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单分子吸附在Cu(100)表面上的振动谱及其STM图像模拟 总被引:1,自引:0,他引:1
本文利用第一性原理方法对乙炔(C2H2),苯(C6H6)和吡啶(C5H5N)及其离解物(CCH,C6H4和C5H4N等)吸附在Cu(100)表面时C-H伸缩振动频率进行了理论计算,同时还计算了H被D替代时的C-D伸缩振动频率,理论计算结果与STM-IETS给出的测量值相当吻合,基于Tersoff-Hamann理论模型,本文还模拟出这些小分子吸附在Cu(100)表面的STM图像,与实验图像的主要特征吻合。 相似文献
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本文叙述了C/Ni(100)系统的LEED和STM的研究结果,并讨论了该系统的表面结构模型。 相似文献
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Tobias Mönch Peter Guttmann Jan Murawski Chris Elschner Moritz Riede Lars Müller-Meskamp Karl Leo 《Organic Electronics》2013,14(11):2777-2788
The performance of organic solar cells strongly depends on the nanoscale structure of the used mixed absorber layer. Utilizing photoconductive and conductive atomic force microscopy (pcAFM and cAFM), as well as transmission X-ray microscopy (TXM), we investigate the influence of different substrate temperatures Tsub on the thin-film structure and local photocurrent in bulk-heterojunctions (BHJs) of vacuum deposited zinc phthalocyanine (ZnPc) and Buckminsterfullerene (C60) mixed absorber layers. In this paper, we present topography maps, photocurrent maps under short-circuit current conditions, dark-current maps, and TXM images with high lateral resolution down to 25 nm. We observe a strong influence of the substrate temperatures during deposition Tsub on the nanoscopical segregation of the two components in the BHJ. This segregation leads to a spatial extension of the dark-current and a reduced short-circuit current at higher substrate deposition temperatures Tsub. 相似文献
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We establish quantitative models on the formation of depletion regions in organic photodiodes (OPD) based on fullerene/N,N′-diphenyl-N,N′-bis(1-naphthyl)-1,1′-biphenyl-4,4′-diamine (C60/NPB) heterojunctions. The models describe the relation of dark current and open-circuit voltage to the deposited thickness of C60 or NPB. Interfacial electronic structures, such as built-in potential, the charge density, the minimized thicknesses of completely developed depletion regions and the energy level bending on each side of the heterojunction were derived from the fitting model. Also, we observed a shift of depletion region from NPB to C60 due to the relative change of charge density under illumination. The device performance proved the reasonability of the models. This paper provides a universally applicable method to probe the interfacial information of organic semiconductors. 相似文献
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本文利用自洽LMTO-ASA方法研究了晶体Si及Si(111)表面的几种模型的电子结构,给出了在slab模型各不同结构下的态密度和分波态密度,以及各不等价原子态密度和分波态密度,该结果与其它理论计算和实验结果相吻合 相似文献
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Sn在Cu(111)上欠电位沉积的现场STM研究 总被引:1,自引:0,他引:1
本文用现场扫描隧道显微镜(in-situ STM)研究Sn在Cu(111)上的欠电位沉积(underpotential deposition UPD)过程,实验结果表明:Sn原子在Cu(111)表面上的UPD首先在晶面的边缘处发生,随后向晶面的其余地方发展并取代吸附在表面的SO4^2-,这一过程伴随着显著的台阶轮廓的变化,在Sn的UPD层溶出过程中,台阶边缘形状发生了更剧烈的变化。并且观察到凹洞的出现,表明Sn与Cu (111)基底形成了表面合金。 相似文献
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Torben Menke Peng Wei Debdutta Ray Hans Kleemann Benjamin D. Naab Zhenan Bao Karl Leo Moritz Riede 《Organic Electronics》2012,13(12):3319-3325
We compare two air-stable n-dopants for the fullerene C60: AOB and DMBI-POH. Conductivity and Seebeck coefficient measurements were performed at various doping concentrations and the thermal activation of the conductivity was determined. A superlinear increase of conductivity upon doping was found for DMBI-POH doped C60 reaching a maximum conductivity of 5.3 S/cm. In contrast to this, a linear rise of conductivity and an exponential thermal activation of mobility was observed for C60 doped by AOB. This suggests a different doping mechanism for the two compounds. 相似文献
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C_(60),M@C_(60)电子传输特性研究 总被引:1,自引:2,他引:1
采用扩展的Hückel方法与格林函数方法,分析了双Au电极作用下,C60,M@C60(M=Si,Ge)富勒烯分子的电子结构与导电性,并对三种富勒烯分子的电子结构与电子输运特性进行了对比。研究结果表明,三种富勒烯分子与A u电极“接触”后,其最高占据分子轨道与最低未占据分子轨道间的能隙减小,它们与A u电极之间的结合既有共价键的成分,又有离子键的成分;三种富勒烯分子的电子输运性能依次具有Ge@C60>Si@C60>C60的顺序。 相似文献
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Daniel Stoeffler 《Microelectronic Engineering》2008,85(12):2451-2455
The present study is focussed on the intrachain magnetic interactions between the trigonal prismatic (TP) and octahedral (OCT) Co sites in Ca3Co2O6 cobaltites from their electronic structure determined using the first principle full potential linearized augmented plane wave method within the GGA+U approximation. The occurence of various magnetic solutions as a function of the Coulomb integral U of the GGA+U approach is investigated. Various magnetic configurations, corresponding to different total magnetization, are found only when the insulating state is reached for U > 2.5 eV and the most stable solution corresponds to a magnetic spin moment on the TP (respectively OCT) site around 2.6 (respectively 1) Bohr magneton. 相似文献
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采用第一性原理贋势平面波方法对(111)应变下立方相Ca2P0.25Si0.75的能带结构及光学性质进行模拟计算,全面分析了应变对其能带结构、光学性质的影响。计算结果表明:在-8%~0%压应变范围内,随着应变的逐渐增大导带向低能方向移动,价带向高能方向移动,带隙逐渐减小,但始终为直接带隙;在0%~2%张应变范围内,随着应变的增加,带隙逐渐增大,应变为2%时直接带隙达到最大Eg=0.60441eV;当张应变为4%时,Ca2P0.25Si0.75变为间接带隙半导体。Ca2P0.25Si0.75的介电常数和折射率随着张应变的增加而增加;施加-2%~0%压应变时,介电常数和折射率逐渐减小,到达-2%时达到最小值,此后随着压应变的增加介电常数和折射率逐渐增大。施加压应变时吸收谱和反射谱随着应变的增大而减小,施加张应变时吸收谱和反射谱随着应变的增大而增大。应变可以改变立方相Ca2P0.25Si0.75的电子结构和光学常数,是调节其光电传输性能的有效手段。 相似文献
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Timoshnev S. N. Mizerov A. M. Lapushkin M. N. Kukushkin S. A. Bouravleuv A. D. 《Semiconductors》2019,53(14):1935-1938
Semiconductors - Ultrathin epitaxial silicon nitride films were formed on different Si(111) and SiC/Si(111) substrates by nitridation with plasma-activated nitrogen. Photoemission studies of the... 相似文献
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以溶胶–凝胶法在Pt/Ti/SiO2/Si(111)基底上制备了厚度为30~1 110 nm的0.7BiFeO3-0.3PbTiO3(0.7BFO-0.3PT)薄膜,研究了薄膜厚度对0.7BFO-0.3PT薄膜的结构与电学性能的影响。结果表明,随着膜厚的增加,晶格常数c与a的比值c/a以及晶粒尺寸都呈现先增大后减小的趋势,但其剩余极化强度及介电常数却均与薄膜厚度呈正比。厚度为180 nm的0.7BFO-0.3PT薄膜具有最大的矫顽场(2.99×105V/cm)和晶粒均匀度(42 nm),同时其晶格常数比c/a也达到最大,为1.129 9。 相似文献
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The frequency dependent capacitance-voltage (C-V) and conductance-voltage (G/ω-V) characteristics of the metal-ferroelectric-insulator-semiconductor (Au/Bi4Ti3O12/SiO2/n-Si) structures (MFIS) were investigated by considering series resistance (Rs) and surface state effects in the frequency range of 1 kHz-5 MHz. The experimental C-V-f and G/ω-V-f characteristics of MFIS structures show fairly large frequency dispersion especially at low frequencies due to Rs and Nss. In addition, the high frequency capacitance (Cm) and conductance (Gm/ω) values measured under both reverse and forward bias were corrected for the effect of series resistance to obtain the real capacitance of MFIS structures. The Rs-V plots exhibit anomalous peaks between inversion and depletion regions at each frequency and peak positions shift towards positive bias with increasing frequency. The C−2-V plot gives a straight line in wide voltage region, indicating that interface states and inversion layer charge cannot follow the ac signal in the depletion region, but especially in the strong inversion and accumulation region. Also, it has been shown that the surface state density decreases exponentially with increasing frequency. The C-V-f and G/w-V-f characteristics confirm that the interface state density (Nss) and series resistance (Rs) of the MFIS structures are important parameters that strongly influence the electrical properties of MFIS structures. 相似文献
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