X-ray reflectivity study of hydrogen implanted silicon

The X-ray reflectivity (XRR) technique was used to study monocrystalline silicon samples implanted with H₂ ions at an energy of 31 keV and to the dose of 2 × 10¹⁶ hydrogen atoms/cm². All samples were subsequently isochronally annealed in vacuum at different temperatures in the range from 100 to 900 °C. Although the hydrogen depth distribution was expected to be smooth initially, fringes in the XRR spectra were observed already in the implanted but not annealed sample, revealing the presence of a well-defined film-like structure. Annealing enhances the film top to bottom interface correlation due to structural relaxation, resulting in the appearance of fringes in the larger angular range, already at low annealing temperatures. The thickness of the film decreases slowly up to 350 °C where substantial changes in the roughness are observed, probably due to the onset of larger clusters formation. Further annealing at higher temperatures restores the high correlation of the film interfaces, while the thickness decreases with the temperature more rapidly.     

A comparative study of donor formation in dysprosium, holmium, and erbium implanted silicon

Formation of donor centers in Czochralski grown silicon doped with dysprosium, holmium, and erbium is discussed. Donor states of three kinds are introduced in the implanted layers after annealing at T=700°C. Shallow donor states with ionization energies between 20 and 40 meV are attributed to oxygen -related thermal donors. Other donor centers in the energy range of E_C−(60…70) meV and E_C−(100…120) meV appear to be dependent on dopants. After a 900°C anneal strong changes in the donor formation are observed only in silicon doped with erbium. Instead of donors at E_C−(118±5) meV, new donor centres at E_C−(145±5) meV are formed. Reportedly, the latter ones are involved in the excitation process of the Er³⁺ ions with a characteristic luminescence line at ≈1.54 μm.     

离子注入法制备GaN∶Er薄膜的Raman光谱分析

对离子注入法制备的u-,n-和p-GaN∶Er三种类型的薄膜样品进行了Raman光谱分析。Er+注入GaN样品后新出现了293,362和670 cm-1等波数的Raman峰,其中293 cm-1处的Raman峰被指认为无序激活的Raman散射(DARS),362 cm-1和670 cm-1处的Raman峰可能与离子注入后形成的GaN晶格缺陷有关。上述GaN∶Er样品在800℃退火前后的E₂(high)特征峰均向高频方向移动,表明薄膜晶格中均存在着压应力。采用洛伦兹拟合分析了Raman光谱中组成A₁(LO)模式峰的未耦合LO模与等离子体激元耦合模LPP+在不同样品中的出现情况,定性指出了GaN∶Er系列样品中载流子浓度的变化规律。     

Broad band light emission from Ag-ion implanted silicon nanocrystals

Silicon nanoparticles formed using low energy (<50 keV) silver ion implantation in crystalline Si exhibit broad band light emission from ultraviolet (UV) to green. The formation of nanoparticles is confirmed using high resolution electron microscopy (HRTEM) and the resulting microscopy is used to obtain the size distribution of Si nanoparticles. Photoluminescence (PL) spectra were observed in the range of the UV to the green. The origin of emission is most likely from highly localized defects at the Si/SiO2 which is further confirmed from Photoluminescence Excitation (PLE) and effective mass theory estimation.     

Radiation damage and annealing in Sb implanted diamond

The predicted, but as yet unobserved, intradonor absorption spectrum of the hydrogenic-like donors in CdF₂ crystals is presented. The role of phonon coupling in these spectra is discussed. From the data on the insulator-semiconductor transition in CdPbF₂ it is concluded that the dominant factor in convertibility of CdF₂ to a semiconducting state is its electron affinity, the largest among the fluorites (x≈4 eV).     

The effect of annealing under hydrostatic pressure on the visible photoluminescence from si-ion implanted SiO2 films

We have studied the influence of the hydrostatic pressure during annealing on the intensity of the visible photoluminescence (PL) from thermally grown SiO₂ films irradiated with Si⁺ ions. Post-implantation anneals have been carried out in an Ar ambient at temperatures T_a of 400°C and 450°C for 10 h and 1130°C for 5 h at hydrostatic pressures of 1 bar–15 kbar. It has been found that the intensity of the 360, 460 and 600 nm PL peaks increases with rising hydrostatic pressure during low-temperature annealing. The intensity of the short-wavelength PL under conditions of hydrostatic pressure continues to rise even at T_a=1130°C. Increasing T_a leads to a shift in the PL spectra towards the ultraviolet range. The results obtained have been interpreted in terms of enhanced, pressure-mediated formation of ≡Si–Si≡ centres and small Si clusters within metastable regions of the ion-implanted SiO₂.     

Modifications of He implantation induced cavities in silicon by MeV silicon implantation

Doppler broadening spectroscopy (DBS) coupled to a slow positron beam has been used to investigate the formation of He-cavities in the presence of high vacancy concentrations in Cz-Si (1 1 1). Si samples were first implanted with MeV Si ions in order to create a damaged Si layer. DBS measurements show the presence of divacancy (SV₂/SSi lattice=1.052,WV₂/WSi lattice=0.83) from the surface up to 4.2 μm depth with a concentration higher than 10¹⁸ cm⁻³. The thickness of this damaged layer was confirmed by spreading resistance measurements. In the second step, samples were implanted with 50 keV ³He with fluence of 10¹⁶ cm⁻². DBS results show that the apparent divancancy concentration decreases at ³He implantation depth ∼435 nm due to ³He passivation of vacancies that occurs during the implantation process. After 900 °C annealing, large defects are detected at depth up to 2 μm and (S, W) values suggest the detection of cavities at the implantation depth. We also report the possible presence of impurity complexes. The formation of these complexes is attributed to the gettering of metallic impurities present in the Si sample.     

Behavior of implanted hydrogen in thermally stimulated blistering in silicon

The processes of accumulation of ion implanted hydrogen in blisters in silicon and its release during the thermal treatment from 350 to 1020?°C have been studied by optical techniques. It was established that accumulation of gaseous hydrogen inside blisters takes place at temperatures lower than ～450–500?°C and is accompanied by the growth of blister thickness and deformation of their caps. At higher temperatures the gaseous hydrogen goes out of the cavities dissolving in silicon. Due to the internal pressure dropping the elastically deformed top layer partially relaxes and the blister thickness decreases. Etching of the surface layer reveals the agglomerations of small voids (<0.3?mm) located in the place of blisters approximately at their depth. Proceeding from the fact that the processes in blistering are similar to those in ion cut, the following conclusions with respect to the latter were drawn. The exfoliation processes themselves occur at temperatures lower than ～500?°C. The exfoliation efficiency particularly at the higher temperatures is essentially dependent on the heating rate.     

Enhanced photoluminescence of Ar implanted sapphire before and after annealing

In this paper, we studied the changes in the photoluminescence spectra of the Ar⁺ ion implanted mono-crystalline sapphire annealed at different atmospheres and different temperatures. Single crystals of sapphire (Al₂O₃) with the (1 0 1¯ 0) (m-samples) orientation were implanted at 623 K with 110 keV Ar⁺ ions to a fluence of 9.5×10¹⁶ ions/cm². Photoluminescence measurement of the as-implanted sample shows a new emission band at 506 nm, which is attributed to the production of interstitial Al atoms. The intensity of emission band at 506 nm first increased then decreased with increase in annealing temperature. For the same annealing temperature, the intensity of PL peak at 506 nm of the sample annealed in air was higher than the sample annealed in vacuum. The experimental results show that the intensity of the PL peak at 506 nm of Ar-implanted sapphire can be enhanced by subsequent annealing with an enhancement of nearly 20 times. The influence of thermal annealing of the Ar-implanted samples on the new 506 nm emission band was discussed.     

Effect of thermal annealing on nitrogen implanted epitaxial Fe films

Nitridated iron is a promising material for potential applications in permanent magnets. Recent work on stabilization of nitridated iron in a foil form through nitrogen ion implantation and annealing motivates to study effect of thermal annealing on the surface of nitrogen-implanted iron. In this work, we show effect of annealing on chemical state and magnetism of nitrogen implanted epitaxial iron films. It is observed that nitrogen in the lattices only stays at the lower temperatures than 450 °C. In addition, significant reduction and lattice modification are taken placed, when the film is annealed at 450 °C. The increases of saturation magnetization and coercivity, where it is annealed at 450 °C, are likely to be triggered by reduction of oxygen contents at the surface and thinning of Fe₂O₃.     

Influence of annealing on the concentration profiles of boron implantations in silicon

The influence of annealing on the concentration profiles of boron implanted into silicon with does of 10¹⁴ ions/cm² up to 10¹⁶ ions/cm² and an energy of 70 keV was studied. The concentration profiles were measured with Secondary Ion Mass Spectrometry (SIMS). The broadening of the concentration profiles during annealing can be described as a superposition of effects resulting from a relatively immobile and a mobile boron fraction. The properties of the immobile boron fraction were studied by measuring the influence of a boron implantation on the distribution of a homogeneous boron background dope. From these experiments it was concluded that the immobile boron fraction consists of boron precipitates. The properties of the mobile fraction were studied from concentration profiles that were obtained after annealing during different periods at the same temperature. It was found that during the initial stage of the annealing process a fast broadening of the profile occurs; this was assumed to be due to an interstitial type boron diffusion. After prolonged annealing the much slower substitutional type diffusion prevails, due to trapping of the interstitial boron atoms by vacancies. The reliability of the SIMS method, as applied to profile measurements, was checked for the high boron doses used in this investigation. Excessive boron precipitates, obtained after annealing of a high dose, such as 10¹⁶ ions/cm² at about 1000°C, appear to give some increase of the ion yield.     

Thermal annealing induced photocarrier radiometry enhancement for ion implanted silicon wafers

An experimental study on the photocarrier radiometry signals of As⁺ ion implanted silicon wafers before and after rapid thermal annealing is performed. The dependences of photocarrier radiometry amplitude on ion implantation dose (1×10¹¹--1×10¹⁶/cm²), implantation energy (20--140 keV) and subsequent isochronical annealing temperature (500--1100 du are investigated. The results show that photocarrier radiometry signals are greatly enhanced for implanted samples annealed at high temperature, especially for those with a high implantation dose. The reduced surface recombination rate resulting from a high built-in electric field generated by annealing-activated impurities in the pn junction is believed to be responsible for the photocarrier radiometry signal enhancement. Photocarrier radiometry is contactless and can therefore be used as an effective in-line tool for the thermal annealing process monitoring of the ion-implanted wafers in semiconductor industries.     

Origin of ferromagnetism and nano-scale phase separations in diluted magnetic semiconductors

This paper reviews various origins of ferromagnetic response that has been detected in diluted magnetic semiconductors (DMS). Particular attention is paid to those ferromagnetic DMS in which no precipitation of other crystallographic phases has been observed. It is argued that these materials can be divided into three categories. The first consists of (Ga,Mn)As and related compounds. In these solid solutions the theory built on p–d Zener's model of hole-mediated ferromagnetism and the Kohn–Luttinger kp theory of semiconductors describes quantitatively thermodynamic, micromagnetic, optical, and transport properties. Moreover, the understanding of these materials has provided a basis for the development of novel methods enabling magnetisation manipulation and switching. To the second group belong compounds, in which a competition between long-range ferromagnetic and short-range antiferromagnetic interactions and/or the proximity of the localisation boundary lead to an electronic nano-scale phase separation that results in characteristics similar to colossal magnetoresistance oxides. Finally, in a number of compounds a chemical nano-scale phase separation into the regions with small and large concentrations of the magnetic constituent is present. It has recently been suggested that this spinodal decomposition can be controlled by the charge state of relevant magnetic impurities. This constitutes a new perspective method for 3D self-organised growth of coherent magnetic nanocrystals embedded by the semiconductor matrix.     

Analysis of the effect of annealing on the photoluminescence spectra of Cu ion implanted ZnS nanoparticles

In the present study, we report the photoluminescence (PL) study of nanoparticles of ZnS implanted with Cu⁺ ions at the doses of 5×10¹⁴, 1×10¹⁵ and 5×10¹⁵ ions/cm² and annealed at 200 and 300 °C. The photoluminescence spectra of the samples implanted at lower doses of 5×10¹⁴ and 1×10¹⁵ ions/cm² and annealed at 200 and 300 °C showed peaks at around 406, 418 and 485 nm. The PL emission peak at 485 nm was attributed to the transition of electrons from conduction band of ZnS to the impurity level formed by the implanted Cu⁺ ions. In the PL spectrum of the sample implanted at the highest dose of 5×10¹⁵ ions/cm², in addition to the emission peaks observed in the PL spectra of the samples implanted at lower doses, a peak at around 525 nm, the intensity of which decreased with increase in the annealing temperature, was observed. The emission peak at 525 nm was attributed to the transitions between sulfur and zinc vacancy levels. The full width at half maximum (FWHM) of the emission peak at 406 nm was observed to decrease with increase in annealing temperature, indicating lattice reconstruction. The observation of copper ion impurity related peak at 485 nm in the PL spectra of samples of the present study indicated that the doping of copper ions into the ZnS lattice is achievable by implanting Cu⁺ ions followed by annealing.     

Origins of ferromagnetism in transition metal doped diamond

Using first-principles calculations, we investigated the electronic and magnetic properties of Mn-doped, Fe-doped, and Co-doped diamond. It is found that the Mn-, Fe-, and Co-doped diamond are stabilized in ferromagnetic configurations. The origins of the magnetic ordering are explained successfully by the phenomenological band coupling model based on the p–d and d–d level repulsions between the dopant ions and host elements. According to Heisenberg model, high Curie temperature may be expected for Mn-, Fe-, and Co-doped diamond if there are no native defects or other impurities.     

The effect of annealing ambient on carrier recombination in boron implanted silicon

The selection of either an oxidising or inert ambient during high temperature annealing is shown to affect dopant activation and electron–hole recombination in boron implanted silicon samples. Samples implanted with B at fluence between 3 × 10¹⁴ cm^–2 to 3 × 10¹⁵ cm^–2 are shown to have lower dopant activation after oxidation at 1000 °C compared to an equivalent anneal in an inert ambient. In addition, emitter recombination is shown to be up to 15 times higher after oxidation compared with an inert anneal for samples with equivalent passivation from deposited Al₂O₃ films. The observed increase in recombination for oxidised samples is attributed to the enhanced formation of boron‐interstitial defect clusters and dislocation loops under oxidising conditions. It is also shown that an inert anneal for 10 minutes at 1000 °C prior to oxidation has no significant impact on sheet resistance or recombination compared with a standard oxidation process.

     

Photoluminescence of “dark” excitons in CdMnTe quantum well, embedded in a microcavity

A diluted magnetic semiconductor (DMS) quantum well (QW) microcavity operating in the limit of the strong coupling regime is studied by magnetoptical experiments. The interest of DMS QW relies on the possibility to vary the excitonic resonance over a wide range of energies by applying an external magnetic field, typically about 30 meV for 5 T in our sample. In particular, the anticrossing between the QW exciton and the cavity mode can be tuned by the external field. We observe the anticrossing and formation of exciton polaritons in magneto-reflectivity experiments. In contrast, magneto-luminescence exhibits purely excitonic character. Under resonant excitation conditions an additional emission line is observed at the energy of the dark exciton. The creation of dark excitons is made possible due to heavy hole–light hole mixing in the QW. The emission at this energy could be due to a combined spin flip of an electron and a bright exciton recombination.     

Effect of hydrogen introduced by channelling implantation on the microstructures in silicon wafers

High-resolution transmission electron microscopy has been employed to study the platelet defects before annealing and the extended defects generated by annealing in the channelling-implanted silicon wafers. It has been found that there apparently appear platelet defects of quite great size and spacing at the maximum projected range of ions (R _max). Additionally, the cracks induced by annealing at 550 °C are generated around R _max instead of the average projected range of ions (R _p) as it is in the non-channelling-implanted samples. Moreover, after annealing at 1000 °C, cracks without branches and cavities arranging in a single array, different from the forked cracks and cavities arranged in several arrays in the non-channelling-implanted samples, are observed in the channelling-implanted silicon wafers. It is suggested that those special microstructure characteristics are ascribed to the channelling effect of implanted hydrogen ions.     

Effects of temperature and atmosphere on the magnetic properties of Co-doped ZnO rods

Co-doped ZnO (Zn_0.95Co_0.05O) rods are fabricated by co-precipitation method at different temperatures and atmospheres. X-ray diffraction, Energy dispersive X-ray spectroscopy and Raman results indicate that the samples were crystalline with wurtzite structure and no metallic Co or other secondary phases were found. Raman results indicate that the Co-doped ZnO powders annealed at different temperatures have different oxygen vacancy concentrations. The oxygen vacancies play an important role in the magnetic origin for diluted magnetic semiconductors. At low oxygen vacancy concentration, room temperature ferromagnetism is presented in Co-doped ZnO rods, and the ferromagnetism increases with the increment of oxygen vacancy concentration. But at very high oxygen vacancy concentration, large paramagnetic or antiferromagnetic effects are observed in Co-doped ZnO rods due to the ferromagnetic-antiferromagnetic competition. In addition, the sample annealed in Ar gas has better magnetic properties than that annealed in air, which indicates that O₂ plays an important role. Therefore, the ferromagnetism is affected by the amounts of structural defects, which depend sensitively on atmosphere and annealing temperature.     

Role of vanadium content in ZnO thin films grown by pulsed laser deposition

Vanadium-doped ZnO films (Zn_1−xV_xO, where x = 0.02, 0.03, 0.05 and 0.07), were formed from ceramic targets on c-cut sapphire substrates using pulsed laser deposition at substrate temperature of 600 °C and oxygen pressure of 10 Pa. In order to clarify how the vanadium concentration influences the films’ properties, structural and magnetic investigations were performed. All films crystallised in wurtzite phase and presented a c-axis preferred orientation at low concentrations of vanadium. The results implied that the doping concentration and crystalline microstructure influence strongly the system's magnetic characteristics. Weak ferromagnetism was registered for the film with the lowest doping concentration (2 at.%), which exhibited a ferromagnetic behavior at Curie temperature higher than 300 K. Increasing the vanadium content in the film caused degradation of the magnetic ordering.