Evolution of InAs islands in the Stranski-Krastanow mode of InAs/GaAs(001) fabricated using molecular beam epitaxy

Based on step-by-step observation using atomic force microscope, two distinctive successive phases were distinguished in accordance with evolution of the three-dimensional InAs islands during the Stranski-Krastanow mode of the InAs/GaAs(001) system fabricated using molecular-beam epitaxy. The initial phase is consistent with a power law, and the latter phase is a comparatively gradual one.      

In-situ mechanical characterization of wurtzite InAs nanowires

High aspect ratio vertical InAs nanowires were mechanically characterized in a scanning electron microscope equipped with two micromanipulators. One, equipped with a calibrated atomic force microscope probe, was used for in-situ static bending of single nanowires along the 〈11–20〉 crystallographic direction. The other one was equipped with a tungsten tip for dynamic resonance excitation of the same nanowires. This setup enabled a direct comparison between the two techniques. The crystal structure was analyzed using transmission electron microscopy, and for InAs nanowires with a hexagonal wutzite crystal structure, the bending modulus value was found to BM=43.5 GPa. This value is significantly lower than previously reported for both cubic zinc blende InAs bulk crystals and InAs nanowires. Besides, due to their high resonance quality factor (Q>1200), the wurtzite InAs nanowires are shown to be a promising candidate for sub-femtogram mass detectors.     

As压调制的InAlAs超晶格对InAs纳米结构形貌的影响

利用固源分子束外延设备生长出InAs/InAlAs/InP(001)纳米结构材料, 探讨了As压调制的InAlAs超晶格对InAs纳米结构形貌的影响. 结果表明, As压调制的InAlAs超晶格能控制InAs量子线的形成, 导致高密度均匀分布的量子点的生长. 结果有利于进一步理解量子点形貌控制机理. 分析认为, InAs纳米结构的形貌主要由InAlAs层的各向异性应变分布和In吸附原子的各向异性扩散所决定.     

Extremely low density self-assembled InAs/GaAs quantum dots

The self-assembled InAs/GaAs quantum dots (QDs) with extremely low density of 8×106 cm-2 are achieved using higher growth temperature and lower InAs coverage by low-pressure metal-organic chemical vapour deposition (MOVCD). As a result of micro-photoluminescence (micro-PL), for extremely low density of 8×106 cm-2 InAs QDs in the micro-PL measurements at 10 K, only one emission peak has been achieved. It is believed that the InAs QDs have a good potential to realize single photon sources.     

InAs和InAs/GaSb异质结的MOCVD生长和表征

以三甲基铟(TMIn)、砷烷(AsH3)、三甲基镓(TMGa)和三甲基锑(TMSb)为源,用水平常压MOCVD技术,在较低的Ⅴ/Ⅲ比的条件下(1.5～4)于GaAs和GaSb衬底上成功地生长了InAs合金和InAs/GaSb异质结。实验表明,生长温度在500℃～620℃范围内,InAs外延生长是扩散控制的。在Ⅴ/Ⅲ比为2.5时,生长效率(相对Ⅲ族源)为3×103μm/mol.不掺杂InAs外延层为n型的,室温迁移率为2000cm2/V.s.InAs/GaSb异质结的12KPL谱为一个在375meV处较宽的与杂质相关的跃迁峰,和一个在417meV附近的几乎被杂质峰湮没的带边峰.     

Modeling of Terahertz Radiation from InSb and InAs

In this paper the THz radiation dynamics of InSb and InAs, two typical narrow band semiconductors, was investigated using the ensemble Monte Carlo method. Our simulations indicated that the single mechanism of current surge only can result in small difference of THz emission efficiency for InSb and InAs. The great advantage of InAs over InSb in THz emission efficiency that was found in a published work is possibly due to the mechanism of optical rectification. In addition, under low excitation level, we found the emission efficiency of InSb is advantage over that of InAs, but under high excitation level, the result is reversed. On the other hand, through the Fourier transforms of temporal THz waveforms we found that the main frequency of THz pulses from InAs is always higher than that of InSb.     

Scanning tunneling microscopy of InAs/GaSb superlattices with various growth conditions

Cross-sectional scanning tunneling microscopy (STM) is used to characterize InAs/GaSb superlattices, grown by molecular beam epitaxy (MBE). Previous STM studies have found an interface asymmetry, with the interfaces of InAs grown on GaSb being rougher than those of GaSb on InAs. In the present work, a comparison is made between samples grown under various conditions, using elevated growth temperature or using atomic layer epitaxy (ALE). In both cases, the interface asymmetry is found to decrease compared to MBE growth at 380°C. In addition, Sb incorporation in the InAs layers is observed directly in the STM images. It is argued that the additional roughness seen at the InAs on GaSb interfaces arises in part from incorporation of excess Sb into the growing InAs layers. Elevated temperatures reduces this incorporation, and hence produces smoother interfaces.     

Growth of InAs nanostructures on InP using atomic-force nanolithography

Atomic-force nanolithography was used to control the nucleation sites of InAs nanostructures on InP substrates. Indentations with a wide range of dimensions were produced on InP. InAs nanostructures were selectively grown by metal organic vapor phase epitaxy. It is shown that the number of active nucleation sites depends on the normal force applied during nanoindentation. Crystalline defects introduced by nanoindentation are shown to be nucleation sites for these nanostructures. The presence of screw dislocations within the grown nanostructures further supports this observation. PACS 81.07.-b; 68.37.Ps; 81.16.Nd     

Growth of InGaAs-capped InAs quantum dots characterized by Atomic Force Microscope and Scanning Electron Microscope

Atomic force microscopy (AFM) is typically used to measure the quantum dot shape and density formed by lattice mismatched epitaxial growth such as InAs on GaAs. However, AFM images are distorted when two dots are situated in juxtaposition with a distance less than the AFM tip width. Scanning electron Microscope (SEM) is much better in distinguishing the dot density but not the dot height. Through these measurements of the growth of In_xGa_1-xAs cap layer on InAs quantum dots, it was observed that the InGaAs layer neither covered the InAs quantum dots and wetting layer uniformly nor 100% phase separates into InAs and GaAs grown on InAs quantum dots and wetting layer, respectively.     

Vibrational spectroscopy of InAs and AlAs quantum dot structures

In this paper we present an experimental comparative study of InAs/AlAs periodical structures with InAs and AlAs quantum dots (QDs) by means of infrared and Raman spectroscopies. The first observation of optical phonons localized in InAs and AlAs QDs using infrared spectroscopy is demonstrated. Confined optical phonon frequencies of the QDs measured by means of Raman scattering are compared with those deduced from the analysis of infrared spectra performed in the framework of the dielectric function approximation.     

Pressure and volume dependence of thelo-to phonons in InAs

The pressure dependence of thelo-to phonons in InAs has been investigated by Raman scattering using the diamond anvil cell. Indium arsenide transforms, presumably to the rock-salt structure at 70±1 kbar. The mode Grüneisen parameters for thelo-to phonons are γ _lo =0.99±0.03, γ _to =1.2±0.03 respectively. The effective charge,e* _T , for InAs decreases slightly with pressure and this trend is in accordance with the behaviour of other III–V zinc blende structured semiconductors: The structural phase transition is discussed in the light of theoretical calculations for phase stability of III–V compounds, as well as recent high pressure x-ray diffraction studies.     

Bandgap engineering of self-assembled InAs quantum dots with a thin AlAs barrier

We investigate the effects of a thin AlAs layer with different position and thickness on the optical properties of InAs quantum dots (QDs) by using transmission electron microscopy and photoluminescence (PL). The energy level shift of InAs QD samples is observed by introducing the thin AlAs layer without any significant loss of the QD qualities. The emission peak from InAs QDs directly grown on the 4 monolayer (ML) AlAs layer is blueshifted from that of reference sample by 219 meV with a little increase in FWHM from 42–47 meV for ground state. In contrast, InAs QDs grown under the 4 ML AlAs layer have PL peak a little redshifted to lower energy by 17 meV. This result is related to the interdiffusion of Al atom at the InAs QDs caused by the annealing effect during growing of InAs QDs on AlAs layer.     

Growth and characterization of straight InAs/GaAs nanowire heterostructures on Si substrate

Vertical InAs/GaAs nanowire (NW) heterostructures with a straight InAs segment have been successfully fabricated on Si (111) substrate by using AlGaAs/GaAs buffer layers coupled with a composition grading InGaAs segment. Both the GaAs and InAs segments are not limited by the misfit strain induced critical diameter. The low growth rate of InAs NWs is attributed to the AlGaAs/GaAs buffer layers which dramatically decrease the adatom diffusion contribution to the InAs NW growth. The crystal structure of InAs NW can be tuned from zincblende to wurtzite by controlling its diameter as well as the length of GaAs NWs. This work helps to open up a road for the integration of high-quality III-V NW heterostructures with Si.     

Heteroepitaxial growth of thin InAs layers on GaAs(1 0 0) misoriented substrates: A structural and morphological comparison

Thin InAs epilayers were grown on GaAs(1 0 0) substrates exactly oriented and misoriented toward [1 1 1]A direction by atmospheric pressure metalorganic vapor phase epitaxy. InAs growth was monitored by in situ spectral reflectivity. Structural quality of InAs layers were studied by using high-resolution X-ray diffraction. No crystallographic tilting of the layers with respect to any kind of these substrates was found for all thicknesses. This result is discussed in terms of In-rich growth environment. InAs layers grown on 2° misoriented substrate provide an improved crystalline quality. Surface roughness of InAs layers depend on layer thickness and substrate misorientation.     

Stress evolution during growth of bilayer self-assembled InAs/GaAs quantum dots

We investigated the stress evolution during molecular-beam epitaxy of bilayer InAs/GaAs(001) quantum dot (QD) structures in real time and with sub-monolayer precision using an in-situ cantilever beam setup. During growth of the InAs at 470 °C a stress of 5.1 GPa develops in the wetting layer, in good agreement with the theoretical misfit stress. At a critical thickness of 1.5 monolayers the strain is relieved by the QD formation. In the case of InAs/GaAs bilayer structures, the second InAs layer grows identical to the first for GaAs spacer thicknesses exceeding ∼13 nm. For thinner spacers the critical thickness for the 2D/3D transition in the second layer decreases. The stress of the second InAs layer does not reach the value of the first, indicating that InAs QDs grow on partially strained areas due to the strain field of the previous InAs layer. PACS 68.35.-p; 68.35.Gy; 68.65.Hb; 81.07.Ta; 81.10.Aj     

InAs/GaAs和InAs/InxGa1-xAs/GaAs纳米线异质结构的生长研究

利用金辅助金属有机化学气相沉淀法(MOCVD)在GaAs(111)B衬底上分别制备了InAs/GaAs和InAs/In _{x Ga1-xAs/GaAs(0≤x≤1)纳米线异质结构.实验结果显示,直接生长在GaAs纳米线上的InAs纳米线生长方向杂乱或者沿着GaAs纳米线侧壁向衬底方向生长,生长的含有In x Ga1-xAs组分渐变缓冲段的InAs/In x Ga1-x关键词： 纳米线异质结构 xGa1-xAs')" href="#">InxGa1-xAs 组分渐变缓冲层 金属有机化学气相沉淀法}     

Magnetotransport and magnetic properties of InAs/Mn digital alloys

We have investigated the magnetic and magneto-transport properties of a systematic sequence of five InAs/Mn digital alloys grown by a combination of molecular beam epitaxy and atomic layer epitaxy. The samples consist of 30 periods of Mn fractional monolayers (ML) (0.17–0.5 ML) separated by 14 ML thick InAs spacer layers in a superlattice configuration. Four samples show n-type electrical conduction while the fifth (0.25 ML Mn) is p-type. Squid magnetization measurements performed on these samples show remnant magnetization above room temperature, which is apparently related to a second phase.     

Etching and oxidation of InAs in planar inductively coupled plasma

The surface of InAs (1 1 1)A was investigated under plasmachemical etching in the gas mixture CH₄/H₂/Ar. Etching was performed using the RF (13.56 MHz) and ICP plasma with the power 30–150 and 50–300 W, respectively; gas pressure in the reactor was 3–10 mTorr. It was demonstrated that the composition of the subsurface layer less than 5 nm thick changes during plasmachemical etching.A method of deep etching of InAs involving ICP plasma and hydrocarbon based chemistry providing the conservation of the surface relief is proposed. Optimal conditions and the composition of the gas phase for plasmachemical etching ensuring acceptable etch rates were selected.     

Terahertz Spectroscopy of Two-Dimensional Semimetal in Three-Layer InAs/GaSb/InAs Quantum Well

JETP Letters - The features of terahertz photoluminescence and magnetoabsorption in magnetic fields up to 16 T in threelayer InAs/GaSb/InAs quantum wells with a band structure corresponding to a...     

Comparison of single-layer and bilayer InAs/GaAs quantum dots with a higher InAs coverage

Epitaxially grown self-assembled InAs quantum dots (QDs) have found applications in optoelectronics. Efforts are being made to obtain efficient quantum-dot lasers operating at longer telecommunication wavelengths, specifically 1.3 μm and 1.55 μm. This requires narrow emission linewidth from the quantum dots at these wavelengths. In InAs/GaAs single layer quantum dot (SQD) structure, higher InAs monolayer coverage for the QDs gives rise to larger dots emitting at longer wavelengths but results in inhomogeneous dot-size distribution. The bilayer quantum dot (BQD) can be used as an alternative to SQDs, which can emit at longer wavelengths (1.229 μm at 8 K) with significantly narrow linewidth (∼16.7 meV). Here, we compare the properties of single layer and bilayer quantum dots grown with higher InAs monolayer coverage. In the BQD structure, only the top QD layer is covered with increased (3.2 ML) InAs monolayer coverage. The emission line width of our BQD sample is found to be insensitive towards post growth treatments.