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1.
X-ray diffraction and electron diffraction techniques indicate that Cdx Zn1–xSe thin films on glass substrates have a polycrystalline nature, with sphalerite structure for x0.5 and wurtzite structure for x0.6. The crystalline size in each composition increases with increasing the film thickness. The room temperature dark resistivity varies from one composition to another showing a transition at x=0.55The temperature dependence of of the deposited films revealed two conduction mechanisms, one below 352 K due to shallow levels, surface states, and defects introduced during the film growth, and over 352 K due to deep-level ionization following the ordinary semiconducting behaviour.The thermal activation energy of the free charge carriers decreases linearly with increasing the molar fraction x of the CdSe content up to x=0.55, above which it increases with increasing x.The optical constants of Cdx Zn1–xSe thin films of different compositions were determined in the spectral range 400–2000 nm. The analysis of the absorption coefticient at and near the absorption edge indicates the existence of allowed direct transition energy gaps decreasing with increasing x.  相似文献   

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This work investigates the effect of NaF on optical and structural properties of nano crystalline CdxZn1?xS films. The CdxZn1?xS films are prepared through chemical bath deposition (CBD) technique in aqueous alkaline bath and their subsequent condensation on substrates. The as-obtained samples are characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV–VIS absorption spectroscopy. Micro structural features, obtained from XRD analysis confirm the formation of cubic phase of undoped as well as NaF doped CdxZn1?xS nano particles while SEM observations depict non-uniform distribution of grains. These results show the average grain size of pure as well as NaF doped samples to range from 50 to 90 nm. Tauc's plots, extracted from absorption spectra exhibit absorption to be dominating mainly in blue-green region of visible spectrum. The room-temperature photoluminescence (PL) spectra of CdxZn1?xS samples show a peak around 425 nm, which gets blue shifted for doped sample indicating improvement in PL properties on its addition.  相似文献   

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The band structure of the solid solutions MnxHg1–xSe is constructed on the basis of the band parameters obtained from the electrophysical and optical investigations of these solid solutions. It is shown that the band structure of MnxHg1–xSe and the dynamics of the bands as a function of the composition and temperature are analogous to those for CdxHg1–xTe. It is shown that the variation of the nonparabolicity of the band spectrum of MnxHg1–xSe as a function of the temperature greatly affects the temperature coefficient of the change of the width of the optical forbidden band (dgop/dT).Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 4, pp. 40–44, April, 1991.  相似文献   

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Swift heavy ion (SHI) irradiation is an effective technique to modify the optical properties of the materials. In the present investigation, the effect of 100?MeV?Ag7+ SHI irradiation fluence on the optical properties of ZnO1?x:Nx thin films was studied. The post irradiation spectroscopic characterizations such as UV–VIS reflectance spectroscopy, Raman spectroscopy and photoluminescence (PL) spectroscopy analysis were carried out. The studies imply that when the SHI passes through the solid, the higher electronic stopping power of ions can weaken oxygen bonds in ZnO, resulting in the formation of donor defects such as oxygen vacancies and zinc interstitials. The formation of donor defects has been acknowledged through the increase in bandgap with irradiating ion fluence. The blue shift observed from the Raman spectra for the 3?×?1013 ions/cm2 fluence-irradiated films implies the existence of compressive stress in the films. The PL analysis acknowledges the formation of donor defects upon irradiation. Furthermore, it conveys that the presence of N atoms in ZnO lattice leads to the formation of a less number of defects as compared with undoped ZnO while irradiation.  相似文献   

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Amorphous GexS1−x films (x=0.27, 0.32, 0.36 and 0.4) were prepared by thermal evaporation. The values of the refractive index, the optical gap and the parameters of the Wemple–DiDomenico single oscillator model were determined. Using Miller's generalized rule the values of the third-order non-linear susceptibility were also estimated. Thermally induced bleaching was observed for films studied. Photobleaching was observed for sulfur rich and nearly stoichiometric films (x=0.27, 0.32) while for a germanium rich film (x=0.4) no response to the illumination was observed. The differences in photobleaching are attributed to the role of p-lone pair states and to an overall network rigidity of the films.  相似文献   

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The dc and thermal conductivities of five different compositions of the chalcogenide glass system Se75Ge25–x Sb x have been studied in a temperature range below T g. The dc conductivity results indicate that each composition has a single activation energy in the considered temperature range. The coefficient of thermal conductivity increased linearly with temperature below T g for the compositions investigated. The increase of Sb content in the chalcogenide glass system leads to an increased coefficient of electrical conductivity , an increased coefficient of thermal conductivity , and to a decreased activation energy E and pre-exponential factor 0. The observed compositional dependencies of and E have been correlated with the increase of weak bond density and the decrease of covalent bond density in the structure of the compositions investigated with increasing Sb content at the expense of Ge content. The decrease in 0 and the increase in has been, respectively, correlated with the decrease in mobility and the increase in phonon velocity.  相似文献   

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In addition to the conversion from p-type to n-type conductivity that occurs in Ge–Se–Bi thin films when Bi is incorporated in a certain concentration. We found that, when these films were illuminated to UV light, after being annealed at glass transition temperature T g, the photobleaching is dominant for Ge20Se80?x Bi x (x=0, 2.5, and 5 at.%), while for Ge20Se72.5Bi7.5 photodarkening is dominant. The photoinduced changes in the optical constants were studied. The refractive index (n) has been analysed according to the Wwmple–DiDominico single oscillator model and the values of E o and E d for exposed and unexposed films were determined, respectively. The photostructural effects were discussed in the light of single–double well model proposed by Tanaka and chemical bond approach.  相似文献   

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A. Dahshan  K.A. Aly 《哲学杂志》2013,93(12):1005-1016
The effect of varying bismuth concentration on the optical constants of amorphous Ge20Se80? x Bi x (where x = 0, 3, 6, 9 and 12 at%) thin films prepared by thermal evaporation has been investigated. The transmission spectra T(λ) of the films at normal incidence were obtained in the spectral region from 400 to 2500 nm. An analysis proposed by Swanepoel [J. Phys. E: Sci. Instrum. 16 (1983) p.1214], based on the use of the maxima and minima of the interference fringes, was applied to derive the real and imaginary parts of the complex index of refraction and also the film thickness. Increasing bismuth content was found to affect the refractive index and extinction coefficient of the Ge20Se80? x Bi x films. Optical absorption measurements show that the fundamental absorption edge is a function of composition. With increasing bismuth content, the refractive index increases while the optical band gap decreases.  相似文献   

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The influence of a Ni deficit in the nickel sublattice on the electronic and magnetic properties of PrNi2−xSb2 compound is investigated. The band structure is calculated using the LMTO method for x=0, 0.50, 1.0 and 1.5. At T=0 K the compound is antiferromagnetic with a magnetic moment on Pr close to 2.0 μB.  相似文献   

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Using the Transverse Electrical Excitation at Atmospheric Pressure (TEA) nitrogen laser, we had irradiated the amorphous thin films of Ga10Se81Pb9 chalcogenide glass and the results have been discussed in terms of the structural aspects of Ga10Se81Pb9 glass. The observed changes are associated with the interaction of the incident photon and the lone-pairs electrons which affects the band gap. The X-ray structural characterization revealed the amorphous nature of as prepared films and polycrystalline nature of the laser irradiated films. The optical band gap of these thin films is measured by using the absorption spectra as a function of photon energy in the wavelength region 400–1200 nm. It is found that the optical band gap decreases while the absorption coefficient increases with increasing the irradiation time. The decrease in the optical band gap has been explained on the basis of change in nature of films, from amorphous to polycrystalline state, with the increase in exposure time. The dc conductivities and activation energies of these thin films are measured in temperature range 303–403 K. It has been found that the activation energy in Ga10Se81Pb9 chalcogenide thin films decreases whereas the dc conductivity increases at each temperature by increasing the irradiation time.  相似文献   

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The effect of laser irradiation on the optical properties of thermally evaporated Se100?x Te x (x=8, 12, 16) chalcogenide thin films has been studied. The result shows that the irradiation causes a shift in the optical gap. The results have been analyzed on the basis of laser irradiation-induced defects in the film. The width of the tail of localized state in the band gap has been evaluated using the Urbach edge method. As the irradiation time increases, the values of the optical energy gap for all compositions decrease, while tail energy width increases. It is also observed that the optical energy gap decreases with increasing Te content in the alloy. These changes are a consequence of an increment in disorder produced by laser irradiation in the amorphous structure of thin film.  相似文献   

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Silver oxide nano layers were prepared by RF magnetron sputtering on amorphous SiO2 substrates. O2 pressure in chamber was varied from 1 to 4 and 7 mTorr during growth process. The effects of different O2 pressure on structural, morphological and optical properties of the films were investigated by means of X-ray diffraction, scanning electron microscopy, atomic force microscopy and UV–Vis spectroscopy analyses. Optical reflectance measured in the wavelength of 350–950 nm by spectroscopy. Other optical properties and optical band gaps were calculated using Kramers–Kronig relations. The X-ray diffraction measurements showed change in crystalline structure with increasing O2 pressure. Preferred orientation has been changed to another growth orientation at 4 mTorr O2 pressure. The Atomic force microscope images showed increasing in roughness consistently by increasing oxygen pressure. The thickness of the thin films decreases (from 217 to 180 nm) with increasing O2 pressure. Optical results revealed that the highest optical band gap of 3.1 eV and the highest transmittance of?~?80% were achieved at lower O2 pressure (1 mTorr).  相似文献   

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We have studied the electrical and optical properties of Cu–Al–O films deposited on silicon and quartz substrates by using radio frequency (RF) magnetron sputtering method under varied oxygen partial pressure PO. The results indicate that PO plays a critical role in the final phase constitution and microstructure of the films, and thus affects the electrical resistivity and optical transmittance significantly. The electrical resistivity increases with the increase of PO from 2.4 × 10?4 mbar to 7.5 × 10?4 mbar and afterwards it decreases with further increasing PO up to 1.7 × 10?3 mbar. The optical transmittance in visible region increases with the increase of PO and obtains the maximum of 65% when PO is 1.7 × 10?3 mbar. The corresponding direct band gap is 3.45 eV.  相似文献   

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《Current Applied Physics》2020,20(9):1041-1048
We report the effect of germanium doping on the active layer of amorphous Zinc–Tin-Oxide (a-ZTO) thin film transistor (TFT). Amorphous thin film samples were prepared by RF magnetron sputtering using single targets composed of Zn2Ge0.05Sn0.95O4 and Zn2SnO4 with variable oxygen contents in the sputtering gases. In comparison with undoped, Ge-doped a-ZTO films exhibited five order of magnitude lower carrier density with a significantly higher Hall-mobility, which might be due to suppressed oxygen vacancies in the a-ZTO lattice since the Ge substituent for the Sn site has relatively higher oxygen affinity. Thus, the bulk and interface trap densities of Ge-doped a-ZTO film were decreased one order of magnitude to 7.047 × 1018 eV−1cm−3 and 3.52 × 1011 eV−1cm−2, respectively. A bottom-gate TFT with the Ge-doped a-ZTO active layer showed considerably improved performance with a reduced SS, positively shifted Vth, and two orders of magnitude increased Ion/Ioff ratio, attributable to the doped Ge ions.  相似文献   

19.
A. Dahshan  H.H. Amer 《哲学杂志》2013,93(5):787-797
We report the effect of replacement of sulfur by germanium on the optical constants and some other physical parameters of chalcogenide Ge x As20S80– x (where x?=?0, 5, 10, 15 and 20 at%) thin films. Increasing germanium content affected the average heat of atomization, average coordination number, number of constraints and the cohesive energy. Films with thicknesses 800–820?nm of Ge x As20S80– x were prepared by thermal evaporation of bulk samples. Transmission spectra, T(λ), of the films at normal incidence were obtained in the region from 400 to 2500?nm. A straightforward analysis proposed by Swanepoel [J. Phys. E Sci. Instrum. 16 (1983) p 1214], based on the use of maxima and minima of the interference fringes, has been applied to derive the real and imaginary parts of the complex index of refraction and also the film thickness. Optical absorption measurements showed that the fundamental absorption edge is a function of composition. Optical absorption is due to allowed non-direct transition and the energy gap decreases while the refractive index increases with increasing germanium content. The chemical-bond approach has been applied to obtain the excess of S–S homopolar bonds and the cohesive energy of the Ge x As20S80– x system.  相似文献   

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CR-39 polymer samples were irradiated with γ-irradiation up to dose ranging from 500 to 2000 kGy. The virgin and γ-irradiated polymer samples were investigated using UV–visible spectroscopy and Fourier transform infrared (FTIR) spectroscopy. In the present work, the Urbach energy was calculated using the Urbach edge method. Also, the direct and indirect energy band gaps in virgin and γ-irradiated CR-39 polymer samples were calculated. The values of indirect energy band gap were found to be lower than the corresponding values of direct energy band gap. The decrease in the optical energy band gap with increasing γ-irradiation dose was discussed on the basis of γ-irradiation-induced modifications in CR-39 polymer. The correlation between optical energy band gap and the number of carbon atoms in a cluster with modified Tauc's equation was also discussed. The FTIR spectra show considerable changes due to γ-irradiation, indicating that the detector is not chemically stable.  相似文献   

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