共查询到16条相似文献,搜索用时 62 毫秒
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太阳上层大气,即日冕、过渡区和色球,是由炽热的高度动态的磁化等离子体构成,其中高度电离的离子发射出丰富的极紫外谱线。空间太阳极紫外光谱成像观测对于捕获太阳上层大气中爆发活动的动态物理演化过程,以及实现对大气等离子体特征参数的精确测量具有重要的意义。然而现有的极紫外光谱成像仪器只能针对太阳上层大气的一个或两个目标区域进行成像观测,缺乏采用单一仪器对整个太阳上层大气区域在大空间和宽波段尺度范围内的光谱进行诊断的能力,严重制约了人们对太阳爆发活动中的能量及物质输运过程的理解。为了利用单个仪器实现对日冕、过渡区和色球的高分辨率同时诊断观测,本文提出并设计了一款同时工作在17~21 nm、70~80 nm和95~105 nm三个波段的太阳极紫外成像光谱仪,该仪器基于非罗兰圆结构下的椭球面变线距(EVLS)光栅像差校正理论,采用狭缝扫描式成像光谱结构,实现了具有大离轴狭缝视场的高空间、高光谱分辨的消像散光谱成像。基于蒙特卡罗统计模拟方法对太阳极紫外三波段成像光谱仪的最优模型开展光线追迹仿真实验,仿真结果表明,所设计的成像光谱仪取得了良好的光栅像差校正效果,系统空间分辨率优于0.6″,光谱分辨率在1... 相似文献
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极紫外望远镜各通道夹角的测量 总被引:1,自引:1,他引:0
极紫外望远镜是由四个单通道的望远镜捆绑在一起,以便同时对太阳的相同部分观测,由于受地面装调以及发射过程中的影响,无法保证四个通道光轴严格平行,必然带来观测位置上的误差。只要测出各通道之间的光轴夹角,便可在像面上采取适当的处理方法,以便减小这种误差,但这一夹角的测量精度必须控制在0.1″内。为达到如此高的精度,采用了太阳局部边缘探测的方法,很好地解决了这一问题。 相似文献
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太阳极紫外成像光谱仪光学系统设计 总被引:1,自引:0,他引:1
在极紫外波段对太阳进行超光谱成像观测是研究太阳上层大气,日冕中等离子物理特性的重要手段。依据太阳极紫外成像光谱仪的应用,结合国内外极紫外成像光谱仪发展现状,制定了太阳极紫外成像光谱仪的性能指标。通过比较各种光学结构的优缺点,选择望远镜与光谱仪组合的结构。讨论并选择了可用的基本元器件,望远系统采用离轴抛物面反射镜,分光器件为高密度超环面等间距光栅。设计出符合指标的光学系统。最后给出了太阳极紫外成像光谱仪的设计过程、详细参数与结果。光学系统的工作波段为17.0~21.0nm,视场是1 228″×1 024″,空间分辨率达到0.8arcsec.pixel-1,光谱分辨率约为0.001 98nm.pixel-1,系统总长度约为2.8m。 相似文献
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针对太阳极紫外成像光谱仪的应用目的与工作环境,设计了一种太阳极紫外成像光谱仪的光学系统.该系统由望远系统、狭缝、光栅与探测器组成.望远系统采用离轴WolterⅡ型结构,入射光掠入射进入系统,具有光谱范围宽、稳定性高、克服恶劣空间环境能力强等优点.扫描镜采用平面反射镜,成像质量不随扫描角的改变而改变.分光光栅采用超环面3 600lines/mm变间距光栅,与超环面等间距光栅相比,具有成像质量高、光谱分辨率高、缩短系统长度的优势.工作波段为17.0~21.0nm,可满足探索温度在5.8≤log T≤6.3区间的宁静日冕的需要.视场为1 228″×2 400″,空间分辨率达到0.8arc second/pixel,光谱分辨率约为0.001 98nm/pixel,总长度不超过2.5m.计算了望远系统的理论有效面积,给出了望远系统的成像质量与实际的视场.系统整体的成像质量、光栅的谱线弯曲与谱带弯曲,均满足实际应用要求. 相似文献
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天基光电望远镜空间多目标成像模拟技术研究 总被引:6,自引:0,他引:6
提出了一种天基光电望远镜对空间多目标成像的模拟方法。首先由卫星轨道参数向量和三维矩阵变换得到卫星在地心赤道坐标系中的坐标矩阵,然后再通过平移、旋转和比例等变换得到卫星及恒星在望远镜中的坐标矩阵,最后即可得到总模拟图。设计了一种应用在天基光电望远镜上的空间多目标成像模拟数据库,并为数据库提供了几种基本的维护管理功能。给出了该数据库的基本设计方法和目标数据实例,提供了1000余颗卫星的相关轨道参数。计算机模拟了天基光电望远镜对空间多目标的成像。仿真结果表明,该方法可有效地模拟天基光电望远镜对空间多目标的成像。 相似文献
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LIU Zhen YANG Lin CHEN Bo CHEN Bin & CAO JianLin State Key Laboratory of Applied Optics Changchun Institute of Optics Fine Mechanics Physics Chinese Academy of Sciences Changchun China Graduate University of Chinese Academy of Sciences Beijing 《中国科学:物理学 力学 天文学(英文版)》2011,(3)
This paper first reviews an EUV normal incidence solar telescope that we have developed in our lab. The telescope is composed of four EUV telescopes and the operation wavelengths are 13.0 nm, 17.1 nm, 19.5 nm, and 30.4 nm. These four wavelengths, fundamental to the research of the solar activity and the atmosphere dynamics, are always chosen by the EUV normal incidence solar telescope. In the EUV region, almost all materials have strong absorption, so optics used in this region must be coated by the multila... 相似文献
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P. W. Wachulak M. C. Marconi A. Isoyan L. Urbanski A. Bartnik H. Fiedorowicz R. A. Bartels 《Opto-Electronics Review》2012,20(1):1-14
Imaging systems with nanometer resolution are instrumental to the development of the fast evolving field of nanoscience and
nanotechnology. Decreasing the wavelength of illumination is a direct way to improve the spatial resolution in photon-based
imaging systems and motivated a strong interest in short wavelength imaging techniques in the extreme ultraviolet (EUV) region.
In this review paper, various EUV imaging techniques, such as 2D and 3D holography, EUV microscopy using Fresnel zone plates,
EUV reconstruction of computer generated hologram (CGH) and generalized Talbot self-imaging will be presented utilizing both
coherent and incoherent compact laboratory EUV sources. Some of the results lead to the imaging with spatial resolution reaching
50 nm in a very short exposure time. These techniques can be used in a variety of applications from actinic mask inspection
in the EUV lithography, biological imaging to mask-less lithographic processes in nanofabrication. 相似文献
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文章以较为轻松的笔调概述了光学天文望远镜400年的发展史.全文分7个部分,内容包括望远镜的诞生、像差和消色差透镜、传统的反射望远镜和折射望远镜、施密特望远镜的作用、当代巨型望远镜的出现、空间望远镜,以及对月基望远镜的憧憬. 相似文献
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提出傅里叶望远镜外场成像实验的光学系统组成,详细介绍光学系统的装调和检测过程,并对模拟目标进行成像实验。采用3束不同频率的激光照射模拟目标并在目标表面形成干涉条纹,利用拼接主镜接收散射回波能量,再经次镜汇聚,最后进入压缩透镜组被光电倍增管探测。实验结果表明:主镜支撑结构稳定性优于0.075 mrad,子镜指向调整精度优于0.05 mrad,对安装的61块子镜进行共焦试验,光斑质心重合精度小于20 mm。最后,对3 mm的模拟目标进行外场成像实验,结果表明:室外环境下傅里叶望远镜的成像效果与实验室内成像效果及计算机仿真结果吻合较好,为后续反射模拟目标的成像提供了参考。 相似文献
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One of the most promising methods for next generation device manufacturing is extreme ultraviolet (EUV) lithography, which uses 13.5 nm wavelength radiation generated from freestanding plasma-based sources. The short wavelength of the incident illumination allows for a considerable decrease in printed feature size, but also creates a range of technological challenges not present for traditional optical lithography. Contamination and oxidation form on multilayer reflecting optics surfaces that not only reduce system throughput because of the associated reduction in EUV reflectivity, but also introduce wavefront aberrations that compromise the ability to print uniform features. Capping layers of ruthenium, films ∼2 nm thick, are found to extend the lifetime of Mo/Si multilayer mirrors used in EUV lithography applications. However, reflectivities of even the Ru-coated mirrors degrade in time during exposure to EUV radiation. Ruthenium surfaces are chemically reactive and are very effective as heterogeneous catalysts. In the present paper we summarize the thermal and radiation-induced surface chemistry of bare Ru exposed to gases; the emphasis is on H2O vapor, a dominant background gas in vacuum processing chambers. Our goal is to provide insights into the fundamental physical processes that affect the reflectivity of Ru-coated Mo/Si multilayer mirrors exposed to EUV radiation. Our ultimate goal is to identify and recommend practices or antidotes that may extend mirror lifetimes. 相似文献