Low-power bacteriorhodopsin-silicon n-channel metal-oxide field-effect transistor photoreceiver

A bacteriorhodopsin (bR)-silicon n-channel metal-oxide field-effect transistor (NMOSFET) monolithically integrated photoreceiver is demonstrated. The bR film is selectively formed on an external gate electrode of the transistor by electrophoretic deposition. A modified biasing circuit is incorporated, which helps to match the resistance of the bR film to the input impedance of the NMOSFET and to shift the operating point of the transistor to coincide with the maximum gain. The photoreceiver exhibits a responsivity of 4.7 mA/W.     

Monolithically integrated bacteriorhodopsin-GaAs field-effect transistor photoreceiver

We have applied the large photovoltage developed across a layer of selectively deposited bacteriorhodopsin to the gate terminal of a monolithically integrated GaAs-based modulation-doped field-effect transistor, which delivers an amplified photoinduced current signal. The integrated biophotoreceiver device exhibits a responsivity of 3.8 A/W. The optoelectronic integrated circuit is achieved by molecular-beam epitaxy of the field-effect transistor's heterostructure, photolithography, and selective-area bacteriorhodopsin electrodeposition.     

Influence of the channel–gate barrier height on the detection properties of a field-effect transistor in the microwave and terahertz ranges

The detection properties of a field-effect transistor with a low Schottky barrier gate in the microwave and terahertz ranges has been studied theoretically. Different detector circuits have been considered. The voltage and current distributions along the channel, the input impedance of the transistor, sensitivity, and noise equivalent power have been found. The influence of the Schottky barrier height on the above characteristics has been analyzed.     

Photosensitive field-effect transistor based on a composite film of polyvinylcarbazole with nickel nanoparticles

The electronic and optoelectronic properties of field-effect transistor structures with an active layer based on composite films of a semiconducting polymer, namely, polyvinylcarbazole (PVC), with nickel nanoparticles have been investigated. It has been shown that these structures at low nickel concentrations (5–10 wt %) possess current-voltage characteristics that indicate an ambipolar transport. For the field-effect transistor structures based on PVC: Ni (Ni ～ 5 wt %) films, the mobilities of electrons and holes are found to be ～1.3 and ～1.9 cm²/V s, respectively. It has been established that the photosensitivity observed in these structures is associated with the specific features of transport in the film of the polymer with nickel nanoparticles. The mechanism of this transport is determined by the modulation of electrical conductivity of the working channel of the field-effect transistor by applying a combination of incident light and gate voltages.     

Suppression of the tunneling effect by shallow junctions in field-effect transistor

We study the quantum wave transport in nanoscale field-effect transistors. It has been shown that the tunneling effect between the source and the drain in an ultra-short channel transistor significantly degrades the control of the drain current by the gate. However, the tunneling effect is suppressed by reducing the depth of the source and drain junctions which is designated to suppress the short-channel effects concerning the cut-off characteristics of the field-effect transistor. The reduced junction depth confines the carriers in the direction (y -direction) perpendicular to the transport direction (x -direction). The matching of y -direction wavefunctions at regional boundaries suppresses the tunneling effect and normal FET current–voltage characteristics has been obtained, which explains theoretically the successful fabrication of nanoscale field-effect transistors.     

Electrical and optical properties of light-emitting field-effect transistors based on MEH-PPV polymer composite films with ZnO nanoparticles

The optical and electrical properties of light-emitting field-effect transistor structures with an active layer based on nanocomposite films containing zinc oxide (ZnO) nanoparticles dispersed in the matrix of the soluble conjugated polymer MEH-PPV have been investigated. It has been found that the current-voltage characteristics of the field-effect transistor based on MEH-PPV: ZnO films with a composite component ratio of 2: 1 have an ambipolar character, and the mobilities of electrons and holes in these structures at a temperature of 300 K reach high values up to ～1.2 and ～1.4 cm²/V s, respectively, which are close to the mobilities in fieldeffect transistors based on ZnO films. It has been shown that the ambipolar field-effect transistor based on MEH-PPV: ZnO films emits light at both positive and negative gate bias voltages. The mechanisms of injection, charge carrier transport, and radiative recombination in the studied structures have been discussed.     

Resonant tunneling field-effect transistors

We report an experimental project to incorporate double-barrier tunnel structures into three-terminal devices. These devices have the negative-differential-resistance (NDR) features of the double barrier, and the added flexibility of a third controlling electrode. One way to make such a device involves the series combination of a double-barrier tunnel structure with a field-effect transistor. We have realized this concept in two types of devices, using samples grown by metalorganic chemical vapor deposition. The devices consist of a GaAsAl_xGa_1−xAs double-barrier tunneling heterostructure, the current through which is controlled by either an integrated vertical field-effect transistor or a planar metal-semiconductor field effect transistor. The voltage location and peak-to-valley current ratio of the NDR present in the source-drain circuit can be modulated with gate voltage. Experimental results for four samples are presented.     

Memory effects in field-effect transistor structures based on composite films of polyepoxypropylcarbazole with gold nanoparticles

The memory effects in field-effect transistor structures with an active layer based on composite films of a semiconductor polymer, i.e., the carbazole derivative and gold nanoparticles, manifesting themselves in the hysteresis of the transient characteristics of the transistor have been studied. It has been shown that the observed effects are associated with the features of transport in the polymer-gold nanoparticle structure, where the gold particles serve as a medium of charge carrier collection (accumulation). The data writeerase mechanism based on conductivity modulation of the working channel of the field-effect transistor by the gate voltage have been discussed.     

Modulation bandwidth and noise limit of photoconductive gates

The modulation bandwidth and noise limit of a photoconductive sampling gate are studied by reducing the parasitic capacitance and leakage current of the sampling circuit using an integrated junction field-effect transistor (JFET) source follower. The modulation bandwidth of the photoconductive sampling gate is limited by the external parasitic capacitance, and its efficiency is found to saturate at a laser gating power of about 1 mW. It is determined that the noise of the photoconductive sampling gate is dominated by the photovoltaic current due to the gating laser amplitude fluctuation. A minimum noise level of 4 nV Hz^–1/2 has been measured, and an enhancement in signal-to-noise ratio by a factor of >45 has been achieved after the integration of the source follower with the photoconductive sampling gate. The JFET source follower serves to increase the modulation bandwidth of the photoconductive sampling gate by about 15 times and buffer the charge of the measured signal using its extremely high gate input impedance. The performance of the photoconductive sampling gate in regard to invasiveness and gating efficiency has been optimized, while a picosecond temporal resolution has been maintained and the signal-to-noise performance has been enhanced using a gating laser power as low as 10 W.     

基于石墨烯-钙钛矿量子点场效应晶体管的光电探测器

以等离子增强化学气相沉积法制备的石墨烯作为导电沟道材料,将其与无机CsPbI_3钙钛矿量子点结合,设计并制备了石墨烯-钙钛矿量子点场效应晶体管光电探测器.研究和分析了石墨烯作为场效应晶体管的电学特性及其与钙钛矿量子点结合作为光电探测器的光电特性.结果表明,石墨烯在场效应晶体管中表现出良好的电学性质,其与钙钛矿量子点的结合对波长为400 nm的光辐射具有明显的光响应,在光强为12μW时器件光生电流最大为64μA,响应率达6.4 A·W~(-1),对应的光电导增益和探测率分别为3.7×10~4,6×10~7Jones(1 Jones=1 cm·Hz~(1/2)·W~(-1)).     

Double-gate-all-around tunnel field-effect transistor

In this work, a double-gate-all-around tunneling field-effect transistor is proposed. The performance of the novel device is studied by numerical simulation. The results show that with a thinner body and an additional core gate, the novel device achieves a steeper subthreshold slope, less susceptibility to the short channel effect, higher on-state current, and larger on/off current ratio than the traditional gate-all-around tunneling field-effect transistor. The excellent performance makes the proposed structure more attractive to further dimension scaling.     

The dual role of multiple-transistor charge sharing collection in single-event transients

As technologies scale down in size, multiple-transistors being affected by a single ion has become a universal phenomenon, and some new effects are present in single event transients (SETs) due to the charge sharing collection of the adjacent multiple-transistors. In this paper, not only the off-state p-channel metal-oxide semiconductor field-effect transistor (PMOS FET), but also the on-state PMOS is struck by a heavy-ion in the two-transistor inverter chain, due to the charge sharing collection and the electrical interaction. The SET induced by striking the off-state PMOS is efficiently mitigated by the pulse quenching effect, but the SET induced by striking the on-state PMOS becomes dominant. It is indicated in this study that in the advanced technologies, the SET will no longer just be induced by an ion striking the off-state transistor, and the SET sensitive region will no longer just surround the off-state transistor either, as it is in the older technologies. We also discuss this issue in a three-transistor inverter in depth, and the study illustrates that the three-transistor inverter is still a better replacement for spaceborne integrated circuit design in advanced technologies.     

Charge carrier accumulation and relaxation effects in the active region of polymer and composite (polymer-gold nanoparticles) field-effect transistor structures

The charge carrier accumulation and relaxation effects in the active region of polymer field-effect transistor structures based on the semiconducting polymer poly(9-epoxypropylcarbazole) have been studied by means of Kelvin probe microscopy. It has been shown that the introduction of gold nanoparticles into the polymer noticeably accelerates the processes considered. The characteristic times of charge accumulation and dissipation upon the application and removal of the potential at the transistor gate in this case are of a few minutes.     

The effect of substrate doping on the flatband and threshold voltages of a strained-Si pMOSFET

The effect of substrate doping on the flatband and threshold voltages of a strained-Si/SiGe p metal-oxide semiconductor field-effect transistor(pMOSFET) has been studied.By physically deriving the models of the flatband and threshold voltages,which have been validated by numerical simulation and experimental data,the shift in the plateau from the inversion region to the accumulation region as the substrate doping increases has been explained.The proposed model can provide a valuable reference to the designers of strained-Si devices and has been implemented in software for extracting the parameters of a strained-Si MOSFET.     

Memory element based on ferroelectric field-effect transistor with use of ZnO:Li/LaB6 heterostructures

Ferroelectric field-effect transistors using ZnO:Li films simultaneously as a transistor channel and as a ferroelectric active element have been prepared and studied. We show an opportunity of using the ferroelectric field-effect transistor based on ZnO:Li films in ZnO:Li/LaB₆ heterostructure as a bistable memory element for information recording. The proposed structure of a ferroelectric memory cell does not possess the fatigue under repeated readout of single recorded information that will allow increasing the resource of storage devices essentially.     

Low-voltage antimony-doped SnO₂ nanowire transparent transistors gated by microporous SiO₂-based proton conductors

A battery drivable low-voltage transparent lightly antimony(Sb)-doped SnO 2 nanowire electric-double-layer(EDL) field-effect transistor(FET) is fabricated on an ITO glass substrate at room temperature.An ultralow operation voltage of 1 V is obtained on account of an untralarge specific gate capacitance(～2.14 μF/cm 2) directly bound up with mobile ions-induced EDL(sandwiched between the top and bottom electrodes) effect.The transparent FET shows excellent electric characteristics with a field-effect mobility of 54.43 cm 2 /V · s,current on/off ration of 2 × 10 4,and subthreshold gate voltage swing(S = dV gs /d(log I ds)) of 140 mV/decade.The threshold voltage V th(0.1 V) is estimated which indicates that the SnO 2 namowire transistor operates in an n-type enhanced mode.Such a low-voltage transparent nanowire transistor gated by a microporous SiO 2-based solid electrolyte is very promising for battery-powered portable nanoscale sensors.     

A novel photoelectric MOSFET with AC output under constant illumination

Traditional photoelectric devices can generate only DC electric signals under constant illumination. In this work, a novel photoelectric metal-oxide-semiconductor field-effect transistor (MOSFET) with AC output under constant illumination is introduced, in which the channel current is modulated by the gate voltage. This virtue can greatly simplify the signal processing circuitry. This photoelectric MOSFET has been successfully fabricated using a standard 0.8 micron MOSFET process.     

$lt;i$gt;γ$lt;/i$gt;射线总剂量辐照效应对应变Sip型金属氧化物半导体场效应晶体管阈值电压与跨导的影响研究

分析了双轴应变Si p型金属氧化物半导体场效应晶体管(PMOSFET)在γ射线辐照下载流子的微观输运过程, 揭示了γ射线的作用机理及器件电学特性随辐照总剂量的演化规律, 建立了总剂量辐照条件下的双轴应变Si PMOSFET 阈值电压与跨导等电学特性模型, 并对其进行了模拟仿真. 由仿真结果可知, 阈值电压的绝对值会随着辐照总剂量的积累而增加, 辐照总剂量较低时阈值电压的变化与总剂量基本呈线性关系, 高剂量时趋于饱和; 辐照产生的陷阱电荷增加了沟道区载流子之间的碰撞概率, 导致了沟道载流子迁移率的退化以及跨导的降低. 在此基础上, 进行实验验证, 测试结果表明实验数据与仿真结果基本相符, 为双轴应变Si PMOSFET辐照可靠性的研究和应变集成电路的应用与推广提供了理论依据和实践基础. 关键词： 应变Sip型金属氧化物半导体场效应晶体管 总剂量辐照 阈值电压 跨导     

Molecular gated transistors: Role of self-assembled monolayers

In order to understand the biosensing mechanism of field-effect based biosensors and optimize their performance, the effect of each of its molecular building block must be understood. In this work the gating effect of self-assembled linker molecules on field-effect transistor was studied in detail. We have combined Kelvin probe force microscopy, current-voltage measurements, capacitance-voltage measurements, equivalent circuit modeling and device simulations in order to trace the mechanism of silicon-on-insulator biological field-effect transistors. The measurements were conducted on the widely used linker molecules (3-aminopropyl)-trimethoxysilane (APTMS) and 11-aminoundecyl-triethoxysilane (AUTES), which were self-assembled on ozone activated silicon oxide surface covering the transistor channel. In a dry environment, the work function of the modified silicon oxide decreased by more than 1.5 eV, and the transistor threshold voltage increased by about 30 V following the self-assembly. A detailed analysis indicates that these changes are due to negative induced charges on the top dielectric layer, and an effective dipole due to the polar monolayer. However, the self-assembly did not change the silicon flat-band voltage when in contact with an electrolyte. This is attributed to electrostatic screening by the electrolyte.     

An individual particle approach to noise in pseudomorphic heterojunction field effect transistors

The fluctuating steady state current through a pseudomorphic heterojunction field-effect transistor at a typical working point has been calculated by means of the Monte Carlo particle model. This method was chosen because the noise it yields reflects the physical processes in the transistor itself. The pattern of the fluctuating current inside the transistor was mapped at regular intervals of time. The temporal fluctuations in the drain current from the mean were correlated to these maps and it was found that the observed deviations from its mean originate between the gate and the drain. (c) 2001 American Institute of Physics.