共查询到20条相似文献,搜索用时 15 毫秒
1.
C. Zhu 《Physics letters. A》2007,372(1):81-86
Using Landau-Devonshire (LD)-type phenomenological model, we investigate the phase diagrams and dielectric behaviors of single-domain single-crystal Ba0.6Sr0.4TiO3 films deposited on orthorhombic substrates. An anisotropic strain factor is introduced to quantitatively calculate the effects of anisotropic in-plane misfit strains. Investigation indicates that anisotropic strains play a crucial role on formation of stable ferroelectric phases and dielectric properties. The anisotropic strains induce tetragonal phases which only contain one in-plane spontaneous polarization component. These phases do not exist in BST films of the same composition under isotropic strains. Moreover, permittivity and tunability of films can reach to maximum when the corresponding spontaneous polarization component disappears at the boundaries of structural phase transition. 相似文献
2.
Peng Shi Xi Yao Liangying Zhang Xiaoqing Wu Mingqiang Wang Xin Wan 《Solid State Communications》2005,134(9):589-593
(Ba0.7Sr0.3)TiO3 (BST) ferroelectric thin films with perovskite crystal structure were fabricated by soft solution processing on a quartz substrate. The third-order nonlinear optical properties were investigated by using Z-scan technique. Positive nonlinear refractive index and nonlinear absorption coefficient were determined to be 4×10−7 esu and 1.2×10−6 m/w, respectively. The real part and imaginary part of third-order optical nonlinear susceptibility were calculated and the values were 6.43×10−8 and 5.14×10−8 esu, respectively. All of these results show ferroelectric BST thin film is promising for applications in nonlinear optical devices. 相似文献
3.
Ba0.6Sr0.4TiO3 thin films were deposited on Pt/SiO2/Si substrate by radio frequency magnetron sputtering. High-resolution transmission electron microscopy (HRTEM) observation shows that there is a transition layer at BST/Pt interface, and the layer is about 7-8 nm thickness. It is found that the transition layer was diminished to about 2-3 nm thickness by reducing the initial RF sputtering power. X-ray photoelectron spectroscopy (XPS) depth profiles show that high Ti atomic concentration results in a thick interfacial transition layer. Moreover, the symmetry ν of ?r-V curve of BST thin film is enhanced from 52.37 to 95.98%. Meanwhile, the tunability, difference of negative and positive remanent polarization (Pr), and that of coercive field (EC) are remarkably improved. 相似文献
4.
Ba0.70Sr0.30TiO3 (BST) thin films doped by Co (BSTC) are fabricated by sol-gel method on a Pt/Ti/SiO2/Si substrate. A strong correlation is observed among the microstructure, dielectric, ferroelectric, ferromagnetic properties and Co concentration. The dielectric constant of BST thin films can be tailored from 343 to 119 by manipulating the Co concentration. The dielectric loss of BSTC thin films are still kept below 0.020 and the tunability is above 30% at a dc-applied electric field of 500 kV/cm. With increasing Co doping up to 10 mol%, the coexistence of ferromagnetism and ferroelectrics is found. Suitable dielectric constant, low-dielectric loss, and high tunability of this kind of thin films can be useful for potential tunable applications. 相似文献
5.
N.D. Scarisoreanu L. Nedelcu M.I. Toacsan S.D. Stoica 《Applied Surface Science》2010,256(22):6526-6530
Single-phase Ba(Mg1/3Ta2/3)O3 thin films were prepared by radiofrequency plasma beam assisted pulsed laser deposition (RF-PLD) starting from a bulk ceramic target synthesized by solid state reaction. Atomic force microscopy, X-ray diffraction and spectroscopic ellipsometry were used for morphological, structural and optical characterization of the BMT thin films. The X-ray diffraction spectra show that the films exhibit a polycrystalline cubic structure. From spectroscopic ellipsometry analysis, the refractive index varies with the thin films deposition parameters. By using the transmission spectra and assuming a direct band to band transition a band gap value of ≈4.72 eV has been obtained. 相似文献
6.
Chunlin Fu Chuanren Yang Hongwei Chen Liye Hu Linshan Dai 《Applied Surface Science》2005,252(2):461-465
The microstructure and electrical properties of Ba0.6Sr0.4TiO3 thin films have been investigated. Nanometer-sized domains, ranging from 8 to about 30 nm, were observed by piezoresponse force microscopy (PFM). The critical size, below which only single domains exist, is found to be about 31 nm. The film exhibits ferroelectric behavior characterized by polarization hysteresis loop and capacitance-voltage curve. 相似文献
7.
Metallo-organic decomposition derived dielectric thin films of calcium zirconate doped with various concentrations of strontium ((Ca, Sr)ZrO3) were prepared on Pt coated silicon substrate. Mainly in this paper, we present the investigations of their structural developments and present their electric and dielectric properties as well. The structural developments show that the CaZrO3 film has amorphous structure with carbonate existing when annealed at 600 °C, while annealed at 650 °C and above, the carbonate is decomposed and those films crystallize into perovskite phase without preferred orientation. In addition, the prepared (Ca, Sr)ZrO3 films with their Zr-O bonds affected by strontium doping are homogenous and stable as solid solutions in any concentration of strontium and all Bragg diffraction characteristics for the films shift downward with the increase in the concentration of strontium. Moreover, the electric properties show that the (Ca, Sr)ZrO3 films have very low leakage current density and high breakdown strength; typically, the CaZrO3 film annealed at 650 °C has the leakage current density approximately 9.5 × 10−8 A cm−2 in the field strength of 2.6 MV cm−1. Furthermore, the dielectric properties show that their dielectric constants are higher than 12.8 with very little dispersion in the frequency range from 100 Hz to 1 MHz and are independent of applied dc bias as well. The dielectric properties, in combination with the electric properties, make the materials promising candidates for high-voltage and high-reliability capacitor applications. 相似文献
8.
The structural properties and the room temperature luminescence of Er2O3 thin films deposited by RF magnetron sputtering have been studied. Films characterized by good morphological properties have been obtained by using a SiO2 interlayer between the film and the Si substrate. The evolution of the properties of the Er2O3 films due to rapid thermal annealing processes in O2 ambient performed at temperatures in the range 800-1200 °C has been investigated in details. The existence of well-defined annealing conditions (temperature of 1100 °C or higher) allowing to avoid the occurrence of extensive chemical reactions with the oxidized substrate has been demonstrated and an increase of the photoluminescence (PL) intensity by about a factor of 40 with respect to the as deposited material has been observed. The enhanced efficiency of the photon emission process has been correlated with the longer lifetime of the PL signal. The same annealing processes are less effective when Er2O3 is deposited on Si. In this latter case interfacial reactions and pit formation occur, leading to a material characterized by stronger non-radiative phenomena that limit the PL efficiency. 相似文献
9.
L. Shi 《Applied Surface Science》2007,253(7):3731-3735
As a potential gate dielectric material, the La2O3 doped SiO2 (LSO, the mole ratio is about 1:5) films were fabricated on n-Si (0 0 1) substrates by using pulsed laser deposition technique. By virtue of several measurements, the microstructure and electrical properties of the LSO films were characterized. The LSO films keep the amorphous state up to a high annealing temperature of 800 °C. From HRTEM and XPS results, these La atoms of the LSO films do not react with silicon substrate to form any La-compound at interfacial layer. However, these O atoms of the LSO films diffuse from the film toward the silicon substrate so as to form a SiO2 interfacial layer. The thickness of SiO2 layer is only about two atomic layers. A possible explanation for interfacial reaction has been proposed. The scanning electron microscope image shows the surface of the amorphous LSO film very flat. The LSO film shows a dielectric constant of 12.8 at 1 MHz. For the LSO film with thickness of 3 nm, a small equivalent oxide thickness of 1.2 nm is obtained. The leakage current density of the LSO film is 1.54 × 10−4 A/cm2 at a gate bias voltage of 1 V. 相似文献
10.
This paper reports on the influence of the sintering temperature and atmosphere and transition-metal doping on the magnetic properties of nanocrystalline and bulk In2O3. Undoped nanocrystalline In2O3 is diamagnetic whatever the sintering temperature and atmosphere. All single-phase transition-metal-doped In2O3 samples are paramagnetic, with a paramagnetic effective moment originating from weakly interacting transition metal ions. No trace of ferromagnetism has been detected even with samples sintered under argon, except extrinsic ferromagnetism for samples with magnetic dopant concentrations exceeding the solubility limit. 相似文献
11.
Hongwei Chen Chuanren Yang Jihua Zhang Bo Wang Hong Ji 《Applied Surface Science》2009,255(8):4585-4589
BaZr0.1Ti0.9O3 and BaZr0.2Ti0.8O3 (BZT) thin films were deposited on Pt/Ti/LaAlO3 (1 0 0) substrates by radio-frequency magnetron sputtering, respectively. The films were further annealed at 800 °C for 30 min in oxygen. X-ray diffraction θ-2θ and Φ-scans showed that BaZr0.1Ti0.9O3 films displayed a highly (h 0 0) preferred orientation and a good cube-on-cube epitaxial growth on the LaAlO3 (1 0 0) substrate, while there are no obvious preferential orientation in BaZr0.2Ti0.8O3 thin films. The BaZr0.1Ti0.9O3 films possess larger grain size, higher dielectric constant, larger tunability, larger remanent polarization and coercive electric field than that of BaZr0.2Ti0.8O3 films. Whereas, BaZr0.1Ti0.9O3 films have larger dielectric losses and leakage current density. The results suggest that Zr4+ ion can decrease dielectric constant and restrain non-linearity. Moreover, the enhancement in dielectric properties of BaZr0.1Ti0.9O3 films may be attributed to (1 0 0) preferred orientation. 相似文献
12.
Nitrogen-doped TiO2 thin films were prepared by pulsed laser deposition (PLD) by ablating metallic Ti target with pulses of 248 nm wavelength in reactive atmospheres of O2/N2 gas mixtures. The layers were characterized by UV-VIS spectrophotometry and variable angle spectroscopic ellipsometry with complementary profilometry for measuring the thickness of the films. Band gap and extinction coefficient values are presented for films deposited at different substrate temperatures and for varied N2 content of the gas mixture. The shown tendencies are correlated to nitrogen incorporation into the TiO2-xNx layers. It is shown that layers of significantly increased visible extinction coefficient with band gap energy as low as 2.89 eV can be obtained. A method is also presented how the spectroscopic ellipsometric data should be evaluated in order to result reliable band gap values. 相似文献
13.
S. Bobby Singh H.B. Sharma H.N.K. Sarma Sumitra Phanjoubam 《Physica B: Condensed Matter》2008,403(17):2678-2683
Ferroelectric barium strontium titanate (Ba0.7Sr0.3TiO3)(BST) thin films have been prepared from barium 2-ethylhexanoate [Ba[CH3(CH2)3CH(C2H5)CO2]2], strontium 2-ethylhexanoate [Sr[CH3(CH2)3CH(C2H5)CO2]2] and titanium(IV) isopropoxide [TiOCH(CH3)2]4 precursors using a modified sol-gel technique. The precursor except [TiOCH(CH3)2]4 were synthesized in the laboratory. Transparent and crack-free films were fabricated on pre-cleaned quartz substrates by spin coating. The structural and optical properties of films annealed at different temperatures have been investigated. The as-fired films were found to be amorphous that crystallized to the tetragonal phase after annealing at 550 °C for 1 h in air. The lattice constants “a” and “c” were found to be 3.974 A and 3.990 A, respectively. The grain sizes of the films annealed at 450, 500 and 550 °C were found to be 30.8, 36.0 and 39.8 nm respectively. The amorphous film showed very high transparency (∼95%), which decreases slightly after crystallization (∼90%). The band gap and refractive index of the amorphous and crystalline films were estimated. The optical dispersion data are also analyzed in the light of the single oscillator model and are discussed. 相似文献
14.
Ba(ZrxTi1−x)O3 (BZT) (x = 0.20 and 0.30) thin films are deposited on Pt(1 1 1)/Ti/SiO2/Si(1 0 0) substrate by sol-gel method. X-ray diffraction patterns show that the thin films have a good crystallinity. Optical properties of the films in the wavelength range of 2.5-12 μm are studied by infrared spectroscopic ellipsometry (IRSE). The optical constants of the BZT thin films are determined by fitting the IRSE data using a classical dispersion formula. As the wavelength increases, the refractive index decreases, while the extinction coefficients increase. The effective static ionic charges are derived, which are smaller than that in a purely ionic material for the BZT thin films. 相似文献
15.
Hongwei Chen Chuanren Yang Chunlin Fu Li Zhao Zhiqiang Gao 《Applied Surface Science》2006,252(12):4171-4177
Barium strontium titanate (BST) thin films were prepared by RF magnetron sputtering. The dielectric constant-voltage curves and the hysteresis loops of BST thin films with different grain sizes and film thicknesses were investigated. When the grain size increases from 12 nm to 35 nm, remarkable increases in dielectric constant and tunability were observed. Above 12 nm, the BST films exhibited size effects, i.e. a decrease in maximal polarization (Pm) and an increase in coercive electric field (Ec) with reduction in grain size. In our investigation, the dielectric constant, tunability and maximal polarization increased as the film thickness increased. Furthermore, the size dependence of the dielectric constant and tunability of Ba0.6Sr0.4TiO3 thin films is determined by that of the maximal polarization and the coercive electric field. 相似文献
16.
X.L. Zhong 《Applied Surface Science》2006,253(2):417-420
Bi3.25La0.75Ti3O12 (BLT) thin films were fabricated on Pt/Ti/SiO2/Si(1 0 0) substrates by chemical solution deposition (CSD), and the dependence of ferroelectric and dielectric properties of the as-deposited BLT thin films on excess Bi content in precursor sols was studied. It is found that the prepared BLT thin film shows the best polarization-electric field, capacitance-voltage and dielectric constant (?r)-frequency characteristics, when the value of excess Bi content in precursor sols is 10%. In detail, its remnant polarization (2Pr) value is 40 μC/cm2, the capacitance tunability is 21% measured at room temperature under conditions of an applied voltage of 8 V and measurement frequency of 10 kHz, and the ?r is 696 at 100 kHz frequency. 相似文献
17.
High-k HfO2-Al2O3 composite gate dielectric thin films on Si(1 0 0) have been deposited by means of magnetron sputtering. The microstructure and interfacial characteristics of the HfO2-Al2O3 films have been investigated by using X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR) and spectroscopic ellipsometry (SE). Analysis by XRD has confirmed that an amorphous structure of the HfO2-Al2O3 composite films is maintained up to an annealing temperature of 800 °C, which is much higher than that of pure HfO2 thin films. FTIR characterization indicates that the growth of the interfacial SiO2 layer is effectively suppressed when the annealing temperature is as low as 800 °C, which is also confirmed by spectroscopy ellipsometry measurement. These results clearly show that the crystallization temperature of the nanolaminate HfO2-Al2O3 composite films has been increased compared to pure HfO2 films. Al2O3 as a passivation barrier for HfO2 high-k dielectrics prevents oxygen diffusion and the interfacial layer growth effectively. 相似文献
18.
Qing Xu Xiao-Fei Zhang Wen Chen Min Chen 《Journal of Physics and Chemistry of Solids》2010,71(11):1550-1556
Ba0.6Sr0.4TiO3 ceramics were prepared by a citrate precursor method. The structure and nonlinear dielectric properties of the resulting ceramics were investigated within the sintering temperature range 1200-1300 °C. Adopting fine Ba0.6Sr0.4TiO3 powder derived from the citrate method was confirmed to be effective in reducing the sintering temperatures required for densification. The ceramic specimens sintered at 1230-1280 °C presented relative densities of around 95%. A significant influence of sintering temperature on the microstructure and nonlinear dielectric properties was detected. The discrepancy in nonlinear dielectric behavior among the specimens sintered at different temperatures was qualitatively interpreted in terms of the dielectric response of polar micro-regions under bias electric field. The specimens sintered at 1230 and 1250 °C attained superior nonlinear dielectric properties, showing relatively low dielectric losses (tan δ) of 0.24% and 0.22% at 10 kHz together with comparatively large figure of merits (FOM) of 121 and 142 at 10 kHz and 20 kV/cm, respectively. 相似文献
19.
Sandwich-structure Al2O3/HfO2/Al2O3 gate dielectric films were grown on ultra-thin silicon-on-insulator (SOI) substrates by vacuum electron beam evaporation (EB-PVD) method. AFM and TEM observations showed that the films remained amorphous even after post-annealing treatment at 950 °C with smooth surface and clean silicon interface. EDX- and XPS-analysis results revealed no silicate or silicide at the silicon interface. The equivalent oxide thickness was 3 nm and the dielectric constant was around 7.2, as determined by electrical measurements. A fixed charge density of 3 × 1010 cm−2 and a leakage current of 5 × 10−7A/cm2 at 2 V gate bias were achieved for Au/gate stack /Si/SiO2/Si/Au MIS capacitors. Post-annealing treatment was found to effectively reduce trap density, but increase in annealing temperature did not made any significant difference in the electrical performance. 相似文献
20.
We have investigated the oxygen pressure and the temperature dependence on BiFeO3 thin films deposited on SrTiO3 substrates by pulsed laser deposition. Reflection high energy electron diffraction (RHEED), atomic force microscopy (AFM) and X-ray diffraction measurements indicate that high-quality epitaxial thin films are obtained for and T=650 °C. Outside of this pressure-temperature window, parasitic peaks attributed to β-Bi2O3 appear. We find an increase of the out-of-plane lattice parameter with oxygen pressure that we ascribe to Bi-deficiency due to its high volatility at low pressure. Ex-situ anneals have been performed and results show that as-grown single-phase BiFeO3 thin films degrade after annealing, whereas as-grown BiFeO3 containing impurity phases evolve toward a single-phase structure. These experiments demonstrate that parasitic phases can stabilize compounds which are usually unstable in air at elevated temperatures. 相似文献