激光辐照下薄膜镜面波纹损伤机理研究

用透镜将脉冲激光束聚焦在铝膜镜面上,在部分样品的激光损伤边缘区,出现波纹状损伤形貌。大多数情况下,有多套波纹同时存在,在镜面形成花纹,或者其中有一两套波纹占优势。提出了脉冲激光辐照下光学元件损伤区边缘产生波纹的一种光干涉模型：认为样品表面本身存在微米级杂质颗粒或者表面缺陷点在激光辐照下首先产生鼓包变形,鼓包或杂质颗粒将激光反射（散射）在未发生变形的区域,与直接辐照在该区域的激光束产生干涉,使得变形区周围的光强呈周期性分布,当变形区进一步损伤后,则在损伤区周围留下了波纹状图案。模拟实验验证了这种设想。     

脉冲激光引起铜膜镜面的环形损伤波纹研究

 用波长1.06μm、半高宽10ns的脉冲Nd:YAG激光辐照铜膜镜面，在激光辐照区，用光学显微镜观察到有规律的环形波纹状损伤图案，波纹平均周期约几十μm。通过对光路系统分析，认为样品前的小孔光阑对激光产生了菲涅尔衍射，使得在样品表面光强分布变成周期性环状分布。在极短的相互作用时间内，热扩散很小，损伤图案依赖于光强分布。并依据实验参数，用柯林斯公式对样品表面的光强分布进行了计算，所得光强分布的周期与损伤波纹的周期基本一致。     

脉冲激光引起铜膜镜面的环形损伤波纹研究

用波长1.06μm、半高宽10ns的脉冲Nd:YAG激光辐照铜膜镜面,在激光辐照区,用光学显微镜观察到有规律的环形波纹状损伤图案,波纹平均周期约几十μm。通过对光路系统分析,认为样品前的小孔光阑对激光产生了菲涅尔衍射,使得在样品表面光强分布变成周期性环状分布。在极短的相互作用时间内,热扩散很小,损伤图案依赖于光强分布。并依据实验参数,用柯林斯公式对样品表面的光强分布进行了计算,所得光强分布的周期与损伤波纹的周期基本一致。     

短脉冲激光辐照下金属镜面波纹损伤机理研究

用脉冲Nd：YAG激光(波长1．06μm、半高宽10ns)辐照了多种金属膜层镜面，用光学与原子力显微镜观察到某些样品损伤区或周围有规律的波纹图案，波纹周期从几微米到几十微米。通过分析实验结果，这里提出了波纹产生的光学模型，认为光路系统中某些元件的衍射或者强光与元件表面相互作用过程中产生的干涉可能会导致元件表面波纹状损伤图案。通过理论计算，初步解释了实验中波纹的周期和其他现象。     

激光辐照薄膜镜面产生损伤现象的研究

描述了薄膜镜面因激光辐照产生的波纹现象,对产生机理进行了分析,提出热导波模型。热导波模型比通常的光学模型能更好的解释波纹现象。     

激光辐照硅、锗材料形成表面波纹实验

随着激光与材料相互作用破坏机理和效应研究的深入，通过大量的实验发现：当激光辐照某些材料表面的功率密度（或能量密度）在损伤阈值附近时，会形成自发的、周期性的、也是永久性的表面波纹。     

准分子激光辐照HgCdTe半导体材料的损伤机理研究

利用光学显微镜和扫描电子显微镜对248 nm准分子脉冲强激光辐照的HgCdTe晶片表面进行了观察,观察到一些与红外波段内激光辐照HgCdTe晶片时大不相同的实验现象.研究表明,红外波段内1 064nm激光辐照HgCdTe半导体材料的损伤机制主要为光热作用,而紫外波段248 nm准分子激光对HgCdTe材料的损伤机制既包含光化学作用也包含光热作用.分析了准分子激光对晶体的机械破坏现象,同时对HgCdTe材料在激光辐照区的条纹产生机理进行了探讨,发现激光驱动声波理论模型比光学模型和热导波模型能更好地解释HgCdTe晶体表面的条纹现象.     

355 nm纳秒紫外激光辐照下熔石英前后表面损伤的对比研究

为了理解前后表面损伤不对称性的物理内涵, 利用阴影成像技术研究了纳秒紫外激光诱使熔石英光学元件表面损伤的时间分辨动力学过程.研究表明,纳秒紫外激光与熔石英作用过程中前后表面损伤的物理机理是完全不同的.前表面处空气中等离子体和冲击波较强, 等离子体的屏蔽作用抑制了余脉冲能量的沉积, 降低了元件损伤程度.而后表面处等离子体吸收激光能量膨胀, 对后表面冲击作用更为严重, 形成的等离子体电子密度可达到10²³cm^-3以上, 反射部分激光能量与入射的激光余脉冲干涉, 使得 关键词： 熔石英 激光诱使损伤 阴影成像技术 光学元件表面     

脉冲激光冲击镁合金表面产生周期性波纹结构的现象及分析

为了研究激光辐照材料引起表面波纹现象及原因,采用钕玻璃激光器产生的脉冲激光来冲击黑漆作为吸收层的AZ91镁合金试样。激光冲击后采用表面三维轮廓仪对试样冲击区域表面进行测量,结果得到在冲击区域存在波纹分布现象;观测并描绘了表面形貌及表面波纹的分布情况,并分析了材料表面波纹特性与激光能量的关系;得出波纹特性受激光能量影响。最后从等离子体对试样的作用和等离子体内部相干受激光散射机制引起的光栅效应两个方面出发,讨论了热传导、热辐射以及激光照射等因素在试样表面产生热微扰动现象的耦合过程,进而从表面热微扰动的非平衡状态探讨了表面波纹的形成机理。     

激光对半导体材料损伤的机理研究

研究了半导体材料对激光的吸收机制。运用一维热传导方程以及载流子耦合扩散方程研究了激光与半导体材料相互作用的热输运、自由载流子输运过程。分析了半导体材料的热学损伤、力学损伤,以及光电探测器的击穿损伤机制。应用数值模拟的方法对Nd:YAG脉冲激光(1.06μm)辐照下感兴趣的半导体材料PbS内部瞬时温度场分布进行了模拟。     

The morphology of pulsed laser-induced damage on the surface of a copper film mirror

A copper film mirror was irradiated using a pulsed Nd:YAG laser (1.06 μm,10 ns) through an aperture. After laser irradiation, the damaged spot was analyzed using an optical microscope and periodic damage rings were found at the laser irradiation spot, the average spacing of these rings being about 40–50 μm. The damage ring could be observed in the periphery of the laser spot under lower laser energy densities. As the laser fluence increased, the periodic damage rings grew to cover the whole laser spot. Under higher laser energy density, the whole film was damaged and the rings disappeared. A Fresnel diffraction model is used to explain the appearance of these rings. The laser beam is diffracted by the aperture in the optic path, the laser intensity distribution at the copper film mirror becomes periodic rings and damage ripple pattern forms instantly with the laser ablation. The laser intensity distribution at the mirror surface is calculated using Collins formula, with which the period of the damage rings and other phenomena can be explained.     

Evaporation of a thin film coated on a substrate induced by a pulsed laser

The two-dimensional Laplace integral transform technique has been applied to get the spatial and temporal temperature distributions in both the molten layer thickness of a thin film coated on a substrate, the still solid part of the thin film of the target and the temperature distribution in the substrate. Also a formula for the time dependence of the evaporated part of the thin film of the target as well as the molten layer thickness of the thin film were obtained. Calculations of the obtained relations were carried out during the irradiation with a pulsed laser. The derivation has taken into account the temperature-dependent absorption coefficient of the irradiated surface and the chemical reaction in the vapor of the thin film. As an illustrative example, computations were carried out on an aluminum thin film coated on a glass substrate.     

Analysis of material modifications induced during laser damage in SiO2 thin films

The damage mechanisms in silica thin films exposed to high fluence 1064 nm nano-second laser pulses are investigated. The thin films under study are made with different techniques (evaporation and sputtering, with and without ion assistance) and the results are compared. The material morphological, optical and structural modifications are locally analyzed with optical microscopy and profilometry, photoluminescence and absorption microscopies. These observations are made for fluences near and above the laser damage threshold, and also in the case of multiple pulse irradiations. An increase in absorption in and around the damages is observed, as well as the generation of different defects that we spatially resolve with absorption and luminescence mappings.     

氧分压对ZrO2薄膜激光损伤阈值的影响

 在不同的氧分压下用电子束热蒸发的方法制备了ZrO₂薄膜。分别通过X射线衍射、光学光谱、热透镜技术、抗激光辐照等测试，对所制备样品的微结构、折射率、吸收率及激光损伤阈值进行了测量。实验结果表明，薄膜中晶粒主要是四方相为主的多晶结构，并且随着氧分压的增加，结晶度、折射率以及弱吸收均逐渐降低。薄膜的激光损伤阈值开始随着氧分压增加从18.5J/cm²逐渐增加，氧分压为9×10^-3Pa时达到最大，值为26.7 J/cm²，氧分压再增加时则又降低到17.5 J/cm²。由此可见，氧分压引起的薄膜微结构变化是ZrO₂薄膜激光损伤阈值变化的主要原因。     

熔石英表面铜膜污染物诱导损伤实验研究

 在熔石英元件表面溅射一层厚度小于10 nm的金属铜膜污染物,并测试元件的透过率。测试355 nm熔石英元件的激光损伤阈值,并用光学显微镜观测损伤形态。实验结果表明：污染后的熔石英元件的损伤阈值降低20%左右,元件表面的金属污染物薄膜经强激光辐照,在熔石英表面形成很多坑状微损伤,分布不均的热应力导致表面起伏,并有明显的烧蚀现象,导致基底损伤阈值下降。建立的光吸收和热沉积传输模型初步解释污染物膜层导致熔石英元件损伤的机理。     

Theoretical and experimental research on spectral performance and laser induced damage of Brewster's thin film polarizers

Polarizers respectively with broad polarizing region bandwidth, large layer thickness error tolerance and high extinction ratio are designed and prepared. Transmittance spectra of the prepared samples are measured at Brewster's angle, and the results show that different requirements can be fulfilled by optimized designs. Spectral performance of designs with higher layer thickness error tolerance coincides better with the theoretical spectra. Laser induced damage threshold of the prepared samples are evaluated. Electric field distribution, defect, film absorption, and damage morphology are investigated, and the results indicate that electric field distribution in high index layers is the main reason that causes the difference of laser induced damage threshold. For both p polarized and s polarized light, the lower the electric field peak value and the farther the layer, which has the strongest electric field away from air, the higher the laser induced damage threshold.     

超声清洗与激光预处理对减反膜阈值的影响

 研究了超声清洗和激光预处理两种后处理手段对减反膜的损伤特性的影响。采用电子束蒸发技术制备了1 064 nm减反膜,利用超声清洗及激光预处理的方法分别对样品进行处理,并对处理前后的样品分别进行激光损伤阈值测试及破斑深度测量。结果表明：处理后减反膜的损伤阈值均有所提升,但激光预处理的阈值增强效果更加明显;超声清洗前后的破斑深度没有大的变化,而激光预处理后的破斑深度比处理前浅得多;原因在于超声清洗只能去除表面杂质,激光预处理可减少和抑制膜层内较深处的缺陷。