Angle-resolved polarization-dependent photoemission spectra of benzenethiol adsorbed on Cu(110)

Angle-resolved photoelectron spectra of benzenethiol chemisorbed on the Cu(110) face have been obtained with p- and s-polarized HeI (21.2 eV) radiation at room temperature. Comparison with the gas-phase spectrum and molecular-orbital correlation diagrams indicates that the benzenethiol bonds to the copper by way of the sulfur, rather than phenyl ring π-orbitals, and that the adsorption is dissociative, yielding a phenyl sulfide (mercaptide) surface species. An analysis of the polarization/angular dependence of the band intensities and comparison to symmetry-allowed transitions confirms that the molecule has the plane of the phenyl ring perpendicular to the surface. The assumed C_2v symmetry together with packing considerations further allows the orientation of the molecule and nature of the bonding to be suggested.     

Photoelectron spectroscopy study of oxygen adsorption on Mo2C(0 0 0 1)

Oxygen adsorption on the α-Mo₂C(0 0 0 1) surface has been investigated with X-ray photoelectron spectroscopy and valence photoelectron spectroscopy utilizing synchrotron radiation. It is found that oxygen adsorbs dissociatively at room temperature, and the adsorbed oxygen atoms interact with both Mo and C atoms to form an oxycarbide layer. As the O-adsorbed surface is heated at ≧800 K, the C-O bonds are broken and the adsorbed oxygen atoms are bound only to Mo atoms. Valence PES study shows that the oxygen adsorption induces a peculiar state around the Fermi level, which enhances the emission intensity at the Fermi edge in PES spectra.     

Imaging the phenol molecule adsorbed on TiO2(110) by scanning tunneling microscopy

The image of a phenol molecule adsorbed on a TiO₂(110) single crystal was obtained, for the first time, by using the STM. TiO₂(110) has a tunneling active free region from + 1.35 eV below the Fermi level to −0.25 eV above the Fermi level. This region was found after measuring the surface density of states by using tunneling spectroscopy. The phenol molecule was fixed on TiO₂ utilizing the amphoteric nature of the TiO₂ surface. The image of the phenol molecule was measured at a dp bias of + 443 mV, which almost matches the energy of the OH and C-H stretching bond of the phenol molecule, in the free of energy levels region of the TiO₂(110) substrate. The electron density of phenol ring is apparent in the STM picture.     

XPS,UPS and thermal desorption studies of alcohol adsorption on Cu(110): I. Methanol

The adsorption of methanol on clean and oxygen dosed Cu(110) surfaces has been studied using temperature programmed reaction spectroscopy (TPRS), ultra-violet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS). Methanol was adsorbed on the clean surface at 140 K in monolayer quantities and subsequently desorbed over a broad range of temperature from 140 to 400 K. The UPS He (II) spectra showed the 5 highest lying emissions seen in the gas phase spectrum of methanol with a chemisorption bonding shift of the two highest lying orbitais due to bonding to the surface via the oxygen atom with which these orbitals are primarily associated. A species of quite a different nature was produced by heating this layer to 270 K. Most noticeably the UPS spectrum showed only 3 emissions and the maximum coverage of this state was approximately $\text{1}\text{2}$ monolayer. The data are indicative of the formation of a methoxy species, thus showing that methanol is dissociated on the clean Cu(110) surface at 270 K. The same dissociated species was observed on the oxygen dosed surface, the main difference in this ease being the production of large amounts of H₂CO observed in TPRS at 370 K.     

Sulfur dioxide adsorption and reaction with atomic oxygen on the Ag(110) surface

The adsorption of SO₂ on Ag(110) and the reaction of SO₂ with oxygen adatoms have been studied under ultrahigh vacuum conditions using low energy electron diffraction, temperature programmed reaction spectroscopy and photoelectron spectroscopy. Below 300 K, SO₂ adsorbs molecularly giving p(1×2) and c(4×2) LEED patterns at coverages of one half and three quarter monolayers. respectively. At intermediate coverages, streaked diffraction patterns, similar to those reported for noble gas and alkali metal adsorption on the (110) face of face-centered cubic metals were observed, indicating adsorption out of registry with the surface. A feature at low binding energy in the ultraviolet photoemission spectrum appeared which was assigned to a weak chemisorption bond to the surface via the sulfur, analogous to bonding observed in SO₂-amine charge transfer complexes and in transition metal complexes. SO₂ exhibited three binding states on Ag(110) with binding energies of 41, 53 and 64 kJ mol^?1; no decomposition on clean Ag(110) was observed. On oxygen pretreated Ag(110), SO₂ reacted with oxygen adatoms to form SO_3(a), as determined by X-ray photoelectron spectroscopy. Reacting preadsorbed atomic oxygen in a p(2 × 1) structure with SO₂ resulted in a c(6 × 2) pattern for SO_3(a). The adsorbed SO_3(a) decomposed and disproportionated upon heating to 500 K to yield SO_2(g), SO_4(a) and subsurface oxygen.     

Thermal decomposition of 1,1-dimethylhydrazine on Si(100)-2 × 1

The surface reaction of 1,1-dimethylhydrazine (DMH) with Si(100) has been studied with temperature programmed desorption spectroscopy (TPD), temperature programmed static secondary ion mass spectrometry (TPSSIMS), X-ray photoelectron spectroscopy (XPS), and Auger electron spectroscopy (AES). Adsorption of DMH on Si(100) at 170 K followed by annealing to 1100 K results in significant decomposition to form surface carbide and nitride. TPD results show that the only gas phase desoprtion products are hydrogen and dimethylamine. Furthermore, decomposition occurs over a broad temperature range; XPS and TPSIMS results indicate C---N bond cleavage beginning at 400 K and by 600 K, all the C---N bonds have dissociated. We propose a molecular level mechanism that involves partial decomposition upon adsorption followed by extensive bond cleavage to form surface carbide and nitride.     

Photoemission via bloch states and evanescent band gap states for Cu(110)

Normal emission photoelectron spectra from Cu(110) using polarized synchrotron radiation (hv < 35 eV) can be explained with a direct transition model using realistic final state bands. Prominent surface photoemission via evanescent final states is observed in the large X′₅-X₁ conduction band gap. Accurate valence band eigenvalues at K and X have been determined.     

Application of synchrotron radiation to investigation of the mechanism of increase in the yield of alkali metal ions in electron-stimulated desorption

Core-level photoelectron spectroscopy with synchrotron radiation (hv = 140 eV) has been applied to study the variation in the Si⁺ charge state in silicon films deposited on the W(100) surface after thermal annealing of the substrate. The purpose of this study is to check the mechanism responsible for the sharp increase in the yield of Na⁺ ions in electron-stimulated desorption from a sodium layer adsorbed on the Si/W(100) surface after high-temperature annealing. The evolution of the W 4f _7/2 and Si 2p photoelectron spectra and the valence band photoemission spectra is investigated for two silicon coverages (1 and 3 ML) on the W(100) surface in the temperature range 300<T<2200 K. It is shown that annealing of 1 ML Si on the W(100) surface results in the formation of a W-Si covalent bond, which can weaken the Si-Na bond and lead to an increase in the equilibrium distance X ₀ and, hence, to an increase in the yield of Na⁺ ions in electron-stimulated desorption. The variation in the photoelectron spectra under annealing of 3 ML Si differs from that observed after annealing of 1 ML Si in the direction of charge transfer, thus correlating with the opposite effect of annealing of 3 ML Si/W on the Na⁺ yield in electron-stimulated desorption.     

Angular-resolved photoemission from NH3 on Ni(110)

NH₃ adsorbed on Ni(110) at a temperature of 100 K has been studied by angular-resolved ultraviolet photoelectron spectroscopy (ARUPS) using synchrotron radiation in the energy range 10 ? ? ω ? 35 eV. From ARUPS it is concluded that NH₃ bonds via its nitrogen lone-pair orbital with its molecular axis normal to the surface. For both the 3a₁ and 1e level dispersion has been found indicating lateral interactions within a compact NH₃ layer. Increasing the NH₃ coverage beyond the chemisorbed monolayer produces a physisorbed monolayer followed by a multilayer deposition of NH₃ phase on top which has been identified by photoemission and thermal desorption. Desorption and partial decomposition result from annealing. At 300 K NH₃ or NH is left at the surface which desorbs almost completely by annealing to 400 K.     

Photon-induced chemical vapor deposition of molybdenum on Pt(1 1 1)

Temperature-programmed desorption (TPD) and X-ray photoelectron spectroscopy (XPS) have been employed to study the adsorption and photon-induced decomposition of Mo(CO)₆. Mo(CO)₆ adsorbs molecularly on a Pt(1 1 1) surface with weak interaction at 100 K and desorbs intact at 210 K without undergoing thermal decomposition. Adsorbed Mo(CO)₆ undergoes decarbonylation to form surface Mo(CO)_x (x ? 5) under irradiation of ultraviolet light. The Mo(CO)_x species can release further CO ligands to form Mo adatoms with CO desorption at 285 K. In addition, a fraction of the released CO ligands transfers onto the Pt surface and subsequently desorbs at 350-550 K. The resulting Mo layer deposited on the Pt surface is nearly free of contamination by C and O. The deposited Mo adatoms can diffuse into the bulk Pt at temperatures above 1070 K.     

Effect of the crystalline constitution of TiO2 substrates on the growth of ultrathin Mo layer

Metallic molybdenum was deposited by magnetron sputtering on amorphous and (110) rutile TiO₂ substrates. An interfacial reaction between the deposited Mo and the TiO₂ substrates generating Ti^3 +, Ti^2 + oxidation states is evidenced by X-ray photoelectron spectroscopy. Our XPS data suggest, as compared to the (110) rutile substrate, a higher reactivity of the amorphous TiO₂ leading to a stronger Mo oxidation. In both cases, this reaction, leads to the formation of MoO_x nanostructures at the interfaces. The growth mechanism of the Mo deposit as a function of the crystalline constitution of the TiO₂ substrate was analyzed by processing the XPS data using the Quases ® software. The data reveal a layer-by-layer growth of the Mo deposit on the (110) rutile substrate and a Stranski–Krastanov growth on the amorphous one. We explain these different growth modes based on the TiO₂ surface reactivity and electronic structure using the Cabrera–Mott theory. This explanation is supported by Time-of-Flight Secondary Ion Mass spectrometry profiling.     

Décomposition thermique du monoxide de carbone sur une surface de molybdène: Formation de couches superficielles de carbone et de carbure

We have investigated the decomposition of carbon monoxide on polycrystalline and (001), (110) monocrystalline molybdenum surfaces. This study was performed by massspectrometry, for thermal desorption studies, Auger electron spectrometry (AES), low energy electron diffraction (LEED) and photoelectron spectroscopy (ESCA). By heating the clean Mo surface in CO or by heating the Mo surface covered with CO, the dissociation of chemisorbed CO leads to a build-up of carbon layer which inhibits the subsequent adsorption. Two distinct types of fine structure are associated with the KLL line of carbon Auger spectra. If the Mo surface is heated at a temperature between 300 and 1500 K, the Auger peak is characteristic of a “graphite layer”. If the Mo surface is heated at a temperature up to 2000 K, the Auger peak is characteristic of a “carbure” layer. This “carbure layer” give rise to a surstructure which agrees with a Mo₂C surface layer and was also investigated by ESCA. Chemical shifts of (1s) C and (3d) Mo photoemission bands were observed and attributed to the bounding between Mo and C atoms in the Mo₂C layer.     

Adsorption and reaction of bromine with Ag(110): A photoemission study

The adsorption of bromine on the (110) surface of silver has been studied by ultraviolet (hυ = 21.2 and 40.8 eV) photoelectron spectroscopy in the temperature range of 100–300 K. Four different adsorption and reaction states could be detected. For fractional monolayer coverages Br₂ adsorbs dissociatively on the Ag(110) surface. The chemisorption of bromide leads to new emission features at about 3 and 5.2 eV below E_F, which are assigned as occupied antibonding structures (3 eV) and as bonding Br4p_{x, y} orbitals (5.2 eV). At 100 K, further bromide adsorption leads to the formation of an AgBr layer with molecular adsorbed bromine on top of this corrosion layer. The He I spectrum is dominated by structures at 3.5, 5.8 and 7.5 eV which are due to emission from the π_g, π_u and σ_g molecular orbitals of Br₂. The buildup of the AgBr layer is clearly demonstrated by desorbing the molecular bromine at about 150 K. The resulting spectrum of the AgBr layer shows peaks at 2.5 and 3.4 eV with p- and mixed-in d-character and peaks at 4.1, 5.2 and 6.1 eV which are primarily d-like. Heating of the AgBr layer up to 300 K results in a transformation from a 2D layer into a 3D agglomeration of larger AgBr clusters on top of a Br/Ag(110) chemisorption layer.     

The adsorption and reaction of Acetonitrile on clean and oxygen covered Ag(110) surfaces

The adsorption and reaction of acetonitrile (CH₃CN) on clean and oxygen covered Ag(110) surfaces has been studied using temperature programmed reaction spectroscopy (TPRS), isotope exchange, chemical displacement reactions and high resolution electron energy loss spectroscopy (EELS). On the clean Ag(110) surface, CH₃CN was reversibly adsorbed, desorbing with an activation energy of 10 kcal mol^-1 at 166 K from a monolayer state and at 158 K from a multilayer state. Vibrational spectra of multilayer, monolayer and sub-monolayer CH₃CN were in excellent agreement with that of gas phase CH₃CN indicating that CH₃CN is only weakly bonded to the clean Ag(110) surface. On the partially oxidized surface CH₃CN reacts with atomic oxygen to form adsorbed CH₂CN, OH and H₂O in addition to forming another molecular adsorption state with a desorption peak at 240 K. This molecular state shows a CN stretching frequency of 1840 cm^-1, which is indicative of substantial rehybridization of the CN bond and is associated with side-on coordination via the π system. The CH₂CN species is stable up to 430 K, where C-H bond breaking and reformation begins, leading to the formation of CH₃CN at 480 K and HCN at 510 K and leaving only carbon on the surface. In the presence of excess oxygen atoms C-H bond breaking and reformation is more facile leading to additional desorption peaks for CH₃CN and H₂O at 420 K. This destabilizing effect of O_(a) on Ch₂CN_(a) is explained in terms of an anionic (CH₂CN^-1) species. Comparison of the vibrational spectra from CH₂CN_(a) and CD₂CN_(a) supports the following assignment for the modes of adsorbed CH₂CN: ν(Ag-C) 215: δ(CCN) 545; ϱ_t(CH₂) 695; ϱ_w(CH₂) 850; ν(C-C) 960; ϱ_r(CH₂) 1060; δ(CH₂) 1375; ν(CN) 2075; and ν(CH₂) 2940 cm^-1. These results serve to further indicate the wide applicability of the acid-base reaction concept for reactions between gas phase Brönsted acids and adsorbed oxygen atoms on solver surfaces.     

Effects of potassium on the reaction pathways of CH2 fragment over Mo2C/Mo(1 0 0)

The adsorption and surface reactions of CH₂I₂ on the K-dosed Mo₂C/Mo(1 0 0) have been studied by high resolution electron energy loss spectroscopy, X-ray photoelectron spectroscopy and thermal desorption spectroscopy. Potassium is an effective promoter for the rupture of C-I bond in the adsorbed CH₂I₂. A partial dissociation of this compound occurred even at 100 K and was completed at 190 K at monolayer K coverage. The dissociation was further promoted by the illumination of coadsorbed layer at 100 K. As revealed by HREELS and XPS measurements the primary products of the dissociation are CH₂ and I. Methylene was converted to π-bonded ethylene characterized by T_p = 160 K, and di-σ-ethylene with T_p = 350 K. Other products of the surface reaction are hydrogen and methane. The coupling reaction of CH₂ species was clearly facilitated by potassium. The effect of potassium was explained by the extended electron donation to adsorbed alkyl iodide in one hand, and by the direct interaction between potassium and I on the other hand.     

Interaction of ethylene with palladium clusters supported on oxidised tungsten foil

The reactivity with ethylene of palladium clusters supported on oxidised tungsten foil has been investigated by synchrotron radiation-induced photoelectron spectroscopy and temperature programmed desorption. The effect of the heat pre-treatment of the sample on the interaction strength with ethylene is demonstrated. Already at room temperature, adsorption of ethylene causes breaking of both the C-H and C-C bonds and the appearance of a highly reactive C₁ phase with unsaturated bonds. A part of this phase is oxidised to carbon monoxide by oxygen supplied by the support immediately after ethylene adsorption. Another part of ethylene is probably adsorbed in the form of ethylidyne. Heating at temperatures between 400 K and 500 K brings about the dissolution of the C₁ phase in the shallow subsurface region of the Pd clusters. Further oxidation of the C₁ phase by oxygen from the support proceeds at ∼600 K. Substantial reduction of the concentration of C₁ phase at room temperature is observed after heat pre-treatment of the sample at 500 K, while complete suppression of the room temperature ethylene chemisorption proceeds upon heat pre-treatment at 800 K. This effect is related to thermally induced encapsulation of palladium clusters in surface tungsten oxide.     

Reactivity of 3-hexyne on oxygen modified Ru(0 0 1) surfaces: Observation of oxametallacycles by RAIRS

The chemical behaviour of 3-hexyne on oxygen modified Ru(0 0 1) surfaces has been analysed under ultrahigh-vacuum, using reflection-absorption infrared spectroscopy (RAIRS). The effects of oxygen coverage, 3-hexyne exposure and adsorption temperature were studied. Two modified Ru(0 0 1) surfaces were prepared: Ru(0 0 1)-(2 × 2)-O and Ru(0 0 1)-(2 × 1)-O that correspond to oxygen coverages (θ_O) of 0.25 and 0.5 ML, respectively. The striking result is the direct bonding to an O atom when the modified surfaces are exposed to a very low dose (0.2 L) of 3-hexyne at low temperature (100 K). For θ_O = 0.25 ML, an unsaturated oxametallacycle [Ru-O-C(C₂H₅)C(C₂H₅)-Ru] is proposed, identified by RAIRS for the first time, through the νCC and νCO modes. Further decomposition at 110 K yields smaller oxygenated intermediates, such as acetyl [μ₃-η²(C,O)-CH₃CO], co-adsorbed with a small amount of carbon monoxide and non-dissociated species. The temperature at which a fraction of molecules undergoes complete C-C and C-H bond breaking is thus much lower than on clean Ru(0 0 1). The ultimate decomposition product observed by RAIRS at 220 K is methylidyne [CH]. Another key observation was that the adsorption temperature is not determinant of the reaction route, contrarily to what occurs on clean Ru(0 0 1): even when 3- hexyne strikes the surface at a rather high temperature (220 K), the multiple bond does not break completely. For θ_O = 0.5 ML, a saturated oxametallacycle [Ru-O-CH(C₂H₅)-CH(C₂H₅)-Ru] is also proposed at 100 K, identified by the ν_asO-C-C (at 1043 cm⁻¹) and ν_sO-C-C (at 897 cm⁻¹) modes, showing that some decomposition with C-H bond breaking occurs. For this oxygen coverage, the reaction temperatures are lower, and the intermediate surface species are less stable.     

Overtone spectroscopy of benzaldehyde

The vibrational overtone spectra of aryl and alkyl C-H stretch vibrations in benzaldehyde have been studied using conventional IR and thermal lensing technique at room temperature. The stretching vibrational frequencyω _e, anharmonicity constantω _e x _e and the dissociation energies of the two C-H bonds have been calculated. The bond length of C-H bond in aryl position has been estimated.     

The interactions of thiophene with polycrystalline UO2

We have studied the adsorption and desorption of thiophene on polycrystalline UO₂ as function of coverage, over the temperature range 100-640 K, using X-ray photoelectron spectroscopy (XPS), temperature programmed desorption (TPD) and electron stimulated desorption (ESD). Thiophene is found to adsorb molecularly on stoichiometric UO₂. C 1s and S 2p XPS spectra are measured at different thiophene exposures and at different temperatures; they show no evidence for the presence of dissociation fragments, confirming that thiophene adsorbs and desorbs molecularly on a polycrystalline stoichiometric UO₂ surface. The variation of the S 2p and C 1s intensity as function of exposure, together with ESD measurements of O⁺ as function of exposure, can be connected to the growth mode of a thiophene film on UO₂; the thiophene film converts from a flat-lying configuration to an inclined structure as coverage increases. The effects of X-rays, UV, and electron irradiation on thiophene films have been studied in two different coverage regimes, monolayer and multilayer. Irradiation leads to a modification of thiophene films, and appreciable concentrations of species stable to 640 K are present on the surface for both regimes. The XPS results suggest that irradiation induces polymerization and oligomerization, as well as formation of thiolates and dissociation fragments of thiophene. The adsorption and reactivity of thiophene on defective UO₂ surfaces have also been studied. The O vacancies and defects in the oxide surface cause cleavage of C-H and C-S bonds leading to the dissociation of thiophene at temperatures as low as 100 K. These results illustrate the important role played by O vacancies in the chemistry of thiophene over an oxide surface.     

The reaction of carbon and water as catalyzed by a nickel surface

Many of the individual steps which make up the reaction of carbon and water to produce CO and H₂ were studied on a nickel foil surface using temperature-programmed reaction spectroscopy (TPRS), Auger electron spectroscopy (AES), and ultraviolet photoelectron spectroscopy (UPS). Surface graphite and carbide, two metastable surface carbon forms, were prepared by dehydrogeneration of C₂H₂ and served as reactant carbon. UPS of the graphite monolayer in contact with the metal yielded a valence electronic structure that could be interpreted in terms of the bulk band structure of graphite. The fully carbided Ni surface was active for H₂O dissociation with an estimated activation energy ≤ 5 kcal/mol. The reaction of graphitic carbon in contact with the nickel surface and adsorbed oxygen occurs directly without isolated prior breaking of carbon-carbon bonds. The estimated activation energy for the direct reaction was 44 kcal/mol. A different catalytic reaction cycle involving carbon-carbon bond breaking followed by oxidation of the carbide is energetically more demanding. The activation energy for direct carbon-carbon bond breaking was estimated to be between 65 and 70 kcal/mol. Following this demanding step, the reaction between carbidic carbon and oxygen proceeded with estimated activation energy of 31 kcal/mol.