太赫兹量子级联激光器中有源区上激发态电子向高能级泄漏的研究

利用热力学统计理论和激光器输出特性理论,建立了太赫兹量子级联激光器(THz QCL)有源区中上激发态电子往更高能级电子态泄漏的计算模型,以输出功率度量电子泄漏程度研究分析了晶格温度和量子阱势垒高度对电子泄漏的影响.数值仿真结果表明,晶格温度上升会加剧电子泄漏,并且电子从上激发态泄漏到束缚态的数量大于泄漏到阱外连续态,同时温度的上升也会降低激光输出功率.增加量子阱势垒高度能抑制电子泄漏,并且有源区量子阱结构中存在一个最优量子阱势垒高度. THz QCL经过最优量子阱势垒高度优化后,工作温度得到提升,其输出功率相比于以往的结果也有所提高.研究结果对优化THz QCL有源区结构、抑制电子泄漏和改善激光器输出特性有指导作用.     

Effective cut-offs for modes on helical fibres

Every mode of a single-mode or multimode helical fibre is always leaky but, for practical purposes, can be treated as being bound with an effective cut-off wavelength. The leakage loss for each mode is quantified, showing that, for fixed core offset and source wavelength, the cut-off pitch increases with increasing mode order. The value of the cut-off pitch for each mode is in agreement with experimental measurements.     

Spectral variations in the optical transition matrix element and their impact on the optical properties associated with hydrogenated amorphous silicon

Using an empirical model for the density of states functions associated with hydrogenated amorphous silicon, in conjunction with an elementary model for the optical transition matrix elements, we aim to explore how variations in the matrix elements impact upon the spectral dependence of the optical properties associated with this material. We also wish to ascertain as to whether or not the hydrogenated amorphous silicon mobility gap result suggested by Jackson et al. [W.B. Jackson, S.M. Kelso, C.C. Tsai, J.W. Allen, S.-J. Oh, Phys. Rev. B 31 (1985) 5187] is consistent with the results of the experiment. We find that the mobility gap value suggested by Jackson et al. is too large. An upper bound on the mobility gap associated with hydrogenated amorphous silicon of 1.68 eV is suggested instead. Electrical measurements performed on undoped hydrogenated amorphous silicon yield a mobility gap value that is consistent with this bound.     

Novel post‐process for the passivation of a CMOS biosensor

Sensors, which are designed and fabricated in complementary metal oxide semiconductor (CMOS) technology, have become increasingly important in the field of bioelectronics. The standardized industry processes enable a fast, cheap, and reliable fabrication of biosensor devices with integrated addressing and processing units. However, the interfacing of such chips with a liquid environment has been a challenge in recent years. Especially for interfacing living cells with CMOS biosensors different elaborate post‐processes have been proposed. In this article we describe a novel and single step passivation of a CMOS biosensor using a bio‐compatible high‐permittivity thin film, which can be directly applied to the top aluminium layer of a CMOS process. The aluminium oxide and hafnium oxide multi‐layer thin films were prepared using atomic layer deposition at low process temperatures. Electrical I –V and capacitance measurements as well as electrochemical leakage current measurements were performed on films grown on aluminium bottom electrodes. The films showed a very low leakage current and were stable up to 6 V at a thickness of just 50 nm. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Leakage current study of Si1−xCx embedded source/drain junctions

This work investigates the impact of various processing parameters on the leakage current of in situ P-doped Si_1−xC_x embedded source/drain (S/D) junctions, i.e., the carbon content x (%) and the thermal budget used either before or after the selective epitaxial deposition. It is shown that while the area leakage current density, generated by defects in the depletion region is not affected by the epitaxial process or the strain in the substrate, the perimeter leakage current density (J_P) increases with x. From the stronger reverse bias dependence of J_P, it is derived that a higher electric field exists along the junction periphery. This is confirmed by capacitance-voltage (C-V) measurements, demonstrating a higher p-well B doping density for increasing x. It is believed that this originates from the strain dependence of the B diffusivity in the p-well region. No evidence of electrically active extended defect formation was found, so it is expected that the off-state current of embedded Si_1−xC_x S/D nMOSFETs will not be adversely affected by the selective epitaxial deposition.     

Photoluminescence investigation of ZnO:P nanoneedle arrays on InP substrate by pulsed laser deposition

Phosphorus-doped ZnO nanoneedle arrays were prepared by phosphorus diffusion from InP substrate using a pulsed laser deposition (PLD) technique. The optical properties of ZnO nanoneedle were investigated by photoluminescence (PL) spectroscopy. Low-temperature photoluminescence spectrum measurements exhibited five acceptor-related emission peaks. The excitation intensity and temperature dependent photoluminescence spectra confirmed that the emission peaks corresponded to neutral-acceptor bound exciton, free electron to acceptor, donor-acceptor pairs, and their first and second photon replicas transitions. Acceptor-binding energy was determined to be 135-167 meV, which agrees well with the best-fitting result of the temperature dependent photoluminescence measurements and is reasonable in terms of theoretic prediction in ZnO.     

Controllability of pure states for the Pöschl-Teller potential with a dynamical group SU(2)

The controllability of a quantum system for the modified Pöschl-Teller (MPT) potential with the discrete bound states is investigated. The creation and annihilation operators of this potential are constructed directly from the normalized wave function with the factorization method and associated to an su(2) algebra. It is shown that this quantum system with the nondegenerate discrete bound states can, in principle, be strongly completely controllable, i.e., the system eigenstates can be guided by the external field to approach arbitrarily close to a target state, which could be theoretically realized by the actions of the creation and annihilation operators on the ground state.     

Optical properties of Zn0.5Cd0.5Se thin films grown on InP by molecular beam epitaxy

We report photoluminescence (PL) and reflectivity measurements of Zn_0.5Cd_0.5Se epilayers grown by molecular beam epitaxy on InP substrates. The low-temperature PL spectra are dominated by asymmetric lines, which can be deconvoluted into two Gaussian peaks with a separation of ∼8 meV. The behavior of these peaks is studied as a function of excitation intensity and temperature, revealing that these are free exciton (FE) and bound exciton emission lines. Two lower energy emission lines are also observed and assigned to the first and second longitudinal optical phonon replicas of the FE emission. The temperature dependence of the intensity, line width, and energy of the dominant emission lines are described by an Arrhenius plot, a Bose-Einstein type relationship, Varshni's and Bose-Einstein equations, respectively.     

Mechanism and control of current transport in GaN and AlGaN Schottky barriers for chemical sensor applications

Strong interests are recently emerging for development of integrated high-performance chemical sensor chips. In this paper, the present status of understanding and controlling the current transport in the GaN and AlGaN Schottky diodes is discussed from the viewpoint of chemical sensor applications. For this purpose, a series of works recently carried out by our group are reviewed in addition to a general discussion. First, current transport in GaN and AlGaN Schottky barriers is discussed, introducing the thin surface barrier (TSB) model to explain the anomalously large leakage currents. Following this, attempts to reduce the leakage currents are presented and discussed. Then, as an example of gas-phase sensors using Schottky barriers, a Pd/AlGaN/GaN Schottky diode hydrogen sensor developed recently by our group is presented with a discussion on the sensing mechanism and related current transport. On the other hand, in liquid-phase sensors, contact is made between liquid and semiconductor which is regarded as a kind of Schottky barrier by electrochemists. As one of such liquid-phase sensors, open-gate AlGaN/GaN heterostructure field effect transistor (HFET) pH sensor developed recently by our group is presented. Finally, a brief summary is given together with some remarks for future research.     

Optical properties of GaN/AlN multiple quantum wells

Optical properties of GaN/AlN multiple quantum wells (MQW) have been investigated by Raman scattering, photoluminescence and photoluminescence excitation measurements. A careful examination of the Raman spectrum reveals the fact that the constituent layers of GaN/AlN MQWs are well strained. The experimental results of emission and absorption in MQWs were compared with the calculated solutions of the finite quantum well and the bound states involved in the optical transitions were identified. It is found that the interband transitions up to n=3 bound state can be observed in the strained GaN/AlN MQWs sample. The temperature dependence of the heavy-hole transitions shows an interesting phenomenon, in which the peak energy first increases with increasing temperature and then decreases with the temperature rapidly. The observation can be explained in a consistent way by the strain effects of lattice mismatch due to the interplay between the thermal expansion of GaN and AlN layers. Our results indicate that pseudomorphic GaN/AlN MQWs with good quality can be readily grown, and their applications in optoelectronics can be expected in the near future.     

Analysis of thermionic emission from electrodeposited Ni–Si Schottky barriers

Ni–Si Schottky barriers are fabricated by electrodeposition using n on n+ Si substrates. I–V, C–V and low temperature I–V measurements are presented. A high-quality Schottky barrier with extremely low reverse leakage current is revealed. The results are shown to fit an inhomogeneous barrier model for thermionic emission over a Schottky barrier proposed by Werner and Guttler [J.H. Werner, H.H. Guttler, Barrier inhomogeneities at Schottky contacts, J. Appl. Phys. 69 (3) (1991) 1522–1533]. A mean value of 0.76 V and a standard deviation of 66 mV is obtained for the Schottky barrier height at room temperature with a linear bias dependence. X-ray diffraction and scanning electron microscopy measurements reveal a polycrystalline Ni film with grains that span from the Ni–Si interface to the top of the Ni layer. The variation in Ni orientation is suggested as a possible source of the spatial distribution of the Schottky barrier height.     

Esdiad from CO on W(100): Evidence for non-vertically adsorbed CO

Mass-discriminating measurements of the angular distributions of electron-stimulated ion desorption (ESDIAD) from CO adsorbed on W(100) and coadsorbed with C and O have been performed. The O⁺ beams indicate normal and off-normal (by 5 to 13°) desorption which is interpreted as due to CO molecules bound in symmetric and in two types of unsymmetric bridges. Preadsorption of C suppresses the vertical state, while oxidation of the surface suppresses the off-normal states.     

Electromagnetic field confined and tailored with a few air holes in a photonic-crystal fiber

Conventional and scanning near-field optical microscopy techniques are cross referenced to femtosecond nonlinear-optical measurements and finite-element numerical simulations to visualize and analyze a strong confinement of electromagnetic radiation in guided modes of a photonic-crystal fiber with only a few air holes surrounding the fiber core. A nonlinear coefficient of about 120 W⁻¹ km⁻¹ is achieved at the wavelength of 670 nm for a fused-silica fiber with a full hexagonal cycle of closely packed air holes around the fiber core. The removal of a single element from this array of air holes is shown to frustrate field confinement in guided modes, leading to mode leakage.     

Fault-Tolerant Quantum Dialogue Without Information Leakage Based on Entanglement Swapping between Two Logical Bell States

At present, the anti-noise property and the information leakage resistant property are two great concerns for quantum dialogue(QD). In this paper, two anti-noise QD protocols without information leakage are presented by using the entanglement swapping technology for two logical Bell states. One works well over a collective-dephasing noise channel, while the other takes effect over a collective-rotation noise channel. The negative influence of noise is erased by using logical Bell states as the traveling quantum states. The problem of information leakage is avoided by swapping entanglement between two logical Bell states. In addition, only Bell state measurements are used for decoding, rather than four-qubit joint measurements.     

Nitric acid oxidation of Si (NAOS) method for low temperature fabrication of SiO2/Si and SiO2/SiC structures

We have developed low temperature formation methods of SiO₂/Si and SiO₂/SiC structures by use of nitric acid, i.e., nitric acid oxidation of Si (or SiC) (NAOS) methods. By use of the azeotropic NAOS method (i.e., immersion in 68 wt% HNO₃ aqueous solutions at 120 °C), an ultrathin (i.e., 1.3-1.4 nm) SiO₂ layer with a low leakage current density can be formed on Si. The leakage current density can be further decreased by post-metallization anneal (PMA) at 200 °C in hydrogen atmosphere, and consequently the leakage current density at the gate bias voltage of 1 V becomes 1/4-1/20 of that of an ultrathin (i.e., 1.5 nm) thermal oxide layer usually formed at temperatures between 800 and 900 °C. The low leakage current density is attributable to (i) low interface state density, (ii) low SiO₂ gap-state density, and (iii) high band discontinuity energy at the SiO₂/Si interface arising from the high atomic density of the NAOS SiO₂ layer.For the formation of a relatively thick (i.e., ≥10 nm) SiO₂ layer, we have developed the two-step NAOS method in which the initial and subsequent oxidation is performed by immersion in ∼40 wt% HNO₃ and azeotropic HNO₃ aqueous solutions, respectively. In this case, the SiO₂ formation rate does not depend on the Si surface orientation. Using the two-step NAOS method, a uniform thickness SiO₂ layer can be formed even on the rough surface of poly-crystalline Si thin films. The atomic density of the two-step NAOS SiO₂ layer is slightly higher than that for thermal oxide. When PMA at 250 °C in hydrogen is performed on the two-step NAOS SiO₂ layer, the current-voltage and capacitance-voltage characteristics become as good as those for thermal oxide formed at 900 °C.A relatively thick (i.e., ≥10 nm) SiO₂ layer can also be formed on SiC at 120 °C by use of the two-step NAOS method. With no treatment before the NAOS method, the leakage current density is very high, but by heat treatment at 400 °C in pure hydrogen, the leakage current density is decreased by approximately seven orders of magnitude. The hydrogen treatment greatly smoothens the SiC surface, and the subsequent NAOS method results in the formation of an atomically smooth SiO₂/SiC interface and a uniform thickness SiO₂.     

Investigation of the effects of porous layer on the electrical properties of Pt/n-GaN Schottky contacts

This article reports the effects of porosity on the enhancement of the Schottky barrier height (SBH) and reduction of the leakage current of Pt Schottky diode based on n-type GaN. The porous GaN layer in this work was generated by electroless chemical etching under UV illumination. For comparative study, two additional samples, i.e. one as-grown sample and one thermally treated sample, were also prepared. The structural studies showed that the porous GaN sample has a relatively rough surface morphology with slightly broader X-ray diffraction peak of the (0 0 0 2) plane. The current-voltage (I-V) measurements revealed that the electrical characteristics of the Pt Schottky diode were improved significantly by the presence of the porous layer, in which SBH was observed to be enhanced by 27%.     

Charged excitons at high magnetic fields: the effect of the surrounding electron gas

We study the photoluminescence (PL) spectrum of a two-dimensional electron system at the high magnetic field limit, where all electrons reside at the lowest Landau level (ν<2). Using a gated structure we tune the electron density from the dilute limit to a dense electron gas, and follow the changes in the emission spectrum. We find that the spectrum at the dilute limit consists of two bound triplets, whose behavior is consistent with that of the dark and bright triplets. We show that the spectrum undergoes critical changes at ν=1/3, from an isolated charged exciton-like spectrum at ν<1/3, to a spectrum that reflects the interactions with the surrounding electrons above this filling factor. This behavior is found to be robust, independent of the electron density and magnetic field. We compare our observations with other recent low temperature PL measurements of a two-dimensional electron gas at high magnetic field and find good agreement and consistency.     

Illumination of multimode optical fibresleaky ray analysis

The power transmitted within multimode circular optical fibres illuminated at one end by either coherent or incoherent light is determined. In general, a significant portion of this power is due to the radiation field even kilometres from the source. Thus an analysis in terms of bound modes alone is inadequate and so is geometric optics using Fresnel's lawS. Instead, we use a modified form of geometric optics in which the rays are appropriately weighted to account for the leakage (radiation) from the fibre not included by Fresnel's laws. Extensive numerical results are given.     

硅衬底InGaN/GaN基蓝光发光二极管droop效应的研究

InGaN/GaN基阱垒结构LED当注入的电流密度较大时, LED的量子效率随注入电流密度增大而下降, 即droop效应.本文在Si (111)衬底上生长了 InGaN/GaN 基蓝光多量子阱结构的LED,通过将实验测量的光电性能曲线与利用ABC模型模拟的结果进行对比, 探讨了droop效应的成因.结果显示:温度下降会阻碍电流扩展和降低空穴浓度, 电子在阱中分布会越来越不平衡,阱中局部区域中因填充了势能越来越高的电子而溢出阱外, 从而使droop效应随着温度的降低在更小的电流密度下出现且更为严重, 不同温度下实验值与俄歇复合模型模拟的结果在高注入时趋势相反.这此结果表明,引起 droop效应的主因不是俄歇非辐射复合而是电子溢出,电子溢出的本质原因是载流子在阱中分布不均衡.     

Electrical characteristics of polycrystalline Si layers embedded into high-k Al2O3 gate layers

The electrical characteristics of polycrystalline Si (poly Si) layers embedded into high-k Al₂O₃ (alumina) gate layers are investigated in this work. The capacitance versus voltage (C-V) curves obtained from the metal-alumina-polysilicon-alumina-silicon (MASAS) capacitors exhibit significant threshold voltage shifts, and the width of their hysteresis window is dependent on the range of the voltage sweep. The counterclockwise hysteresis observed in the C-V curves indicates that electrons originating from the p-type Si substrate in the inversion condition are trapped in the floating gate layer consisting of the poly Si layer present between the top and bottom Al₂O₃ layers in the MASAS capacitor. Also, current versus voltage (I-V) measurements are performed to examine the electrical characteristics of the fabricated capacitors. The I-V measurements reveal that our MASAS capacitors show a very low leakage current density, compared to the previously reported results.