Lateral resolution in focused electron beam-induced deposition: scaling laws for pulsed and static exposure

In this work, we review the single-adsorbate time-dependent continuum model for focused electron beam-induced deposition (FEBID). The differential equation for the adsorption rate will be expressed by dimensionless parameters describing the contributions of adsorption, desorption, dissociation, and the surface diffusion of the precursor adsorbates. The contributions are individually presented in order to elucidate their influence during variations in the electron beam exposure time. The findings are condensed into three new scaling laws for pulsed exposure FEBID (or FEB-induced etching) relating the lateral resolution of deposits or etch pits to surface diffusion and electron beam exposure dwell time for a given adsorbate depletion state.     

半导体量子阱材料微加工光子晶体的光学特性

利用聚焦离子束刻蚀方法和电子束制版结合干法刻蚀方法制备了二维近红外波段光子晶体，发现两种方法都可以制备出均匀的二维光子晶体，聚焦离子束方法操作简单，电子束制版结合干法刻蚀方法操作步骤复杂.光谱测试表明，利用聚焦离子束方法在有源材料上刻蚀的光子晶体不发光，而电子束制版结合干法刻蚀方法制备的小晶格常数光子晶体即使有些无序，其出光效率也提高到没有光子晶体时的两倍.对两种方法所加工的光子晶体不发光和提高出光效率的机理进行了分析. 关键词： 聚焦离子束 电子束制版 光子晶体 出光效率     

Dependence on substrate topography of growth of nanosized dendritic structures in an electron-beam-induced deposition process

Nanometer-sized W-dendrites are fabricated on Al₂O₃ substrates with an electron-beam-induced deposition process. Dependence of growth of nanodendrite on surface topography is investigated with transmission electron microscopy. It is confirmed that the nanodendrite grows on convex surfaces but not around a hole on a substrate. These are attributed to different distribution of charges on surfaces with different topographies during electron beam irradiation when charges are produced on the surface due to emission of second electrons. The charges accumulate on convex surface and do not distribute around a hole. Therefore, the nanodendrite grows on the former and not on the latter.     

Spatial chemistry evolution during focused electron beam-induced deposition: origins and workarounds

The successful application of functional nanostructures, fabricated via focused electron-beam-induced deposition (FEBID), is known to depend crucially on its chemistry as FEBID tends to strong incorporation of carbon. Hence, it is essential to understand the underlying mechanisms which finally determine the elemental composition after fabrication. In this study we focus on these processes from a fundamental point of view by means of (1) varying electron emission on the deposit surface; and (2) changing replenishment mechanism, both driven by the growing deposit itself. First, we revisit previous results concerning chemical variations in nanopillars (with a quasi-1D footprint) depending on the process parameters. In a second step we expand the investigations to deposits with a 3D footprint which are more relevant in the context of applications. Then, we demonstrate how technical setups and directional gas fluxes influence final chemistries. Finally, we put the findings in a bigger context with respect to functionalities which demonstrates the crucial importance of carefully set up fabrication processes to achieve controllable, predictable and reproducible chemistries for FEBID deposits as a key element for industrially oriented applications.     

人工裁剪制备石墨纳米结构

采用不同的方法裁剪高定向热解石墨（HOPG），制备纳米尺寸的石墨条.首先,发现用聚焦离子束（镓离子）刻蚀高定向热解石墨，可以得到边缘整齐程度在几十纳米的石墨条,另外,用 电子束曝光和反应离子刻蚀的工艺，可以得到最小尺寸为50 nm的纳米石墨图型 (nano-size d graphite pattern,纳米尺寸的多层石墨结构).采用了三种不同的方案制备反应等离子刻 蚀过程中需要的掩膜，分别是PECVD生长的SiO₂掩膜，磁控溅射的方法生长的Si O₂掩膜和PMMA光刻胶掩膜，并将三种方案的刻蚀结果做了对比. 关键词： 高定向热解石墨 聚焦离子束刻蚀 电子束曝光 反应离子刻蚀     

Nanofabrication of tungsten supertip by electron-beam-induced deposition

Two methods were used to fabricate tungsten supertips by electron-beam-induced deposition using 200 keV electrons. The first method is stationary deposition of self-standing tips. The smallest lateral size is less than 10 nm with a rather low aspect ratio of tip. High aspect ratio (up to 30) can only be obtained at a big lateral size with a saturated root diameter of 60–65 nm. The other method is scan deposition of self-supporting tip, with a root width of 7–10 nm and a sharp apex in size of 3 nm. Using this method a higher aspect ratio (more than 72) can be achieved at a smaller lateral size, which is better to fabricate fine supertips for usage.     

A new fabrication technique for photonic crystals: Nanolithography combined with alternating-layer deposition

We propose two photonic crystal structures that can be created by combining nanolithography with alternating-layer deposition. Photonic band calculations suggest that a drilled alternating-layer photonic crystal combining two-dimensional (2D) alternating multilayers and an array of vertically drilled holes may achieve a full photonic bandgap. In addition, a 3D/2D/3D cross-dimensional photonic crystal, which sandwiches a 2D photonic crystal slab between three-dimensional (3D) alternating-layer photonic crystals, should provide better vertical confinement of light than a conventional index guiding slab. Fabrication techniques based on existing technologies (electron beam lithography, bias sputtering, and low-pressure ECR etching) require very few process steps. Our preliminary fabrication suggests that, by refining these technologies, we will be able to realize photonic crystals.     

微波等离子体技术在ICF制靶中的应用

 为了提高ICF精密制靶的质量，提出用微波等离子体（MP）技术，包括等离子体薄膜制备、等离子体反应性离子束刻蚀、聚焦离子束刻蚀、掺杂纳米金属粉末制备和掺杂纳米金属粉末的表面包覆改性等技术，去加以改进和解决。此方法与其它成膜技术相结合，在ICF精密制靶中得到广泛应用。     

Holes drilling in gold and silver decahedral nanoparticles by the convergent beam electron diffraction electron beam

The 200?kV focused electron beam in the convergent beam electron diffraction patterns mode in a transmission electron microscope (TEM) with field emission gun is able to drill holes in gold and silver decahedral nanoparticles. However, although they are done under the same circumstances, the holes are shapeless in the silver and faceted in gold nanoparticles. In addition to this, the holes are closed during their high-resolution TEM observation in both materials. To comment their differences, displacement energy considerations are taken into account as function of the sputtering energy in order to modify the displacement cross-section of the processes.     

Focused electron beam induced deposition as a tool to create electron vortices

Focused electron beam induced deposition (FEBID) is a microscopic technique that allows geometrically controlled material deposition with very high spatial resolution. This technique was used to create a spiral aperture capable of generating electron vortex beams in a transmission electron microscope (TEM). The vortex was then fully characterized using different TEM techniques, estimating the average orbital angular momentum to be ∼0.8ℏ per electron with almost 60% of the beam ending up in the ℓ = 1 state.     

Three-dimensional nanofabrication by electron-beam-induced deposition using 200-keV electrons in scanning transmission electron microscope

Attempts were made to fabricate three-dimensional nanostructures on and out of a substrate by electron-beam-induced deposition in a 200-kV scanning transmission electron microscope. Structures with parallel wires over the substrate surface were difficult to fabricate due to the direct deposition of wires on both top and bottom surfaces of the substrate. Within the penetration depth of the incident electron beam, nanotweezers were fabricated by moving the electron beam beyond different substrate layers. Combining the deposition of self-supporting wires and self-standing tips, complicated three-dimensional doll-like, flag-like, and gate-like nanostructures that extend out of the substrate were successfully fabricated with one-step or multi-step scans of the electron beam. Effects of coarsening, nucleation, and distortion during electron-beam-induced deposition are discussed. PACS 81.16.-c; 81.07.-b; 68.37.Lp; 81.15.Jj; 79.20.Fv     

Cathodoluminescence investigations of RIE-induced defects in InP

Cathodoluminescence (CL) measurements have been performed to characterize defects in InP created by reactive ion etching (RIE) in a CH₄/H₂/Ar plasma. Etching of semi-insulating InP:Fe leads to an increase of CL intensity. After etching of undoped, n-type InP a reduction of band-edge as well as band-acceptor/donor-acceptor-pair emission intensity is detected. No additional emission lines due to etching-induced defects have been detected in the spectral range examined. After a few minutes of electron beam injection the band-edge luminescence recovers to its initial value. Using donor-bound exciton emission, which is especially affected by RIE, mapping of these defects is possible, showing homogeneous defect distribution. In conjunction with other measurements (conductivity, photoluminescence, electron-beam-induced current, Raman scattering, Auger electron spectroscopy depth profiling) these results indicate a nonradiative, donor-like defect created by RIE.     

High-performance and damage-free neutral-beam etching processes using negative ions in pulse-time-modulated plasma

For the past 30 years, plasma-etching technology has led efforts to shrink the patterns of ultralarge-scale integrated (ULSI) devices. However, inherent problems with plasma processes, such as charge build-up and UV photon radiation, have limited etching in the future devices. To overcome these and fabricate sub-50 nm devices in practice, neutral-beam etchings have been proposed. In this paper, we introduce damage-free etching processes using neutral beam with negative ions in pulse-time-modulated plasmas. These techniques can achieve damage-free etching processes. They are promising candidates for the practical technology that will be required to fabricate future devices.     

Electron-assisted chemical etching of oxidized chromium

Electron-assisted chemical etching of oxidized chromium, CrO_x, has been studied by scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and atomic force microscopy (AFM). Two model substrates were used—10 nm CrO_x deposited on Si(1 0 0) that was covered with either native oxide or a 20 nm Au/Pd alloy film. Using chlorine and/or oxygen as etching gases, the experiments were conducted in a customized high vacuum system, equipped with a high density electron source and a low pressure reaction cell. On both substrates, electron-assisted chemical etching of CiO_x was detected by SEM, EDS and AFM. Making the method questionable for etching applications, there is substantial substrate damage associated with the etching. The SEM images indicate strongly inhomogeneous material removal, apparently initiated and propagated from specific but unidentified sites. In the experiments involving the Au/Pd film, there was phase separation of Au and Pd, and dewetting to form metallic islands. AFM data show that the etched holes were as deep as 200 nm, confirming relatively rapid etching of the Si substrate after the top layer of Cr oxide was removed.     

衍射光学元件的反应离子束蚀刻研究

本文提出了一种制作衍射光学元件的新方法——-反应离子束蚀刻法.对此技术研究的结果表明:反应离子束蚀刻法具有高蚀刻速率、蚀刻过程各向异性好、蚀刻参数控制灵活等特点,对于衍射光学元件和微光学元件的精细结构制作十分有利.本文详细总结了反应离子束蚀刻过程中各工艺参数对蚀刻速率的影响,并在红外材料上制作了Dammann分束光栅.     

Growth and characterization of branched carbon nanostructures arrays in nano-patterned surfaces from porous silicon substrates

A method to grow branched carbon nanostructures arrays is presented. We employ the electron-beam-induced deposition method using a transmission electron microscope in poor vacuum conditions where hydrocarbons are present in the chamber. The hydrocarbons are attracted to the substrates by the local electric fields. Saw-tooth nano-patterns were made with a focused ion beam in porous silicon substrates with high porosity in order to create sites with high-local electric fields. We found that the adequate ion dose to create well-defined saw-tooth nano-patterns was between 8 and 10 nC/microm(2). Raman and electron energy-loss spectroscopy on the branched carbon nanostructures show a high concentration of sp(2) sites suggesting that they are made of graphite-like hydrogenated amorphous carbon. Selected area electron diffraction, high-resolution images and energy dispersive X-ray analysis (EDS) are also presented.     

Laser generated microstructures

Deposition and etching processes based on the interaction of laser light with a substrate surface and molecules of the surrounding ambient are discussed in this tutorial review. This laser writing approach is based on photolytic, pyrolytic, or photoelectrochemical microreactions. The fundamental properties of such reactions and corresponding processing parameters (e.g. deposition or etch rate, resolution) are discussed. Important published results for deposition by photolysis, pyrolysis, and etching are summarized in the form of tables. A special list of potential applications for such techniques and a list of all materials used thus far for laser deposition and etching are included.     

a-Si:H based two-dimensional photonic crystals

We describe the fabrication processes of silicon-based two-dimensional photonic crystals (2D-PCs) with a photonic band gap in the near-IR range. The procedures involve electron beam lithography followed by an anisotropic etching step of hydrogenated amorphous silicon thin films deposited by plasma enhanced chemical vapor deposition. Micrometric and submicrometric arrays of cylindrical holes are transferred using a poly-methylmethacrylate resist layer as a mask. A careful comparison between standard parallel plate reactive ion etching and inductively coupled plasma etching techniques is performed, aimed at obtaining periodic structures with high aspect ratio and good profile sharpness.     

Unique electrical properties of nanostructured diamond cones

The preparation and electrical properties of diamond nanocones are reviewed, including a maskless etching pro- cess and mechanism of large-area diamond conical nanostructure arrays using a hot filament chemical vapor deposition （HFCVD） system with negatively biased substrates, and the field electron emission, gas sensing, and quantum transport properties of a diamond nanocone array or an individual diamond nanocone. Optimal cone aspect ratio and array density are investigated, along with the relationships between the cone morphologies and experimental parameters, such as the CH4/H2 ratio of the etching gas, the bias current, and the gas pressure. The reviewed experiments demonstrate the possi- bility of using nanostructured diamond cones as a display device element, a point electron emission source, a gas sensor or a quantum device.     

气相沉积技术在原子制造领域的发展与应用

随着未来信息器件朝着更小尺寸、更低功耗和更高性能方向的发展,构建器件的材料尺寸将进一步缩小.传统的"自上而下"技术在信息器件发展到纳米量级时遇到瓶颈,而气相沉积技术由于其能在原子尺度构筑纳米结构引起极大关注,被认为是最有潜力突破现有制造极限进而在原子尺度构造、搭建物质形态的"自下而上"方法.本文重点讨论适用于低维材料的...