Temperature-Dependent Electron Transport in In0.5Ga0.5 P/GaAs Grown by MOVPE

Hall effect measurements in undoped In0.5Ga0.5 P/GaAs allo grown by metal organic vapour-phase epitaxy （MOVPE） have been carried out in the temperat.ure range 15-350K. The experimenta.1 results are analysed using a two-band model including conduction band transport calculated using an iterative solution of the Boltz- mann equation. A good agreement was obtained between theory and experiment. The impurity contents of In0.5Ga0.5 P/GaAs alloy, such as donor density ND, acceptor density NA and donor activation energy εD, were also determined.     

Electron Transport in Ga-Rich InxGa1-xN Alloys

Resistivity and Hall effect measurements on n-type undoped Ga-rich InxGa1-xN （0.06 ≤ x ≤ 0.135） alloys grown by metal-organic vapour phase epitaxy （MOVPE） technique are carried out as a function of temperature （15-350 K）. Within the experimental error, the electron concentration in Inx Ga1-x N alloys is independent of temperature while the resistivity decreases as the temperature increases. Therefore, Inx Ga1-xN （0.06 ≤ x ≤0.135） alloys are considered in the metallic phase near the Mort transition. It has been shown that the temperaturedependent metallic conductivity can be well explained by the Mort model that takes into account electron-electron interactions and weak localization effects.     

Photo-magneto-electric effect in semi-insulating GaAs: carrier lifetimes and influence of the defect structure

We report the investigation of the Photo-Magneto-Electric effect (PME) in semi-insulating Liquid-Encapsulated (LEC-) grown GaAs crystals, using both intrinsic and impurity excitation. The role of the majority and minority carriers on the conductivity phenomena was evaluated and the lifetimes of electrons and holes were determined depending on excitation conditions. Anomalously high PME voltages, reaching in some cases some volts, were measured, which demonstrate a sharp drop in the temperature region 320–360K. The observed changes are discussed supposing that the influence of the non-homogeneous defect structure of the samples is essential.     

Investigation of transient transport and recombination phenomena in semiinsulating GaAs

Photoconductivity and Hall voltage kinetics were measured simultaneously in SI GaAs monocrystals, using the pulsed neodimium laser excitation. The scattering and recombination centres were found to have a different influence at different time intervals of the transients (from 10 ns to some seconds). It is shown that in GaAs the photoconductivity relaxation in some time intervals can be interpreted correctly only by taking into account the mobility changes. The obtained resuls are explained in terms of recharging of the scattering centres and variations of the capture cross-section of charge carries on the local centres.     

Van der Pauw resistivity measurements on evaporated thin films of cadmium arsenide, Cd3As2

Cadmium arsenide is a II-V semiconductor, exhibiting n-type intrinsic conductivity with high mobility and narrow bandgap. It is deposited by thermal evaporation, and has shown the Schottky and Poole-Frenkel effects at high electric fields, but requires further electrical characterisation. This has now been extended to low-field van der Pauw lateral resistivity measurements on films of thickness up to 1.5 μm. Resistivity was observed to decrease with increasing film thickness up to 0.5 μm from about 3 × 10⁻³ Ω m to 10⁻⁵ Ω m, where the crystalline granular size increases with film thickness. This decrease in resistivity was attributed to a decrease in grain boundary scattering and increased mobility. Substrate temperature during deposition also influenced the resistivity, which decreased from around 10⁻⁴ Ω m to (10⁻⁵ to 10⁻⁶) Ω m for an increase in substrate deposition temperature from 300 K to 423 K. This behaviour appears to result from varying grain sizes and ratios of crystalline to amorphous material. Resistivity decreased with deposition rate, reaching a minimum value at about 1.5 nm s⁻¹, before slowly increasing again at higher rates. It was concluded that this resulted from a dependence of the film stoichiometry on deposition rate. The dependence of resistivity on temperature indicates that intercrystalline barriers dominate the conductivity at higher temperatures, with a hopping conduction process at low temperatures.     

The effect of arsenic vapour species on electrical and optical properties of GaAs grown by molecular beam epitaxy

Hall effect, DLTS and low-temperature photoluminescence measurements were used to study the effect of dimeric (As₂) vs tetrameric (As₄) vapour species on the electrical and optical properties of nominally undoped and of Ge-doped GaAs layers grown by molecular beam epitaxy (MBE). The arsenic molecular beam was generated from separate As₂ and As₄ sources, respectively, and from a single source providing an adjustable As₂/As₄ flux ratio. The occurence of the previously described defect related bound exciton lines in the luminescence spectra at 1.504–1.511 eV was found to be directly correlated with the presence of three deep states (M1, M3, M4) which are characteristic of MBE grown GaAs. The intensity of the extra luminescence lines and simultaneously the concentration of the deep electron traps can be reduced substantially simply by decreasing the As₄/As₂ flux ratio. The incorporation of defect related centers as well as of amphoteric dopants like Ge strongly depends on the surface chemistry involved. Therefore, a considerably lower autocompensation ratio in Ge-dopedn-GaAs is obtained with As₂ molecular beam species which provide a higher steady-state arsenic surface population.     

Quantitative evaluation of substrate temperature dependence of Ge incorporation in GaAs during molecular beam epitaxy

Combined Hall effect and low-temperature photoluminescence measurements have been used to perform a thorough evaluation of the growth temperature dependence of Ge incorporation in GaAs during molecular beam epitaxy (MBE) over the entire substrate temperature range (400°≦T _s ≦600[°C]) practicable forn-type layer growth. Using a constant As₄ to Ga flux ratio of two, growth below 500°C yieldsn-GaAs: Ge films having electrical and optical properties rapidly deteriorating with decreasingT _s . Growth at 500° ≦T _s ≦600[°C] produces high-qualityn-GaAs: Ge films (N _D /N _A ≈4) with C as well as Ge residual acceptors competing on the available As sites. The amount of Ge atoms on As sites [Ge_As] increases with substrate temperature, whereas simultaneously the amount of C atoms on As sites [C_As] decreases thus leading to the well-establishednonlinear behaviour of the (N _A /N _D vs. 1/T _s plot. Counting the incorporated Ge impurities separately, however, yields alinear behaviour of the ([Ge_As]/[Ge_Ga]) vs. 1/T _s plot which has exactly the same slope as the (P _{As 2}/P _Ga) vs. 1/T _s plot derived from vapour pressure data of As₂ and Ga over solid GaAs surfaces. The important result is, therefore, that the incorporation behaviour of Ge in GaAs during molecular beam epitaxy is directly correlated with theevaporation behaviour of the growing GaAs surface.     

Microwave waveguide method for the measurement of electron mobility and conductivity in GaAs/AlGaAs heterostructures

The microwave waveguide method for contactless determination of the electron mobility and conductivity of thin active layers is reported. The method is based on relative measurements of the magnetic field dependences of the derivative of the reflection coefficient with respect to the magnetic field from a semiconductor wafer bridging the waveguide.Experiments are performed on GaAs/AlGaAs heterostructures at microwave frequency = 36.4 GHz and liquid nitrogen temperature. For the analysis of the experimental data the theoretical basis for arbitrary frequencies is developed. The main advantage of the proposed method is that this method enables one to determine material parameters - mobility and conductivity - without careful calibration of the microwave system and does not require the accurate measurements of the absolute values of the reflection coefficient and phase of the reflected wave.     

Light-intensity dependence of slow-relaxation phenomena in semi-insulating GaAs

Quenching-only and quenching-enhancement phenomena in low-temperature photoconductivity (PC) of SI GaAs have been studied as a function of light intensity for photons in 1.0–1.2 eV energy range. Quenching-only of PC occurs only at high light intensities (above 10¹⁴ photons/cm² s) and reflects well-known bleaching of EL2 defects. On the contrary, the quenching-enhancement effect can be observed only for several orders of magnitude lower light intensities and neither the quenching nor the enhancement part of low-temperature evolution of PC is directly connected with EL2 defects, but reflects the time evolution of the occupancy of deep traps other than EL2. It was also found that bleaching of EL2 is quite an unefficient process.     

Photoconductive response of GaAs epitaxial layers

In the present work the photoconductive response of low resistivity, n-type GaAs epitaxial layers is studied by experimentally monitoring the dependence of the photoconductive gain (PG) optoelectronic parameter upon incident photon flux and temperature. The characterized samples fall into three major categories: ion implanted (II) GaAs epilayers formed within undoped, semi-insulating GaAs substrates; GaAs epitaxial layers grown by liquid phase epitaxy (LPE) on Cr-doped, semi-insulating GaAs substrates; and ungated GaAs MESFETs.     

Optimization of carbon incorporation in GaAs during molecular beam epitaxial growth

Carbon-doped GaAs with dopant concentrations up to about 10²⁰ cm^–3 has been grown by molecular beam epitaxy. Above a critical carbon concentration, which depends on the deposition parameters, the surface deteriorates and loses its mirror-like appearance. From X-ray diffractometry and scanning electron microscopy, a diagram is established separating two areas with rough and mirror-like surface morphologies. The electrical properties as well as the morphology of GaAs : C can be simultaneously improved by a careful adjustment of the deposition parameters according to this diagram. On leave at: Tokyo Institute of Technology, Research Center for Quantum Effect Electronics, 2-12-1 O-okayama, Meguro-ku, Tokyo 152, Japan     

Carrier injection level dependence of post-breakdown metastability in semi-insulating GaAs

Recently, a room temperature electrically induced metastability in semi-insulating (SI)-GaAs has been reported in which the normally high resistance state of SI-GaAs converts into a low resistance state when breakdown electric fields are applied to the metal/SI-GaAs/metal system. The low resistance state continues to persist when the electric field is lowered below the breakdown bias and as such may be treated as metastable state of the material. This phenomenon is believed to be closely related to the ‘lock-on’ effect utilized in high power photoconductive semiconductor switches made from SI-GaAs. The present study seeks to understand the mechanism for this electrically induced metastability by studying the influence of the injection current on the metastable phase. The data favor an interpretation of the high current state of the SI-GaAs in terms of double carrier injection and the sustaining of an internal electron-hole plasma in the material.     

Contactless measurement of the conductivity of II–VI epitaxial layers by means of the partially filled waveguide method

We report the contactless determination of the conductivity, the mobility and the carrier concentration of II–VI semiconductors by means of the technique of the partially filled waveguide at a microwave frequency of 9 GHz. The samples are CdHgTe epitaxial layers, grown on CdZnTe substrates by molecular beam epitaxy. The conductivity is determined from the transmission coefficient of the sample in the partially filled waveguide. For the analysis of the experimental data, the complex transmission coefficient is calculated by a rigorous multi-mode matching procedure. By varying the conductivity of the sample, we obtain an optimum fit of the calculated data to the experimental results. Comparison with conductivity data determined by the van der Pauw method shows that our method allows to measure the conductivity with good accuracy. The behaviour of the transmission coefficient of the sample is discussed in dependence on the layer conductivity, the layer thickness and the dielectric constant of the substrate. The calculations require to consider in detail the distribution of the electromagnetic fields in the sample region. The usual assumption of a hardly disturbed TE₁₀ mode cannot be used in our case. By applying a magnetic field in extraordinary Voigt configuration, galvanomagnetic measurements have been carried out which yield the mobility and thus the carrier concentration. These results are also in good agreement with van der Pauw transport measurements.     

Incorporation behaviour of manganese in MBE grown Ga0.47In0.53As

Acceptor doping of MBE grown Ga_0.47In_0.53As on InP:Fe substrates utilizing manganese is investigated as an alternative for overcoming problems related to beryllium doping. The incorporation behaviour of manganese is analyzed in detail with respect to its application in optoelectronic device structures. Special emphasis is put on low-level and maximum-level doping relevant for use in buffer and contact layers, respectively. The dependence of activation energy and the degree of ionization on acceptor concentration is determined. At high doping levels the free-hole concentration is markedly lower than the doping concentration. It is attributed to the diffusion of acceptor species across the heterointerface into the substrate. Manganese diffusion is demonstrated to be an important effect for the interpretation of the measurement results. Manganese doping is applied in p⁺/n/p^–-layer structures for junction field effect transistor applications. The intended abruptness of acceptor profiles is deteriorated by diffusion of manganese in the Ga_0.47In_0.53As material. The degraded device characteristics obtained are attributed to the acceptor diffusion behaviour established.     

Optical properties and origin of infrared light scattering centers in undoped semi-insulating GaAs crystals

The wavelength dependence and polarization characteristics of the infrared light scattered from an undoped GaAs crystal were investigated in the 90° angle infrared light scattering configuration. The scattering is Rayleigh scattering from scatterers which are always associated with the dislocations, and they are classified into three types,S, L _A , andL _G scatterers, according to their polarization characteristics. TheS, L _A , andL _G -scatterers are thought to be small As clusters, large As precipitates and large Ga precipitates, respectively.     

Metal-insulator transition induced by the magnetic field in n-type GaSb

The metal-insulator (MI) transition induced by a magnetic field was evidenced for the first time in compensated n-type GaSb layers grown by molecular beam epitaxy. The free electron densities were in the low 10¹⁶ cm⁻³ range or even slightly lower, so that the zero-field 3D electron gas was degenerate and, at the B_MI magnetic field of the MI transition, it populates only the spin-split 0⁽⁺⁾ Landau level (extreme quantum limit). On the metallic side of the MI transition a T^1/3 dependence of the conductivity was assumed to fit the low-T data and to estimate the B_MI value, which resulted of 9.1 T in the purest sample. The MI transition manifests in a strong increase of the diagonal resistivity with the magnetic field, but not of the Hall coefficient, suggesting that the apparent electron density is practically constant, whereas the mobility varies strongly. The evidence of a maximum in the temperature dependence of the Hall coefficient has been explained through a two channels transport mechanism involving localized and extended states.     

Ge diffusion into GaAs by pulsed laser irradiation

Ge diffusion into GaAs from thin evaporated layers as sources is reported. Irradiation with aQ-switched ruby laser gives rise ton-type diffused layers of a thickness from 240 to 710 Å. A strong compensation of the diffused layers, that cannot be removed by thermal annealing, was observed. From the present experimental results it can be inferred that the diffusion coefficient increases at the melting point by 5 to 6 orders of magnitude.     

Selectively dopedn-AlxGa1−xAs/GaAs heterostructures with high-mobility two-dimensional electron gas for field effect transistors

In selectively dopedn-Al_xGa_1–xAs/GaAs heterostructures with high-mobility two-dimensional electron gas (2 DEG) at the heterointerface a second conductive channel exists, if the Al_xGa_1–xAs layer is not totally depleted from free carries. The occurrence of parallel conductance has a deleterious effect on the performance of high-electron mobility transistors (HEMTs) fabricated from this material. Although in principle computable, parallel conductance depends on a large number of design parameters to be chosen for the heterostructure, which are additionally affected by the presence of deep electron traps inn-Al_xGa_1–xAs of composition 0.25n-Al_xGa_1–xAs/GaAs heterostructures is shown.     

Carrier concentration in modulation-doped AlGaAs-GaAs heterostructures

Single-interface modulation-doped AlGaAs-GaAs heterostructures have very high mobilities if thick undoped spacers are introduced between the Si donors and the twodimensional electron gas. Electron densities are limited to values below 10¹² cm^–2. Higher channel densities are desirable for device applications and can be obtained by confining the electrons in quantum wells doped from both sides. Single quantum-well structures have been grown with sheet carrier densities exceeding 3×10¹² cm^–2 at 300 K and 77 K mobilities of 54,000 cm²/Vs. Single quantum wells doped from one side only with low electron concentrations of 2×10¹¹ cm^–2 have 4.2 K mobilities of 200,000cm²/Vs.     

Photoconductivity and the structural phase transition in SrTiO3

Detailed photoconductivity measurements have been performed in nominally pure SrTiO₃ in order to elucidate the effect of the antiferrodistorsive cubic-tetragonal phase transition. Small features in the photoconductivity’s temperature dependence in the phase transition region were found using low intensity interband UV or 514 nm light illumination. Such features are associated with a transformation of the defect system controlling the photoconductivity. At the same time, the temperature behavior of the photoconductivity spectral maximum reveals a rather unusual feature which is connected with changes in the absorption band edge structure in the phase transition region.