2.45GHz ECR 强流等离子体源核心部件设计与实验研究

电子回旋共振(Electron Cyclotron Resonance,ECR)等离子体源能产生高电荷态离子、高流强的单电荷态离子,提供稳定的束流和良好的重复性.核心部件的设计对ECR等离子体源是至关重要的,磁场对等离子体的生成和分布有直接影响,良好的磁场可以提高等离子体的性能和效率.采用有限元分析方法对ECR等离子体源磁场进行分析与设计,得到了满足设计需求与目标的磁场位形,通过高斯计对设计的永磁环轴向磁场精确测量,发现磁场仿真结果与实验结果吻合比较好,只是轴向磁场最大值及对应位置上有点偏差.通过集成实验,研究核心部件对离子源引出束流强度的影响,引出束流稳定且强度达到7 m A.     

2.45 GHz ECR离子源的微波阻抗匹配

ECR离子源的等离子体阻抗对其微波传输与阻抗匹配设计至关重要。在中国科学院近代物理研究所现有的2.45 GHz ECR 质子源上,对等离子体阻抗进行了测量。首先用水吸收负载代替等离子体负载测量得到了所用微波窗阻抗,然后根据质子源测量数据,推算得到了等离子体阻抗。实验结果表明,脊波导输出端阻抗与后续负载不完全匹配,等离子体阻抗随微波功率变化呈非线性。这些结果为ECR离子源过渡匹配和微波窗的设计提供了参考依据。Plasma impedance of an ECR ion source is important for microwave transmission and impedance matching design. Plasma impedance was measured indirectly with the 2.45 GHz ECR proton source at the Institute of Modern Physics, Chinese Academy of Sciences. In the test, we got microwave window mpedance by using water absorption load instead of plasma load, and the source plasma impedance was derived from the test data with the 2.45 GHz ECR proton source and microwave window impedance. The experimental results show that ridge waveguide output impedance and the subsequent load does not exactly match, plasma impedance variation is nonlinear with microwave power. The achievedresult is useful in the design of ridged waveguide and microwave window.     

ECR等离子体的磁电加热研究

在ECR等离子体装置上进行了磁电加热研究,利用离子灵敏探针(ISP)测量了磁电加热前后离子温度的变化,研究了电极环偏压、磁场强度、气压等参数对磁电加热过程以及加热效率的影响.结果表明:等离子体的整体加热是通过离子在电极环鞘层中的磁电加热及被加热的离子沿径向的输运来完成的.轴心处离子温度随电极环偏压的升高呈非线性增加.磁电加热效率随偏压的增大而增大,在电极环偏压为1000 V时,磁电加热效率为2%-2.5%,ECR等离子体中的离子温度能够提高20 eV以上.磁场强度在磁电加热过程中对离子的限制和加热起到重要作用,当磁场强度在6.3×10^-2-8.7×10^-2T之间变化时,磁电加热的效率随磁场强度的增大而增大.气压在0.02-0.8 Pa范围内,磁电加热的效率随气压的减小而增大. 关键词： ECR等离子体 磁电加热 离子温度     

6.4 GHz ECR ion source at VECC

The 6.4 GHz ECR ion source that was indigenously developed a few years ago has been operating continuously for injecting oxygen and neon beams to the cyclotron since 1997. VEC-ECR is a single stage high magnetic field ion source provided with a negatively biased electron repeller placed on the axis, near the injection mirror point. The supply of cold electrons and use of low mass mixing gas improve the stability of ECR plasma. Very recently, the effect of aluminum oxide coating on the copper plasma chamber wall has been studied. The plasma chamber wall was coated with aluminum by vacuum evaporation method and then exposed to oxygen gas to form aluminum oxide. It was noticed that the process substantially shifts the charge state distribution to the higher charge state with an enhancement of ion current by an order of magnitude. With the aluminized plasma chamber, the VEC-ECR can now produce 12 μA of O⁷⁺, 6.5 μA of Ar¹²⁺, 1.5 μA of Kr²⁰⁺ and 1.0 μA of Xe³¹⁺.     

ORNL-HRIBF 6GHzECR离子源的最新结果

Experimental studies were conducted to characterize and improve the performance of the flat-B ECR ion source.The emittance of the source was investigated for the first time.The output beam currents of high-charge-states of Ar(q>8)were nearly doubled by increasing the plasma electrode aperture from 4mm to 6mm in diameter.To investigate possible enhancements with broadband microwave radiation,a"white"Gaussian noise generator was employed with a TWT amplifier to generate microwave radiation with a bandwidth of～200MHz.The performance of the flat-B ECR ion source was found to be much better with narrow bandwidth radiation when the source was operated in the flat-B region.However,the ion beam intensities and charge state distributions were improved with the broadband radiation when the source was tuned off the flat-B region.     

Experimental study of the dependence of beam current on injection magnetic field in 6.4 GHz ECR ion source

The ion current from an electron cyclotron resonance (ECR) heavy ion source depends on the confining axial and radial magnetic fields. Some efforts were made by earlier workers to investigate magnetic field scaling on the performance of the ECR source. In order to study the dependence of the ion current on the injection magnetic field in the 6.4 GHz ECR source, we have measured the current by varying the peak injection field and have inferred that the variation of the current is exponential up to our maximum design injection field of 7.5 kG. An attempt has been made to understand this exponential nature on the basis of ion confinement time.     

一台14.5GHz新型高磁场高电荷态ECR离子源

自行研制成功一台14.5GHz新型高磁场高电荷态电子回旋共振(ECR)离子源.描述了该离子源结构特点、参数优化及其磁场分布,并给出了调试测量结果.该离子源轴向磁镜场在轴线上的最高磁场可达1.5T,六极永磁体在弧腔内表面磁场可达1.0T.经初步调试,可得到0⁷+140eμA,Ar¹¹+185eμA,Xe²⁶⁺50eμA.所得结果与1998年国际上最好的ECR离子源进行了比较.     

Texas的14.5GHzECR离子源

A new plasma chamber for the Texas A&M 14.5GHz ECR ion source ECR2 has been recently installed and the beam analysis line has been recently upgraded with the replacement of the solenoid with a shorter Glaser lens.The source is now used along with the 6.4GHz ECRl for injection of beams into the K500 cyclotron.The new plasma chamber incorporates water-carrying copper tubes,each with an inner diameter of 0.7mm and all outer diameter of 1.8mm.interposed between the NbFeB permanent magnets and the aluminum plasma-chamber wall.The design allows for a much higher water flow and thus better cooling than the previous design,which used a thin,water-cooled liner.The source commissioning and operation is described.     

ECR离子源金属离子的产生

讨论了ECR离子源金属供料方法,在145GHzECR离子源上应用炉子加热和MIVOC法获得了⁴⁰Ca¹¹⁺140eμA和⁵⁶Fe¹⁰⁺65eμA,并对实验过程和结果作了分析.     

Argonne国家实验室ECR离子源在固体材料离子束流产生方面的研究进展

Development work with solid materials at the Argonne National Laboratory ECR ion sources has been focused on two areas-introduction of materials with low vapour pressures,and increasing the beam intensities of heavy beams(i.e.-lead and uranium).An induction oven,with a demonstrated operating temperature extending to 2000℃,has been utilized to produce a Ti-50 beam with an intensity of 5.5eμA (12 ).In addition,a refinement of the sputter technique has been employed which has resulted in a 42% improvement in lead beam intensities.Details of the induction oven as well as the refined sputter technique will be presented.     

ECR ion source based low energy ion beam facility

Mass analyzed highly charged ion beams of energy ranging from a few keV to a few MeV plays an important role in various aspects of research in modern physics. In this paper a unique low energy ion beam facility (LEIBF) set up at Nuclear Science Centre (NSC) for providing low and medium energy multiply charged ion beams ranging from a few keV to a few MeV for research in materials sciences, atomic and molecular physics is described. One of the important features of this facility is the availability of relatively large currents of multiply charged positive ions from an electron cyclotron resonance (ECR) source placed entirely on a high voltage platform. All the electronic and vacuum systems related to the ECR source including 10 GHz ultra high frequency (UHF) transmitter, high voltage power supplies for extractor and Einzel lens are placed on a high voltage platform. All the equipments are controlled using a personal computer at ground potential through optical fibers for high voltage isolation. Some of the experimental facilities available are also described.