annealing treatment because the existence of comparatively unstable microstructures. It is suggested that cracking phenomena dominate the damage cause of Si/SiGe SLSs.     

Electrical properties of p-type and n-type ZnSeZnTe strained-layer

ZnSe and ZnTe semiconducting materials are highly promising candidates for the fabrication of short-wavelength light-emitting devices. We have grown ZnSeZnTe strained-layer superlattices (SLSs) on InP substrates by molecular beam epitaxy. In addition to undoped SLSs, two kinds of modulation doped SLS samples were prepared in this study, the first with Ga-doped ZnSe layers and undoped ZnTe layers, and the second with undoped ZnSe layers and Sb-doped ZnTe layers. Van der Pauw measurements of the SLS samples at room temperature showed that their electrical properties can be controlled by using the modulation doping technique. The undoped sample and the Ga-doped sample exhibited n-type conduction, whereas p-type conduction was observed for the Sb-doped sample. Interdiffusion profiles of dopants were measured by secondary ion mass spectroscopy, and significant Ga redistribution was observed. Finally, we have fabricated pn junctions from ZnSeZnTe SLSs, and measured their current-voltage characteristics.     

Coherent control via interplay between driving field and two-body interaction in a double well

We investigate interplay between external field and interatomic interaction and its applications to coherent control of quantum tunneling for two repulsive bosons confined in a high-frequency driven double well. By using a full solution which is generated analytically as a coherent non-Floquet state, three kinds of the stationary-like states (SLSs) with different degeneracies are illustrated, which corresponding to the different coherent destructions of tunneling (CDT) at the Floquet level-crossing, avoided-crossing and uncrossing points. The analytical results are numerically confirmed and perfect agreements are found. Based on the results, a useful scheme of quantum tunneling switch between the SLSs is presented.     

Defect reduction in ZnMgSSe epilayers on GaAs by using ZnMgSe/ZnSSe strained-layer superlattices

Effectiveness of ZnMgSe/ZnSSe strained layer superlattices(SLSs) in reducing threading dislocations of ZnMgSSe has been studied. Transmission electron microscopy has been used to investigate the dislocation structure. The strained layer superlattice buffer was effective in blocking threading dislocations. The surface dislocation in ZnMgSSe could be reduced by using the ZnMgSe/ZnSSe SLSs. The dislocation density would be reduced further by adjusting the stress level of SLS layer or by designing it properly.     

Electrical activation of phosphorus-donors introduced in 6H-SiC by hot-implantation

Phosphorus ion (P⁺) implantations into 6H-SiC at room temperature (RT), 800 °C, and 1200 °C with mean concentrations of 1᎒¹⁸-5᎒¹⁹ /cm³ were performed to investigate the effects of hot-implantation on the electrical activation of P atoms. Improvement of the electrical activation of P atoms due to hot-implantation is found to depend on their implantation concentration, which can be divided into three regions. In the implantation with P in a low-concentration region (for example, 1᎒¹⁸ /cm³), no significant difference in the carrier concentrations among the samples implanted at RT and elevated temperatures is observed after annealing above 񫰸 °C. In a medium-concentration region, the carrier concentration increases with implantation temperature. When P ions were implanted in a high-concentration region (for example, 5᎒¹⁹ /cm³), the hot-implanted samples exhibit higher carrier concentration as compared with RT-implanted samples. Regarding hot-implantation, the carrier concentration in 800 °C-implanted samples is higher than that in the 1200 °C-implanted samples. This results can be interpreted as a degree of damage introduced by each implantation.     

Observation of long spin-relaxation times in bilayer graphene at room temperature

We report on the first systematic study of spin transport in bilayer graphene (BLG) as a function of mobility, minimum conductivity, charge density, and temperature. The spin-relaxation time τ(s) scales inversely with the mobility μ of BLG samples both at room temperature (RT) and at low temperature (LT). This indicates the importance of D'yakonov-Perel' spin scattering in BLG. Spin-relaxation times of up to 2 ns at RT are observed in samples with the lowest mobility. These times are an order of magnitude longer than any values previously reported for single-layer graphene (SLG). We discuss the role of intrinsic and extrinsic factors that could lead to the dominance of D'yakonov-Perel' spin scattering in BLG. In comparison to SLG, significant changes in the carrier density dependence of τ(s) are observed as a function of temperature.     

The refractive index of III–V semiconductor strained-layer superlattices

Strained-layer superlattices (SLSs), such as the material system InGaAs/GaAs, offer one approach to optical waveguides. For such applications a knowledge of the way in which the ternary layer composition, strain and size quantization affect the refractive index is essential. This review looks at how the refractive index of bulk semiconductors has been modelled, and at the modifications that are involved in accounting for the effects of strain and quantization, in order to enable a prediction of the SLS refractive index.     

The effects of deposition temperature and ambient on the physical and electrical performance of DC-sputtered n-ZnO/p-Si heterojunction

The effects of deposition conditions on the physical and electrical performance of the n-ZnO/p-Si heterojunction were systematically investigated. ZnO films were deposited on the Si and glass substrates using direct current (DC) magnetron sputtering with various ambients and substrate temperatures. The results showed that increasing the O₂ content and substrate temperature during the deposition process could improve the crystallinity and stoichiometry of the ZnO film, resulting in a lower carrier concentration and higher resistivity. The electrical properties of the n-ZnO/p-Si heterojunctions were also affected by the deposition parameters. For the junctions fabricated in the pure Ar ambient, the sample deposited at room temperature (RT) showed Ohmic behavior, while the one deposited at 300?°C exhibited poor rectifying behavior. On the other hand, the junctions fabricated in the O₂/Ar ambient possessed ideal rectifying behaviors. The different carrier transport mechanisms for the heterojunctions under forward and reverse bias were systematically studied using a high temperature current–voltage (I-V) measurement. The recombination-tunneling current showed temperature insensitive performance while the space-charge limited current (SCLC) changed with the measurement temperature.