Study of the effect of swift heavy Ni ion irradiation on ruby single crystal by using the XANES and EXAFS techniques

We have made the XAFS measurements at the Cr–K-edge on natural Indian ruby single crystals (corundum) and its two irradiated samples with fluence 1×10¹² Ni⁶⁺ and 5×10¹² Ni⁶⁺ ions/cm². Irradiated samples show interesting changes in their physical appearance. XANES measurements show progressive decrease in Δ_oct value on increase of Ni fluence in irradiated samples. EXAFS measurements on these samples show decrease in Cr–O distance on increase of Ni fluence. Lowering of Δ_oct value is correlated with the increase of Cr–O distance.     

EPR study of erbium-impurity complexes in silicon

Electron paramagnetic resonance (EPR) measurements have been used to characterise Er complexes formed in FZ silicon by the implantation of erbium together with either oxygen or fluorine. The samples have a 2 μm thick layer containing 10¹⁹ Er/cm³ alone or in addition 3×10¹⁹ O/cm³, 10²⁰ O/cm³ or 10²⁰ F/cm³. Various post-implantation anneals were carried out. Several different erbium centres, which have either C_1h monoclinic or trigonal symmetry, are observed and the way in which the type of centre depends on the implantation and annealing conditions is reported.     

Ionizing particles may create shockwaves

To find a model that describes the gas diffusion on irradiated polymers (Makrofol KG polycarbonate) the diffusion constants have been measured with argon as diffusion gas. The polymers were irradiated with uranium, gold and lead ions of about 10 MeV/u and ion fluences between 1×10¹⁰ and 4×10¹¹ ions/cm². The ion irradiated probes show two quite different dependencies of the diffusion constant on the ion energy loss. These effects are strongly related to the fluence of the irradiation. In case of low ion fluences, the diffusion constant is up to 8 times higher than that of pristine material. In the probes with high ion fluences we observe a decrease of diffusion constant to half the value of the pristine material. To understand the dependence of the diffusion constant on ion fluences we apply a model of compacting. This model describes the compacting ability of shockwaves arising from latent tracks. A track formation model is suggested. When an ion penetrates the foil it creates shockwaves around its path. These shockwaves put compacting forces on earlier created latent tracks in the same foil.     

56Fe13+离子引起GaP晶体的微结构损伤

利用X射线衍射（XRD）技术、傅里叶变换红外光谱（FTIR）和Raman光谱对经不同剂量的56Fe13+离子辐照的GaP晶体的微结构进行了表征。结果表明:随着辐照离子剂量的增加,GaP晶体中产生了局部的无序与缺陷。随着56Fe13+离子剂量的增加,Raman光谱展示出振动峰强度逐渐减弱而且一些逐渐消失,但其峰位几乎没有发生变化;XRD显示出GaP晶体的衍射峰的强度逐渐减小;FTIR主要表现为宽化及其强度增加。这表明重离子56Fe13+的辐照使得GaP晶体中的缺陷与无序性增加,导致晶体产生了局部的非晶化。The Misconstructural damage of GaP irradiated with 56Fe13+ to fluences ranging from 1×107 ions/cm2~1×1010 ions/cm2 were analyzed by X-ray diffraction (XRD) techniques, Fourier transform infrared spectroscopy (FTIR) and Raman spectroscopy. The result shows that, with the increase of irradiation ion fluences, local disorder and defects were produced in GaP crystal. With the increase of ion fluence, Raman spectra reveal the intensity of scattering peaks gradually weakens and some scattering peaks gradually disappear, however no changes in the peak position were found. XRD measurement displays that the intensity of diffraction peaks gradually decreases with an increase in ions fluences. Result from FTIR spectra exhibits that the intensity of reflection peaks gradually increases and the FWHM of reflection peaks broadens. These phenomena indicate that, the irradiation of heavy-ion Fe produces defects and disorder in GaP crystal, leading to a local amorphization.     

Defect versus nanocrystal luminescence emitted from room temperature and hot-implanted SiO2 layers

Silicon nanocrystals have been synthesized in SiO₂ matrix using Si ion implantation. Si ions were implanted into 300-nm-thick SiO₂ films grown on crystalline Si at energies of 30–55 keV, and with doses of 5×10¹⁵, 3×10¹⁶, and 1×10¹⁷ cm⁻². Implanted samples were subsequently annealed in an N₂ ambient at 500–1100°C during various periods. Photoluminescence spectra for the sample implanted with 1×10¹⁷ cm⁻² at 55 keV show that red luminescence (750 nm) related to Si-nanocrystals clearly increases with annealing temperature and time in intensity, and that weak orange luminescence (600 nm) is observed after annealing at low temperatures of 500°C and 800°C. The luminescence around 600 nm becomes very intense when a thin SiO₂ sample is implanted at a substrate temperature of 400°C with an energy of 30 keV and a low dose of 5×10¹⁵ cm⁻². It vanishes after annealing at 800°C for 30 min. We conclude that this luminescence observed around 600 nm is caused by some radiative defects formed in Si-implanted SiO₂.     

The effect of nitrogen ion implantation on tungsten surfaces

X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) were used to study the phase, composition and chemical states of elements at the tungsten surface. The measurement results indicate that nitrogen-containing phase of tungsten were formed by nitrogen ion implantation (energy 40 keV, implantation doses of 4×10¹⁷, 8×10¹⁷ and 1.6×10¹⁸ ions/cm²). The formation of the W_x(O,N) and WN in the surface layer occurred as a result of nitrogen ion irradiation. A decrease in concentration of W_x(O,N) is observed with increasing N⁺ while that WN increases. Due to residual oxygen in the chamber WO₃ still exists at the surface of the specimen.     

Chemical effects of Ne bombardment on the MoS2(0001) surface studied by high-resolution photoelectron spectroscopy

The effect of 1 keV Ne⁺ bombardment on the clean MoS₂(0001)-1 × 1 surface with fluences between 4 × 10¹⁴ and 4 × 10¹⁶ Ne⁺/cm² was studied using high-resolution photoelectron spectroscopy excited with synchrotron radiation. Spectra of the Mo 3d and S 2p core levels were measured with photon energies that ensured that the kinetic energy of the photoelectrons was the same, resulting in the same depth being probed for both core levels. For lower fluences (i.e., 2 × 10¹⁵ Ne⁺/cm²), S vacancy defect formation occurs in the MoS₂ lattice, with the concurrent formation of a small amount (< 10%) of dispersed elemental molybdenum [Mo(0)]. For fluences greater than l × 10¹⁶ Ne⁺/cm², the Mo(0) is the predominant species in the surface region, while the remaining species consist of amorphous MoS_2−x and polysulfide species. Valence band spectra taken with photon energies of 152 and 225 eV were consistent with the core level results. The movement of the valence band maximum toward the Fermi level indicated the formation of a metallic surface region. Annealing the sample to temperatures up to 1000 K resulted in the formation of metallic Mo coexisting, in approximately equal amounts, with reformed MoS₂ in a surface with no long-range order as determined by LEED. Finally, a qualitative depth distribution of the chemical species present after Ne⁺ bombardment was determined by varying the photon energies used for the core level spectra. The results indicate that the preferential sputtering of sulfur over molybdenum occurs predominantly through a mechanism involving chemical bonding effects, specifically, through the preferential emission of polysulfide ions over other species in the bombarded region.     

Observation and study of latent tracks on the surface of HOPG induced by H ions

The topography and size of damage on the surface of HOPG (Highly Oriented Pyrolitic Graphite) bombarded by high fluence (1×10¹⁶ ions/cm²) of H⁺ ions were observed and studied. In this work, 457 STM images of each one with 9×9 nm² area were obtained. From 163 of these pictures visible damage was found. In these 163 STM images the diameter of most damage is from 0.2 to 0.8 nm. In this study the number density of visible damage is much less than the ion fluence. The probability of damage is only about 1.8×10⁻⁴. The possible mechanism of damage formation is also analyzed and discussed.     

TEM study of the origin of the surface microroughness in DSL photoetched Si-implanted GaAs wafers

TEM has been used to study the origin of the surface microroughness that formed in both ²⁹Si as-implanted and rapid thermal annealed LEC undoped GaAs wafers after DSL photoetching. The degree of microroughness increased as the implant dose increased from 3 × 10¹² to 3 × 10¹⁴ atoms/cm². It has been found that such a microroughness is due to the fine-scale damage induced by the implantation in the as-implanted wafers and to interstitial dislocation loops in the implanted and then annealed wafers. Microroughness appears during DSL etching because such defects are effective recombination centres for the holes involved in the dissolution of the GaAs surface so that the wafers etch slower at the point-defect clusters and dislocation loops.     

Comparison of nanosecond laser ablation at 1064 and 308 nm wavelength

To study the solid Cu ablation in vacuum, two different laser sources operating at 1064 and 308 nm wavelength are employed at similar values of laser fluences. The infrared laser is a Q-switched Nd:Yag having 9 ns pulse width (INFN-LNS, Catania), while the ultraviolet one is a XeCl excimer having 20 ns pulse width (INFN-LEA, Lecce). Both experiments produced a narrow angular distribution of the ejected material along the normal to the target surface. The ablation showed a threshold laser power density, of about 7 and 3 J/cm² at 1064 and 308 nm, respectively, below which the ablation effect was negligible. The laser interaction produces a plasma at the target surface, which expands very fast in the vacuum chamber. Time-of-flight (TOF) measurements of the ion emission indicated an average ion velocity of the order of 4.7×10⁴ and 2.3×10⁴ m/s for the infrared and ultraviolet radiation, respectively. We also estimated approximately the corresponding temperature of the plasma from which ions originated, i.e. about 10⁶ and 10⁵ K for IR and UV wavelength, respectively. A discussion of the analysis of the ablation mechanism is presented. At the used laser power densities the produced Cu ions showed ionisation states between 1+ and 5+ in both cases.     

Electronic conduction properties of Au/C60/p-Si and C60/Au/p-Si sandwich structures: I–V and transducer characteristics

Gold-fullerite [C₆₀]-silicon (p-type) sandwich structures have been fabricated in order to investigate intrinsic cross-sectional and planar electronic conductive properties, in particular the C₆₀/p-Si p–n heterojunction. The turn-on voltage of this p–n heterojunction lies in the range 0.25–0.27 V. The I–V characteristics of the Au/C₆₀/p-Si structure are mostly defined by the bulk specific resistance of the fullerite crystal film itself (6×10⁷ Ω cm). I–V curves in the C₆₀/Au/p-Si structure are shown to be ohmic. Au/C₆₀/p-Si sandwiches irradiated with swift (300 MeV) heavy ions, (⁸⁴Kr¹⁴⁺) to a total fluence 10¹⁰ ion/cm² yield structures which are sensitive to ambient air pressure, specifically in the case of a transverse contact configuration, and if one of the contacts is located on the irradiated part of the fullerite film. The sandwich-structure sensitivity to pressure is 5×10⁻⁶ Pa⁻¹. This exceeds the sensitivity of conventional silicon pressure transducers by almost three orders of magnitude.     

The BCC to FCC/HCP phase transformation of the Co70Fe30 alloy produced by ion irradiation of Co70Fe30/Cu discontinuous multilayers

We report on the BCC to FCC/HCP structural transformation of Co₇₀Fe₃₀ alloy produced by room temperature ion irradiation of Co₇₀Fe₃₀/Cu discontinuous multilayers. The structural changes were analyzed by X-ray diffraction and X-ray absorption spectroscopy. For this study, two different samples were examined, one irradiated with 50 keV He⁺ and another with 600 keV Kr⁺ with doses of 1×10¹⁷ and 3×10¹⁵ ions/cm², respectively. No substantial change is observed after He⁺ irradiation, while after Kr⁺ irradiation an unexpected structural transition from BCC to FCC/HCP closed packed of the Co₇₀Fe₃₀ alloy was found.     

退火对Pb辐照Al2O3单晶发光特性的影响

研究了230MeV的²⁰⁸Pb²⁷⁺辐照Al₂O₃样品及随后在600,900,1100K高温条件下退火后的光致发光特性。从辐照样品的测试结果可以清楚地看到在波长为390,450nm处出现了强的发光峰。辐照量为1×10¹³ions/cm²时,样品的发光峰最强。经过600K退火2h后测试结果显示,380nm发光峰剧烈增强,而其他发光峰显示不明显。在900K退火条件下,380nm的发光峰开始减弱,而在360,510nm出现了明显的发光峰,至到1100K退火完毕后380nm的发光峰完全消失,而360,510nm的发光峰相对增强。从被辐照样品的FTIR谱中看到,波数在460~510cm^-1间的吸收是振动模式,经过离子辐照后,吸收带展宽,随着辐照量的增大,Al₂O₃振动吸收峰消失,说明Al₂O₃振动模式被完全破坏。1000~1300cm^-1之间为Al—O—Al桥氧的伸缩振动模式,辐照后吸收带向高波数方向移动,说明其振动模式受到影响。辐照剂量较小的样品,损伤程度相对较低,经退火晶化后,振动模式基本恢复到单晶状态;辐照剂量较高的样品,损伤程度大,退火处理后表面变得较粗糙,振动模式并未出现,说明结构破坏严重。     

Domain wall pinning in polycrystalline perovskite La0.7Sr0.3MnO3

Reversible and irreversible domain wall (DW) motions have been investigated in La_0.7Sr_0.3MnO₃ ceramic samples using frequency-response complex permeability with various amplitudes of AC field. We also examine the effects of temperature in the range from 293 to 368 K and transverse DC magnetic field with a maximum of 4.40×10⁵ A/m on the real part of permeability (μ′). Two relaxations corresponding to reversible wall motions and domain rotations occur in low and high frequency regions, respectively. The irreversible DW displacements can be activated as the amplitude larger than the pinning field of 3 A/m, leading to an increase in μ′. The μ′ obeys a Rayleigh law at the temperature below 343 K or under DC field of less than 4.22×10⁴ A/m. The Rayleigh constant η increases from 5.45×10⁻² to 1.54×10⁻¹ (A/m)⁻¹ as the temperature rises from 293 to 343 K, and η decreases from 5.58×10⁻² to 3.67×10⁻² (A/m)⁻¹ with increasing DC field from 1.99×10³ to 4.22×10⁴ A/m.     

Observation of diffusion through ion irradiated Makrofol KG

The features of the latent track in polycarbonate can be analysed by measuring the diffusion constant under ultra high vacuum conditions. Stacks of 30 μm Makrofol KG foils were irradiated with uranium ions of 11.4 MeV/u at the GSI Darmstadt, Germany. We used different fluences from 3·10¹⁰ to 5·10¹¹ ions/cm². The diffusion constant was determined by the time-lag-method [1]. A quadrupole mass filter was used to observe the diffusion of the gas. We measured the diffusion of argon through different foils of each stack at room temperature. In all cases also unirradiated foils were measured. The dependence of the permeability and the diffusion constant on the ion fluence and the energy loss of the ions will be given and indications on the size of latent ion tracks concerning gas diffusion will be discussed.     

Comparison between MeV Ni and He ion-implanted planar optical waveguides in quartz

Optically polished crystalline quartz samples were implanted at room temperature by 2.6 MeV Ni⁺ ions with a dose of 9×10¹⁴ ions/cm² and 2.0 MeV He⁺ ions with a dose of 1.5×10¹⁶ ions/cm², respectively. A comparison of the MeV Ni⁺ ion-implanted planar waveguide formation was made with the MeV He⁺ ion-implanted one. The prism-coupling method was carried out to measure the dark modes in the quartz waveguides by using model 2010 prism coupler. Five modes were observed in the Ni⁺ implanted waveguide while 15 modes were found in the He⁺ ion-implanted one. Reflectivity calculation method was applied to fitting the refractive index profile. TRIM’98 (transport of ions in matter) code was used to simulate the damage profile in quartz by MeV Ni⁺ and He⁺ ions implantation, respectively. It is found that the refractive index profile in MeV Ni⁺ ions implanted waveguide is somewhat different in shape from that in MeV He⁺ ions implanted waveguide.     

EXAFS analysis of Er sites in Er–O and Er–F co-doped crystalline Si

We present extended X-ray absorption fine structure (EXAFS) and photoluminescence (PL) analyses of Er–O and Er–F co-doped Si. Samples were prepared by multiple implants at 77 K of Er and co-dopant (O or F) ions resulting in the formation of a2 μm thick amorphous layer uniformly doped with 1×10¹⁹ Er/cm³ and 3×10¹⁹ O/cm³, 1×10²⁰ O/cm³ or 1×10²⁰ F/cm³. EXAFS measurements show that the local environment of the Er sites in the amorphous layers consists of 6 Si first neighbors. After epitaxial regrowth at 620°C for 3 h, Er is fully coordinated with 8 F ions in the Er–F samples, while Si and O ions are concomitantly present in the first shell of O co-doped samples. Post regrowth thermal treatments at 900°C leave the coordination unchanged in the Er+F, while the Er+O (ratio 1 : 10) doped samples present Er sites with a fully O coordinated shell with an average of 5 O atoms and 4 O atoms after 30 s and 12 h, respectively. We have also found that the fine structure and intensity of the high-resolution PL spectra are strongly dependent on the Er-impurity ratio and on thermal process parameters in the Er–O co-doped samples, while this is not observed for the F-doped samples. The most intense PL response at 15 K was obtained for the 1 : 3 E : O ratio, suggesting that an incomplete O shell around Er is particularly suitable for optical excitation.     

Role of chromium ion implantation on the corrosion behavior of zirconium in 1N H2SO4

In order to study the effect of chromium ion implantation on the aqueous corrosion behavior of zirconium, specimens were implanted by chromium ions with a dose range from 1×10¹⁶ to 1×10¹⁷ ions/cm², using MEVVA source at an extracted voltage of 40 kV. The valence and elements penetration distribution of the surface layer were analyzed by X-ray photoelectron spectroscopy (XPS) and auger electron spectroscopy (AES), respectively. Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) were used to examine the micro-morphology and microstructure of chromium-implanted samples. The potentiodynamic polarization measurement was employed to value the aqueous corrosion resistance of zirconium in a 1N H₂SO₄ solution. It was found that a significant improvement was achieved in the aqueous corrosion resistance of zirconium compared with that of as-received zirconium. The mechanism of the corrosion resistance improvement of chromium-implanted zirconium is probably due to the addition of the chromium oxide dispersoid into the zirconium matrix.     

Emission of intermediate mass fragments in the heavy ion interaction of (14.0 MeV/u) Pb+Au

We have studied the heavy ion interactions of (14.0 MeV/u) Pb + Au using two threshold detectors, mica and CN-85. A thin layer of Au was deposited on each of the three mica and two CN-85 detector pieces. These target-detector assemblies were exposed to a beam of 14.0 MeV/u Pb ions having the fluence of 1.5×10⁶ cm² at GSI, Darmstadt, Germany. After removing the target material and etching the samples in appropriate etchants, we scanned 32.29 cm² and 24.97 cm² area of mica and CN-85, respectively. Based on the observed number of events of various multiplicities, we have determined the total as well as partial experimental reaction cross-sections. It is shown that a significant number of intermediate mass fragments are emitted alongwith the heavy fragments in the present reaction.     

Erbium in silicon–germanium quantum wells

Strained Si_1−xGe_x/Si quantum wells have been doped with erbium by implantation. A comparison is made with strained Si_1−xGe_x/Si quantum wells and relaxed Si_1−xGe_x, with x between 10% and 25%, doped with erbium during MBE growth. The erbium concentration was between 1×10¹⁸ and 5×10¹⁸ cm⁻³ throughout the active regions. Transmission electron microscopy, X-ray diffraction, and photoluminescence studies indicate that good regrowth can been achieved after full amorphisation by implantation of the strained quantum wells. The erbium luminescence is more intense in the Si_1−xGe_x/Si layers, but erbium-implanted samples containing Si_1−xGe_x exhibit defect luminescence in the region of 0.9–1.0 eV. These defects are also present when Si_1−xGe_x/Si quantum wells are implanted with an amorphising dose of silicon, and then regrown. They are attributed to small germanium-rich platelets, rather than to erbium-related defects. Electroluminescence is presented from a forward biased erbium-implanted Si_0.87Ge_0.13/Si structure at a drive current density of only 1.8 mA/cm².