Transformations of C-type defects on Si(100)-2 × 1 surface at room temperature – STM/STS study

We present a scanning tunneling microscopy study of the C-type defects on the Si(100)-2 × 1 surface and their transformations into other defect forms at room temperature. A model of the C defect as a dissociated water molecule was adopted for interpretation of the observed transformations. We explained the transformations by hopping the H or OH between bonding sites on Si dimers. Newly, the most stable defect form, corresponding to the H and hydroxyl group adsorbed on the same dimer, is reported. Real time observations provided an explanation for the defect C2-C2 described earlier. A reversible transition of this defect into another form, not revealed yet, is presented. Electronic structure of the observed defects is studied by means of scanning tunneling spectroscopy. Measured spectra show semiconducting character of the C defect. Spectra of the other defect forms are discussed.     

Point defects along metallic atomic wires on vicinal Si surfaces: Si(5 5 7)–Au and Si(5 5 3)–Au

Point defects on the metallic atomic wires induced by Au adsorbates on vicinal Si surfaces were investigated using scanning tunneling microscopy and spectroscopy (STM and STS). High-resolution STM images revealed that there exist several different types of defects on the Si(5 5 7)–Au surface, which are categorized by their apparent bias-dependent images and compared to the previous report on Si(5 5 3)–Au [Phys. Rev. B (2007) 205325]. The chemical characteristics of these defects were investigated by monitoring them upon the variation of the Au coverage and the adsorption of water molecules. The chemical origins and the tentative atomic structures of the defects are suggested as Si adatoms (and dimers) in different registries, the Au deficiency on terraces, and water molecules adsorbed dissociatively on step edges, respectively. STS measurements disclosed the electronic property of the majority kinds of defects on both Si(5 5 7)–Au and Si(5 5 3)–Au surfaces. In particular, the dominating water-induced defects on both surfaces induce a substantial band gap of about 0.5 eV in clear contrast to Si adatom-type defects. The conduction channels along the metallic step-edge chains thus must be very susceptible to the contamination through the electronic termination by the water adsorption.     

RAS: An efficient probe to characterize Si(0 0 1)-(2 × 1) surfaces

A complete inspection of the capabilities of reflectance anisotropy spectroscopy (RAS) in studying the adsorption of molecules or atoms on the Si(0 0 1)-(2 × 1) surface is presented. First, a direct comparison between RA spectra recorded on the clean Si(0 0 1)-(2 × 1) and the corresponding topography of the surface obtained using scanning tunneling microscopy (STM) allows us to quantify the mixing of the two domains that are present on the surface. Characteristic RA spectra recorded for oxygen, hydrogen, water, ethylene, benzene are compared to try to elucidate the origin of the optical structures. Quantitative and qualitative information can be obtained with RAS on the kinetics of adsorption, by monitoring the RA signal at a given energy versus the dose of adsorbate; two examples are presented: H₂/Si(0 0 1) and C₆H₆/Si(0 0 1). Very different behaviours in the adsorption processes are observed, making of this technique a versatile tool for further investigations of kinetics.     

An STM study of the localized atomic reaction of 1,2- and 1,4-dibromoxylene with Si(1 1 1)-7 × 7

Thermal reactions of 1,2- and 1,4-dibromoxylene (1,2- and 1,4-diBrXy) with Si(1 1 1)-7 × 7 were investigated by STM at room temperature under UHV conditions. Reaction led to the formation of single adsorbed Br-atoms or pairs of Br-atoms, in a ratio approx. 3:1 for both reagents. Experimental results were interpreted in terms of ‘parent-mediated’ (halogen atom accompanied by organic residue), and ‘daughter-mediated’ (no accompanying organic residue) reaction dynamics. Both mechanisms contributed to the bromination of the silicon surface in comparable amounts. For pairs of bromine atoms the Br–Br separation had a most probable value of 7.6 Å for 1,2-diBrXy, and 11.5 Å for 1,4-diBrXy. This separation was in each case greater than that in the diBrXy parent molecule by a few angstroms. For parent-mediated reaction the dynamics were revealed in detail by the STM images which gave the vectorial location of the halogen-atom products (distance and angle of the daughter atoms) relative to the prior location and alignment of the adsorbed parent molecule. Both reagents, 1,2- and 1,4-diBrXy, were found to be less reactive than the corresponding dibromobenzenes studied earlier in this laboratory [S. Dobrin et al., Surf. Sci. 561 (2004) 11], in both parent- and daughter-mediated modes.     

Formation of a √3 × √3 surface on Si/Ge(1 1 1) studied by STM and LEED

We have performed a detailed study of the formation and the atomic structure of a √3 × √3 surface on Si/Ge(1 1 1) using both scanning tunneling microscopy (STM) and low energy electron diffraction (LEED). Both experimental methods confirm the presence of a √3 × √3 periodicity but unlike the Sn/Ge(1 1 1) and the Sn/Si(1 1 1) surfaces, the Si/Ge(1 1 1) surface is not well ordered. There is no long range order on the surface and the √3 × √3 reconstruction is made up of double rows of silicon atoms separated by disordered areas composed of germanium atoms.     

Dissociative adsorption and site specificity in the initial stages of tetraethoxysilane (TEOS) interaction with Si(111)-(7×7)

We report results of a scanning tunneling microscopy and X-ray photoelectron spectroscopy study on the interaction of tetraethoxysilane (TEOS), a precursor for chemical vapor deposition of silicon dioxide, with Si(111)-(7×7) at room temperature. Under these conditions the interaction of TEOS with the surface is predominantly dissociative. The main adsorption products are ethyl- and triethoxysiloxane groups, which probably evolve in a four-center reaction of TEOS with two neighboring surface dangling bonds. Adsorption of the dissociation products is highly site-selective: triethoxysiloxane groups adsorb on the Si adatoms while ethyl groups react with the rest-atom dangling bonds. Center adatoms are over three times more reactive towards this reaction than corner adatoms. This two-fold selectivity is explained within the concept of local electron donor/acceptor properties.     

The origin of inter-dimer-row correlated adsorption for NH3 on Si(0 0 1)

We discuss the interaction between adsorbing ammonia molecules and pre-adsorbed ammonia fragments on the Si(0 0 1) surface, searching for experimental evidence of a H-bonded precursor state predicted by modelling. While correlations along dimer rows have already been identified, these mix substrate-mediated effects due to dimer buckling with ammonia–adsorbate effects. Correlations between fragments on neighbouring dimer rows are not affected by substrate effects (in this system), allowing an analysis of direct ammonia–adsorbate effects. We present an analysis of cross-row correlations in existing high-coverage STM data which shows significant correlations between NH₂ groups on neighbouring dimer rows over a significant range, providing evidence for the H-bonded precursor state with a range of around 10 Å. We discuss implications for the interpretation of STM images of ammonia on Si(0 0 1).     

Growth of a single layer gold stripe and investigation of the preferable growth direction on reconstructed Au(1 1 1) surface using STM

We have investigated the growth of nanometer-scale gold stripes on reconstructed Au(1 1 1) surface using scanning tunneling microscopy (STM). The experiment was carried out under the conditions of ultrahigh vacuum and room temperature. The stripes were grown by the scanning motion of the STM tip over the area containing more than one step edge with the tunnel resistance less than several tens of mega ohms (MΩs). Unlike the previous reports [J.C. Heyraud, J.J. Metoris, Surf. Sci. 100 (1989) 519; V.M. Hallmark, S. Chiang, J.F. Rabolt, J.D. Swalen, R.J. Wilson, Phys. Rev. Lett. 59 (1987) 2879], we found, by directly comparing the direction of the stripes and the orientation of the underlying lattice, that the gold stripes grow preferentially along [1,−1,0] direction and its threefold symmetric directions at (1 1 1) surface of fcc structure. We also found that the scanning direction of the STM tip does not affect the direction of the stripe growth although the growth rate is suppressed remarkably when the scanning direction is close to [1,1,−2] direction of Au(1 1 1) surface.     

Large scale atomic ordering on uncovered GaAs(0 0 1) after InAs monolayer capping: Atomic structure of the (12 × 6) reconstruction

A well ordered c(8 × 2)-InAs monolayer is grown by molecular beam epitaxy (MBE) on a GaAs(0 0 1) substrate. After slow sublimation of this monolayer up to 560 °C, a homogeneously (n × 6) reconstructed GaAs surface is obtained. This surface is studied by scanning tunneling microscopy (STM) in UHV. This shows that it is well-ordered on a large scale with 200 nm long As dimer rows along and is also locally (12 × 6) reconstructed, the cell structure is proposed. We believe that this surface organization results from the specific As/Ga (0.7) surface atomic ratio obtained after the InAs monolayer growth and sublimation cycle.     

Oxygen adsorption on Pt(110)-(1×2): new high-coverage structures

From an interplay between scanning tunneling microscopy (STM) experiments and density functional theory (DFT) calculations, a comprehensive picture is obtained for oxygen adsorption on the Pt(110)-(1×2) surface, from single isolated oxygen atoms chemisorbed in FCC sites along the platinum ridges to the formation of a new high-coverage oxide-like structure with a local coverage of two oxygen atoms per platinum surface atom. We find that the repulsive O–O interactions for the O/Pt(110) system are compensated by an effective O–O attractive interaction originating from a strong coupling between oxygen adsorption and platinum lattice distortions.     

The role of repulsive interactions in molecular bromine adsorption and patterning of Si(100)-2×1

Scanning tunneling microscopy (STM) was used to investigate the role of repulsive interactions in the adsorption and patterning of molecular bromine on the Si(100) surface. At room temperature and low coverage, chemisorption of bromine occurs dissociatively on the same side of adjacent dimers of the same row. Using the STM tip as a probe, we demonstrate the existence of repulsive interactions at adjacent sites on the Si(100)-2×1 surface. These repulsive interactions also contribute to the arrangement of adatoms on the surface. In particular, we report the presence of a stable c(4×2) surface phase that results after exposing the Si(100) surface to bromine under certain conditions. This phase involves adsorption on non-neighboring dimers and is stabilized by repulsive interactions that force bromine adatoms to occupy alternating dimers within rows with an out-of-phase occupancy between adjacent rows.     

Si nucleation on Si(1 1 1)-7 × 7: From cluster pairs to 2D islands

Nucleation of 2D islands in Si/Si(1 1 1)-7 × 7 molecular beam epitaxy is studied using scanning tunneling microscopy (STM). A detailed analysis of the population of small amorphous clusters coexisting on the surface with epitaxial 2D islands has been performed. It is shown that small clusters tend to form pairs. The pairs serve as precursors for 2D islands as confirmed by direct STM observations of the smallest 2D islands covering two adjacent half-unit cells of the 7 × 7 reconstruction. It is proved with scaling arguments that the critical nucleus for 2D island formation consists not only of the pair itself, but also includes additional adatoms not belonging to the stable clusters.     

An STM study of the localized atomic reaction of 1,2- and 1,4-dibromobenzene at Si(1 1 1)-7 × 7

A comparative study is reported of the thermal reaction of 1,2- and 1,4-dibromobenzene (1,2- and 1,4-diBrPh) on Si(1 1 1)-7 × 7, investigated by STM. Some results are given for the intermediate case of 1,3-diBrPh. The STM images gave evidence of a different pattern of reaction to yield pairs of Br-Si for 1,2-, 1,3- and 1,4-diBrPh. The ratio of pairs of Br-Si to single bromination events was 1:2 for 1,2-diBrPh and 1:3 for 1,4-diBrPh. In many cases organic residue from the bromination reaction, R-Si, was evident in the STM image. The products R-Si and Br-Si were found to be bound to adjacent Si, for both 1,2- and 1,4-diBrPh. The mean Br?Br pair separation at the surface depended on the parent molecule, being 7.6 Å for 1,2-diBrPh, 10.3 Å for 1,3-diBrPh, and 11.3 Å for 1,4-diBrPh. These separations are, in each case, about 4 Å greater than the separation of the Br-atoms in the intact parent molecule, which increases systematically down the series. There was a marked decrease in the percentage of R-Si accompanying the Br-Si in going down the series, decreasing from 70% for 1,2- to 20% for 1,4-diBrPh; this was interpreted as being due to a decrease in the percentage of `benzene-mediated' reaction dynamics, in which the benzene ring was bound to the surface. At moderately increased surface temperature (45 °C) the reaction of 1,2- and also 1,4-diBrPh no longer resulted in R-Si formation, suggesting that the dynamics had altered from benzene-mediated to `bromine-mediated'.     

An STM study of the Si(0 0 1) (2 × 7)-Gd, Dy surface

Both Gd and Dy induce two different reconstructions of the Si(0 0 1) surface with 2 × 4 and 2 × 7 unit cells. Detailed examination by scanning tunneling microscopy shows that the structure of both phases is essentially the same for both metals. Furthermore, the 2 × 7 unit cell contains structural subunits that are the same as the 2 × 4 structure. The similarities and differences between the two superstructures induced by the two metals are discussed.     

Surface diffusion during decay of nano-island on Si(1 0 0) at high temperature

Surface diffusion during decay of a two-dimensional nano-island formed on Si(1 0 0) surface at 750-800 K is studied using STM and a kinetic Monte Carlo simulation. From a surface diffusion point of view, decay proceeds so that the total diffusion rate of atoms on a surface decreases. Atoms at step edges move more frequently than terrace atoms, which results in decay from step edges of the island. In addition, a terrace atom takes part in surface diffusion in the same way as an atom from steps of the island once it hops up on a terrace leaving a vacancy. The mass transport is not a specific atom process but terrace atoms and vacancies on the terrace are involved. Repeated upward and downward hops of atoms and their difference are combined with surface diffusion, which leads to the mass transport. Some tracks of atom using simulation show random walk with preferential diffusion along step edges, re-entering to the island, exchange of diffusing atom and filling in a vacancy on the terrace. The motion of the center of the island to the upper side of the terrace observed by STM is also well reproduced in the simulation.     

Vanadium nanoclusters on Si(1 1 1) 7 × 7 surface studied by scanning tunneling microscopy

The size distribution and shape transition of self-assembled vanadium silicide clusters on Si(1 1 1) 7 × 7 have been investigated by scanning tunneling microscopy. Nanoclusters were formed by submonolayer vanadium deposition at room temperature followed by subsequent annealing (solid phase epitaxy - SPE). At room temperature, initially V-nanoclusters are formed which occupy sites avoiding the corner hole parts of the unit cells in the Si(1 1 1) 7 × 7 surface. Upon annealing, strong metal-silicon reaction occur leading to the formation of vanadium silicide nanoclusters. As a function of temperature, both, flat (2D) and three dimensional (3D) clusters have been obtained. After annealing at temperatures around 900 K many faceted clusters are created, whereas at higher annealing temperature, around 1300 K, predominantly 3D clusters are formed. The size distribution of SPE grown clusters could be well controlled in the range of 3-10 nm. The cluster size depends on the annealing temperature as well as on the initial vanadium coverage. Based on high resolution STM images a structure model for one kind of vanadium disilicide clusters exposing atomically flat surfaces was proposed.     

Interaction of copper with sulfur on the sulfur-terminated Si(1 1 1)-(7 × 7) surface

The adsorption of S₂ on the Si(1 1 1)-(7 × 7) surface and the interaction of copper and sulfur on this sulfur-terminated Si(1 1 1) surface have been studied using synchrotron irradiation photoemission spectroscopy and scanning tunneling microscopy. The adsorption of S₂ at room temperature results in the passivation of silicon dangling bonds of Si(1 1 1)-(7 × 7) surface. Excessive sulfur forms S_n species on the surface. Copper atoms deposited at room temperature directly interact with S-adatoms through the formations of Cu-S bonds. Upon annealing the sample at 300 °C, CuS_x nanocrystals were produced on the sulfur-terminated Si(1 1 1) surface.     

A scanning tunneling microscopy study of water on Si(111)-(7 × 7): adsorption and oxide desorption

Scanning tunneling microscopy and temperature-programmed desorption have been used to investigate the chemistry of water on Si(111)-(7 × 7) substrates which were misoriented 2° toward the [ 10] direction. Upon room temperature exposure to water, the adatoms of the (7 × 7) unit cell are still evident even after high exposures, implying that major modifications of the substrate do not occur. At high coverages, the distribution of reacted adatoms shifts from one controlled by dissociative adsorption across the adatom-rest atom pair to a statistical distribution based on the availability of dangling bonds. Desorption of the oxide layer which remains after water adsorption and the desorption of hydrogen have also been characterized. The oxide desorption occurs along well-defined wavefronts which originate at step edges and advance in directions consistent with the underlying substrate symmetry, primarily the [ 2] direction (i.e. the wave vector points in the [ 2] direction). In regions of the surface where the oxide has desorbed, the (7 × 7) unit cell can be seen clearly. Vacancies resulting from the loss of surface silicon atoms (via the etching) coalesce into islands in the clean regions of the terraces, but unlike desorption of oxide layers from Si(100), the desorption does not occur from the boundaries of these vacancy islands.     

Defects and Pd growth on the reduced SnO2(1 0 0) surface

Scanning tunneling microscopy experiments on a clean, reduced SnO₂(1 0 0)-(1 × 1) surface reveal surface defects with zero-, one-, and two-dimensions. Point defects consist of missing SnO/SnO₂ units. Line defects are probably crystallographic shear planes that extend to the surface and manifest themselves as rows of atoms, shifted half a unit cell along the [0 1 0] direction. Their ends act as preferential nucleation sites for the formation of Pd clusters upon vapor deposition. Areas of a more reduced surface phase, still with a (1 × 1) structure and a half-unit cell deep, form at [0 0 1]-oriented step edges.     

Investigation of hydrogen interaction with the Si(1 1 1)-7 × 7 surface by STM with Bi/W tips

The STM technique with a special Bi/W tip was used to study the interaction of hydrogen atoms with the Si(1 1 1)-7 × 7 surface. The reactivity of different room temperature (RT) adsorption sites, such as adatoms (A), rest atoms (R), and corner holes (CH) was investigated. The reactivity of CH sites was found to be ∼2 times less than that of R and A sites. At temperatures higher than RT, hydrogen atoms rearrange among A, R, and CH sites, with increased occupation of R sites (T <  300 °C). Further temperature increase leads to hydrogen desorption, where its surface diffusion plays an active role. We discuss one of the possible desorption mechanisms, with the corner holes surrounded by a high potential barrier. Hydrogen atoms have a higher probability to overcome the desorption barrier rather than diffuse either into or out of the corner hole. The desorption temperature of hydrogen from CH, R, and A sites is about the same, equal to ∼500 °C. Also it is shown that hydrogen adsorption on the CH site causes slight electric charge redistribution over neighbouring adatoms, namely, increases the occupation of electronic states on A sites in the unfaulted halves of the Si(1 1 1)-7 × 7 unit cell. Based on these findings, the indirect method of investigation with conventional W tips was suggested for adsorbate interaction with CH sites.