超薄膜生长的Monte Carlo模拟研究

利用Monte Carlo(MC)方法模拟研究了薄膜生长的初始阶段岛的形貌和岛的尺寸与基底温度和入射粒子剩余能量之间的关系.模型中考虑了粒子的沉积、吸附粒子的扩散和蒸发等过程.结果表明当基底温度从200K变化到260K时,岛的形貌经历了一个从分散生长逐渐过渡到分形生长的过程,并且在较低温度(200K)下,随入射粒子剩余能量的增加,岛的形貌也经历了同样的变化过程.进一步研究证明,随着基底温度的升高或入射粒子剩余能量的增加,沉积粒子的扩散能力显著增强,从而使岛的形貌发生了改变.     

不同晶格基底上薄膜生长的Monte Carlo模拟研究

利用Monte Carlo(MC)方法模拟研究了四方和六方晶格基底上薄膜生长的初始阶段岛的形貌和岛的尺寸与基底温度和入射粒子剩余能量之间的关系.模型中考虑了粒子的沉积、吸附粒子的扩散和蒸发等过程.结果表明,基底晶格结构对薄膜生长具有明显影响.当基底温度为300K、入射粒子剩余能量为0时,四方晶格基底上薄膜的生长已经呈现明显的凝聚生长,随着基底温度或入射粒子剩余能量的增加,岛的数目变少、岛的平均尺寸变大.对于六方晶格基底,当入射粒子剩余能量为0、温度从300 K升高到350 K时,岛的形貌从分散生长向分形生长转变;当基底温度为300 K、入射粒子剩余射能量从0上升到0.05 eV时,岛由分散生长向分形生长转变.     

不同晶格基底上薄膜生长的Monte Carlo模拟研究

利用Monte Carlo（MC）方法模拟研究了四方和六方晶格基底上薄膜生长的初始阶段岛的形貌和岛的尺寸与基底温度和入射粒子剩余能量之间的关系. 模型中考虑了粒子的沉积、吸附粒子的扩散和蒸发等过程. 结果表明,基底晶格结构对薄膜生长具有明显影响. 当基底温度为300K、入射粒子剩余能量为0时,四方晶格基底上薄膜的生长已经呈现明显的凝聚生长,随着基底温度或入射粒子剩余能量的增加,岛的数目变少、岛的平均尺寸变大. 对于六方晶格基底,当入射粒子剩余能量为0、温度从300K升高到350K时,岛的形貌从分散生长向分形生长转变;当基底温度为300K、入射粒子剩余射能量从0上升到0.05eV时,岛由分散生长向分形生长转变.     

薄膜生长的随机模型

利用Monte Carlo模型研究了薄膜生长初始阶段岛的形貌与基底温度之间的关系,同时还研究了它们与汽相粒子入射剩余能量之间的关系．模型中考虑了三种动力学过程：粒子入射、吸附粒子扩散和粒子脱附,与以前薄膜生长模型的不同之一在于把入射过程看作独立于其他过程,而扩散和脱附过程是相互关联的．结果表明随基底温度的升高,岛的形貌经历了一个从分散生长、分形生长到凝聚生长的变化过程．低温下随汽相粒子入射和剩余能量增加,岛的形貌也经历了同样的变化过程. 关键词：     

基底显微结构对薄膜生长影响的Monte Carlo模拟研究

利用Monte Carlo方法研究了基底显微结构对薄膜生长的影响. 对不同显微结构基底上薄膜生长的初始阶段岛的形貌和尺寸与薄膜覆盖度和入射粒子沉积速率之间的关系进行了模拟和分析. 模型中考虑了粒子沉积、吸附粒子扩散和蒸发等过程. 结果表明,基底显微结构对薄膜生长具有明显影响. 当沉积温度为300K、沉积速率为0.005ML/s（Monolayer/second,简称ML/s）、覆盖度为0.05ML时,四方基底上薄膜生长呈现凝聚生长. 随着覆盖度增加,岛的尺寸变大,岛的数目减少. 而对于六方基底,当覆盖度从0.05ML变化到0.25ML时,薄膜生长经历了一个从分散生长过渡到分形生长的过程. 无论是四方还是六方基底,随着沉积速率的增加,岛的形貌由少数聚集型岛核分布状态向众多各自独立的离散型岛核分布状态过渡.     

沉积粒子能量对薄膜早期生长过程的影响

利用Monte Carlo(MC)模型研究了能量粒子对薄膜生长的初始阶段岛膜的形貌和岛的尺寸的影响,沉积粒子的能量范围为:0—0.7eV.在模型中考虑了原子沉积、吸附原子扩散和蒸发等过程,并详细考虑了临近和次临近原子的影响.结果表明,在所采用的参量范围内不同的基底温度情况下,能量粒子的影响有很大的区别.低基底温度情况下,沉积粒子强烈地影响着薄膜的生长过程中,岛膜的形貌、数量和尺寸随能量粒子的能量增加而有很大的变化.分析表明,这些变化都是由于能量粒子的介入使得表面吸附粒子的扩散能力增强所致 关键词： 薄膜生长 Monte Carlo方法 扩散     

六方晶格基底上薄膜生长的Monte Carlo模拟研究

利用Monte Carlo（MC）方法,模拟研究了六方晶格基底上薄膜生长的初始阶段岛的形貌和岛的尺寸与薄膜覆盖度以及入射粒子沉积速率之间的关系. 结果表明在基底温度为300K时,岛的形貌主要表现为分形生长,随着薄膜覆盖度的增加,岛的分形枝簇变大,岛的数目不断减少. 在同样的温度下,随着入射粒子沉积速率的增大,薄膜表面的形貌逐步由少数聚集型岛核分布状态向众多各自独立的离散型岛核分布状态过渡. 进一步研究得出,薄膜覆盖度和入射粒子沉积速率对粒子扩散能力的影响最终导致岛的形貌发生了改变.     

超薄膜生长的Monte-Carlo研究

利用MonteCarlo(MC)模型研究了薄膜生长的初始阶段岛的形貌和岛的尺寸与基底温度之间的关系.模型中考虑了原子沉积、吸附原子扩散和蒸发等过程,与以前模型不同的是我们用Morse势计算粒子之间的相互作用,并详细考虑了临近和次临近原子的影响.结果表明,随基底温度的升高,岛的形貌经历了一个从分形生长到凝聚生长的变化过程.进一步研究表明,岛的形貌与基底的形貌之间的关系随着基底温度的升高有很大的变化,基底温度低时,岛的形状与基底形貌无关,高温时岛具有与基底形貌相似的结构.这些结果与实验结果一致.为了进一步说明 关键词：     

载能原子沉积Au/Au(100)外延薄膜生长的计算机模拟

在分子动力学研究的基础上建立了载能原子的沉积动力学物理模型,并根据在局域环境下的表面原子扩散模型,通过运动学Monte Carlo方法研究了载能粒子沉积Au/Au(100)薄膜的初期生长过程,探讨了载能粒子沉积对薄膜生长的影响及其随基体温度的变化.通过计算机模拟发现：载能粒子沉积的Au/Au(100)薄膜生长仍然呈现层状生长-三维岛状生长-准二维层状.在薄膜生长初期,载能粒子的作用是促进表面原子的成核,增加基体表面的缺陷;在薄膜的生长阶段,载能粒子通过抑制三维岛的生长速率起着平滑薄膜表面形貌的作用.载能粒 关键词：     

Al(001)表面上沉积Ti薄膜的分子动力学模拟

采用分子动力学模拟方法,研究了Ti原子连续沉积于Al(001)表面上的薄膜生长过程,分析了入射能量为0.1、5 eV和衬底温度为300、700 K时的界面结合及微观结构.模拟结果表明,增加入射能量和衬底温度,使Ti薄膜的表面越光滑;通过径向分布函数和键对分析技术对薄膜微观结构进行分析,发现衬底温度时薄膜微观结构影响较大,温度300 K及以下时,Ti薄膜主要是FCC结构,随着温度升高,FCC结构成分减少,无序结构成分增加,而入射能量则对薄膜微观结构没有明显影响.     

C(膜)/Si(SiO2)(纳米微粒)/C(膜) 的光致发光性质研究

用直流辉光溅射法结合真空镀膜法制备出了一种“多层三明治结构”的光致发光材料—C(膜 ) /Si(SiO2 ) (纳米微粒 ) /C(膜 )夹层膜 ,然后分别在 40 0、6 5 0和 75 0℃退火 1h .在波长为 2 5 0nm的紫外光激发下 ,刚制备出来未经退火处理的样品具有一个在 398nm (3.12eV)处的紫光宽带PL1峰 .在 6 5 0℃退火后 ,又出现了一个在 36 0nm (3.44eV)附近的PL2 峰 .PL1和PL2 峰形状和峰位与退火温度和激发波长无关 ,但强度却与退火温度和激发波长密切相关 .结合形态结构分析可知 ,紫光PL1峰可用量子限制 -发光中心 (QC LCs)模型进行解释 :即光激发发生在SiO2 微粒内部 ,而光发射源于SiO2 与Si界面上的缺陷中心 .紫外荧光PL2 峰则源自SiC内部的电子 空穴复合发光     

Optical and electronic properties of (GaAs)n / (InAs)n(001) superlattices: LMTO-ASA approach

The optical and electronic properties of (GaAs)_n/(InAs)_n superlattices are calculated by means of LMTO-ASA method. The too small band gap problem of bulk material and superlattices is corrected by adding to the effective potentials an additional external potential that is sharply peaked at the atomic sites. The results show that the optical properties of GaAs/InAs(001) superlattices are about average of that of two bulks of GaAs and InAs.     

Angular-distribution He(I) /Ne(I) /Ar(I) photoelectron spectra of unsaturated hydrocarbons

The energy dependence of the anisotropy parameters of the π- and selected σ-bands of ethylene, 1,3-butadiene, benzene, cyclohexene, norbornadiene, 1,3-and 1,4-cyclohexadiene has been determined in the low energy region. Whereas the behaviour of the σ-bands is much less uniform, all π-band β-values decrease with decreasing energy towards similar threshold values. Strong intra-band energy dependencies have been observed for both π and σ orbitals, while in the multiple π-orbital molecules there is a symmetry-specific contribution to the π β-values. Marked intensity variations are observed among the ethylene, butadiene and benzene bands, and the anisotropy-parameter-based assignment of symmetric character to the 1,4-cyclohexadiene first band is confirmed.     

Phase Structure of Polyamide 6/Poly(styrene-co-acrylonitrile) and Poly(styrene-b-(ethylene-co-butylene)-b-styrene) or Poly(maleated Styrene/Ethylene-co-Butylene/Styrene) Ternary Blends

Two sets of ternary blends; polyamide 6/poly(styrene-co-acrylonitrile)/poly(styrene-b-(ethylene-co-butylene)-b-styrene) (PA6/SAN/SEBS) and polyamide 6/poly(styrene-co-acrylonitrile)/poly(maleated styrene/ethylene-co-butylene/styrene) (PA6/SAN/SEBS-g-MA), based on 70 wt% of matrix and 30 wt% of the dispersed phases at various concentrations of the minor components, were prepared via melt blending. Morphologies of the ternary systems were studied using scanning electron microscopy (SEM) and compared with the predictions of the spreading coefficient (SC), minimum relative interfacial energy (RIE), and dynamic interfacial energy (DIE) phenomenological models. The effects of different reported surface tensions of the used polymers and different protocols of the core-shell ratio calculation on the prediction of the models were investigated. The core-shell structure for PA6/SAN/SEBS system and two separate minor phases for PA6/SAN/SEBS-g-MA were observed at all of the compositions. The results indicated that the most important parameter for the accurate prediction of the models is the accurate calculation of the interfacial tension of the used polymers, in both the static and dynamic conditions.     

直流电致发光(DCEL)器件在交流(AC)电压下的I-V,B-V和B-I特性

本文研究了DCEL器件在AC条件下的电流-电压(I-V),亮度-电压(B-V)和亮度-电流(B-I)特性.提出了在不同激发条件下的I-V,B-V和B-I的经验公式.证明了DCEL器件在AC条件下按激发条件可分为三个负载区:容性负载区,电阻负载区和混合负载区.在不同的负载区DCEL器件呈现完全不同的光电特性.证明了在不同负载区工作时磷光粉层内电场分布和电子能量分布截然不同.分析了上述特性的原因.证明了老化和形成过程具有同样的物理机制,老化是形成过程的继续.     

Fracture Micromechanisms of Polypropylene/Polycarbonate/Poly(styrene-b-(ethylene-co-butylene)-b-styrene) (PP/ PC/SEBS) Ternary Blends: The Effects of SEBS Content

Ternary blends of polypropylene/polycarbonate/poly(styrene-b-(ethylene-co-butylene)-b-styrene) (PP/PC/SEBS) with varying SEBS contents were produced via melt blending in a co-rotating twin-screw extruder. The phase morphology of the resulting ternary blends and its relationship with bending and impact behaviors were studied. Transmission optical microscopy (TOM) of the crack tip damage zone and scanning electron microscopy (SEM) of impact fractured surfaces were performed to characterize the fracture mechanism. With increasing SEBS content in the PP/PC/SEBS ternary blends, the number of PC/SEBS core-shell particles increased and the size of the core-shell particles enlarged. It was shown that with an SEBS content of 5%, the crack initiation resistance decreased and then was almost unchanged with further increase of SEBS content, while resistance to crack growth increased continuously with increasing of SEBS content. Preliminary analysis of the micromechanical deformation suggested that the high impact toughness observed for samples containing 20 and 30 wt% of SEBS could be attributed to cavitation of the rubbery shell and, consequently, shear yielding of the matrix. This plastic deformation absorbed a tremendous amount of energy. Due to low interfacial adhesion between PC particles and PP matrix in samples containing 5 and 10 wt% of SEBS, debonding occurred too early, so the occurrence of matrix shear yielding was delayed and resulted in premature interfacial failure and, hence, rapid crack propagation.     

SU(3) LIMIT OF U(6/20) SUPERSYMMETRY IN NUCLEI

In this paper we discuss the SU(3) limit of U(6/20) supersymmetry. First we derive the reduction formulas of the relevant group chain. Then we discuss the dynamical symmetry. Finally we make comparison between the theoretical calculation and experimental measurement in the case of nucleus .²³⁵₉₂U₁₄₃     

Leptonic nonet in SUL (3) × SUR (3)

A left-right symmetric SU_L(3) × SU_R(3) gauge model with leptons in the ($\text{3}\text{, 3) + (3,}\text{3}$) representation is presented. The SU^I_L(2)×U(1) subgroup is practically the WS + GIM model for $\text{sin}{}^2\text{?}{}_{\mathrm{<mtext>W</mtext>}}\text{≈}\text{3}\text{8}$, with additional currents involving heavy leptons. μ→eγ is naturally suppressed and a new kind of $\text{ν}{}_{\mathrm{<mtext>e</mtext>}}\text{?}\text{ν}{}_{\mathrm{\mu }}$ oscillations is possible. τ and 3_μ events can be related to one leptonic triplet. The model is naturally imbedded in exceptional groups.