共查询到18条相似文献,搜索用时 203 毫秒
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借助于原子力显微镜研究了离子束溅射沉积工艺中入射离子能量对制备的Ti薄膜表面形貌的影响。对薄膜表面高度数据进行相关运算,发现在此工艺条件下制备的薄膜具有典型的分形特征,利用分形表面高度—高度相关函数的唯象表达形式对不同能量下制备Ti薄膜表面的高度相关函数进行拟合。得到了薄膜表面的分形维数、水平相关长度、标准偏差粗糙度等参量。研究发现,入射Ar离子能量在300—700eV之间薄膜表面的粗糙度随着沉积粒子的能量增加而增大,分形维数随着入射离子能量的增加而减少。另外,在得到的分形维数基础上对不同溅射电压下Ti薄膜的生长机制进行了初步研究。 相似文献
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用离子束溅射方法制备的钛薄膜表面形貌分析 总被引:11,自引:4,他引:7
用离子束溅工艺在K9玻璃基片上沉积Ti薄膜,并用原子力显微镜对其表面形貌进行测量,通过数值相关运算,发现在此工艺条件下薄膜生长界面为各向同性的自仿射分形表面,并用粗糙指数、横向相关长度和标准偏差粗糙度对薄膜样品表面进行定量描述。利用自仿射分形表面的相关函数对数值运算的结果进行拟合,得出Ti薄膜生长界面的粗糙度指数α=0.72,相应的分形维数Df=2.28,并由此得到在离子束溅射工艺下Ti薄膜屑于守恒生长的结论,其生长动力学过程可用Kuramoto—Sivashinsky方程来描述。 相似文献
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沉积工艺对二氧化锆薄膜生长特性影响的研究 总被引:3,自引:2,他引:1
利用反应离子束溅射、反应磁控溅射和电子束蒸发在K9基底上沉积ZrO2薄膜,并用原子力显微镜对薄膜表面形貌进行测量。通过数值相关运算,对不同工艺条件下薄膜生长界面进行定量描述,得到了薄膜表面的粗糙度指数、横向相关长度、标准偏差粗糙度等参量。由于沉积条件的不同,薄膜生长具有不同的动力学过程。在反应离子束溅射和反应磁控溅射沉积薄膜过程中,薄膜生长动力学行为均可用Kuramoto-Sivashinsky方程来描述,电子束蒸发制备薄膜的过程可以用Mullins扩散模型来描述,并发现在沉积薄膜过程中基底温度和沉积过程的稳定性对薄膜表面特征影响很大。 相似文献
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利用脉冲激光沉积(PLD)法在氧压为16 Pa、衬底温度为400~700 ℃时,在单晶Si(100) 衬底上制备ZnO薄膜,并通过原子力显微镜(AFM)、X射线衍射(XRD)谱和光致发光谱对制得的薄膜样品进行表面形貌、结构特性和发光性质研究。其中通过原子力显微镜对样品的二维、三维以及剖面线图进行了分析。结果表明衬底温度700 ℃时得到的薄膜样品表面较均匀致密,晶粒生长较充分,结晶质量较高,相对发光强度高。控制氧压为5.7 Pa,在衬底温度为600 ℃,沉积时间分别为10,20,45 min制备ZnO薄膜样品;利用原子力显微镜对样品进行表面形貌观察,得知只有沉积时间足够长才能使薄膜表面晶粒充分生长。 相似文献
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采用大直径中空柱状阴极直流磁控制溅射装置,在LaAlO3和Zr(Y)O2衬底上制备YBCO超导薄膜。用透射电镜(TEM)、扫描隧道显微镜(SIM)和原子力显微镜(AFM)对薄膜和衬底间的界面,薄膜的螺旋生长结构,YBCO薄膜及其相应衬底的表面形貌进行了观察和测量。分析了基片表面形貌及表层内缺陷对界面附近薄膜组织结构的影响。研究了不同衬底沉积的超导薄膜具有不同表面形貌的原因。从生长机理角度对表面形貌、缺陷和位错的形成机制进行讨论。 相似文献
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采用直流磁控溅射工艺, 在一定条件下通过控制溅射时间, 在钠钙玻璃上制备了不同厚度的用于Cu(Inx, Ga1-x)Se2薄膜太阳电池背接触材料的Mo薄膜, 并利用X射线衍射 (XRD)、场发射扫描电子显微镜 (SEM)、四探针测试仪、台阶仪研究了厚度对溅射时间、薄膜微结构、电学性能及力学性能的交互影响. Mo薄膜的厚度与溅射时间呈线性递增关系; 随厚度的增大, Mo薄膜 (110) 和 (211) 面峰强均逐渐增大, 择优生长从(110)方向逐渐向 (211)方向转变, 方块电阻值只随 (110) 方向上的生长而急剧减小直到一特定值约2 Ω/⇑, 电导率随薄膜的 (110) 择优取向程度的降低而线性减小直到一特定值约0.96×10-4 Ω·cm; Mo薄膜内部是一种多孔的长形簇状颗粒和颗粒间隙交织的结构, 并处于拉应力态, 其内部应变随薄膜厚度的增大而减小.
关键词:
Mo薄膜
CIGS背接触
厚度
微结构 相似文献
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A. Biswas 《Applied Surface Science》2008,254(11):3347-3356
An ion beam sputtering system, which uses a commercial ECR microwave based plasma ion source, has been designed and fabricated in-house for deposition of soft X-ray multilayer mirrors. To begin with, in the ion beam sputtering system W, Si thin films, W/Si bi-layer and W/Si/W tri-layer samples have been deposited on c-Si substrates as precursors to W/Si multilayer stack. The samples have been characterized by grazing incidence X-ray reflectivity (GIXR), atomic force microscopy (AFM) and spectroscopic ellipsometry (SE) techniques. By analyzing the results, density, thickness, surface roughness of the single layer samples and interface width of the bi-layer and tri-layer samples have been estimated. 相似文献
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《Journal of Macromolecular Science: Physics》2013,52(4-6):1033-1042
The film thickness dependence of crystal growth is investigated for isotactic polystyrene (it-PS) in thin films for thicknesses from 20 down to 4 nm. The single crystals of it-PS grown at 180°C in the ultrathin films show a morphology typical of diffusion-controlled growth: dense branching morphology and fractal seaweed. The characteristic length of the morphology, i.e., the width of the branch, increases with decreasing film thickness. The thickness dependence of the crystal growth rate shows a crossover around the lamellar thickness of 8 nm. The thickness dependences of the growth rate and morphology are discussed in terms of the diffusion of chain molecules in thin films. 相似文献
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Jing Tian Lianqin Peng Jinwei Chen Gang Wang Xueqin Wang Hong Kang Ruilin Wang 《Applied Physics A: Materials Science & Processing》2014,116(4):1813-1820
The Cu(In, Ga)Se2 (CIGS) thin films were deposited on bare glass and DC sputtered preferential oriented Mo-coated glass by RF sputtering from a single quaternary target. The structural and morphological properties of the films were characterized by X-ray diffraction (XRD), Raman spectroscope, energy dispersive X-ray spectrometer (EDS) and atomic force microscope (AFM). Preferred orientation of the Mo back contact was tuned between (110) and (211) plane by controlling the thickness. All the deposited CIGS thin films show (112) preferred oriented chalcopyrite structures. The films prepared on Mo-coated glass show higher quality crystallinity, better stoichiometry composition and more smooth surface morphology. Especially, the film on (211) oriented Mo-coated glass with the best integrated performance is expected to be a candidate absorber for high-efficiency CIGS solar cell device. 相似文献
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《中国物理 B》2015,(7)
A new Fe Pt nanostructure with stripe-like patterns has been prepared by direct current(DC) magnetron sputtering on anodic aluminum oxide(AAO) templates. AAO templates anodized under low voltages(7 V) demonstrate self-organized,maze-like patterns, different from the conventional porous structures obtained at high voltages. Fe Pt thin films deposited on such templates tend to replicate the morphology of the templates. Although there is no obvious spatial ordering, the dimensions of the Fe Pt nano-stripes are highly uniform, due to the constrained growth along the transverse direction of the AAO pattern. The magnetic properties are strongly influenced by this unique morphology. While continuous films demonstrate strong exchange coupling, the dominant interaction in Fe Pt nano-stripes with the same nominal thickness is magnetostatic. The morphology also dictates the magnetization reversal behaviors, with thin films dominated by domain nucleation; while nano-stripes incline to reverse their magnetization by spin rotation. Our work demonstrates that selforganized AAO templates can be used to control the morphology and magnetic behavior of Fe Pt materials. 相似文献
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R. P. Yadav U. B. Singh A. K. Mittal S. Dwivedi 《Applied Physics A: Materials Science & Processing》2014,117(4):2159-2166
The atomic force microscopy images representing the surface morphology of the nanostructured gold thin films of thickness of 20, 50 and 200 nm, respectively, were investigated using the multifractal analysis. The interface width and growth exponent corresponding to films of different thicknesses were estimated. The surfaces having greater roughness give rise to larger nonlinearity and wider width of the multifractal spectrum. The statistical tests confirm that the gold thin film surfaces under investigation are multifractal in nature. 相似文献