甚高频电容耦合氢等离子体特性研究

采用高H₂稀释的SiH₄等离子体放电, 特别是甚高频等离子体增强化学气相沉积技术是当前高速制备优质微晶硅薄膜的主流方法. 尽管在实验上取得了很大的突破, 但其沉积机理一直是研究的热点和难点. 本文通过建立二维时变的轴对称模型,在75 MHz放电频率下, 对与微晶硅沉积非常相关的甚高频电容耦合氢等离子体放电进行了数值模拟, 研究了沉积参数对等离子体特性的影响, 并与光发射谱(OES)在线监测结果进行了比较. 结果表明: 电子浓度 n_e在等离子体体层中间区域最大, 而电子温度 T_e及H_α与H_β的数密度在体层和鞘层界面附近取极大值; 当气压从1 Torr (1 Torr=133.322 Pa)增大至5 Torr时, 等离子体电势单调降低, 在体层中间区域 n_e先快速增大然后逐渐减小, T_e先下降后趋于稳定; 随着放电功率从30 W增大到70 W, 电子浓度 n_e及H_α与H_β的数密度均线性增大, 而电子温度 T_e基本保持不变; OES在线分析结果与模拟结果符合得很好.     

Defect-free growth of epitaxial silicon at low temperatures (500–800 °C) by atmospheric pressure plasma chemical vapor deposition

Epitaxial Si growth at low temperatures (500–800 °C) by atmospheric pressure plasma chemical vapor deposition has been investigated. Silicon films are deposited on (001) Si wafers using gas mixtures containing He, H₂, and SiH₄. The effects of deposition parameters (composition of reactive gases, very high frequency (VHF) power, and substrate temperature) on film properties are investigated by reflection high-energy electron diffraction, atomic force microscopy, cross-sectional transmission electron microscopy, and plasma emission spectroscopy. It is found that epitaxial temperature can be reduced by increasing VHF power, and that an optimum range of VHF power exists for Si epitaxy, depending on the substrate temperature and the composition of the reactive gases. The result of the H₂ concentration dependence of H_α emission intensity, shows that hydrogen atoms generated in the atmospheric pressure plasma play an important role in Si epitaxial growth. Under the optimized growth conditions, defect-free epitaxial Si films (as observed by transmission electron microscopy) with excellent surface flatness are grown at 500 °C with an average growth rate of approximately 0.25 μm/min. PACS 81.05.Cy; 81.15.Gh; 68.55.Jk     

Measurements of SiH4/H2 VHF Plasma Parameters with Heated Langmuir Probe

The parameters of a SiH₄/H₂ VHF plasma were measured as a function of silane gas concentration with a heated Langmuir probe. It was found that when the sailane gas concentration is increased, the nagative ion density increases. Here the negative ion density was estimated from the reduction of the electron saturation current. In addition, the dependence of the wall potential on the silane gas concentration agreed with the theoretical values derived from the Bohm sheath equation including negative ions. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

60MHz电容耦合等离子体中电子能量分布函数特性研究

甚高频(频率大于30 MHz)耦合放电源由于能产生大面积高密度的等离子体而受到了人们的广泛关注. 采用电流、电压探针以及朗缪尔探针诊断技术对60MHz射频激发产生的容性耦合等离子体的放电特性及电子行为进行了研究. 实验结果表明,等离子体的等效电阻/电容随着射频输入功率的增加而减小/增加;等离子体中电子行为不仅依赖于射频输入功率,还与放电气压密切相关;放电气压的增加导致电子能量概率分布函数(EEPF)从双温Maxwellian分布向Druyvesteyn分布转变,而且转变气压远低于文献所报道的数值,这主要是由于在60MHz容性耦合等离子体中电子反弹共振加热效率大为降低. 关键词： 甚高频容性耦合等离子体 朗缪尔探针诊断 电子加热模式     

Characteristics of an atmospheric‐pressure radio frequency‐driven Ar/H2 plasma discharge with copper wire in tube

This paper investigates a plasma discharge driven by a 13.56 MHz radio frequency (RF) power supply at atmospheric pressure, in which a copper wire is inserted in the discharge tube for the deposition of Cu films. The results show that the jet plasma formation originates from the discharge between the copper wire and induction coil because of its electrostatic field. The axial distribution of the plasma parameters in the RF plasma jet, namely the gas temperature, excitation temperature, and electron number density, is determined by diatomic molecule OH fitting, Boltzmann slope, and H_β Stark broadening, respectively. The discharge current significantly declines when a small amount of hydrogen is added to the argon as the plasma‐forming gas, and the gas temperature of discharge plasma increases considerably.     

Numerical study on characteristics of nitrogen discharge at high pressure with induced plasma

Based on the fluid theory of plasma, a model is built to study the characteristics of nitrogen discharge at high pressure with induced argon plasma. In the model, the spices such as electron, N₂⁺, N₄⁺, Ar⁺, and two metastable states (N₂ (A³∑_u⁺), N₂ (a¹∑_u^-)) are taken into account. The model includes particle's continuity equations, electron's energy balance equation, and Poisson equation. The model is solved with a finite difference method. The numerical results are obtained and used to investigate the effect of time taken to add nitrogen gas and initially-induced argon plasma pressure. It is found that lower speeds of adding the nitrogen gas and varying the gas pressure can induce higher plasma density, and inversely lower electron temperature. At high-pressure discharge, the electron density increases when the proportion of nitrogen component is below 40%, while the electron density will keep constant as the nitrogen component further increases. It is also shown that with the increase of initially-induced argon plasma pressure, the density of charged particles increases, and the electron temperature as well as the electric field decrease.     

A non-equilibrium atmospheric pressure Capacitively-Coupled-Plasma (CCP) driven at VHF (162 MHz) for plasma catalysis of CO2 into CO

The design of a Very-High-Frequency (VHF) 162 MHz driven atmospheric-pressure Capacitively-Coupled-Plasma (CCP), with top and bottom electrodes operated in push-pull configuration, powered via a Power-Splitting-Transmission-Line-Driver (PSTLD), is presented. Application to the reprocessing of carbon dioxide into carbon-monoxide in this "high” VHF atmospheric plasma is presented, demonstrating some behaviour of the plasma source. rf power in the system is characterized using measured current (~ 1′s Amps peak) and voltage (~ 10′s Volts peak) waveforms at the electrode; Both are sinusoidal confirming a glow-discharge operational condition. Analysis of Optical Emission Spectra results find a highly non-equilibrium plasma, with high vibrational temperatures (from N₂) in the range ~4000 K, while gas temperature, monitored by a thermocouple at the gas outlet, remains low ~300 K, and confirmed by analysis of the N₂ rotational bands. The relative density of CO produced, as a by-product of CO₂ dissociation, is measured optically using N₂ as an actinometer. The CO density increases with rf power and longer gas residence times in the plasma volume. The high VHF atmospheric plasma is found to operate in pure CO₂ flows (no helium) with minimal gas heating for the full range of power densities (specific energy input of 0.4–2 eV per molecule) investigated.     

感应耦合等离子体的1维流体力学模拟

 采用双极扩散近似的流体力学模型,通过数值模拟方法研究了射频感应耦合等离子体(ICP)中等离子体密度和电子温度等物理量的空间分布,其中射频源的功率沉积由动力学理论给出。分析了不同的射频线圈的驱动电流和放电气压对等离子体密度和电子温度空间分布的影响。在低气压下,等离子体密度基本上保持空间均匀分布。随着放电压强的增加,等离子体密度的分布呈现出明显的空间不均匀性。当线圈电流增大时,等离子体密度和电子温度都随着增大。     

13.56 MHz/2 MHz柱状感性耦合等离子体参数的对比研究

通过Langmuir双探针和发射光谱诊断方法,对比研究了驱动频率为13.56 MHz和2 MHz柱状感性耦合等离子体中电子密度和电子温度的径向分布规律.结果表明:在高频和低频放电中,输入功率的增加对等离子体参数产生了不同的影响,高频放电中主要提升了电子密度,低频放电中则主要提升了电子温度.固定气压为10 Pa,分别由高频和低频驱动时,电子密度的径向分布均为"凸型".而电子温度的分布差异比较明显,高频驱动时,电子温度在腔室中心较为平坦,在边缘略有上升;低频驱动时,电子温度随径向距离的增加而逐渐下降.为了进一步分析造成这种差异的原因,在相同放电条件下采集了氩等离子体的发射光谱图,利用分支比法计算了亚稳态粒子的数密度,发现电子温度的径向分布始终与亚稳态粒子的径向分布相反.继续升高气压到100 Pa,发现不论高频还是低频放电,电子密度的径向分布均从"凸型"转变为"马鞍形",较低气压时电子密度的均匀性有了一定的提升,但低频的均匀性更好.     

大面积等离子体片密度分布分析

利用空心阴极放电产生了尺寸为60 cm× 60 cm× 2 cm的大面积等离子体面. 在实验室条件下对大面积等离子体片的密度分布进行了测量. 由于高压放电脉冲脉宽较短, 实验中改变了测量方法, 同时, 在中等磁场影响下, 为了得到真实的等离子体密度, 进行了必要的数值修正.在放电电流为1---6 A时, 测量了二维的电子密度分布. 另外, 测量并讨论了其他环境参数对等离子体密度的影响. 电子密度的分布情况对与微波波束切换相当重要. 由空心阴极增强型放电产生的大面积等离子体面具有反射X波段(8---12 GHz) 微波需要的足够稠密的电子密度和足够均匀的密度分布, 这是等离子体面在雷达系统中取代金属面板的有利条件.     

Online diagnosis of electron excitation temperature in CH<Subscript>4</Subscript>+H<Subscript>2</Subscript> discharge plasma at atmospheric pressure by optical emission spectra

Methane coupling under low temperature plasmas at atmospheric pressure is a green process by use of renewable sources of energy. In this study, CH₄+H₂ discharge plasma was on-line diagnosed by optical emission spectra so as to characterize the discharge system and to do spade work for the optimization of the technical parameters for future commercial production of methane coupling under plasmas. The study was focused on a calculation method for the online diagnosis of the electron excitation temperature in CH₄+H₂ discharge plasma at atmospheric pressure. The diagnostic method is easy, efficient and fairly precise. A serious error in a literature was corrected during the reasoning of its series of equations formerly used to calculate electron temperatures in plasmas. Supported by the National Natural Science Foundation of China (Grant Nos. 29776037 and 10675028) and the Science and Technology Development Foundation of SINOPEC (Grant No. X500005)     

双温度氩-氮等离子体热力学和输运性质计算

获得覆盖较宽温度和压力范围内的等离子体热力学和输运性质是开展等离子体传热和流动过程数值模拟的必要条件.本文通过联立Saha方程、道尔顿分压定律以及电荷准中性条件求解等离子体组分;采用理想气体动力学理论计算等离子体热力学性质;基于Chapman-Enskog方法求解等离子体输运性质.利用上述方法计算了压力为0.1, 1.0和10.0 atm (1 atm=101325 Pa),电子温度在300—30000 K范围内,非局域热力学平衡(电子温度不等于重粒子温度)条件下氩-氮等离子体的热力学和输运性质.结果表明压力和非平衡度会影响等离子体中各化学反应过程,从而对氩-氮等离子体的热力学及输运性质有较大的影响.在局域热力学平衡条件下,计算获得的氩-氮等离子体输运性质和文献报道的数据符合良好.     

Langmuir单探针诊断电子回旋共振等离子体参数分布特性

本文采用Langmuir单静电探针法,分析诊断了电子回旋共振等离子体的参数分布特性,并分析了微波功率、气压对轴向、径向等离子体空间分布的影响。在微波功率400W~650W范围内等离子体具有较高的密度及良好的径向均匀性。     

纳秒激光诱导紫铜黄铜等离子体特征参数的对比研究

基于1064 nm Nd:YAG激光器,对比研究了紫铜和黄铜等离子的特征参数。洛仑兹函数拟合Cu I 324.75 nm得到紫铜和黄铜等离子体的电子密度分别是3.61017 cm-3和3.31017 cm-3。为了减小谱线自发辐射跃迁几率不确定性和测量误差带来的计算误差,采用改进型迭代玻耳兹曼算法精确求解紫铜等离子体和黄铜等离子体的电子温度分别是6316 K和6051 K,分析表明,两种等离子体特征参数的差异主要是由于黄铜中的锌元素的电离能（9.39 eV）大于铜元素的电离能（7.72 eV）而造成的。实验数据证实激光诱导的紫铜和黄铜等离子体满足局部热力学平衡模型和光学薄模型。     

Experimental study on parameters of dust plasma in SiH4/C2H4/Ar discharges

Measurements of dust plasma parameters were carried out in the discharges of （SiH4/C2H4/Ar） mixtures. Dust particles were formed in the capacitively coupled radio-frequency discharge of these reactive mixtures in a cylindrical chamber. Langmuir probe was employed for diagnosing and measuring the important plasma parameters such as electron density and electron temperature. The results showed that the electron density dropped, and in contrast the electron temperature rose when the dust particles formed. The curves of the electron density and temperature versus the RF power and pressure were presented and analysed. Further, it was found that the wriations of electron temperature and the size of dust void with the RF power followed the similar trends. These trends might be useful for understanding more about the characteristics of dusty voids.     

层流氩等离子体射流温度的测量

 采用给水冷管状静电探针施加负偏置电压、并使探针以一定速度垂直于射流轴线扫过层流氩等离子体射流的方法,测量探针所收集到的累积离子饱和电流随侧向位置的变化,利用Abel变换推导出了局部离子饱和电流密度沿射流径向的分布;采用自制的水冷动压探针,以动态扫描法测量了射流动压沿射流径向的分布;根据局部离子饱和电流密度和射流动压的测量数据,由理论关系式推导出了等离子体射流横截面上的温度分布,同时,采用谱线相对强度法测量了等离子体射流的激发温度。结果表明：两种方法得到的等离子体射流中心温度吻合较好,所得到的射流中心温度随弧电流加大而增大的变化趋势也一致。     

Formation and Dynamics of Very Deep Negative Potential Well in the Small Tokamak Device CSTN-IV

We achieved a potential well more than fifty times deeper than the plasma electron temperature, down to -0.3 kV with the electrode biasing, by the cross-field radial arcing current of up to 150 A which flows between the small electron-emitting electrode (LaB₆) inserted to the plasma center and the stainless-steel wall of vacuum chamber. The empirical scaling of the radial resistance of plasma R _r on the radial arcing current I _b and the toroidal magnetic field B _T is found to be R _r I _b ^-1.2 B _T ^1.0. Structural dynamics of negative potential well formation is observed: the potential dip propagates from the plasma core to the periphery. The ion saturation current also increases, starting from the inner region. The fluctuation frequency in I _sat changes abruptly from 200 kHz to 30 kHz in a time of around 0.25 ms after negative biasing.     

低混杂波高N‖分量对EAST等离子体电流驱动的影响

EAST等离子体高约束模运行条件下，在等离子体边缘区域观测到明显的等离子体电流带.在EAST托卡马克装置非圆截面平衡位形下，使用射线追踪方法研究低混杂波高平行折射率N_‖分量对电流驱动的影响.结果表明：当-8≤N_‖≤-6时，平行折射率分量能够在小半径（0.7 < r/a < 1）区域驱动kA量级的等离子体电流.对于具有台基区、等离子体边缘温度更高的电子温度剖面，驱动电流的位置r/a>0.9.低混杂波朗道阻尼的理论分析与数值模拟结果一致.另外，高N_‖低混杂波在等离子体边缘的功率沉积和电流驱动与电子温度分布和发射谱分布相关.     

Längsfeldstärke,Elektronentemperatur, mittlere Neutralgasdichte,Ionenstromdichte auf die Wand und mittlere Entladungsstromdichte in der Freifallsäule bei hohem Ionisationsgrad

On the basis of a foregoing paper new theoretical results for the positive column at low pressure and strong ionization, especially for discharges in noble gas ion lasers, are given. The mean velocity v_n0 of the neutral atoms reemitted from the wall is taken into account. The electric conductivity is calculated for an argon plasma. The formulas connecting the electron temperature, the mean neutral gas density, and the electric field strength are derived. The electron temperature, the axial electric field intensity, the degree of ionization, the axial electron drift velocity, the ion flux to the wall, and the force density causing the main part of gas pumping along the column are calculated as functions of the product of the mean current density and the tube radius, and of v_n0 for argon. The axial drift velocity of the electrons is still smaller than the mean thermal electron velocity for high discharge currents, except at very low gas pressures. In general, the ion flux to the wall is not directly proportional to the discharge current. The factor for the determination of the charged particle density by means of probe measurements at the wall is discussed. The self-magnetic field affects the discharge only at high electron temperature, high degree of ionization, and relatively large tube radius, i.e. at high current density and low gas pressure in not too narrow discharge channels.     

时空非均匀等离子体鞘套中太赫兹波的传播特性

高超声速飞行器再入地面的过程中,其周围等离子体的电子密度是非均匀且随时间变化的.对于不同的再入高度,飞行器周围的温度和压强也会发生改变.因此,研究电磁波在时空非均匀等离子体鞘套中的传播特性意义重大.首先建立了时变非均匀的等离子体鞘套模型,然后通过经验公式得到温度、压强与碰撞频率三者的关系.采用时域有限差分方法计算了太赫兹波段中不同电子密度弛豫时间、温度、压强时的反射系数、透射系数和吸收率.研究结果表明:在太赫兹波段中,电子密度的弛豫时间越长,温度越高,压强越大,电磁波越容易穿透等离子体;弛豫时间越短,温度越低,压强越小,等离子体对电磁波吸收率的变化越明显.这些结果为解决"黑障"问题提供了理论依据.